JP7594857B2 - 高アスペクト比のガラスウエハ - Google Patents

高アスペクト比のガラスウエハ Download PDF

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Publication number
JP7594857B2
JP7594857B2 JP2019545991A JP2019545991A JP7594857B2 JP 7594857 B2 JP7594857 B2 JP 7594857B2 JP 2019545991 A JP2019545991 A JP 2019545991A JP 2019545991 A JP2019545991 A JP 2019545991A JP 7594857 B2 JP7594857 B2 JP 7594857B2
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Japan
Prior art keywords
glass wafer
less
major surface
glass
wafer
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JP2019545991A
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English (en)
Japanese (ja)
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JP2020511383A (ja
Inventor
ルシアン ジニア，マイケル
タイラー キーチ，ジョン
サビア，ロバート
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Corning Inc
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Corning Inc
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Publication of JP2020511383A publication Critical patent/JP2020511383A/ja
Priority to JP2022208047A priority Critical patent/JP2023040087A/ja
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Publication of JP7594857B2 publication Critical patent/JP7594857B2/ja
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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001—General methods for coating; Devices therefor
    • C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/30—Doped silica-based glasses containing metals
    • C03C2201/40—Doped silica-based glasses containing metals containing transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
    • C03C2201/42—Doped silica-based glasses containing metals containing transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn containing titanium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/70—Properties of coatings
    • C03C2217/73—Anti-reflective coatings with specific characteristics
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/70—Properties of coatings
    • C03C2217/73—Anti-reflective coatings with specific characteristics
    • C03C2217/732—Anti-reflective coatings with specific characteristics made of a single layer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Glass Compositions (AREA)
  • Surface Treatment Of Glass (AREA)
  • Electroluminescent Light Sources (AREA)
JP2019545991A 2017-02-24 2018-02-23 高アスペクト比のガラスウエハ Active JP7594857B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2022208047A JP2023040087A (ja) 2017-02-24 2022-12-26 高アスペクト比のガラスウエハ

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201762463320P 2017-02-24 2017-02-24
US62/463,320 2017-02-24
PCT/US2018/019421 WO2018156894A1 (en) 2017-02-24 2018-02-23 High aspect ratio glass wafer

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2022208047A Division JP2023040087A (ja) 2017-02-24 2022-12-26 高アスペクト比のガラスウエハ

Publications (2)

Publication Number Publication Date
JP2020511383A JP2020511383A (ja) 2020-04-16
JP7594857B2 true JP7594857B2 (ja) 2024-12-05

Family

ID=61599639

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2019545991A Active JP7594857B2 (ja) 2017-02-24 2018-02-23 高アスペクト比のガラスウエハ
JP2022208047A Pending JP2023040087A (ja) 2017-02-24 2022-12-26 高アスペクト比のガラスウエハ

Family Applications After (1)

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JP2022208047A Pending JP2023040087A (ja) 2017-02-24 2022-12-26 高アスペクト比のガラスウエハ

Country Status (7)

Country Link
US (1) US10935698B2 (enExample)
EP (1) EP3585743A1 (enExample)
JP (2) JP7594857B2 (enExample)
KR (1) KR102536919B1 (enExample)
CN (1) CN110461784A (enExample)
TW (1) TWI771375B (enExample)
WO (1) WO2018156894A1 (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017178912A1 (en) * 2016-04-13 2017-10-19 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and display device including the semiconductor device
CN116655238A (zh) * 2018-08-31 2023-08-29 Ａｇｃ株式会社 光学玻璃和光学部件
US12037282B2 (en) 2018-11-01 2024-07-16 Corning Incorporated Strengthened glass articles with reduced delayed breakage and methods of making the same
JP7376602B2 (ja) 2019-02-14 2023-11-08 マジック リープ， インコーポレイテッド 導波路ディスプレイ基板における偏倚された全厚みばらつき
US11279614B2 (en) * 2019-06-28 2022-03-22 Analog Devices, Inc. Low-parasitic capacitance MEMS inertial sensors and related methods
US12464920B2 (en) * 2019-09-17 2025-11-04 Google Llc Suppressing scattering of light transmitted through OLED displays
JP7003178B2 (ja) * 2020-04-21 2022-01-20 Hoya株式会社 円盤状ガラス基板の製造方法、薄板ガラス基板の製造方法、導光板の製造方法及び円盤状ガラス基板
CN114180826A (zh) * 2020-09-14 2022-03-15 肖特股份有限公司 低光损耗玻璃制品

Citations (3)

