JP7721090B2 - ホスト基及び／又はゲスト基を有するシロキサン結合含有高分子化合物を含む樹脂材料 - Google Patents

ホスト基及び／又はゲスト基を有するシロキサン結合含有高分子化合物を含む樹脂材料

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Publication number
JP7721090B2
JP7721090B2 JP2022503720A JP2022503720A JP7721090B2 JP 7721090 B2 JP7721090 B2 JP 7721090B2 JP 2022503720 A JP2022503720 A JP 2022503720A JP 2022503720 A JP2022503720 A JP 2022503720A JP 7721090 B2 JP7721090 B2 JP 7721090B2
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group
polymer compound
host
guest
resin material
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JPWO2021172468A1 (https=
Inventor
俊彦 松倉
希 小口
義徳 ▲高▼島
明 原田
基史 大▲崎▼
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Shiseido Co Ltd
University of Osaka NUC
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Osaka University NUC
Shiseido Co Ltd
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L5/00—Compositions of polysaccharides or of their derivatives not provided for in groups C08L1/00 or C08L3/00
    • C08L5/16—Cyclodextrin; Derivatives thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/42—Block-or graft-polymers containing polysiloxane sequences
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04—Polysiloxanes
    • C08L83/06—Polysiloxanes containing silicon bound to oxygen-containing groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08B—POLYSACCHARIDES; DERIVATIVES THEREOF
    • C08B37/00—Preparation of polysaccharides not provided for in groups C08B1/00 - C08B35/00; Derivatives thereof
    • C08B37/0006—Homoglycans, i.e. polysaccharides having a main chain consisting of one single sugar, e.g. colominic acid
    • C08B37/0009—Homoglycans, i.e. polysaccharides having a main chain consisting of one single sugar, e.g. colominic acid alpha-D-Glucans, e.g. polydextrose, alternan, glycogen; (alpha-1,4)(alpha-1,6)-D-Glucans; (alpha-1,3)(alpha-1,4)-D-Glucans, e.g. isolichenan or nigeran; (alpha-1,4)-D-Glucans; (alpha-1,3)-D-Glucans, e.g. pseudonigeran; Derivatives thereof
    • C08B37/0012—Cyclodextrin [CD], e.g. cycle with 6 units (alpha), with 7 units (beta) and with 8 units (gamma), large-ring cyclodextrin or cycloamylose with 9 units or more; Derivatives thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08B—POLYSACCHARIDES; DERIVATIVES THEREOF
    • C08B37/00—Preparation of polysaccharides not provided for in groups C08B1/00 - C08B35/00; Derivatives thereof
    • C08B37/0006—Homoglycans, i.e. polysaccharides having a main chain consisting of one single sugar, e.g. colominic acid
    • C08B37/0009—Homoglycans, i.e. polysaccharides having a main chain consisting of one single sugar, e.g. colominic acid alpha-D-Glucans, e.g. polydextrose, alternan, glycogen; (alpha-1,4)(alpha-1,6)-D-Glucans; (alpha-1,3)(alpha-1,4)-D-Glucans, e.g. isolichenan or nigeran; (alpha-1,4)-D-Glucans; (alpha-1,3)-D-Glucans, e.g. pseudonigeran; Derivatives thereof
    • C08B37/0012—Cyclodextrin [CD], e.g. cycle with 6 units (alpha), with 7 units (beta) and with 8 units (gamma), large-ring cyclodextrin or cycloamylose with 9 units or more; Derivatives thereof
    • C08B37/0015—Inclusion compounds, i.e. host-guest compounds, e.g. polyrotaxanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/38—Polysiloxanes modified by chemical after-treatment
    • C08G77/382—Polysiloxanes modified by chemical after-treatment containing atoms other than carbon, hydrogen, oxygen or silicon
    • C08G77/388—Polysiloxanes modified by chemical after-treatment containing atoms other than carbon, hydrogen, oxygen or silicon containing nitrogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04—Polysiloxanes
    • C08L83/08—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/22—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
    • C08G77/26—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen nitrogen-containing groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2205/00—Polymer mixtures characterised by other features
    • C08L2205/02—Polymer mixtures characterised by other features containing two or more polymers of the same C08L -group
    • C08L2205/025—Polymer mixtures characterised by other features containing two or more polymers of the same C08L -group containing two or more polymers of the same hierarchy C08L, and differing only in parameters such as density, comonomer content, molecular weight, structure

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Molecular Biology (AREA)
  • Engineering & Computer Science (AREA)
  • Biochemistry (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Silicon Polymers (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
JP2022503720A 2020-02-25 2021-02-25 ホスト基及び／又はゲスト基を有するシロキサン結合含有高分子化合物を含む樹脂材料 Active JP7721090B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020029737 2020-02-25
JP2020029737 2020-02-25
PCT/JP2021/007192 WO2021172468A1 (ja) 2020-02-25 2021-02-25 ホスト基及び／又はゲスト基を有するシロキサン結合含有高分子化合物を含む樹脂材料

Publications (2)

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JPWO2021172468A1 JPWO2021172468A1 (https=) 2021-09-02
JP7721090B2 true JP7721090B2 (ja) 2025-08-12

