JPH0156141B2 - - Google Patents
Info
- Publication number
- JPH0156141B2 JPH0156141B2 JP60088869A JP8886985A JPH0156141B2 JP H0156141 B2 JPH0156141 B2 JP H0156141B2 JP 60088869 A JP60088869 A JP 60088869A JP 8886985 A JP8886985 A JP 8886985A JP H0156141 B2 JPH0156141 B2 JP H0156141B2
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- substrate holder
- substrate
- holder electrode
- multilayer thin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8886985A JPS61250163A (ja) | 1985-04-26 | 1985-04-26 | 多層薄膜の製造方法および装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8886985A JPS61250163A (ja) | 1985-04-26 | 1985-04-26 | 多層薄膜の製造方法および装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61250163A JPS61250163A (ja) | 1986-11-07 |
| JPH0156141B2 true JPH0156141B2 (pm) | 1989-11-29 |
Family
ID=13955015
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8886985A Granted JPS61250163A (ja) | 1985-04-26 | 1985-04-26 | 多層薄膜の製造方法および装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61250163A (pm) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03223460A (ja) * | 1990-01-25 | 1991-10-02 | Agency Of Ind Science & Technol | 薄膜堆積方法 |
| JP2001240965A (ja) * | 2000-02-29 | 2001-09-04 | Showa Shinku:Kk | 薄膜製造装置に於ける膜厚分布制御方法及びその装置 |
| US11224871B2 (en) | 2017-05-17 | 2022-01-18 | Asahi Kasei Medical Co., Ltd. | Phosphate adsorbing agent for blood processing, blood processing system and blood processing method |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63274756A (ja) * | 1987-04-28 | 1988-11-11 | Toda Kogyo Corp | 真空蒸着多層薄膜形成装置 |
| JPS63274761A (ja) * | 1987-04-28 | 1988-11-11 | Toda Kogyo Corp | 真空蒸着多層薄膜形成装置 |
| JPH01123065A (ja) * | 1987-11-05 | 1989-05-16 | Fuji Electric Co Ltd | 薄膜形成装置 |
| JPH0699803B2 (ja) * | 1988-05-30 | 1994-12-07 | 三容真空工業株式会社 | スパッタリングによる透明導電膜の製造装置 |
| JPH02107757A (ja) * | 1988-10-15 | 1990-04-19 | Koji Hashimoto | アモルファス超格子合金の作製法 |
| JP2002090978A (ja) | 2000-09-12 | 2002-03-27 | Hoya Corp | 位相シフトマスクブランクの製造方法、及び位相シフトマスクブランクの製造装置 |
| JP2006150160A (ja) * | 2004-11-25 | 2006-06-15 | Hosokawa Funtai Gijutsu Kenkyusho:Kk | 粉体膜形成装置 |
| JP4809613B2 (ja) * | 2005-02-14 | 2011-11-09 | 株式会社シンクロン | 薄膜形成装置 |
| JP4489820B2 (ja) * | 2008-03-31 | 2010-06-23 | Hoya株式会社 | 位相シフトマスクブランクの製造方法、及び位相シフトマスクブランクの製造装置 |
| CN102227514B (zh) * | 2008-12-26 | 2014-08-20 | 佳能安内华股份有限公司 | 溅射装置、溅射方法和电子器件制造方法 |
| JP6777098B2 (ja) * | 2015-12-24 | 2020-10-28 | コニカミノルタ株式会社 | 成膜装置および成膜方法 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4912838A (pm) * | 1972-05-15 | 1974-02-04 |
-
1985
- 1985-04-26 JP JP8886985A patent/JPS61250163A/ja active Granted
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03223460A (ja) * | 1990-01-25 | 1991-10-02 | Agency Of Ind Science & Technol | 薄膜堆積方法 |
| JP2001240965A (ja) * | 2000-02-29 | 2001-09-04 | Showa Shinku:Kk | 薄膜製造装置に於ける膜厚分布制御方法及びその装置 |
| US11224871B2 (en) | 2017-05-17 | 2022-01-18 | Asahi Kasei Medical Co., Ltd. | Phosphate adsorbing agent for blood processing, blood processing system and blood processing method |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61250163A (ja) | 1986-11-07 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |