JPH0243258B2 - - Google Patents
Info
- Publication number
- JPH0243258B2 JPH0243258B2 JP56107431A JP10743181A JPH0243258B2 JP H0243258 B2 JPH0243258 B2 JP H0243258B2 JP 56107431 A JP56107431 A JP 56107431A JP 10743181 A JP10743181 A JP 10743181A JP H0243258 B2 JPH0243258 B2 JP H0243258B2
- Authority
- JP
- Japan
- Prior art keywords
- photoresist film
- developer
- laser beam
- substrate
- exposed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 229920002120 photoresistant polymer Polymers 0.000 claims description 47
- 238000000034 method Methods 0.000 claims description 19
- 230000003287 optical effect Effects 0.000 claims description 12
- 239000000758 substrate Substances 0.000 claims description 9
- 230000005484 gravity Effects 0.000 claims description 8
- 230000001678 irradiating effect Effects 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 claims description 2
- 238000011161 development Methods 0.000 description 19
- 238000012545 processing Methods 0.000 description 6
- 239000007789 gas Substances 0.000 description 4
- 238000007796 conventional method Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 238000001514 detection method Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- CPBQJMYROZQQJC-UHFFFAOYSA-N helium neon Chemical compound [He].[Ne] CPBQJMYROZQQJC-UHFFFAOYSA-N 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck
- G03F7/3028—Imagewise removal using liquid means from a wafer supported on a rotating chuck characterised by means for on-wafer monitoring of the processing
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
- Manufacturing Optical Record Carriers (AREA)
Description
【発明の詳細な説明】
本発明は、不連続的凹所若しくは突起部からな
る光学的パターンを表面に有する光学式記録デイ
スクの原盤の製作に用いられるフオトレジスト湿
式現像方法及び現像装置に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a photoresist wet developing method and a developing device used for manufacturing a master for an optical recording disk having an optical pattern on its surface consisting of discontinuous recesses or protrusions.
かかる光学式記録デイスクは、例えば、光学式
ビデオ若しくはオーデイオデイスクシステムの記
録媒体として用いられている。光学式ビデオ若し
くはオーデイオデイスクシステムは、記録媒体で
あるデイスクを回転させながらその表面の凹所若
しくは突起部からなる光学的パターンにレーザ光
を照射し、その光学的パターンによつて変調され
たレーザ光を電気信号に変換してその光学的パタ
ーンに対応する情報を再生するものである。当該
システムに用いられる記録デイスクの原盤は、研
摩したガラス基盤の表面にフオトレジスト膜を設
けて成るものであつて、当該フオトレジスト膜
は、原盤に記録さるべき情報に応じて断続的に照
射されるレーザ光によつて、渦巻状径路に沿つて
不連続的に露光処理され、フオトレジスト膜の感
光した部分は現像液によつて溶解除去され、その
跡にピツトと称される凹所の列が渦巻状に形成さ
れる。記録デイスクは、かかるピツトを有する原
盤から、連続的な音溝を有する従来のオーデイオ
デイスクと同様に複製生産される。 Such optical recording discs are used, for example, as recording media in optical video or audio disc systems. An optical video or audio disk system rotates a disk, which is a recording medium, and irradiates a laser beam onto an optical pattern consisting of recesses or protrusions on the surface of the disk, and generates a laser beam that is modulated by the optical pattern. The optical pattern is converted into an electrical signal and the information corresponding to the optical pattern is reproduced. The master of the recording disk used in this system consists of a polished glass substrate with a photoresist film provided on the surface, and the photoresist film is intermittently irradiated according to the information to be recorded on the master. The photoresist film is exposed discontinuously along a spiral path using a laser beam, and the exposed areas of the photoresist film are dissolved and removed by a developer, leaving behind a row of recesses called pits. is formed in a spiral shape. Recording discs are reproduced from master discs having such pits in the same manner as conventional audio discs having continuous sound grooves.
