KR102536919B1 - 높은 가로세로 비를 갖는 유리 웨이퍼 - Google Patents

높은 가로세로 비를 갖는 유리 웨이퍼 Download PDF

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Publication number
KR102536919B1
KR102536919B1 KR1020197027352A KR20197027352A KR102536919B1 KR 102536919 B1 KR102536919 B1 KR 102536919B1 KR 1020197027352 A KR1020197027352 A KR 1020197027352A KR 20197027352 A KR20197027352 A KR 20197027352A KR 102536919 B1 KR102536919 B1 KR 102536919B1
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Prior art keywords
glass wafer
less
equal
major surface
glass
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Korean (ko)
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KR20190117018A (ko
Inventor
마이클 루시엔 게니어
존 타일러 키치
로버트 사비아
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코닝 인코포레이티드
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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001—General methods for coating; Devices therefor
    • C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/30—Doped silica-based glasses containing metals
    • C03C2201/40—Doped silica-based glasses containing metals containing transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
    • C03C2201/42—Doped silica-based glasses containing metals containing transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn containing titanium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/70—Properties of coatings
    • C03C2217/73—Anti-reflective coatings with specific characteristics
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/70—Properties of coatings
    • C03C2217/73—Anti-reflective coatings with specific characteristics
    • C03C2217/732—Anti-reflective coatings with specific characteristics made of a single layer

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  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Glass Compositions (AREA)
  • Surface Treatment Of Glass (AREA)
  • Electroluminescent Light Sources (AREA)
KR1020197027352A 2017-02-24 2018-02-23 높은 가로세로 비를 갖는 유리 웨이퍼 Active KR102536919B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201762463320P 2017-02-24 2017-02-24
US62/463,320 2017-02-24
PCT/US2018/019421 WO2018156894A1 (en) 2017-02-24 2018-02-23 High aspect ratio glass wafer

Publications (2)

Publication Number Publication Date
KR20190117018A KR20190117018A (ko) 2019-10-15
KR102536919B1 true KR102536919B1 (ko) 2023-05-25

Family

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Application Number Title Priority Date Filing Date
KR1020197027352A Active KR102536919B1 (ko) 2017-02-24 2018-02-23 높은 가로세로 비를 갖는 유리 웨이퍼

Country Status (7)

Country Link
US (1) US10935698B2 (enExample)
EP (1) EP3585743A1 (enExample)
JP (2) JP7594857B2 (enExample)
KR (1) KR102536919B1 (enExample)
CN (1) CN110461784A (enExample)
TW (1) TWI771375B (enExample)
WO (1) WO2018156894A1 (enExample)

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CN115332356A (zh) 2016-04-13 2022-11-11 株式会社半导体能源研究所 半导体装置及包括该半导体装置的显示装置
WO2020045417A1 (ja) * 2018-08-31 2020-03-05 Ａｇｃ株式会社 光学ガラスおよび光学部品
US12037282B2 (en) 2018-11-01 2024-07-16 Corning Incorporated Strengthened glass articles with reduced delayed breakage and methods of making the same
EP3924771B1 (en) 2019-02-14 2024-03-27 Magic Leap, Inc. Biased total thickness variations in waveguide display substrates
US11279614B2 (en) 2019-06-28 2022-03-22 Analog Devices, Inc. Low-parasitic capacitance MEMS inertial sensors and related methods
WO2021055547A2 (en) * 2019-09-17 2021-03-25 Google Llc Suppressing scattering of light transmitted through oled displays
JP7003178B2 (ja) * 2020-04-21 2022-01-20 Hoya株式会社 円盤状ガラス基板の製造方法、薄板ガラス基板の製造方法、導光板の製造方法及び円盤状ガラス基板
CN114180826A (zh) * 2020-09-14 2022-03-15 肖特股份有限公司 低光损耗玻璃制品

Citations (1)