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Country Link
US (1) US20230100274A1 (https=)
EP (1) EP4112672A4 (https=)
JP (1) JP7721090B2 (https=)
KR (1) KR20220146471A (https=)
CN (1) CN115210294A (https=)
TW (1) TW202200677A (https=)
WO (1) WO2021172468A1 (https=)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2021172463A1 (https=) * 2020-02-25 2021-09-02
WO2023003043A1 (ja) * 2021-07-21 2023-01-26 国立大学法人大阪大学 シリコーン系高分子化合物及びシリコーン系高分子材料
JP2024086421A (ja) * 2022-12-16 2024-06-27 国立大学法人大阪大学 複合ポリマー材料及びその製造方法並びに光学材料
WO2024232321A1 (ja) 2023-05-09 2024-11-14 信越化学工業株式会社 環状オリゴ糖変性オルガノポリシロキサン及び皮膜形成剤
JP2024162026A (ja) * 2023-05-09 2024-11-21 信越化学工業株式会社 環状オリゴ糖変性オルガノポリシロキサンの製造方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000506554A (ja) 1995-12-22 2000-05-30 ノバルティス アクチエンゲゼルシャフト ポリシロキサン／ポリオールマクロマーから製造されるポリウレタン
JP2005536653A (ja) 2002-08-23 2005-12-02 ワツカー−ケミー　ゲゼルシヤフト　ミツト　ベシユレンクテル　ハフツング シクロデキストリン残基を含む有機ケイ素化合物
JP2014047269A (ja) 2012-08-30 2014-03-17 Toshiba Corp 自己組織化パターン形成用材料およびパターン形成方法

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DE29624309U1 (de) * 1995-04-04 2002-01-03 Commonwealth Scientific And Industrial Research Organisation, Campbell Dauertraglinsen
US6316268B1 (en) * 1996-11-22 2001-11-13 The Regents Of The University Of California Chemical microsensors for detection of explosives and chemical warfare agents
KR101023916B1 (ko) * 2003-11-24 2011-03-22 삼성전자주식회사 분자 다면체형 실세스퀴옥산을 이용한 반도체 층간절연막의 형성방법
JP2012036069A (ja) 2010-08-03 2012-02-23 Hosen:Kk 鶏糞炭ペレットの製造方法及び鶏糞炭ペレット
WO2012036069A1 (ja) 2010-09-14 2012-03-22 国立大学法人大阪大学 分子認識に基づいた物質材料の選択的接着法および自己組織化法
JP5668707B2 (ja) 2012-02-07 2015-02-12 トヨタ自動車株式会社 半導体モジュール
US10106628B2 (en) 2012-04-27 2018-10-23 Osaka University Gel with self-restorability and shape-memory property and process for producing same
KR102119822B1 (ko) * 2016-08-23 2020-06-05 다이킨 고교 가부시키가이샤 고분자 재료
WO2020139404A1 (en) * 2018-12-29 2020-07-02 Wacker Chemie Ag Cyclodextrin modified silicone composition
WO2021045203A1 (ja) * 2019-09-05 2021-03-11 国立大学法人大阪大学 高分子材料及びその製造方法

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JP2000506554A (ja) 1995-12-22 2000-05-30 ノバルティス アクチエンゲゼルシャフト ポリシロキサン／ポリオールマクロマーから製造されるポリウレタン
JP2005536653A (ja) 2002-08-23 2005-12-02 ワツカー−ケミー　ゲゼルシヤフト　ミツト　ベシユレンクテル　ハフツング シクロデキストリン残基を含む有機ケイ素化合物
JP2014047269A (ja) 2012-08-30 2014-03-17 Toshiba Corp 自己組織化パターン形成用材料およびパターン形成方法

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COUSIN, H. et al.，Synthesis, NMR Spectroscopic Characterization and Polysiloxane-Based Immobilization of the Three Regioisomeric Monooctenylpermethyl-β-cyclodextrins and Their Application in Enantioselective GC，European Journal of Organic Chemistry，2003年，3273-3287
FENG, Wu，Synthesis and characterization of polysiloxane with β-cyclodextrin side groups，China Surfactant Detergent & Cosmetics，2008年，38(4)，214-218
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LEI, Lei et al.，Transparent omniphobic polyurethane coatings containing partially acetylated β-cyclodextrin as the polyol，Chemical Engineering Journal，2020年，380，1-9，[Available online 20 August 2019], Retrieved from the Internet: <URL: http://doi.org/10.1016/j.cej.2
LEVKIN, Pavel A. et al.，Combining the Enantioselectivities of L-Valine Diamide and Permethylated β-Cyclodextrin in One Gas Chromatographic Chiral Stationary Phase，Analytical Chemistry，2006年，78，5143-5148
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Publication number Publication date
JPWO2021172468A1 (https=) 2021-09-02
TW202200677A (zh) 2022-01-01
EP4112672A4 (en) 2024-03-13
WO2021172468A1 (ja) 2021-09-02
US20230100274A1 (en) 2023-03-30
CN115210294A (zh) 2022-10-18
KR20220146471A (ko) 2022-11-01
EP4112672A1 (en) 2023-01-04

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