現像処理によつて形成される上記のピツトの深
さ及び幅すなわちトラツク方向に垂直な断面形状
は、レーザ光による情報検出の精度に密接に関連
する寸法である。従つて、現像工程は、このピツ
トの断面形状が所定範囲内の寸法となるように管
理されねばならない。そのため、従来は、フオト
レジストの感光した部分が現像液に溶解する化学
反応の継続時間すなわち現像時間を、経験から得
られる勘により調節することによつて当該ピツト
の深さあるいは大きさを調節する方法が採られて
いた。しかし、かかる化学反応の進行速度は露光
の度合、現像液の濃度及び温度等の条件に応じて
変るから、現像中に形成されつつあるピツトの深
さあるいは大きさをモニターすることなく勘によ
つて現像時間を調節する従来の方法によつては、
現像処理が終るまではピツトの深さあるいは大き
さを知ることが出来ず、従つて、現像処理された
原盤のピツトの深さあるいは大きさにばらつきが
生じることは避け得ない。 The depth and width of the pit formed by the development process, that is, the cross-sectional shape perpendicular to the track direction, are dimensions closely related to the accuracy of information detection by laser light. Therefore, the developing process must be controlled so that the cross-sectional shape of the pit falls within a predetermined range. Therefore, conventionally, the depth or size of the pits has been adjusted by adjusting the duration of the chemical reaction in which the exposed portion of the photoresist is dissolved in the developer, that is, the development time, based on intuition gained from experience. method was adopted. However, since the rate of progress of such chemical reactions varies depending on conditions such as the degree of exposure, the concentration and temperature of the developer, it is necessary to rely on intuition without monitoring the depth or size of the pits that are forming during development. According to the conventional method of adjusting the development time,
The depth or size of the pits cannot be known until the development process is completed, and therefore it is inevitable that the depth or size of the pits in the developed master will vary.
よつて、本発明の目的は、現像処理中にピツト
の深さあるいは大きさをモニターし、その深さあ
るいは大きさが所定範囲に達したとき現像処理を
停止するよう構成されたフオトレジスト湿式現像
方法及び装置を提供することである。 Therefore, an object of the present invention is to provide a photoresist wet-type developer configured to monitor the depth or size of pits during development and stop the development when the depth or size reaches a predetermined range. An object of the present invention is to provide a method and apparatus.
この目的のため、本発明の現像方法は、露光処
理された原盤の回転中心軸を重力方向に対して所
定角度傾斜させてこれを回転させつつ、フオトレ
ジスト膜に沿つて現像液を接触させ且つフオトレ
ジスト膜の面に対して所定角度傾斜した方向から
所定波長のレーザ光をフオトレジスト膜に照射し
且つフオトレジスト膜のピツトの位置で所定方向
に回折して原盤を透過したレーザ光成分を検出
し、この回折光の強度が所定値に達したときフオ
トレジスト膜への現像液の供給を停止するなどし
てフオトレジスト膜と現像液との接触を中止して
現像処理を停止する構成である。この方法を実施
するための本発明装置は、露光処理された原盤の
回転中心軸を重力方向に対して所定角度傾斜させ
てこれを回転させるための回転駆動手段と、現像
液をフオトレジスト膜上に供給してこれに沿つて
接触させるための現像液供給手段と、フオトレジ
スト膜に対して所定角度傾斜した方向から所定波
長のレーザ光をフオトレジスト膜に照射するレー
ザ光源と、フオトレジスト膜のピツトの位置で所
定方向に回折して原盤を透過したレーザ光成分を
検出してこれを電気信号に変換する光電変換器と
を含んでおり、この電気信号を検出してそのレベ
ルが所定値に達したときフオトレジスト膜と現像
液との接触を停止させるようになされている。 For this purpose, the developing method of the present invention includes rotating the exposed master with its central axis of rotation tilted at a predetermined angle with respect to the direction of gravity, while bringing a developer into contact with the photoresist film. Laser light of a predetermined wavelength is irradiated onto the photoresist film from a direction inclined at a predetermined angle with respect to the surface of the photoresist film, and the laser light component that is diffracted in a predetermined direction at the pit position of the photoresist film and transmitted through the master is detected. However, when the intensity of this diffracted light reaches a predetermined value, the supply of the developer to the photoresist film is stopped, thereby stopping the contact between the photoresist film and the developer and stopping the development process. . The apparatus of the present invention for carrying out this method includes a rotational driving means for rotating the exposed master by tilting its rotation center axis at a predetermined angle with respect to the direction of gravity, and a rotating drive means for rotating the exposed master by tilting the central axis of rotation at a predetermined angle with respect to the direction of gravity, and applying a developer onto the photoresist film. a developer supply means for supplying a developer to contact the photoresist film along the same; a laser light source for irradiating a laser beam of a predetermined wavelength onto the photoresist film from a direction inclined at a predetermined angle with respect to the photoresist film; It includes a photoelectric converter that detects the laser light component that has been diffracted in a predetermined direction at the pit position and transmitted through the master disc, and converts it into an electrical signal. When this point is reached, contact between the photoresist film and the developer is stopped.