* Cited by examiner, † Cited by third party
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JP2013216568A (ja) 2012-04-10 2013-10-24 Schott Ag 赤外吸収ガラスウェハ及びそれを作製する方法
JP2014517805A (ja) 2011-05-27 2014-07-24 コーニング インコーポレイテッド 未研磨ガラスウェハ、未研磨ガラスウェハを使用して半導体ウェハを薄厚化する薄厚化システム及び方法
WO2016143583A1 (ja) 2015-03-10 2016-09-15 日本電気硝子株式会社 半導体用支持ガラス基板及びこれを用いた積層基板

Family Cites Families (23)

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US7112359B2 (en) * 2001-08-22 2006-09-26 Inphase Technologies, Inc. Method and apparatus for multilayer optical articles
US7086927B2 (en) 2004-03-09 2006-08-08 Micron Technology, Inc. Methods and systems for planarizing workpieces, e.g., microelectronic workpieces
CN100501932C (zh) * 2005-04-27 2009-06-17 株式会社迪斯科 半导体晶片及其加工方法
JP5390740B2 (ja) * 2005-04-27 2014-01-15 株式会社ディスコ ウェーハの加工方法
US7928026B2 (en) 2005-06-30 2011-04-19 Corning Incorporated Synthetic silica material with low fluence-dependent-transmission and method of making the same
US20070082179A1 (en) * 2005-10-07 2007-04-12 Wade James J Method and apparatus for forming optical articles
US7691730B2 (en) 2005-11-22 2010-04-06 Corning Incorporated Large area semiconductor on glass insulator
DE102006032047A1 (de) 2006-07-10 2008-01-24 Schott Ag Verfahren zur Herstellung optoelektronischer Bauelemente und damit hergestellte Erzeugnisse
US20080179755A1 (en) * 2007-01-31 2008-07-31 International Business Machines Corporation Structure and method for creating reliable deep via connections in a silicon carrier
US8062986B2 (en) 2007-07-27 2011-11-22 Corning Incorporated Fused silica having low OH, OD levels and method of making
US7920342B2 (en) * 2008-07-01 2011-04-05 Aptina Imaging Corporation Over-molded glass lenses and method of forming the same
JP5091066B2 (ja) 2008-09-11 2012-12-05 富士フイルム株式会社 固体撮像装置の製造方法
JP5436876B2 (ja) * 2009-02-02 2014-03-05 株式会社ディスコ 研削方法
JP5060571B2 (ja) * 2010-03-08 2012-10-31 株式会社大川金型設計事務所 ウェーハホルダフレームの製造方法
WO2012056807A1 (ja) * 2010-10-25 2012-05-03 日本碍子株式会社 セラミックス材料、積層体、半導体製造装置用部材及びスパッタリングターゲット部材
US8859103B2 (en) 2010-11-05 2014-10-14 Joseph Eugene Canale Glass wafers for semiconductor fabrication processes and methods of making same
WO2013179765A1 (ja) 2012-05-30 2013-12-05 オリンパス株式会社 撮像装置の製造方法および半導体装置の製造方法
JP6147250B2 (ja) 2012-05-30 2017-06-14 オリンパス株式会社 撮像装置の製造方法および半導体装置の製造方法
US9221289B2 (en) * 2012-07-27 2015-12-29 Apple Inc. Sapphire window
JP2014151376A (ja) 2013-02-05 2014-08-25 Seiko Instruments Inc ウエハ研磨方法及び電子デバイス製造方法
JP6463341B2 (ja) * 2013-04-30 2019-01-30 コーニング インコーポレイテッド 空乏層を備えたガラスおよびその上に構築された多結晶シリコンｔｆｔ
US9966293B2 (en) * 2014-09-19 2018-05-08 Infineon Technologies Ag Wafer arrangement and method for processing a wafer
CN107108333B (zh) * 2015-01-20 2021-09-21 肖特玻璃科技(苏州)有限公司 具有高的紫外线透射率和耐晒性的低cte玻璃

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014517805A (ja) 2011-05-27 2014-07-24 コーニング インコーポレイテッド 未研磨ガラスウェハ、未研磨ガラスウェハを使用して半導体ウェハを薄厚化する薄厚化システム及び方法
JP2013216568A (ja) 2012-04-10 2013-10-24 Schott Ag 赤外吸収ガラスウェハ及びそれを作製する方法
WO2016143583A1 (ja) 2015-03-10 2016-09-15 日本電気硝子株式会社 半導体用支持ガラス基板及びこれを用いた積層基板

Also Published As

Publication number Publication date
JP2023040087A (ja) 2023-03-22
US10935698B2 (en) 2021-03-02
KR20190117018A (ko) 2019-10-15
CN110461784A (zh) 2019-11-15
JP2020511383A (ja) 2020-04-16
WO2018156894A1 (en) 2018-08-30
KR102536919B1 (ko) 2023-05-25
TWI771375B (zh) 2022-07-21
US20180246257A1 (en) 2018-08-30
TW201834223A (zh) 2018-09-16
EP3585743A1 (en) 2020-01-01

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