JPH0215056B2 - - Google Patents

Info

Publication number
JPH0215056B2
JPH0215056B2 JP57041690A JP4169082A JPH0215056B2 JP H0215056 B2 JPH0215056 B2 JP H0215056B2 JP 57041690 A JP57041690 A JP 57041690A JP 4169082 A JP4169082 A JP 4169082A JP H0215056 B2 JPH0215056 B2 JP H0215056B2
Authority
JP
Japan
Prior art keywords
water
copolymer
mask layer
present
image forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57041690A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58174939A (ja
Inventor
Yasuo Kojima
Nobumasa Sasa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to JP4169082A priority Critical patent/JPS58174939A/ja
Priority to US06/474,023 priority patent/US4542088A/en
Priority to EP83301450A priority patent/EP0089802B2/en
Priority to DE8383301450T priority patent/DE3366376D1/de
Publication of JPS58174939A publication Critical patent/JPS58174939A/ja
Publication of JPH0215056B2 publication Critical patent/JPH0215056B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP4169082A 1982-03-18 1982-03-18 画像形成材料 Granted JPS58174939A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP4169082A JPS58174939A (ja) 1982-03-18 1982-03-18 画像形成材料
US06/474,023 US4542088A (en) 1982-03-18 1983-03-10 Photopolymerizable compositions and image-forming materials using said compositions
EP83301450A EP0089802B2 (en) 1982-03-18 1983-03-16 Photopolymerizable compositions and image-forming materials using said compositions
DE8383301450T DE3366376D1 (en) 1982-03-18 1983-03-16 Photopolymerizable compositions and image-forming materials using said compositions

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4169082A JPS58174939A (ja) 1982-03-18 1982-03-18 画像形成材料

Publications (2)

Publication Number Publication Date
JPS58174939A JPS58174939A (ja) 1983-10-14
JPH0215056B2 true JPH0215056B2 (en, 2012) 1990-04-10

Family

ID=12615417

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4169082A Granted JPS58174939A (ja) 1982-03-18 1982-03-18 画像形成材料

Country Status (1)

Country Link
JP (1) JPS58174939A (en, 2012)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6093427A (ja) * 1983-10-28 1985-05-25 Nippon Kayaku Co Ltd 感光性樹脂の硬化方法
JP2559711B2 (ja) * 1986-09-12 1996-12-04 株式会社 きもと 非銀塩画像形成材料
JP2545951B2 (ja) * 1988-09-26 1996-10-23 東亞合成株式会社 光硬化性組成物
JP2596271B2 (ja) * 1991-09-10 1997-04-02 双葉電子工業株式会社 感光性組成物及び基板の製造方法
JP2912140B2 (ja) * 1993-10-01 1999-06-28 株式会社きもと 製版用感光材料
JP4820640B2 (ja) * 2005-12-20 2011-11-24 富士フイルム株式会社 平版印刷版の作製方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1091969A (en) * 1975-06-19 1980-12-23 Robert W. Hallman Photosensitive unilayer film structure cast from a polymeric emulsion dispersion
JPS5289916A (en) * 1976-01-23 1977-07-28 Fuji Photo Film Co Ltd Image formation and material therefor
DE2812015C3 (de) * 1977-03-22 1984-05-24 E.I. Du Pont De Nemours And Co., Wilmington, Del. Thermisch verschmelzbare Acrylharzorganosoldispersionen und ihre Verwendung

Also Published As

Publication number Publication date
JPS58174939A (ja) 1983-10-14

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