次に、図面を参照して本発明の実施例を説明す
る。 Next, embodiments of the present invention will be described with reference to the drawings.
第１図は本発明の現像装置を示すブロツク図で
ある。この装置は処理槽１を有し、露光処理され
た原盤２はこの槽内のターンテーブル３に載置さ
れる。原盤２の一方の側面のフオトレジスト膜は
図の上方に向けられている。原盤２の他方の側面
側すなわち図面下方においては、処理槽１内にて
独立した雰囲気を形成するように原盤２の周辺か
ら間隔をおいて原盤２の他方の側面下方を囲う筐
体１ａが設けられている。ターンテーブル３は重
力方向に対して所定角度θだけ傾斜しており、電
動モータ（図示せず）により駆動されて原盤２と
ともに一定速度で回転する。適当な現像液供給手
段Ｄから供給される現像液は、加圧ガス源Ｇから
供給される例えば窒素等の加圧ガスと加圧タンク
４で混合され、あるいは加圧ガスの有する所定加
圧力により加圧液体となり、バルブ５及びノズル
６を介して原盤２のフオトレジスト膜上に噴霧さ
れてその上を流下し、槽底の排出口７から槽外へ
排出される。現像液とともにノズル６から処理槽
内に噴出した加圧された現像液又は加圧ガスと現
像液との混合流体の１部はバルブ１７を介して処
理槽外に排出される。例えばヘリウム−ネオンレ
ーザチユーブ等からなるヘーザ光源８が処理槽外
に設けられており、この光源から発生されたレー
ザ光はハーフミラー９によつて分割され、これを
透過したレーザ光はモニター用光電変換器１０に
入射し、ハーフミラー９によつて反射されたレー
ザ光は、処理槽内の原盤に対して所定角度だけ傾
斜した方向から原盤２に入射する。原盤２はガラ
ス等からなる透明な基盤の表面にフオトレジスト
膜（厚みは、2000オングストローム程度又はそれ
以下）を設けて成るものであり、これに入射した
レーザ光は、ピツトが形成されていないときは原
盤２を透過してその下方に設けられたビームスト
ツパ１１によつて吸収される。 FIG. 1 is a block diagram showing a developing device of the present invention. This apparatus has a processing tank 1, and an exposed master 2 is placed on a turntable 3 within this tank. The photoresist film on one side of the master 2 is directed upward in the figure. On the other side of the master 2, that is, at the bottom in the drawing, a housing 1a is provided at a distance from the periphery of the master 2 to surround the lower side of the master 2 so as to form an independent atmosphere in the processing tank 1. It is being The turntable 3 is inclined at a predetermined angle θ with respect to the direction of gravity, and is driven by an electric motor (not shown) to rotate together with the master 2 at a constant speed. The developer supplied from a suitable developer supply means D is mixed with a pressurized gas such as nitrogen supplied from a pressurized gas source G in a pressurized tank 4, or is mixed with a predetermined pressurizing force of the pressurized gas. The pressurized liquid is sprayed onto the photoresist film of the master 2 through the valve 5 and nozzle 6, flows down thereon, and is discharged from the tank through the outlet 7 at the bottom of the tank. A portion of the pressurized developer or the mixed fluid of the pressurized gas and the developer that is ejected from the nozzle 6 into the processing tank together with the developer is discharged to the outside of the processing tank via the valve 17 . For example, a hazer light source 8 consisting of a helium-neon laser tube or the like is provided outside the processing tank. The laser light generated from this light source is split by a half mirror 9, and the laser light transmitted through this is used as a monitor photoelectronic device. The laser beam that is incident on the converter 10 and reflected by the half mirror 9 is incident on the master disk 2 from a direction inclined at a predetermined angle with respect to the master disk in the processing tank. The master disk 2 consists of a photoresist film (thickness of about 2000 angstroms or less) provided on the surface of a transparent substrate made of glass or the like, and the laser beam incident on this film is irradiated with a photoresist film when no pits are formed. The beam passes through the master 2 and is absorbed by the beam stopper 11 provided below.
