JPH01184925A - 洗浄装置および洗浄方法 - Google Patents
洗浄装置および洗浄方法Info
- Publication number
- JPH01184925A JPH01184925A JP63009848A JP984888A JPH01184925A JP H01184925 A JPH01184925 A JP H01184925A JP 63009848 A JP63009848 A JP 63009848A JP 984888 A JP984888 A JP 984888A JP H01184925 A JPH01184925 A JP H01184925A
- Authority
- JP
- Japan
- Prior art keywords
- cleaning
- substrate
- carrier
- window
- side wall
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Cleaning By Liquid Or Steam (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63009848A JPH01184925A (ja) | 1988-01-20 | 1988-01-20 | 洗浄装置および洗浄方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63009848A JPH01184925A (ja) | 1988-01-20 | 1988-01-20 | 洗浄装置および洗浄方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01184925A true JPH01184925A (ja) | 1989-07-24 |
| JPH0435900B2 JPH0435900B2 (enrdf_load_stackoverflow) | 1992-06-12 |
Family
ID=11731552
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63009848A Granted JPH01184925A (ja) | 1988-01-20 | 1988-01-20 | 洗浄装置および洗浄方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01184925A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006295091A (ja) * | 2005-04-07 | 2006-10-26 | Tsukishima Kankyo Engineering Ltd | 基板の洗浄方法 |
-
1988
- 1988-01-20 JP JP63009848A patent/JPH01184925A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006295091A (ja) * | 2005-04-07 | 2006-10-26 | Tsukishima Kankyo Engineering Ltd | 基板の洗浄方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0435900B2 (enrdf_load_stackoverflow) | 1992-06-12 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US5904574A (en) | Process of making semiconductor device and improved semiconductor device | |
| JPS6347137B2 (enrdf_load_stackoverflow) | ||
| JP3343033B2 (ja) | 基板処理装置 | |
| KR20010049878A (ko) | 습식처리장치 | |
| US6372051B1 (en) | Positive flow, positive displacement rinse tank | |
| DE102007027112B4 (de) | Verfahren zur Reinigung, Trocknung und Hydrophilierung einer Halbleiterscheibe | |
| JPH01184925A (ja) | 洗浄装置および洗浄方法 | |
| US6360756B1 (en) | Wafer rinse tank for metal etching and method for using | |
| JPH01184926A (ja) | 洗浄装置および洗浄方法 | |
| JPS63110732A (ja) | 半導体基板の洗浄方法 | |
| JPH0864667A (ja) | 半導体ウェハ用カセット | |
| CN1224077C (zh) | 回收芯片的清洗方法 | |
| JPH04167525A (ja) | 洗浄装置および洗浄方法 | |
| JP3040067B2 (ja) | 半導体層を有する基板の洗浄方法 | |
| TWI895887B (zh) | 一種用於清洗晶圓的裝置和方法 | |
| JP3996730B2 (ja) | 半導体部品の製造方法 | |
| US6589356B1 (en) | Method for cleaning a silicon-based substrate without NH4OH vapor damage | |
| JPH04207031A (ja) | 半導体基板の洗浄方法 | |
| US6974505B2 (en) | Tool for cleaning substrates | |
| KR0147944B1 (ko) | 반도체 웨이퍼의 세정방법 | |
| KR20050002532A (ko) | 반도체 웨이퍼 습식세정방법 | |
| JPS63234535A (ja) | 半導体ウエ−ハの洗浄方法 | |
| JPH10189524A (ja) | 洗浄処理装置および洗浄処理方法 | |
| KR20010017387A (ko) | 웨이퍼 세정 장치 | |
| JPS58161328A (ja) | 薄片状物品の洗浄装置 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |