JPS6364772B2 - - Google Patents

Info

Publication number
JPS6364772B2
JPS6364772B2 JP56027482A JP2748281A JPS6364772B2 JP S6364772 B2 JPS6364772 B2 JP S6364772B2 JP 56027482 A JP56027482 A JP 56027482A JP 2748281 A JP2748281 A JP 2748281A JP S6364772 B2 JPS6364772 B2 JP S6364772B2
Authority
JP
Japan
Prior art keywords
resist
layer
deep ultraviolet
forming method
pattern forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56027482A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57141642A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP56027482A priority Critical patent/JPS57141642A/ja
Publication of JPS57141642A publication Critical patent/JPS57141642A/ja
Publication of JPS6364772B2 publication Critical patent/JPS6364772B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP56027482A 1981-02-26 1981-02-26 Formation of pattern Granted JPS57141642A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56027482A JPS57141642A (en) 1981-02-26 1981-02-26 Formation of pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56027482A JPS57141642A (en) 1981-02-26 1981-02-26 Formation of pattern

Publications (2)

Publication Number Publication Date
JPS57141642A JPS57141642A (en) 1982-09-02
JPS6364772B2 true JPS6364772B2 (en, 2012) 1988-12-13

Family

ID=12222341

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56027482A Granted JPS57141642A (en) 1981-02-26 1981-02-26 Formation of pattern

Country Status (1)

Country Link
JP (1) JPS57141642A (en, 2012)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0210032U (en, 2012) * 1988-06-24 1990-01-23

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5965430A (ja) * 1982-10-06 1984-04-13 Matsushita Electric Ind Co Ltd 半導体装置の製造方法
KR900002364B1 (ko) * 1984-05-30 1990-04-12 후지쓰가부시끼가이샤 패턴 형성재의 제조방법
WO1986005284A1 (en) * 1985-03-07 1986-09-12 Hughes Aircraft Company Polysiloxane resist for ion beam and electron beam lithography
US8053159B2 (en) 2003-11-18 2011-11-08 Honeywell International Inc. Antireflective coatings for via fill and photolithography applications and methods of preparation thereof

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0210032U (en, 2012) * 1988-06-24 1990-01-23

Also Published As

Publication number Publication date
JPS57141642A (en) 1982-09-02

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