JPH0128368B2 - - Google Patents

Info

Publication number
JPH0128368B2
JPH0128368B2 JP55039673A JP3967380A JPH0128368B2 JP H0128368 B2 JPH0128368 B2 JP H0128368B2 JP 55039673 A JP55039673 A JP 55039673A JP 3967380 A JP3967380 A JP 3967380A JP H0128368 B2 JPH0128368 B2 JP H0128368B2
Authority
JP
Japan
Prior art keywords
plasma
photosensitive composition
development
photoresist
manufactured
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55039673A
Other languages
English (en)
Japanese (ja)
Other versions
JPS56137347A (en
Inventor
Wataru Kanai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TOKYO OKA KOGYO KK
Original Assignee
TOKYO OKA KOGYO KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TOKYO OKA KOGYO KK filed Critical TOKYO OKA KOGYO KK
Priority to JP3967380A priority Critical patent/JPS56137347A/ja
Priority to US06/248,325 priority patent/US4388397A/en
Priority to DE3112196A priority patent/DE3112196C2/de
Publication of JPS56137347A publication Critical patent/JPS56137347A/ja
Priority to US06/472,004 priority patent/US4468447A/en
Publication of JPH0128368B2 publication Critical patent/JPH0128368B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/108—Polyolefin or halogen containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/109—Polyester
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/111—Polymer of unsaturated acid or ester
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/128—Radiation-activated cross-linking agent containing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP3967380A 1980-03-29 1980-03-29 Photosensitive composition for dry development Granted JPS56137347A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP3967380A JPS56137347A (en) 1980-03-29 1980-03-29 Photosensitive composition for dry development
US06/248,325 US4388397A (en) 1980-03-29 1981-03-27 Photosensitive composition for dry development
DE3112196A DE3112196C2 (de) 1980-03-29 1981-03-27 Lichtempfindliches Gemisch zur Trockenentwicklung und dessen Verwendung
US06/472,004 US4468447A (en) 1980-03-29 1983-03-04 Photosensitive bisazide composition for dry development

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3967380A JPS56137347A (en) 1980-03-29 1980-03-29 Photosensitive composition for dry development

Publications (2)

Publication Number Publication Date
JPS56137347A JPS56137347A (en) 1981-10-27
JPH0128368B2 true JPH0128368B2 (en, 2012) 1989-06-02

Family

ID=12559611

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3967380A Granted JPS56137347A (en) 1980-03-29 1980-03-29 Photosensitive composition for dry development

Country Status (3)

Country Link
US (2) US4388397A (en, 2012)
JP (1) JPS56137347A (en, 2012)
DE (1) DE3112196C2 (en, 2012)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56137347A (en) * 1980-03-29 1981-10-27 Tokyo Ohka Kogyo Co Ltd Photosensitive composition for dry development
JPS5744143A (en) * 1980-08-29 1982-03-12 Tokyo Ohka Kogyo Co Ltd Composition and method for forming micropattern
KR880002518B1 (ko) * 1981-07-15 1988-11-26 미다가쓰시께 방사선 감응성 조성물
JPS5860537A (ja) * 1981-10-07 1983-04-11 Tokyo Ohka Kogyo Co Ltd 乾式パタ−ン形成方法
JPS60114575A (ja) * 1983-11-28 1985-06-21 Tokyo Ohka Kogyo Co Ltd 乾式パタ−ン形成方法
JPS60115222A (ja) * 1983-11-28 1985-06-21 Tokyo Ohka Kogyo Co Ltd 微細パタ−ン形成方法
FR2583534B1 (fr) * 1985-06-18 1990-06-22 Labo Electronique Physique Composition pour obtenir une resine photosensible de haute resolution, developpable par plasma et procede photolithographique mettant en oeuvre cette resine.
JPS62127735A (ja) * 1985-11-29 1987-06-10 Toshiba Corp 感光性樹脂組成物及びこれを用いたカラ−フイルタ−の製造方法
EP0394741B1 (de) * 1989-04-24 1997-06-25 Siemens Aktiengesellschaft Verfahren zur Erzeugung ätzresistenter Strukturen
US20080142478A1 (en) * 2006-11-01 2008-06-19 Microchem Corp. Epoxy removal process for microformed electroplated devices
US12179157B2 (en) * 2021-10-28 2024-12-31 Saudi Arabian Oil Company Membranes of glassy polymer blends with peg-crosslinked intrinsic microporous polymers for gas separations

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2937085A (en) * 1954-01-11 1960-05-17 Ditto Inc Composite photosensitive plate, and method of making printing plate therefrom
US2852379A (en) * 1955-05-04 1958-09-16 Eastman Kodak Co Azide resin photolithographic composition
BE564617A (en, 2012) 1957-02-07
US3118765A (en) * 1960-08-26 1964-01-21 Litho Chemical And Supply Co I Lithographic product comprising lightsensitive diazido stilbene sulfonic acid salt
US3260599A (en) * 1962-11-19 1966-07-12 Minnesota Mining & Mfg Vesicular diazo copy-sheet containing photoreducible dye
DE2019598A1 (de) * 1970-04-23 1971-11-11 Agfa Gevaert Ag Lichtvernetzbare Schichten
JPS515935B2 (en, 2012) * 1972-04-17 1976-02-24
US4018937A (en) * 1972-12-14 1977-04-19 Rca Corporation Electron beam recording comprising polymer of 1-methylvinyl methyl ketone
US3838317A (en) * 1973-07-12 1974-09-24 Bell Telephone Labor Inc Cross connect switch
JPS5032923A (en, 2012) * 1973-07-23 1975-03-29
US3997344A (en) * 1974-07-05 1976-12-14 American Can Company Dry positive photopolymer imaging process involving heating and application of toner
JPS588576B2 (ja) * 1976-03-12 1983-02-16 三菱電機株式会社 ガスプラズマによる電子ビ−ムレジストの現像方法
JPS52128132A (en) * 1976-04-20 1977-10-27 Fujitsu Ltd Positive type electron beam sensitive composition
DE2726813C2 (de) * 1976-06-17 1984-02-23 Motorola, Inc., 60196 Schaumburg, Ill. Verfahren zur Herstellung eines mit einem Muster versehenen Substrats
JPS5337763A (en) * 1976-09-20 1978-04-07 Asahi Dow Ltd Injection molding machine
AU3870478A (en) * 1977-08-09 1980-02-14 Somar Mfg High energy radiation cruable resist material
US4197133A (en) * 1977-10-14 1980-04-08 Ciba-Geigy Corporation Photo-curable compositions of matter containing bis-azidophthalimidyl derivatives
JPS5820422B2 (ja) * 1977-11-04 1983-04-22 東京応化工業株式会社 超微細パタ−ンの形成方法
US4241165A (en) * 1978-09-05 1980-12-23 Motorola, Inc. Plasma development process for photoresist
JPS56137347A (en) * 1980-03-29 1981-10-27 Tokyo Ohka Kogyo Co Ltd Photosensitive composition for dry development
JPS5744143A (en) * 1980-08-29 1982-03-12 Tokyo Ohka Kogyo Co Ltd Composition and method for forming micropattern

Also Published As

Publication number Publication date
JPS56137347A (en) 1981-10-27
DE3112196C2 (de) 1986-01-23
US4388397A (en) 1983-06-14
US4468447A (en) 1984-08-28
DE3112196A1 (de) 1982-03-11

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