CN110461784A - 高纵横比的玻璃晶片 - Google Patents

高纵横比的玻璃晶片 Download PDF

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Publication number
CN110461784A
CN110461784A CN201880013996.6A CN201880013996A CN110461784A CN 110461784 A CN110461784 A CN 110461784A CN 201880013996 A CN201880013996 A CN 201880013996A CN 110461784 A CN110461784 A CN 110461784A
Authority
CN
China
Prior art keywords
equal
less
glass wafer
chip glass
glass
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201880013996.6A
Other languages
English (en)
Chinese (zh)
Inventor
R·萨比亚
M·L·吉内尔
J·T·基奇
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Corning Inc
Original Assignee
Corning Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Corning Inc filed Critical Corning Inc
Publication of CN110461784A publication Critical patent/CN110461784A/zh
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001—General methods for coating; Devices therefor
    • C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/30—Doped silica-based glasses containing metals
    • C03C2201/40—Doped silica-based glasses containing metals containing transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
    • C03C2201/42—Doped silica-based glasses containing metals containing transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn containing titanium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/70—Properties of coatings
    • C03C2217/73—Anti-reflective coatings with specific characteristics
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/70—Properties of coatings
    • C03C2217/73—Anti-reflective coatings with specific characteristics
    • C03C2217/732—Anti-reflective coatings with specific characteristics made of a single layer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Glass Compositions (AREA)
  • Surface Treatment Of Glass (AREA)
  • Electroluminescent Light Sources (AREA)
CN201880013996.6A 2017-02-24 2018-02-23 高纵横比的玻璃晶片 Pending CN110461784A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201762463320P 2017-02-24 2017-02-24
US62/463,320 2017-02-24
PCT/US2018/019421 WO2018156894A1 (en) 2017-02-24 2018-02-23 High aspect ratio glass wafer

Publications (1)

Publication Number Publication Date
CN110461784A true CN110461784A (zh) 2019-11-15

Family

ID=61599639

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201880013996.6A Pending CN110461784A (zh) 2017-02-24 2018-02-23 高纵横比的玻璃晶片

Country Status (7)

Country Link
US (1) US10935698B2 (enExample)
EP (1) EP3585743A1 (enExample)
JP (2) JP7594857B2 (enExample)
KR (1) KR102536919B1 (enExample)
CN (1) CN110461784A (enExample)
TW (1) TWI771375B (enExample)
WO (1) WO2018156894A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114180826A (zh) * 2020-09-14 2022-03-15 肖特股份有限公司 低光损耗玻璃制品

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WO2017178912A1 (en) * 2016-04-13 2017-10-19 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and display device including the semiconductor device
CN116655238A (zh) * 2018-08-31 2023-08-29 Ａｇｃ株式会社 光学玻璃和光学部件
US12037282B2 (en) 2018-11-01 2024-07-16 Corning Incorporated Strengthened glass articles with reduced delayed breakage and methods of making the same
JP7376602B2 (ja) 2019-02-14 2023-11-08 マジック リープ， インコーポレイテッド 導波路ディスプレイ基板における偏倚された全厚みばらつき
US11279614B2 (en) * 2019-06-28 2022-03-22 Analog Devices, Inc. Low-parasitic capacitance MEMS inertial sensors and related methods
US12464920B2 (en) * 2019-09-17 2025-11-04 Google Llc Suppressing scattering of light transmitted through OLED displays
JP7003178B2 (ja) * 2020-04-21 2022-01-20 Hoya株式会社 円盤状ガラス基板の製造方法、薄板ガラス基板の製造方法、導光板の製造方法及び円盤状ガラス基板

