CN115210294A - 包含具有主体基和/或客体基的含有硅氧烷键的高分子化合物的树脂材料 - Google Patents

包含具有主体基和/或客体基的含有硅氧烷键的高分子化合物的树脂材料 Download PDF

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Publication number
CN115210294A
CN115210294A CN202180016653.7A CN202180016653A CN115210294A CN 115210294 A CN115210294 A CN 115210294A CN 202180016653 A CN202180016653 A CN 202180016653A CN 115210294 A CN115210294 A CN 115210294A
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group
polymer compound
guest
host
resin material
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Chinese (zh)
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松仓俊彦
小口希
高岛义德
原田明
大崎基史
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Shiseido Co Ltd
University of Osaka NUC
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Osaka University NUC
Shiseido Co Ltd
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04Polysiloxanes
    • C08L83/06Polysiloxanes containing silicon bound to oxygen-containing groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/42Block-or graft-polymers containing polysiloxane sequences
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L5/00Compositions of polysaccharides or of their derivatives not provided for in groups C08L1/00 or C08L3/00
    • C08L5/16Cyclodextrin; Derivatives thereof
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08BPOLYSACCHARIDES; DERIVATIVES THEREOF
    • C08B37/00Preparation of polysaccharides not provided for in groups C08B1/00 - C08B35/00; Derivatives thereof
    • C08B37/0006Homoglycans, i.e. polysaccharides having a main chain consisting of one single sugar, e.g. colominic acid
    • C08B37/0009Homoglycans, i.e. polysaccharides having a main chain consisting of one single sugar, e.g. colominic acid alpha-D-Glucans, e.g. polydextrose, alternan, glycogen; (alpha-1,4)(alpha-1,6)-D-Glucans; (alpha-1,3)(alpha-1,4)-D-Glucans, e.g. isolichenan or nigeran; (alpha-1,4)-D-Glucans; (alpha-1,3)-D-Glucans, e.g. pseudonigeran; Derivatives thereof
    • C08B37/0012Cyclodextrin [CD], e.g. cycle with 6 units (alpha), with 7 units (beta) and with 8 units (gamma), large-ring cyclodextrin or cycloamylose with 9 units or more; Derivatives thereof
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08BPOLYSACCHARIDES; DERIVATIVES THEREOF
    • C08B37/00Preparation of polysaccharides not provided for in groups C08B1/00 - C08B35/00; Derivatives thereof
    • C08B37/0006Homoglycans, i.e. polysaccharides having a main chain consisting of one single sugar, e.g. colominic acid
    • C08B37/0009Homoglycans, i.e. polysaccharides having a main chain consisting of one single sugar, e.g. colominic acid alpha-D-Glucans, e.g. polydextrose, alternan, glycogen; (alpha-1,4)(alpha-1,6)-D-Glucans; (alpha-1,3)(alpha-1,4)-D-Glucans, e.g. isolichenan or nigeran; (alpha-1,4)-D-Glucans; (alpha-1,3)-D-Glucans, e.g. pseudonigeran; Derivatives thereof
    • C08B37/0012Cyclodextrin [CD], e.g. cycle with 6 units (alpha), with 7 units (beta) and with 8 units (gamma), large-ring cyclodextrin or cycloamylose with 9 units or more; Derivatives thereof
    • C08B37/0015Inclusion compounds, i.e. host-guest compounds, e.g. polyrotaxanes
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/38Polysiloxanes modified by chemical after-treatment
    • C08G77/382Polysiloxanes modified by chemical after-treatment containing atoms other than carbon, hydrogen, oxygen or silicon
    • C08G77/388Polysiloxanes modified by chemical after-treatment containing atoms other than carbon, hydrogen, oxygen or silicon containing nitrogen
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04Polysiloxanes
    • C08L83/08Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/22Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
    • C08G77/26Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen nitrogen-containing groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2205/00Polymer mixtures characterised by other features
    • C08L2205/02Polymer mixtures characterised by other features containing two or more polymers of the same C08L -group
    • C08L2205/025Polymer mixtures characterised by other features containing two or more polymers of the same C08L -group containing two or more polymers of the same hierarchy C08L, and differing only in parameters such as density, comonomer content, molecular weight, structure

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Molecular Biology (AREA)
  • Engineering & Computer Science (AREA)
  • Biochemistry (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Silicon Polymers (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
CN202180016653.7A 2020-02-25 2021-02-25 包含具有主体基和/或客体基的含有硅氧烷键的高分子化合物的树脂材料 Pending CN115210294A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020-029737 2020-02-25
JP2020029737 2020-02-25
PCT/JP2021/007192 WO2021172468A1 (ja) 2020-02-25 2021-02-25 ホスト基及び/又はゲスト基を有するシロキサン結合含有高分子化合物を含む樹脂材料

