JPH0242901B2 - - Google Patents

Info

Publication number
JPH0242901B2
JPH0242901B2 JP62188030A JP18803087A JPH0242901B2 JP H0242901 B2 JPH0242901 B2 JP H0242901B2 JP 62188030 A JP62188030 A JP 62188030A JP 18803087 A JP18803087 A JP 18803087A JP H0242901 B2 JPH0242901 B2 JP H0242901B2
Authority
JP
Japan
Prior art keywords
chamber
vacuum processing
workpiece
chambers
holder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP62188030A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6431971A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP18803087A priority Critical patent/JPS6431971A/ja
Publication of JPS6431971A publication Critical patent/JPS6431971A/ja
Publication of JPH0242901B2 publication Critical patent/JPH0242901B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
JP18803087A 1987-07-28 1987-07-28 Vacuum treatment device Granted JPS6431971A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18803087A JPS6431971A (en) 1987-07-28 1987-07-28 Vacuum treatment device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18803087A JPS6431971A (en) 1987-07-28 1987-07-28 Vacuum treatment device

Publications (2)

Publication Number Publication Date
JPS6431971A JPS6431971A (en) 1989-02-02
JPH0242901B2 true JPH0242901B2 (enrdf_load_html_response) 1990-09-26

Family

ID=16216436

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18803087A Granted JPS6431971A (en) 1987-07-28 1987-07-28 Vacuum treatment device

Country Status (1)

Country Link
JP (1) JPS6431971A (enrdf_load_html_response)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2644912B2 (ja) 1990-08-29 1997-08-25 株式会社日立製作所 真空処理装置及びその運転方法
USRE39824E1 (en) * 1990-08-29 2007-09-11 Hitachi, Ltd. Vacuum processing apparatus and operating method with wafers, substrates and/or semiconductors
USRE39756E1 (en) * 1990-08-29 2007-08-07 Hitachi, Ltd. Vacuum processing operating method with wafers, substrates and/or semiconductors
US7089680B1 (en) 1990-08-29 2006-08-15 Hitachi, Ltd. Vacuum processing apparatus and operating method therefor
DE9407482U1 (de) * 1994-05-05 1994-10-06 Balzers und Leybold Deutschland Holding AG, 63450 Hanau Funktionseinrichtung für eine Vakuumanlage für die Behandlung von scheibenförmigen Werkstücken
US20060102078A1 (en) * 2004-11-18 2006-05-18 Intevac Inc. Wafer fab
US7611322B2 (en) 2004-11-18 2009-11-03 Intevac, Inc. Processing thin wafers

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5763676A (en) * 1980-10-03 1982-04-17 Hitachi Ltd Continuous sputtering device
JPS5877239A (ja) * 1981-11-04 1983-05-10 Ulvac Corp 連続式真空処理装置
US4500407A (en) * 1983-07-19 1985-02-19 Varian Associates, Inc. Disk or wafer handling and coating system
JPS6050312A (ja) * 1983-08-31 1985-03-20 Sharp Corp 石油燃焼器の点火装置
JPS60109218A (ja) * 1983-11-18 1985-06-14 Hitachi Ltd 分子線エピタキシャル成長装置
JPS6155926A (ja) * 1984-08-27 1986-03-20 Nec Corp 半導体製造装置
JPS61112312A (ja) * 1984-11-07 1986-05-30 Hitachi Ltd 真空連続処理装置
JPS6328863A (ja) * 1986-07-22 1988-02-06 Ulvac Corp 真空処理装置

Also Published As

Publication number Publication date
JPS6431971A (en) 1989-02-02

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