FR2509484B1 - Procede et dispositif pour developper un materiau photo-sensible utilise comme milieu d'enregistrement - Google Patents

Procede et dispositif pour developper un materiau photo-sensible utilise comme milieu d'enregistrement

Info

Publication number
FR2509484B1
FR2509484B1 FR8211935A FR8211935A FR2509484B1 FR 2509484 B1 FR2509484 B1 FR 2509484B1 FR 8211935 A FR8211935 A FR 8211935A FR 8211935 A FR8211935 A FR 8211935A FR 2509484 B1 FR2509484 B1 FR 2509484B1
Authority
FR
France
Prior art keywords
recording medium
material used
sensitive material
developing photo
photo
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR8211935A
Other languages
English (en)
Other versions
FR2509484A1 (fr
Inventor
Fumio Matsui
Mitsuaki Sashida
Toshihiro Komaki
Atsushi Yoshizawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Pioneer Corp
Original Assignee
Pioneer Electronic Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP56107431A external-priority patent/JPS589242A/ja
Priority claimed from JP56112556A external-priority patent/JPS5814343A/ja
Application filed by Pioneer Electronic Corp filed Critical Pioneer Electronic Corp
Publication of FR2509484A1 publication Critical patent/FR2509484A1/fr
Application granted granted Critical
Publication of FR2509484B1 publication Critical patent/FR2509484B1/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck
    • G03F7/3028—Imagewise removal using liquid means from a wafer supported on a rotating chuck characterised by means for on-wafer monitoring of the processing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing Optical Record Carriers (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
FR8211935A 1981-07-08 1982-07-07 Procede et dispositif pour developper un materiau photo-sensible utilise comme milieu d'enregistrement Expired FR2509484B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP56107431A JPS589242A (ja) 1981-07-08 1981-07-08 フオトレジスト湿式現像方法及び装置
JP56112556A JPS5814343A (ja) 1981-07-17 1981-07-17 フオトレジスト湿式現像方法及び装置

Publications (2)

Publication Number Publication Date
FR2509484A1 FR2509484A1 (fr) 1983-01-14
FR2509484B1 true FR2509484B1 (fr) 1986-06-13

Family

ID=26447472

Family Applications (1)

Application Number Title Priority Date Filing Date
FR8211935A Expired FR2509484B1 (fr) 1981-07-08 1982-07-07 Procede et dispositif pour developper un materiau photo-sensible utilise comme milieu d'enregistrement

Country Status (4)

Country Link
US (1) US4469424A (fr)
DE (1) DE3225575C2 (fr)
FR (1) FR2509484B1 (fr)
GB (1) GB2108707B (fr)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5857843U (ja) * 1981-10-16 1983-04-19 パイオニア株式会社 フオトレジスト湿式現像装置
JPS61251135A (ja) * 1985-04-30 1986-11-08 Toshiba Corp 自動現像装置
US4647172A (en) * 1985-05-17 1987-03-03 Gca Corporation Resist development method
JPS61279858A (ja) * 1985-06-05 1986-12-10 Mitsubishi Electric Corp ネガレジスト現像装置
US4857750A (en) * 1987-12-17 1989-08-15 Texas Instruments Incorporated Sensor for determining photoresist developer strength
US5196285A (en) * 1990-05-18 1993-03-23 Xinix, Inc. Method for control of photoresist develop processes
US5138149A (en) * 1990-09-05 1992-08-11 Xinix, Inc. Apparatus and method for monitoring radiant energy signals with variable signal gain and resolution enhancement
US5216487A (en) * 1991-05-22 1993-06-01 Site Services, Inc. Transmissive system for characterizing materials containing photoreactive constituents
US5357304A (en) * 1992-03-25 1994-10-18 Sony Corporation Image development apparatus and method
US5432047A (en) * 1992-06-12 1995-07-11 International Business Machines Corporation Patterning process for bipolar optical storage medium
JP2582996B2 (ja) * 1992-06-12 1997-02-19 インターナショナル・ビジネス・マシーンズ・コーポレイション フォトマスクの製造方法
GB9509039D0 (en) * 1995-05-04 1995-06-28 Kodak Ltd Photographic processing
GB9509040D0 (en) * 1995-05-04 1995-06-28 Kodak Ltd Photographic processing
EP1965383A1 (fr) * 2007-03-02 2008-09-03 Singulus Mastering B.V. Mesure d'ordre de diffraction

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3388652A (en) * 1965-05-27 1968-06-18 Technical Operations Inc Photographic processing control
US3680463A (en) * 1967-03-10 1972-08-01 Curtis C Attridge Automatic film processing device
US3663724A (en) * 1969-11-14 1972-05-16 Chemcut Corp Built-in type speed control for conveyorized continuous etcher
GB1280625A (en) * 1970-02-26 1972-07-05 Nat Res Dev Method of forming fringe pattern images
US3702277A (en) * 1970-09-23 1972-11-07 Zenith Radio Corp Control system for mask etching apparatus
JPS5086345A (fr) * 1973-11-28 1975-07-11
US3995959A (en) * 1975-04-21 1976-12-07 Shaber Gary S Method and apparatus for determining the operational status of a photographic film processor
JPS5941300B2 (ja) 1976-06-09 1984-10-05 株式会社日立製作所 現像処理装置
US4119989A (en) * 1977-01-03 1978-10-10 Pitney-Bowes, Inc. System for controlling concentration of developer solution
US4128325A (en) * 1977-05-31 1978-12-05 Pako Corporation Automatic density measurement calibration for photographic replenishment system
US4180830A (en) * 1977-06-28 1979-12-25 Rca Corporation Depth estimation system using diffractive effects of the grooves and signal elements in the grooves
US4142107A (en) * 1977-06-30 1979-02-27 International Business Machines Corporation Resist development control system
US4136940A (en) * 1977-12-19 1979-01-30 Rca Corporation Resist development control system
US4252400A (en) * 1978-08-09 1981-02-24 Honeywell Inc. Nondestructive dynamic controller for thermoplastic development

Also Published As

Publication number Publication date
GB2108707B (en) 1985-06-19
DE3225575C2 (de) 1986-07-31
DE3225575A1 (de) 1983-03-31
US4469424A (en) 1984-09-04
FR2509484A1 (fr) 1983-01-14
GB2108707A (en) 1983-05-18

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Legal Events

Date Code Title Description
DL Decision of the director general to leave to make available licences of right
ST Notification of lapse
ST Notification of lapse
ST Notification of lapse