JPH0237689B2 - - Google Patents
Info
- Publication number
- JPH0237689B2 JPH0237689B2 JP59210052A JP21005284A JPH0237689B2 JP H0237689 B2 JPH0237689 B2 JP H0237689B2 JP 59210052 A JP59210052 A JP 59210052A JP 21005284 A JP21005284 A JP 21005284A JP H0237689 B2 JPH0237689 B2 JP H0237689B2
- Authority
- JP
- Japan
- Prior art keywords
- ipa
- developer
- material layer
- resist material
- resist
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21005284A JPS6188526A (ja) | 1984-10-05 | 1984-10-05 | ポジ型微細加工法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21005284A JPS6188526A (ja) | 1984-10-05 | 1984-10-05 | ポジ型微細加工法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6188526A JPS6188526A (ja) | 1986-05-06 |
JPH0237689B2 true JPH0237689B2 (enrdf_load_html_response) | 1990-08-27 |
Family
ID=16583009
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP21005284A Granted JPS6188526A (ja) | 1984-10-05 | 1984-10-05 | ポジ型微細加工法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6188526A (enrdf_load_html_response) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0328851A (ja) * | 1988-05-24 | 1991-02-07 | Toppan Printing Co Ltd | 電子ビームレジストのパターン形成方法 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6026220B2 (ja) * | 1977-07-19 | 1985-06-22 | 三菱電機株式会社 | 静電記録装置用搬送ロ−ラ |
JPS5739049A (en) * | 1980-08-21 | 1982-03-04 | Sumitomo Metal Ind Ltd | Manufacture of seamless eccentric reducer tube joint |
-
1984
- 1984-10-05 JP JP21005284A patent/JPS6188526A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS6188526A (ja) | 1986-05-06 |
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