JPH0225501B2 - - Google Patents
Info
- Publication number
- JPH0225501B2 JPH0225501B2 JP56115030A JP11503081A JPH0225501B2 JP H0225501 B2 JPH0225501 B2 JP H0225501B2 JP 56115030 A JP56115030 A JP 56115030A JP 11503081 A JP11503081 A JP 11503081A JP H0225501 B2 JPH0225501 B2 JP H0225501B2
- Authority
- JP
- Japan
- Prior art keywords
- vapor
- developer
- development
- supply nozzle
- developing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11503081A JPS5817443A (ja) | 1981-07-24 | 1981-07-24 | フオトレジスト現像方法および装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11503081A JPS5817443A (ja) | 1981-07-24 | 1981-07-24 | フオトレジスト現像方法および装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5817443A JPS5817443A (ja) | 1983-02-01 |
JPH0225501B2 true JPH0225501B2 (enrdf_load_stackoverflow) | 1990-06-04 |
Family
ID=14652474
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11503081A Granted JPS5817443A (ja) | 1981-07-24 | 1981-07-24 | フオトレジスト現像方法および装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5817443A (enrdf_load_stackoverflow) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3534414A1 (de) * | 1985-09-27 | 1987-04-02 | Standard Elektrik Lorenz Ag | Verfahren und vorrichtung zur erzeugung einer schwarzmatrixschicht |
JPS63250125A (ja) * | 1987-04-06 | 1988-10-18 | Nec Yamagata Ltd | 半導体装置の製造方法 |
EP0443796A3 (en) * | 1990-02-19 | 1992-03-04 | Hitachi Chemical Co., Ltd. | Development process |
JPH07105336B2 (ja) * | 1992-08-27 | 1995-11-13 | 日本電気株式会社 | レジスト現像方法 |
US6025118A (en) * | 1998-05-12 | 2000-02-15 | Sony Corporation | Glassmastering photoresist read after write method and system |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5536182B2 (enrdf_load_stackoverflow) * | 1973-10-15 | 1980-09-19 |
-
1981
- 1981-07-24 JP JP11503081A patent/JPS5817443A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5817443A (ja) | 1983-02-01 |
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