JPH0243258B2 - - Google Patents

Info

Publication number
JPH0243258B2
JPH0243258B2 JP56107431A JP10743181A JPH0243258B2 JP H0243258 B2 JPH0243258 B2 JP H0243258B2 JP 56107431 A JP56107431 A JP 56107431A JP 10743181 A JP10743181 A JP 10743181A JP H0243258 B2 JPH0243258 B2 JP H0243258B2
Authority
JP
Japan
Prior art keywords
photoresist film
developer
laser beam
substrate
exposed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP56107431A
Other languages
English (en)
Japanese (ja)
Other versions
JPS589242A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP56107431A priority Critical patent/JPS589242A/ja
Priority to GB08219667A priority patent/GB2108707B/en
Priority to US06/396,073 priority patent/US4469424A/en
Priority to FR8211935A priority patent/FR2509484B1/fr
Priority to DE3225575A priority patent/DE3225575C2/de
Publication of JPS589242A publication Critical patent/JPS589242A/ja
Publication of JPH0243258B2 publication Critical patent/JPH0243258B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck
    • G03F7/3028—Imagewise removal using liquid means from a wafer supported on a rotating chuck characterised by means for on-wafer monitoring of the processing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Optical Record Carriers And Manufacture Thereof (AREA)
  • Manufacturing Optical Record Carriers (AREA)
JP56107431A 1981-07-08 1981-07-08 フオトレジスト湿式現像方法及び装置 Granted JPS589242A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP56107431A JPS589242A (ja) 1981-07-08 1981-07-08 フオトレジスト湿式現像方法及び装置
GB08219667A GB2108707B (en) 1981-07-08 1982-07-07 Method and system for developing a photo-resist material used as a recording medium
US06/396,073 US4469424A (en) 1981-07-08 1982-07-07 Method and system for developing a photo-resist material used as a recording medium
FR8211935A FR2509484B1 (fr) 1981-07-08 1982-07-07 Procede et dispositif pour developper un materiau photo-sensible utilise comme milieu d'enregistrement
DE3225575A DE3225575C2 (de) 1981-07-08 1982-07-08 Verfahren und Vorrichtung zum Steuern der Entwicklerflüssigkeitszufuhr in einer Fotoresistplattenentwicklungseinrichtung

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56107431A JPS589242A (ja) 1981-07-08 1981-07-08 フオトレジスト湿式現像方法及び装置

Publications (2)

Publication Number Publication Date
JPS589242A JPS589242A (ja) 1983-01-19
JPH0243258B2 true JPH0243258B2 (cs) 1990-09-27

Family

ID=14458962

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56107431A Granted JPS589242A (ja) 1981-07-08 1981-07-08 フオトレジスト湿式現像方法及び装置

Country Status (1)

Country Link
JP (1) JPS589242A (cs)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5916333B2 (ja) * 1975-12-23 1984-04-14 ソニー株式会社 カイテンキロクバイタイノマスタ−バンノセイゾウホウホウ
DE2728361C2 (de) * 1977-06-23 1981-09-24 Ibm Deutschland Gmbh, 7000 Stuttgart Verfahren zum Feststellen eines vorgebbaren Endzustands eines Entwicklungs- oder Ätzvorgangs
US4142107A (en) * 1977-06-30 1979-02-27 International Business Machines Corporation Resist development control system

Also Published As

Publication number Publication date
JPS589242A (ja) 1983-01-19

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