JP7844511B2 - 吸着基板 - Google Patents

吸着基板

Info

Publication number
JP7844511B2
JP7844511B2 JP2023576991A JP2023576991A JP7844511B2 JP 7844511 B2 JP7844511 B2 JP 7844511B2 JP 2023576991 A JP2023576991 A JP 2023576991A JP 2023576991 A JP2023576991 A JP 2023576991A JP 7844511 B2 JP7844511 B2 JP 7844511B2
Authority
JP
Japan
Prior art keywords
face
conductive layer
adsorption substrate
flat portion
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2023576991A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2023145839A5 (https=
JPWO2023145839A1 (https=
Inventor
保典 川邊
柾貴 伊東
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Publication of JPWO2023145839A1 publication Critical patent/JPWO2023145839A1/ja
Publication of JPWO2023145839A5 publication Critical patent/JPWO2023145839A5/ja
Application granted granted Critical
Publication of JP7844511B2 publication Critical patent/JP7844511B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02N—ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
    • H02N13/00—Clutches or holding devices using electrostatic attraction, e.g. using Johnson-Rahbek effect
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping

Landscapes

  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP2023576991A 2022-01-28 2023-01-26 吸着基板 Active JP7844511B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2022012408 2022-01-28
JP2022012408 2022-01-28
PCT/JP2023/002509 WO2023145839A1 (ja) 2022-01-28 2023-01-26 吸着基板

Publications (3)

Publication Number Publication Date
JPWO2023145839A1 JPWO2023145839A1 (https=) 2023-08-03
JPWO2023145839A5 JPWO2023145839A5 (https=) 2024-10-04
JP7844511B2 true JP7844511B2 (ja) 2026-04-13

Family

ID=87471566

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023576991A Active JP7844511B2 (ja) 2022-01-28 2023-01-26 吸着基板

Country Status (2)

Country Link
JP (1) JP7844511B2 (https=)
WO (1) WO2023145839A1 (https=)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004259805A (ja) 2003-02-25 2004-09-16 Kyocera Corp 静電チャック
JP2013084938A (ja) 2011-09-30 2013-05-09 Toto Ltd 静電チャック

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004259805A (ja) 2003-02-25 2004-09-16 Kyocera Corp 静電チャック
JP2013084938A (ja) 2011-09-30 2013-05-09 Toto Ltd 静電チャック

Also Published As

Publication number Publication date
WO2023145839A1 (ja) 2023-08-03
JPWO2023145839A1 (https=) 2023-08-03

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