JPH0136978B2 - - Google Patents
Info
- Publication number
- JPH0136978B2 JPH0136978B2 JP58190210A JP19021083A JPH0136978B2 JP H0136978 B2 JPH0136978 B2 JP H0136978B2 JP 58190210 A JP58190210 A JP 58190210A JP 19021083 A JP19021083 A JP 19021083A JP H0136978 B2 JPH0136978 B2 JP H0136978B2
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- block
- mounting device
- mounting
- heat
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/02631—Physical deposition at reduced pressure, e.g. MBE, sputtering, evaporation
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19021083A JPS6081820A (ja) | 1983-10-11 | 1983-10-11 | 分子線エピタキシヤル装置のウエハ取付装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19021083A JPS6081820A (ja) | 1983-10-11 | 1983-10-11 | 分子線エピタキシヤル装置のウエハ取付装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6081820A JPS6081820A (ja) | 1985-05-09 |
| JPH0136978B2 true JPH0136978B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1989-08-03 |
Family
ID=16254294
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19021083A Granted JPS6081820A (ja) | 1983-10-11 | 1983-10-11 | 分子線エピタキシヤル装置のウエハ取付装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6081820A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07161801A (ja) * | 1993-12-02 | 1995-06-23 | Nippon Telegr & Teleph Corp <Ntt> | 基板ホルダ |
| DE4420113A1 (de) * | 1994-06-09 | 1995-12-14 | Leybold Ag | Transportvorrichtung für in einer Vakuum-Beschichtungsanlage zu beschichtende Substrate |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5730320A (en) * | 1980-07-29 | 1982-02-18 | Fujitsu Ltd | Substrate holder for molecular beam epitaxy |
| JPS5759665A (en) * | 1980-09-25 | 1982-04-10 | Furukawa Electric Co Ltd:The | Control method for coated article-baking oven |
| JPS57107026A (en) * | 1980-12-25 | 1982-07-03 | Seiko Epson Corp | Heating mechanic for vacuum machine |
| JPS58102526A (ja) * | 1981-12-14 | 1983-06-18 | Nec Corp | スパツタ用パレツト治具 |
| JPS58106820A (ja) * | 1981-12-19 | 1983-06-25 | Toshiba Corp | 膜形成装置 |
-
1983
- 1983-10-11 JP JP19021083A patent/JPS6081820A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6081820A (ja) | 1985-05-09 |