原盤２が回転せられるとともにその表面のフオ
トレジスト膜上に現像液が散布されて現像処理が
進行するとき、フオトレジスト膜の感光した部分
は現像液によつて溶解除去されてゆき、その部分
に凹部すなわち上記のピツトが形成されてゆく。
原盤２に入射したレーザ光の一部はこのピツトに
よつて回折される。このピツトによつて回折され
たレーザ光の強度を検出するため、透過レーザ光
の径路外の所定位置に、例えばフオトダイオード
等からなる光電変換器１２が設けられている。制
御回路１３は光電変換器１２の出力電圧若しくは
電流を検出し、この回折光の強度が所定値に達し
て光電変換器１２の出力電圧若しくは電流が所定
値に達すると、バルブ駆動モータ１４を励磁して
バルブ５を閉鎖させてフオトレジスト膜上への現
像液の供給を停止させ、同時に、もう１つのバル
ブ駆動モータ１５を励磁して給水管のバルブ１６
を開いて純水をフオトレジスト膜上に散布し、現
像処理を終了させる。 When the master 2 is rotated and the developing solution is spread onto the photoresist film on its surface to proceed with the development process, the exposed portion of the photoresist film is dissolved and removed by the developer, and the exposed portion of the photoresist film is dissolved and removed by the developer. A recess, ie, the pit described above, is formed.
A portion of the laser beam incident on the master disc 2 is diffracted by this pit. In order to detect the intensity of the laser beam diffracted by this pit, a photoelectric converter 12 made of, for example, a photodiode is provided at a predetermined position outside the path of the transmitted laser beam. The control circuit 13 detects the output voltage or current of the photoelectric converter 12, and when the intensity of this diffracted light reaches a predetermined value and the output voltage or current of the photoelectric converter 12 reaches a predetermined value, it excites the valve drive motor 14. The valve 5 is closed to stop the supply of developer onto the photoresist film, and at the same time, the other valve drive motor 15 is energized to close the water supply pipe valve 16.
is opened and pure water is sprayed onto the photoresist film to complete the development process.
第２図は、露光強度を一定値として露光処理し
た後従来の方法によつて現像処理した11枚の原盤
の現像時間（単位、秒）と、第１図に示した本発
明装置のレーザ光源８及び光電変換器１２を含む
光学−電気系を用いて測定したピツトによる一次
回折光の強度（単位、μW）との対応関係を示す
グラフである。このデータから判るように、現像
時間と、現像によつて形成されたピツトによる一
次回折光の強度との関係はほぼ一次関数的ではあ
るが、ばらつきが大である。この一次回折光の強
度はピツトの深さ、あるいは大きさを直接反映す
るから、勘によつて現像時間を加減する従来方法
によつて得られる原盤は原盤毎のピツトの形状の
ばらつきが大きくて品質が一定でないことが判
る。 Figure 2 shows the development time (in seconds) of 11 master discs that were exposed using a constant exposure intensity and then developed using a conventional method, and the laser light source of the device of the present invention shown in Figure 1. 8 and a photoelectric converter 12. FIG. As can be seen from this data, the relationship between the development time and the intensity of the first-order diffracted light due to the pits formed by development is approximately linear, but there is a large variation. The intensity of this first-order diffracted light directly reflects the depth or size of the pits, so the masters obtained by the conventional method of adjusting the development time based on intuition have large variations in the shape of the pits from master to master. It can be seen that the quality is not constant.
第３図は、本発明装置によつて現像処理された
原盤の現像終了後における一次回折光の強度（単
位μW）と、該原盤から製作された光学式ビデオ
デイスクに記録された信号を光学式ビデオデイス
ク再生装置を用いて再生したとき再生装置のフオ
トセンサから得られた電気信号のレベル（単位ｍ
Ｖ）との関係を示す。このデータは露光強度及び
現像時間などのパラメータをランダムに設定して
行なつた実験から得られたものであつて、現像処
理した原盤における一次回折光の強度と再生信号
レベルとの間には、露光強度すなわちフオトレジ
ストの感光の程度や現像時間等のパラメータに依
存しない指数関数的対応関係が存在することが判
る。 Figure 3 shows the intensity of the first-order diffracted light (in μW) after the development of the master disc developed by the apparatus of the present invention, and the signal recorded on the optical video disc manufactured from the master disc using the optical system. When played back using a video disc playback device, the level of the electrical signal obtained from the photo sensor of the playback device (unit: m)
V). This data was obtained from an experiment in which parameters such as exposure intensity and development time were randomly set. It can be seen that there is an exponential correspondence relationship that does not depend on parameters such as exposure intensity, ie, the degree of photoresist exposure, and development time.
よつて、本発明によれば、ピツトの深さあるい
は大きさのみに依存して変化する回折光強度に基
づいて現像の度合を調節することが出来るから、
所望の寸法のピツトを有する良質の原盤を得るこ
とが出来る。 Therefore, according to the present invention, the degree of development can be adjusted based on the intensity of the diffracted light, which varies depending only on the depth or size of the pit.
