FR2514927B1 - Dispositif de developpement d'un materiau photosensible utilise comme milieu d'enregistrement - Google Patents

Dispositif de developpement d'un materiau photosensible utilise comme milieu d'enregistrement

Info

Publication number
FR2514927B1
FR2514927B1 FR828217300A FR8217300A FR2514927B1 FR 2514927 B1 FR2514927 B1 FR 2514927B1 FR 828217300 A FR828217300 A FR 828217300A FR 8217300 A FR8217300 A FR 8217300A FR 2514927 B1 FR2514927 B1 FR 2514927B1
Authority
FR
France
Prior art keywords
developing
recording medium
material used
photosensitive material
photosensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR828217300A
Other languages
English (en)
Other versions
FR2514927A1 (fr
Inventor
Fumio Matsui
Mitsuaki Sashida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Pioneer Corp
Original Assignee
Pioneer Electronic Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Pioneer Electronic Corp filed Critical Pioneer Electronic Corp
Publication of FR2514927A1 publication Critical patent/FR2514927A1/fr
Application granted granted Critical
Publication of FR2514927B1 publication Critical patent/FR2514927B1/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck
    • G03F7/3028—Imagewise removal using liquid means from a wafer supported on a rotating chuck characterised by means for on-wafer monitoring of the processing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing Optical Record Carriers (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
FR828217300A 1981-10-16 1982-10-15 Dispositif de developpement d'un materiau photosensible utilise comme milieu d'enregistrement Expired FR2514927B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1981153669U JPS5857843U (ja) 1981-10-16 1981-10-16 フオトレジスト湿式現像装置

Publications (2)

Publication Number Publication Date
FR2514927A1 FR2514927A1 (fr) 1983-04-22
FR2514927B1 true FR2514927B1 (fr) 1989-05-12

Family

ID=15567578

Family Applications (1)

Application Number Title Priority Date Filing Date
FR828217300A Expired FR2514927B1 (fr) 1981-10-16 1982-10-15 Dispositif de developpement d'un materiau photosensible utilise comme milieu d'enregistrement

Country Status (5)

Country Link
US (1) US4501480A (fr)
JP (1) JPS5857843U (fr)
DE (1) DE3238528C2 (fr)
FR (1) FR2514927B1 (fr)
GB (1) GB2108710B (fr)

