JPH02168612A - 半導体装置の製造方法 - Google Patents

半導体装置の製造方法

Info

Publication number
JPH02168612A
JPH02168612A JP1242600A JP24260089A JPH02168612A JP H02168612 A JPH02168612 A JP H02168612A JP 1242600 A JP1242600 A JP 1242600A JP 24260089 A JP24260089 A JP 24260089A JP H02168612 A JPH02168612 A JP H02168612A
Authority
JP
Japan
Prior art keywords
resist pattern
insulating film
forming
lower resist
hole
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1242600A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0557730B2 (enExample
Inventor
Naoki Kitano
北野　直樹
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JFE Steel Corp
Original Assignee
Kawasaki Steel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kawasaki Steel Corp filed Critical Kawasaki Steel Corp
Priority to JP1242600A priority Critical patent/JPH02168612A/ja
Publication of JPH02168612A publication Critical patent/JPH02168612A/ja
Publication of JPH0557730B2 publication Critical patent/JPH0557730B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Element Separation (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP1242600A 1988-09-19 1989-09-19 半導体装置の製造方法 Granted JPH02168612A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1242600A JPH02168612A (ja) 1988-09-19 1989-09-19 半導体装置の製造方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP63-234521 1988-09-19
JP23452188 1988-09-19
JP1242600A JPH02168612A (ja) 1988-09-19 1989-09-19 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JPH02168612A true JPH02168612A (ja) 1990-06-28
JPH0557730B2 JPH0557730B2 (enExample) 1993-08-24

Family

ID=16972328

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1242600A Granted JPH02168612A (ja) 1988-09-19 1989-09-19 半導体装置の製造方法

Country Status (1)

Country Link
JP (1) JPH02168612A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013033168A (ja) * 2011-08-03 2013-02-14 Japan Display East Co Ltd 表示装置及び表示装置の製造方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5935446A (ja) * 1982-08-23 1984-02-27 Seiko Epson Corp 半導体装置の製造方法
JPS62133722A (ja) * 1985-12-05 1987-06-16 Ricoh Co Ltd 半導体装置の製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5935446A (ja) * 1982-08-23 1984-02-27 Seiko Epson Corp 半導体装置の製造方法
JPS62133722A (ja) * 1985-12-05 1987-06-16 Ricoh Co Ltd 半導体装置の製造方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013033168A (ja) * 2011-08-03 2013-02-14 Japan Display East Co Ltd 表示装置及び表示装置の製造方法
US9099359B2 (en) 2011-08-03 2015-08-04 Japan Display Inc. Display device and method for manufacturing display device

Also Published As

Publication number Publication date
JPH0557730B2 (enExample) 1993-08-24

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