JPS56137347A - Photosensitive composition for dry development - Google Patents

Photosensitive composition for dry development

Info

Publication number
JPS56137347A
JPS56137347A JP3967380A JP3967380A JPS56137347A JP S56137347 A JPS56137347 A JP S56137347A JP 3967380 A JP3967380 A JP 3967380A JP 3967380 A JP3967380 A JP 3967380A JP S56137347 A JPS56137347 A JP S56137347A
Authority
JP
Japan
Prior art keywords
polymer
photosensitive composition
dry development
plasma
bisazide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3967380A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0128368B2 (en, 2012
Inventor
Wataru Kanai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Ohka Kogyo Co Ltd
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Priority to JP3967380A priority Critical patent/JPS56137347A/ja
Priority to US06/248,325 priority patent/US4388397A/en
Priority to DE3112196A priority patent/DE3112196C2/de
Publication of JPS56137347A publication Critical patent/JPS56137347A/ja
Priority to US06/472,004 priority patent/US4468447A/en
Publication of JPH0128368B2 publication Critical patent/JPH0128368B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/108—Polyolefin or halogen containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/109—Polyester
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/111—Polymer of unsaturated acid or ester
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/128—Radiation-activated cross-linking agent containing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP3967380A 1980-03-29 1980-03-29 Photosensitive composition for dry development Granted JPS56137347A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP3967380A JPS56137347A (en) 1980-03-29 1980-03-29 Photosensitive composition for dry development
US06/248,325 US4388397A (en) 1980-03-29 1981-03-27 Photosensitive composition for dry development
DE3112196A DE3112196C2 (de) 1980-03-29 1981-03-27 Lichtempfindliches Gemisch zur Trockenentwicklung und dessen Verwendung
US06/472,004 US4468447A (en) 1980-03-29 1983-03-04 Photosensitive bisazide composition for dry development

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3967380A JPS56137347A (en) 1980-03-29 1980-03-29 Photosensitive composition for dry development

Publications (2)

Publication Number Publication Date
JPS56137347A true JPS56137347A (en) 1981-10-27
JPH0128368B2 JPH0128368B2 (en, 2012) 1989-06-02

Family

ID=12559611

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3967380A Granted JPS56137347A (en) 1980-03-29 1980-03-29 Photosensitive composition for dry development

Country Status (3)

Country Link
US (2) US4388397A (en, 2012)
JP (1) JPS56137347A (en, 2012)
DE (1) DE3112196C2 (en, 2012)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5860537A (ja) * 1981-10-07 1983-04-11 Tokyo Ohka Kogyo Co Ltd 乾式パタ−ン形成方法

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56137347A (en) * 1980-03-29 1981-10-27 Tokyo Ohka Kogyo Co Ltd Photosensitive composition for dry development
JPS5744143A (en) * 1980-08-29 1982-03-12 Tokyo Ohka Kogyo Co Ltd Composition and method for forming micropattern
KR880002518B1 (ko) * 1981-07-15 1988-11-26 미다가쓰시께 방사선 감응성 조성물
JPS60114575A (ja) * 1983-11-28 1985-06-21 Tokyo Ohka Kogyo Co Ltd 乾式パタ−ン形成方法
JPS60115222A (ja) * 1983-11-28 1985-06-21 Tokyo Ohka Kogyo Co Ltd 微細パタ−ン形成方法
FR2583534B1 (fr) * 1985-06-18 1990-06-22 Labo Electronique Physique Composition pour obtenir une resine photosensible de haute resolution, developpable par plasma et procede photolithographique mettant en oeuvre cette resine.
JPS62127735A (ja) * 1985-11-29 1987-06-10 Toshiba Corp 感光性樹脂組成物及びこれを用いたカラ−フイルタ−の製造方法
EP0394741B1 (de) * 1989-04-24 1997-06-25 Siemens Aktiengesellschaft Verfahren zur Erzeugung ätzresistenter Strukturen
US20080142478A1 (en) * 2006-11-01 2008-06-19 Microchem Corp. Epoxy removal process for microformed electroplated devices
US12179157B2 (en) * 2021-10-28 2024-12-31 Saudi Arabian Oil Company Membranes of glassy polymer blends with peg-crosslinked intrinsic microporous polymers for gas separations

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5040010A (en, 2012) * 1973-07-12 1975-04-12
JPS52128132A (en) * 1976-04-20 1977-10-27 Fujitsu Ltd Positive type electron beam sensitive composition
JPS52155531A (en) * 1976-06-17 1977-12-24 Motorola Inc Dry photo resist developing method
JPS5337763A (en) * 1976-09-20 1978-04-07 Asahi Dow Ltd Injection molding machine

