JPH0242212B2 - - Google Patents

Info

Publication number
JPH0242212B2
JPH0242212B2 JP10423684A JP10423684A JPH0242212B2 JP H0242212 B2 JPH0242212 B2 JP H0242212B2 JP 10423684 A JP10423684 A JP 10423684A JP 10423684 A JP10423684 A JP 10423684A JP H0242212 B2 JPH0242212 B2 JP H0242212B2
Authority
JP
Japan
Prior art keywords
group
water
polymer
vinyl acetate
styrylpyridinium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP10423684A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60247637A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP10423684A priority Critical patent/JPS60247637A/ja
Priority to US06/624,963 priority patent/US4564580A/en
Priority to DE8484304415T priority patent/DE3476703D1/de
Priority to EP84304415A priority patent/EP0130804B1/en
Publication of JPS60247637A publication Critical patent/JPS60247637A/ja
Publication of JPH0242212B2 publication Critical patent/JPH0242212B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerisation Methods In General (AREA)
  • Graft Or Block Polymers (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
JP10423684A 1983-06-30 1984-05-23 感光性樹脂組成物 Granted JPS60247637A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP10423684A JPS60247637A (ja) 1984-05-23 1984-05-23 感光性樹脂組成物
US06/624,963 US4564580A (en) 1983-06-30 1984-06-26 Photosensitive resin composition
DE8484304415T DE3476703D1 (en) 1983-06-30 1984-06-28 Photosensitive resin composition
EP84304415A EP0130804B1 (en) 1983-06-30 1984-06-28 Photosensitive resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10423684A JPS60247637A (ja) 1984-05-23 1984-05-23 感光性樹脂組成物

Publications (2)

Publication Number Publication Date
JPS60247637A JPS60247637A (ja) 1985-12-07
JPH0242212B2 true JPH0242212B2 (sk) 1990-09-21

Family

ID=14375323

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10423684A Granted JPS60247637A (ja) 1983-06-30 1984-05-23 感光性樹脂組成物

Country Status (1)

Country Link
JP (1) JPS60247637A (sk)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07120038B2 (ja) * 1985-11-22 1995-12-20 富士写真フイルム株式会社 感光性組成物
JPS62260142A (ja) * 1986-05-06 1987-11-12 Fuotopori Ouka Kk 感光性樹脂組成物
JPH01113749A (ja) * 1987-10-27 1989-05-02 Shin Etsu Chem Co Ltd スクリーン印刷用感光性樹脂水性液
JP2584671B2 (ja) * 1989-04-26 1997-02-26 富士写真フイルム株式会社 感光性組成物
JP2584672B2 (ja) * 1989-04-28 1997-02-26 富士写真フイルム株式会社 感光性組成物
JPH0425845A (ja) * 1990-05-21 1992-01-29 Fuji Photo Film Co Ltd 感光性平版印刷版
EP0493317B2 (de) * 1990-12-18 2001-01-10 Ciba SC Holding AG Strahlungsempfindliche Zusammensetzung auf Basis von Wasser als Lösungsmittel
JP3561061B2 (ja) * 1995-12-11 2004-09-02 東洋合成工業株式会社 ポリビニルアルコール系感光性樹脂および感光性樹脂組成物並びにそれを用いたパターン形成方法
JP4648695B2 (ja) * 2000-01-31 2011-03-09 三菱製紙株式会社 感光性組成物および感光性平版印刷版材料
WO2007132532A1 (ja) 2006-05-17 2007-11-22 Murakami Co., Ltd. 感光性樹脂組成物およびこれを用いてなる感光性フィルムならびにスクリーン印刷用ステンシル
WO2017094698A1 (ja) * 2015-12-04 2017-06-08 日本酢ビ・ポバール株式会社 懸濁重合用分散助剤およびそれを用いるビニル系重合体の製造方法、並びに塩化ビニル樹脂

Also Published As

Publication number Publication date
JPS60247637A (ja) 1985-12-07

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term