A high-quality master disc having pits of desired dimensions can be obtained.
第１図は本発明の現像装置の一実施例を示すブ
ロツク図、第２図は従来の現像方法によつて処理
した原盤の現像時間とピツトによる一次回折光の
強度との関係を示すグラフ、第３図は種々の現像
条件で現像処理した原盤のピツトによる一次回折
光の強度と再生信号レベルとの対応関係を示すグ
ラフである。
主要部分の符号の説明、３……ターンテーブ
ル、８……レーザ光源、９……ハーフミラー、１
０，１２……光電変換器、１３……制御回路。
FIG. 1 is a block diagram showing an embodiment of the developing device of the present invention, and FIG. 2 is a graph showing the relationship between the developing time of a master processed by a conventional developing method and the intensity of the first-order diffracted light by the pit. FIG. 3 is a graph showing the correspondence between the intensity of the first-order diffracted light due to the pits of master discs developed under various development conditions and the reproduced signal level. Explanation of symbols of main parts, 3... Turntable, 8... Laser light source, 9... Half mirror, 1
0, 12...Photoelectric converter, 13...Control circuit.
Claims (1)
程において、透明な基盤の平坦な一方の側面上の
フオトレジスト膜に現像液を接触させて、フオト
レジスト膜に凹凸を形成する現像方法であつて、
前記基盤を回転させつつ、前記フオトレジスト膜
に沿つて前記現像液を接触させ且つ前記フオトレ
ジスト膜の面に対して所定角度傾斜した方向から
レーザ光源からレーザ光を前記フオトレジスト膜
に入射させ、前記レーザ光のうちの前記フオトレ
ジスト膜で所定方向に回折して前記基盤を透過し
たレーザ光を前記一方の側面が露出する雰囲気と
は独立した雰囲気内にて検出する工程を含んでお
り、前記検出された回折光の強度が所定値に達し
たとき前記フオトレジスト膜と前記現像液との接
触を停止することを特徴とする方法。 ２ 前記凹凸は、フオトレジスト膜の渦巻状経路
をなして不連続的に感光した部分を溶解除去する
ことによりフオトレジスト膜に不連続的かつ列状
に配列したピツトであることを特徴とする特許請
求の範囲第１項記載の方法。 ３ 前記基盤の回転中心軸を重力方向に対して所
定角度傾斜させて前記基盤を回転させることを特
徴とする特許請求の範囲第１又は２項記載の方
法。 ４ 前記フオトレジスト膜の前記レーザ光が照射
さるべき位置は重力方向において前記現像液が供
給さるべき位置より高い位置であることを特徴と
する特許請求の範囲第１、２又は３項記載の方
法。 ５ 透明な基盤の平坦な一方の側面上のフオトレ
ジスト膜に沿つて現像液を接触させて前記フオト
レジスト膜に凹凸を形成する現像装置であつて、
前記基盤を回転させる回転駆動手段と、前記フオ
トレジスト膜上に前記現像液を供給する現像液供
給手段と、前記フオトレジスト膜に対して所定角
度傾斜した方向からレーザ光を前記フオトレジス
ト膜に照射するレーザ光源と、前記基盤の他方の
側面から離れて配置され且つ前記フオトレジスト
膜で所定方向に回折して前記基盤を透過したレー
ザ光を前記一方の側面が露出する雰囲気とは独立
した雰囲気にて検出して受光量に応じた電気的出
力を発生する光電変換器と、前記電気的出力に応
じて前記現像液供給手段を制御する制御手段を含
むことを特徴とする装置。 ６ 前記凹凸は、フオトレジスト膜の渦巻状経路
をなして不連続的に感光した部分を溶解除去する
ことによりフオトレジスト膜に不連続的かつ列状
に配列したピツトであることを特徴とする特許請
求の範囲第５項記載の装置。 ７ 前記基盤はその回転中心軸が重力方向に対し
て所定角度傾斜した状態に保たれて回転せしめら
れることを特徴とする特許請求の範囲第５又は６
項記載の装置。 ８ 前記フオトレジスト膜の前記レーザ光が照射
さるべき位置は重力方向において前記現像液が供
給さるべき位置より高い位置であることを特徴と
する特許請求の範囲第５、６又は７項記載の装
置。[Claims] 1. In the process of manufacturing a recording master for an optical recording disk, a developer is brought into contact with a photoresist film on one flat side of a transparent substrate to form irregularities on the photoresist film. A developing method,
While rotating the substrate, bringing the developer into contact with the photoresist film, and making laser light from a laser light source enter the photoresist film from a direction inclined at a predetermined angle with respect to the surface of the photoresist film; The method includes the step of detecting the laser beam that has been diffracted in a predetermined direction by the photoresist film and transmitted through the substrate in an atmosphere independent of the atmosphere in which the one side surface is exposed; A method characterized in that contact between the photoresist film and the developer is stopped when the intensity of the detected diffracted light reaches a predetermined value. 2. A patent characterized in that the irregularities are pits discontinuously arranged in rows on the photoresist film by dissolving and removing portions of the photoresist film that are discontinuously exposed in a spiral path. The method according to claim 1. 3. The method according to claim 1 or 2, wherein the base is rotated by tilting the rotation center axis of the base at a predetermined angle with respect to the direction of gravity. 4. The method according to claim 1, 2 or 3, wherein the position of the photoresist film to be irradiated with the laser beam is higher in the direction of gravity than the position to which the developer is to be supplied. . 5. A developing device for forming unevenness on the photoresist film by bringing a developer into contact with the photoresist film on one flat side surface of a transparent substrate,
