JPH0153449B2 - - Google Patents

Info

Publication number
JPH0153449B2
JPH0153449B2 JP56121291A JP12129181A JPH0153449B2 JP H0153449 B2 JPH0153449 B2 JP H0153449B2 JP 56121291 A JP56121291 A JP 56121291A JP 12129181 A JP12129181 A JP 12129181A JP H0153449 B2 JPH0153449 B2 JP H0153449B2
Authority
JP
Japan
Prior art keywords
group
photosensitive
lower alkyl
pva
anion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56121291A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5821736A (ja
Inventor
Junnosuke Yamauchi
Tohei Morya
Makoto Shiraishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kuraray Co Ltd
Original Assignee
Kuraray Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kuraray Co Ltd filed Critical Kuraray Co Ltd
Priority to JP12129181A priority Critical patent/JPS5821736A/ja
Publication of JPS5821736A publication Critical patent/JPS5821736A/ja
Publication of JPH0153449B2 publication Critical patent/JPH0153449B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP12129181A 1981-07-31 1981-07-31 感光性組成物 Granted JPS5821736A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12129181A JPS5821736A (ja) 1981-07-31 1981-07-31 感光性組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12129181A JPS5821736A (ja) 1981-07-31 1981-07-31 感光性組成物

Publications (2)

Publication Number Publication Date
JPS5821736A JPS5821736A (ja) 1983-02-08
JPH0153449B2 true JPH0153449B2 (en, 2012) 1989-11-14

Family

ID=14807617

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12129181A Granted JPS5821736A (ja) 1981-07-31 1981-07-31 感光性組成物

Country Status (1)

Country Link
JP (1) JPS5821736A (en, 2012)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6051833A (ja) * 1983-07-01 1985-03-23 Toray Ind Inc 感光性樹脂組成物
JP2548308B2 (ja) * 1988-06-29 1996-10-30 松下電器産業株式会社 パターン形成方法
JP5843620B2 (ja) * 2012-01-11 2016-01-13 株式会社クラレ 一級アミノ基を有するビニルアルコール系重合体を含む架橋性組成物
TW201905005A (zh) * 2017-06-05 2019-02-01 日商可樂麗股份有限公司 側鏈含有胺基之乙烯醇系聚合物

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50101445A (en, 2012) * 1974-01-10 1975-08-12
JPS55135834A (en) * 1979-04-10 1980-10-23 Oriental Shashin Kogyo Kk Photosensitive peeling film

Also Published As

Publication number Publication date
JPS5821736A (ja) 1983-02-08

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