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US5196285A (en) * 1990-05-18 1993-03-23 Xinix, Inc. Method for control of photoresist develop processes
JP3070113B2 (ja) * 1991-03-07 2000-07-24 ソニー株式会社 フォトレジストの現像処理装置
US5357304A (en) * 1992-03-25 1994-10-18 Sony Corporation Image development apparatus and method
GB9307239D0 (en) * 1993-04-07 1993-06-02 Nimbus Communications Int Ltd Method and apparatus for process control
US5416552A (en) * 1994-01-28 1995-05-16 Surface Tek, Inc. Apparatus and method for replenishing developer
US5988896A (en) * 1996-10-26 1999-11-23 Applied Science Fiction, Inc. Method and apparatus for electronic film development
US6069714A (en) 1996-12-05 2000-05-30 Applied Science Fiction, Inc. Method and apparatus for reducing noise in electronic film development
US6017688A (en) 1997-01-30 2000-01-25 Applied Science Fiction, Inc. System and method for latent film recovery in electronic film development
EP1086577B1 (fr) 1998-02-23 2002-09-18 Applied Science Fiction, Inc. Developpement electronique de films a balayage de zones progressif
US6594041B1 (en) 1998-11-20 2003-07-15 Applied Science Fiction, Inc. Log time processing and stitching system
US6781620B1 (en) 1999-03-16 2004-08-24 Eastman Kodak Company Mixed-element stitching and noise reduction system
WO2001001197A1 (fr) * 1999-06-29 2001-01-04 Applied Science Fiction, Inc. Applicateur de couche a fente pour le developpement de film electronique
WO2001013174A1 (fr) 1999-08-17 2001-02-22 Applied Science Fiction, Inc. Procede et systeme d'utilisation de plages d'etalonnage dans le traitement de films electroniques
AU2054401A (en) * 1999-12-17 2001-06-25 Applied Science Fiction, Inc. Method and system for selective enhancement of image data
AU2743701A (en) 1999-12-30 2001-07-16 Applied Science Fiction, Inc. System and method for digital film development using visible light
WO2001050197A1 (fr) 1999-12-30 2001-07-12 Applied Science Fiction, Inc. Systeme et procede de traitement de film couleur numerique
US20010030685A1 (en) * 1999-12-30 2001-10-18 Darbin Stephen P. Method and apparatus for digital film processing using a scanning station having a single sensor
US6788335B2 (en) 1999-12-30 2004-09-07 Eastman Kodak Company Pulsed illumination signal modulation control & adjustment method and system
US6554504B2 (en) 1999-12-30 2003-04-29 Applied Science Fiction, Inc. Distributed digital film processing system and method
AU2742701A (en) 1999-12-30 2001-07-16 Applied Science Fiction, Inc. Improved system and method for digital film development using visible light
US6447178B2 (en) 1999-12-30 2002-09-10 Applied Science Fiction, Inc. System, method, and apparatus for providing multiple extrusion widths
US6864973B2 (en) 1999-12-30 2005-03-08 Eastman Kodak Company Method and apparatus to pre-scan and pre-treat film for improved digital film processing handling
US6813392B2 (en) 1999-12-30 2004-11-02 Eastman Kodak Company Method and apparatus for aligning multiple scans of the same area of a medium using mathematical correlation
WO2001052556A2 (fr) * 1999-12-30 2001-07-19 Applied Science Fiction, Inc. Procedes et appareil permettant de deplacer un film et de le positionner dans un systeme de traitement de film numerique
US6965692B1 (en) 1999-12-30 2005-11-15 Eastman Kodak Company Method and apparatus for improving the quality of reconstructed information
US6707557B2 (en) 1999-12-30 2004-03-16 Eastman Kodak Company Method and system for estimating sensor dark current drift and sensor/illumination non-uniformities
AU2733601A (en) * 1999-12-31 2001-07-16 Applied Science Fiction, Inc. Digital film processing method
US6475711B1 (en) 1999-12-31 2002-11-05 Applied Science Fiction, Inc. Photographic element and digital film processing method using same
WO2001057796A2 (fr) 2000-02-03 2001-08-09 Applied Science Fiction Procede, systeme et logiciel de traitement de signal utilisant une decomposition pyramidale
WO2001095028A2 (fr) 2000-02-03 2001-12-13 Applied Science Fiction Procede et systeme de traitement de pellicules en libre service
AU2001238021A1 (en) * 2000-02-03 2001-08-14 Applied Science Fiction Match blur system and method
US20010040701A1 (en) * 2000-02-03 2001-11-15 Edgar Albert D. Photographic film having time resolved sensitivity distinction
JP2004514156A (ja) 2000-02-03 2004-05-13 アプライド・サイエンス・フィクション フィルム処理液カートリッジ、および、フィルムを現像しかつディジタル化するための方法
US6990251B2 (en) 2000-02-03 2006-01-24 Eastman Kodak Company Method, system, and software for signal processing using sheep and shepherd artifacts
US6619863B2 (en) 2000-02-03 2003-09-16 Eastman Kodak Company Method and system for capturing film images
US20060182337A1 (en) * 2000-06-28 2006-08-17 Ford Benjamin C Method and apparatus for improving the quality of reconstructed information
US20020118402A1 (en) * 2000-09-19 2002-08-29 Shaw Timothy C. Film bridge for digital film scanning system
JP2004517384A (ja) * 2000-09-21 2004-06-10 アプライド・サイエンス・フィクション 動的な画像訂正および画像システム
US20020146171A1 (en) * 2000-10-01 2002-10-10 Applied Science Fiction, Inc. Method, apparatus and system for black segment detection
US6778696B1 (en) * 2000-10-12 2004-08-17 Eastman Kodak Company Integrated traditional and digital photographic processing system with exchanged feedback control
US6888997B2 (en) * 2000-12-05 2005-05-03 Eastman Kodak Company Waveguide device and optical transfer system for directing light to an image plane
EP1360551A2 (fr) 2001-02-09 2003-11-12 Applied Science Fiction, Inc. Procede et solutions de traitement de films numeriques
US6805501B2 (en) * 2001-07-16 2004-10-19 Eastman Kodak Company System and method for digital film development using visible light
US7263240B2 (en) * 2002-01-14 2007-08-28 Eastman Kodak Company Method, system, and software for improving signal quality using pyramidal decomposition
CN100490505C (zh) * 2004-02-13 2009-05-20 索尼株式会社 图像处理装置和图像处理方法

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US3388652A (en) * 1965-05-27 1968-06-18 Technical Operations Inc Photographic processing control
US3663724A (en) * 1969-11-14 1972-05-16 Chemcut Corp Built-in type speed control for conveyorized continuous etcher
GB1280625A (en) * 1970-02-26 1972-07-05 Nat Res Dev Method of forming fringe pattern images
US3702277A (en) * 1970-09-23 1972-11-07 Zenith Radio Corp Control system for mask etching apparatus
US3995959A (en) * 1975-04-21 1976-12-07 Shaber Gary S Method and apparatus for determining the operational status of a photographic film processor
US3953265A (en) * 1975-04-28 1976-04-27 International Business Machines Corporation Meniscus-contained method of handling fluids in the manufacture of semiconductor wafers
US4119989A (en) * 1977-01-03 1978-10-10 Pitney-Bowes, Inc. System for controlling concentration of developer solution
US4128325A (en) * 1977-05-31 1978-12-05 Pako Corporation Automatic density measurement calibration for photographic replenishment system
US4180830A (en) * 1977-06-28 1979-12-25 Rca Corporation Depth estimation system using diffractive effects of the grooves and signal elements in the grooves
US4142107A (en) * 1977-06-30 1979-02-27 International Business Machines Corporation Resist development control system
US4136940A (en) * 1977-12-19 1979-01-30 Rca Corporation Resist development control system
US4469424A (en) * 1981-07-08 1984-09-04 Pioneer Electronic Corporation Method and system for developing a photo-resist material used as a recording medium
GB8719137D0 (en) * 1987-08-13 1987-09-23 Proform Uk Ltd Roofing valleys

Also Published As

Publication number Publication date
FR2514927A1 (fr) 1983-04-22
GB2108710A (en) 1983-05-18
GB2108710B (en) 1985-06-12
US4501480A (en) 1985-02-26
DE3238528A1 (de) 1983-05-05
JPH0238283Y2 (fr) 1990-10-16
JPS5857843U (ja) 1983-04-19
DE3238528C2 (de) 1984-08-16

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Legal Events

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DL Decision of the director general to leave to make available licences of right
ST Notification of lapse