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JP2007019461A (ja) * 2005-04-27 2007-01-25 Disco Abrasive Syst Ltd ウェーハの加工方法及びウェーハ

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US7112359B2 (en) * 2001-08-22 2006-09-26 Inphase Technologies, Inc. Method and apparatus for multilayer optical articles
US7086927B2 (en) 2004-03-09 2006-08-08 Micron Technology, Inc. Methods and systems for planarizing workpieces, e.g., microelectronic workpieces
CN100501932C (zh) * 2005-04-27 2009-06-17 株式会社迪斯科 半导体晶片及其加工方法
US7928026B2 (en) 2005-06-30 2011-04-19 Corning Incorporated Synthetic silica material with low fluence-dependent-transmission and method of making the same
US20070082179A1 (en) * 2005-10-07 2007-04-12 Wade James J Method and apparatus for forming optical articles
US7691730B2 (en) 2005-11-22 2010-04-06 Corning Incorporated Large area semiconductor on glass insulator
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US8062986B2 (en) 2007-07-27 2011-11-22 Corning Incorporated Fused silica having low OH, OD levels and method of making
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JP5091066B2 (ja) 2008-09-11 2012-12-05 富士フイルム株式会社 固体撮像装置の製造方法
JP5436876B2 (ja) * 2009-02-02 2014-03-05 株式会社ディスコ 研削方法
JP5060571B2 (ja) * 2010-03-08 2012-10-31 株式会社大川金型設計事務所 ウェーハホルダフレームの製造方法
WO2012056807A1 (ja) * 2010-10-25 2012-05-03 日本碍子株式会社 セラミックス材料、積層体、半導体製造装置用部材及びスパッタリングターゲット部材
US8859103B2 (en) 2010-11-05 2014-10-14 Joseph Eugene Canale Glass wafers for semiconductor fabrication processes and methods of making same
US9227295B2 (en) * 2011-05-27 2016-01-05 Corning Incorporated Non-polished glass wafer, thinning system and method for using the non-polished glass wafer to thin a semiconductor wafer
DE102012103077B4 (de) * 2012-04-10 2017-06-22 Schott Ag Infrarot-absorbierender Glas-Wafer und Verfahren zu dessen Herstellung
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KR102166947B1 (ko) * 2013-04-30 2020-10-19 코닝 인코포레이티드 공핍층 및 공핍층 상에 제작된 다결정질-실리콘 tft를 갖는 유리
US9966293B2 (en) * 2014-09-19 2018-05-08 Infineon Technologies Ag Wafer arrangement and method for processing a wafer
JP6827934B2 (ja) 2015-01-20 2021-02-10 ショット グラス テクノロジーズ （スゾウ） カンパニー リミテッドＳｃｈｏｔｔ Ｇｌａｓｓ Ｔｅｃｈｎｏｌｏｇｉｅｓ （Ｓｕｚｈｏｕ） Ｃｏ．， Ｌｔｄ． 高いｕｖ透過率および耐ソラリゼーション性を示す低ｃｔｅガラス
KR102508645B1 (ko) * 2015-03-10 2023-03-10 니폰 덴키 가라스 가부시키가이샤 반도체용 지지 유리 기판 및 이것을 사용한 적층 기판

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007019461A (ja) * 2005-04-27 2007-01-25 Disco Abrasive Syst Ltd ウェーハの加工方法及びウェーハ

Also Published As

Publication number Publication date
WO2018156894A1 (en) 2018-08-30
EP3585743A1 (en) 2020-01-01
JP2020511383A (ja) 2020-04-16
US20180246257A1 (en) 2018-08-30
TW201834223A (zh) 2018-09-16
TWI771375B (zh) 2022-07-21
JP2023040087A (ja) 2023-03-22
JP7594857B2 (ja) 2024-12-05
CN110461784A (zh) 2019-11-15
US10935698B2 (en) 2021-03-02
KR20190117018A (ko) 2019-10-15

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