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2937085A (en) * 1954-01-11 1960-05-17 Ditto Inc Composite photosensitive plate, and method of making printing plate therefrom
US2852379A (en) * 1955-05-04 1958-09-16 Eastman Kodak Co Azide resin photolithographic composition
BE564617A (en, 2012) 1957-02-07
US3118765A (en) * 1960-08-26 1964-01-21 Litho Chemical And Supply Co I Lithographic product comprising lightsensitive diazido stilbene sulfonic acid salt
US3260599A (en) * 1962-11-19 1966-07-12 Minnesota Mining & Mfg Vesicular diazo copy-sheet containing photoreducible dye
DE2019598A1 (de) * 1970-04-23 1971-11-11 Agfa Gevaert Ag Lichtvernetzbare Schichten
JPS515935B2 (en, 2012) * 1972-04-17 1976-02-24
US4018937A (en) * 1972-12-14 1977-04-19 Rca Corporation Electron beam recording comprising polymer of 1-methylvinyl methyl ketone
JPS5032923A (en, 2012) * 1973-07-23 1975-03-29
US3997344A (en) * 1974-07-05 1976-12-14 American Can Company Dry positive photopolymer imaging process involving heating and application of toner
JPS588576B2 (ja) * 1976-03-12 1983-02-16 三菱電機株式会社 ガスプラズマによる電子ビ−ムレジストの現像方法
AU3870478A (en) * 1977-08-09 1980-02-14 Somar Mfg High energy radiation cruable resist material
US4197133A (en) * 1977-10-14 1980-04-08 Ciba-Geigy Corporation Photo-curable compositions of matter containing bis-azidophthalimidyl derivatives
JPS5820422B2 (ja) * 1977-11-04 1983-04-22 東京応化工業株式会社 超微細パタ−ンの形成方法
US4241165A (en) * 1978-09-05 1980-12-23 Motorola, Inc. Plasma development process for photoresist
JPS56137347A (en) * 1980-03-29 1981-10-27 Tokyo Ohka Kogyo Co Ltd Photosensitive composition for dry development
JPS5744143A (en) * 1980-08-29 1982-03-12 Tokyo Ohka Kogyo Co Ltd Composition and method for forming micropattern

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5040010A (en, 2012) * 1973-07-12 1975-04-12
JPS52128132A (en) * 1976-04-20 1977-10-27 Fujitsu Ltd Positive type electron beam sensitive composition
JPS52155531A (en) * 1976-06-17 1977-12-24 Motorola Inc Dry photo resist developing method
JPS5337763A (en) * 1976-09-20 1978-04-07 Asahi Dow Ltd Injection molding machine

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5860537A (ja) * 1981-10-07 1983-04-11 Tokyo Ohka Kogyo Co Ltd 乾式パタ−ン形成方法

Also Published As

Publication number Publication date
DE3112196C2 (de) 1986-01-23
US4388397A (en) 1983-06-14
JPH0128368B2 (en, 2012) 1989-06-02
US4468447A (en) 1984-08-28
DE3112196A1 (de) 1982-03-11

Similar Documents

Publication Publication Date Title
JPS5369284A (en) Photopolymerizable composition
JPS5440629A (en) Formation of hard photographic image
JPS53135628A (en) Color potographic material
JPS5280022A (en) Light solubilizable composition
JPS5365381A (en) Photopolymerizable composition
JPS56137347A (en) Photosensitive composition for dry development
JPS5744143A (en) Composition and method for forming micropattern
JPS5412742A (en) Electrophotographic photoreceptor
JPS5341221A (en) Photographic light sensitive material
JPS5225651A (en) Process for fabricating an optical curved surface using a photopolymer izable adhesive
JPS5417831A (en) Light image recording material and dry type light image recording method using this
JPS525742A (en) Process for dechlorination of pcb
JPS5222849A (en) Electronic lexicography
JPS5212838A (en) Developing fluid for electrophotographic printing
JPS53110647A (en) Improvement of water resistance of polyvinyl alcohol type polymer
JPS5359367A (en) Formation of electron beam resist image
JPS5373073A (en) Treatment method for photo resist
JPS531284A (en) Photosensitive compositions
JPS5230428A (en) Photoresist exposure method
JPS5367751A (en) Photosensitive resin composition
JPS5235478A (en) Incineration apparatus for mud, etc.
JPS51130220A (en) Dry type photographic copying method
JPS5399292A (en) Heat decomposable photosensitive resin composition
JPS52131058A (en) Water sealing device
JPS57211144A (en) Formation of micropattern