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CN115210294A true CN115210294A (zh) 2022-10-18

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CN202180016653.7A Pending CN115210294A (zh) 2020-02-25 2021-02-25 包含具有主体基和/或客体基的含有硅氧烷键的高分子化合物的树脂材料

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US (1) US20230100274A1 (https=)
EP (1) EP4112672A4 (https=)
JP (1) JP7721090B2 (https=)
KR (1) KR20220146471A (https=)
CN (1) CN115210294A (https=)
TW (1) TW202200677A (https=)
WO (1) WO2021172468A1 (https=)

Families Citing this family (5)

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Publication number Priority date Publication date Assignee Title
JPWO2021172463A1 (https=) * 2020-02-25 2021-09-02
WO2023003043A1 (ja) * 2021-07-21 2023-01-26 国立大学法人大阪大学 シリコーン系高分子化合物及びシリコーン系高分子材料
JP2024086421A (ja) * 2022-12-16 2024-06-27 国立大学法人大阪大学 複合ポリマー材料及びその製造方法並びに光学材料
WO2024232321A1 (ja) 2023-05-09 2024-11-14 信越化学工業株式会社 環状オリゴ糖変性オルガノポリシロキサン及び皮膜形成剤
JP2024162026A (ja) * 2023-05-09 2024-11-21 信越化学工業株式会社 環状オリゴ糖変性オルガノポリシロキサンの製造方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1186550A (zh) * 1995-05-19 1998-07-01 诺瓦提斯公司 聚硅氧烷多元醇大分子单体、其制备及其应用
CN1678665A (zh) * 2002-08-23 2005-10-05 瓦克化学有限公司 含有环糊精基的有机硅化合物
CN101429338A (zh) * 2003-11-24 2009-05-13 三星电子株式会社 用多面体分子倍半硅氧烷,形成半导体器件用层间电介质膜的方法
CN109642085A (zh) * 2016-08-23 2019-04-16 大金工业株式会社 高分子材料

Family Cites Families (9)

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ATE223933T1 (de) 1995-12-22 2002-09-15 Novartis Erfind Verwalt Gmbh Polyurethane aus polysiloxan-polyol-makromeren
US6316268B1 (en) * 1996-11-22 2001-11-13 The Regents Of The University Of California Chemical microsensors for detection of explosives and chemical warfare agents
JP2012036069A (ja) 2010-08-03 2012-02-23 Hosen:Kk 鶏糞炭ペレットの製造方法及び鶏糞炭ペレット
WO2012036069A1 (ja) 2010-09-14 2012-03-22 国立大学法人大阪大学 分子認識に基づいた物質材料の選択的接着法および自己組織化法
JP5668707B2 (ja) 2012-02-07 2015-02-12 トヨタ自動車株式会社 半導体モジュール
US10106628B2 (en) 2012-04-27 2018-10-23 Osaka University Gel with self-restorability and shape-memory property and process for producing same
JP5642126B2 (ja) 2012-08-30 2014-12-17 株式会社東芝 自己組織化パターン形成用材料およびパターン形成方法
WO2020139404A1 (en) * 2018-12-29 2020-07-02 Wacker Chemie Ag Cyclodextrin modified silicone composition
WO2021045203A1 (ja) * 2019-09-05 2021-03-11 国立大学法人大阪大学 高分子材料及びその製造方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1186550A (zh) * 1995-05-19 1998-07-01 诺瓦提斯公司 聚硅氧烷多元醇大分子单体、其制备及其应用
CN1678665A (zh) * 2002-08-23 2005-10-05 瓦克化学有限公司 含有环糊精基的有机硅化合物
CN102070903A (zh) * 2002-08-23 2011-05-25 瓦克化学股份公司 含有环糊精基的有机硅化合物
CN101429338A (zh) * 2003-11-24 2009-05-13 三星电子株式会社 用多面体分子倍半硅氧烷,形成半导体器件用层间电介质膜的方法
CN109642085A (zh) * 2016-08-23 2019-04-16 大金工业株式会社 高分子材料

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JPWO2021172468A1 (https=) 2021-09-02
TW202200677A (zh) 2022-01-01
EP4112672A4 (en) 2024-03-13
WO2021172468A1 (ja) 2021-09-02
US20230100274A1 (en) 2023-03-30
KR20220146471A (ko) 2022-11-01
EP4112672A1 (en) 2023-01-04
JP7721090B2 (ja) 2025-08-12

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