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CN1855381A (zh) * 2005-04-27 2006-11-01 株式会社迪斯科 半导体晶片及其加工方法
JP2011187604A (ja) * 2010-03-08 2011-09-22 Okawa Kanagata Sekkei Jimusho:Kk ウェーハホルダフレーム
CN103201236A (zh) * 2010-10-25 2013-07-10 日本碍子株式会社 加热装置
CN103359938A (zh) * 2012-04-10 2013-10-23 肖特公开股份有限公司 红外吸收玻璃晶片及其制备方法
CN103597578A (zh) * 2011-05-27 2014-02-19 康宁股份有限公司 非抛光玻璃晶片、使用非抛光玻璃晶片减薄半导体晶片的减薄系统和方法
CN105448797A (zh) * 2014-09-19 2016-03-30 英飞凌科技股份有限公司 晶片装置和用于加工晶片的方法

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JP5390740B2 (ja) * 2005-04-27 2014-01-15 株式会社ディスコ ウェーハの加工方法
US7928026B2 (en) 2005-06-30 2011-04-19 Corning Incorporated Synthetic silica material with low fluence-dependent-transmission and method of making the same
US20070082179A1 (en) * 2005-10-07 2007-04-12 Wade James J Method and apparatus for forming optical articles
US7691730B2 (en) 2005-11-22 2010-04-06 Corning Incorporated Large area semiconductor on glass insulator
DE102006032047A1 (de) 2006-07-10 2008-01-24 Schott Ag Verfahren zur Herstellung optoelektronischer Bauelemente und damit hergestellte Erzeugnisse
US20080179755A1 (en) * 2007-01-31 2008-07-31 International Business Machines Corporation Structure and method for creating reliable deep via connections in a silicon carrier
US8062986B2 (en) 2007-07-27 2011-11-22 Corning Incorporated Fused silica having low OH, OD levels and method of making
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JP5091066B2 (ja) 2008-09-11 2012-12-05 富士フイルム株式会社 固体撮像装置の製造方法
JP5436876B2 (ja) * 2009-02-02 2014-03-05 株式会社ディスコ 研削方法
US8859103B2 (en) 2010-11-05 2014-10-14 Joseph Eugene Canale Glass wafers for semiconductor fabrication processes and methods of making same
WO2013179765A1 (ja) 2012-05-30 2013-12-05 オリンパス株式会社 撮像装置の製造方法および半導体装置の製造方法
JP6147250B2 (ja) 2012-05-30 2017-06-14 オリンパス株式会社 撮像装置の製造方法および半導体装置の製造方法
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CN107108344A (zh) * 2015-03-10 2017-08-29 日本电气硝子株式会社 半导体用支承玻璃基板及使用其的层叠基板

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1855381A (zh) * 2005-04-27 2006-11-01 株式会社迪斯科 半导体晶片及其加工方法
JP2011187604A (ja) * 2010-03-08 2011-09-22 Okawa Kanagata Sekkei Jimusho:Kk ウェーハホルダフレーム
CN103201236A (zh) * 2010-10-25 2013-07-10 日本碍子株式会社 加热装置
CN103597578A (zh) * 2011-05-27 2014-02-19 康宁股份有限公司 非抛光玻璃晶片、使用非抛光玻璃晶片减薄半导体晶片的减薄系统和方法
CN103359938A (zh) * 2012-04-10 2013-10-23 肖特公开股份有限公司 红外吸收玻璃晶片及其制备方法
CN105448797A (zh) * 2014-09-19 2016-03-30 英飞凌科技股份有限公司 晶片装置和用于加工晶片的方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114180826A (zh) * 2020-09-14 2022-03-15 肖特股份有限公司 低光损耗玻璃制品

Also Published As

Publication number Publication date
JP2023040087A (ja) 2023-03-22
US10935698B2 (en) 2021-03-02
KR20190117018A (ko) 2019-10-15
JP2020511383A (ja) 2020-04-16
WO2018156894A1 (en) 2018-08-30
KR102536919B1 (ko) 2023-05-25
JP7594857B2 (ja) 2024-12-05
TWI771375B (zh) 2022-07-21
US20180246257A1 (en) 2018-08-30
TW201834223A (zh) 2018-09-16
EP3585743A1 (en) 2020-01-01

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