a rotation driving means for rotating the substrate; a developer supply means for supplying the developer onto the photoresist film; and irradiating the photoresist film with a laser beam from a direction inclined at a predetermined angle with respect to the photoresist film. a laser light source that is placed away from the other side of the substrate, and the laser beam that has been diffracted in a predetermined direction by the photoresist film and transmitted through the substrate is placed in an atmosphere independent of the atmosphere in which the one side is exposed; 1. A device comprising: a photoelectric converter that detects the amount of light received and generates an electrical output according to the amount of received light; and a control means that controls the developer supply means according to the electrical output. 6. A patent characterized in that the irregularities are pits discontinuously arranged in rows on the photoresist film by dissolving and removing portions of the photoresist film that are discontinuously exposed in a spiral path. The apparatus according to claim 5. 7. Claim 5 or 6, characterized in that the base is rotated with its central axis of rotation tilted at a predetermined angle with respect to the direction of gravity.
Apparatus described in section. 8. The apparatus according to claim 5, 6, or 7, wherein a position of the photoresist film to which the laser beam is to be irradiated is a position higher in the direction of gravity than a position to which the developer is to be supplied. .
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56107431A JPS589242A (en) | 1981-07-08 | 1981-07-08 | Method and device for photoresist wet development |
| GB08219667A GB2108707B (en) | 1981-07-08 | 1982-07-07 | Method and system for developing a photo-resist material used as a recording medium |
| US06/396,073 US4469424A (en) | 1981-07-08 | 1982-07-07 | Method and system for developing a photo-resist material used as a recording medium |
| FR8211935A FR2509484B1 (en) | 1981-07-08 | 1982-07-07 | METHOD AND DEVICE FOR DEVELOPING PHOTO-SENSITIVE MATERIAL USED AS A RECORDING MEDIUM |
| DE3225575A DE3225575C2 (en) | 1981-07-08 | 1982-07-08 | Method and apparatus for controlling the supply of developer liquid in a photoresist plate developer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56107431A JPS589242A (en) | 1981-07-08 | 1981-07-08 | Method and device for photoresist wet development |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS589242A JPS589242A (en) | 1983-01-19 |
| JPH0243258B2 true JPH0243258B2 (en) | 1990-09-27 |
Family
ID=14458962
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56107431A Granted JPS589242A (en) | 1981-07-08 | 1981-07-08 | Method and device for photoresist wet development |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS589242A (en) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5276901A (en) * | 1975-12-23 | 1977-06-28 | Sony Corp | Production of master disc for rotary recording media |
| JPS5410677A (en) * | 1977-06-23 | 1979-01-26 | Ibm | Method of controlling development or etching process |
| JPS5412672A (en) * | 1977-06-30 | 1979-01-30 | Ibm | Method of controlling resist pattern development |
-
1981
- 1981-07-08 JP JP56107431A patent/JPS589242A/en active Granted
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5276901A (en) * | 1975-12-23 | 1977-06-28 | Sony Corp | Production of master disc for rotary recording media |
| JPS5410677A (en) * | 1977-06-23 | 1979-01-26 | Ibm | Method of controlling development or etching process |
| JPS5412672A (en) * | 1977-06-30 | 1979-01-30 | Ibm | Method of controlling resist pattern development |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS589242A (en) | 1983-01-19 |
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