JP7549299B2 - インプリント用光硬化性組成物 - Google Patents

インプリント用光硬化性組成物 Download PDF

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Publication number
JP7549299B2
JP7549299B2 JP2022545602A JP2022545602A JP7549299B2 JP 7549299 B2 JP7549299 B2 JP 7549299B2 JP 2022545602 A JP2022545602 A JP 2022545602A JP 2022545602 A JP2022545602 A JP 2022545602A JP 7549299 B2 JP7549299 B2 JP 7549299B2
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JP
Japan
Prior art keywords
imprints
photocurable composition
resin
molded body
registered trademark
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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JP2022545602A
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English (en)
Japanese (ja)
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JPWO2022044743A1 (https=
JPWO2022044743A5 (https=
Inventor
翔太 今井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nissan Chemical Corp
Original Assignee
Nissan Chemical Corp
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Publication date
Application filed by Nissan Chemical Corp filed Critical Nissan Chemical Corp
Publication of JPWO2022044743A1 publication Critical patent/JPWO2022044743A1/ja
Publication of JPWO2022044743A5 publication Critical patent/JPWO2022044743A5/ja
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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F20/28—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Polymerisation Methods In General (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Graft Or Block Polymers (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP2022545602A 2020-08-28 2021-08-04 インプリント用光硬化性組成物 Active JP7549299B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020144179 2020-08-28
JP2020144179 2020-08-28
PCT/JP2021/028993 WO2022044743A1 (ja) 2020-08-28 2021-08-04 インプリント用光硬化性組成物

Publications (3)

Publication Number Publication Date
JPWO2022044743A1 JPWO2022044743A1 (https=) 2022-03-03
JPWO2022044743A5 JPWO2022044743A5 (https=) 2024-07-05
JP7549299B2 true JP7549299B2 (ja) 2024-09-11

Family

ID=80355048

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022545602A Active JP7549299B2 (ja) 2020-08-28 2021-08-04 インプリント用光硬化性組成物

Country Status (3)

Country Link
JP (1) JP7549299B2 (https=)
TW (1) TW202219188A (https=)
WO (1) WO2022044743A1 (https=)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000171804A (ja) 1998-12-05 2000-06-23 Dainippon Printing Co Ltd 液晶表示装置およびその製造方法
JP2009166486A (ja) 2007-12-19 2009-07-30 Asahi Kasei Corp 光吸収性を有するモールド、該モールドを利用する感光性樹脂のパターン形成方法、及び印刷版の製造方法
JP2012130906A (ja) 2010-11-30 2012-07-12 Dainippon Printing Co Ltd 光硬化性樹脂組成物の硬化方法、及びレリーフパターンの製造方法
WO2019142601A1 (ja) 2018-01-17 2019-07-25 日産化学株式会社 インプリント用光硬化性組成物
US20200071541A1 (en) 2017-08-08 2020-03-05 International Business Machines Corporation Tailorable surface topology for antifouling coatings

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000171804A (ja) 1998-12-05 2000-06-23 Dainippon Printing Co Ltd 液晶表示装置およびその製造方法
JP2009166486A (ja) 2007-12-19 2009-07-30 Asahi Kasei Corp 光吸収性を有するモールド、該モールドを利用する感光性樹脂のパターン形成方法、及び印刷版の製造方法
JP2012130906A (ja) 2010-11-30 2012-07-12 Dainippon Printing Co Ltd 光硬化性樹脂組成物の硬化方法、及びレリーフパターンの製造方法
US20200071541A1 (en) 2017-08-08 2020-03-05 International Business Machines Corporation Tailorable surface topology for antifouling coatings
WO2019142601A1 (ja) 2018-01-17 2019-07-25 日産化学株式会社 インプリント用光硬化性組成物

Also Published As

Publication number Publication date
TW202219188A (zh) 2022-05-16
WO2022044743A1 (ja) 2022-03-03
JPWO2022044743A1 (https=) 2022-03-03

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