JP7478617B2 - 純水製造装置及び超純水製造装置並びに純水製造方法及び超純水製造方法 - Google Patents
純水製造装置及び超純水製造装置並びに純水製造方法及び超純水製造方法 Download PDFInfo
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 title claims description 148
- 238000004519 manufacturing process Methods 0.000 title claims description 75
- 229910021642 ultra pure water Inorganic materials 0.000 title claims description 25
- 239000012498 ultrapure water Substances 0.000 title claims description 25
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 97
- 229910052796 boron Inorganic materials 0.000 claims description 97
- 239000011347 resin Substances 0.000 claims description 49
- 229920005989 resin Polymers 0.000 claims description 49
- 239000012528 membrane Substances 0.000 claims description 44
- 230000003647 oxidation Effects 0.000 claims description 32
- 238000007254 oxidation reaction Methods 0.000 claims description 32
- 238000001223 reverse osmosis Methods 0.000 claims description 21
- 239000003456 ion exchange resin Substances 0.000 claims description 20
- 229920003303 ion-exchange polymer Polymers 0.000 claims description 20
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical group [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 18
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 claims description 17
- 238000007872 degassing Methods 0.000 claims description 16
- 229910052751 metal Inorganic materials 0.000 claims description 13
- 239000002184 metal Substances 0.000 claims description 13
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 11
- 238000009296 electrodeionization Methods 0.000 claims description 9
- 230000001172 regenerating effect Effects 0.000 claims description 9
- 239000000377 silicon dioxide Substances 0.000 claims description 5
- 239000011734 sodium Substances 0.000 claims description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 4
- 239000003054 catalyst Substances 0.000 claims description 4
- 238000011144 upstream manufacturing Methods 0.000 claims description 4
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims description 3
- 229910052708 sodium Inorganic materials 0.000 claims description 3
- 229910052799 carbon Inorganic materials 0.000 claims description 2
- 238000000746 purification Methods 0.000 claims 1
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 14
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 13
- 239000005416 organic matter Substances 0.000 description 13
- 150000002500 ions Chemical class 0.000 description 9
- 239000000126 substance Substances 0.000 description 8
- 238000005342 ion exchange Methods 0.000 description 7
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 6
- 239000001569 carbon dioxide Substances 0.000 description 5
- 229910002092 carbon dioxide Inorganic materials 0.000 description 5
- 238000000108 ultra-filtration Methods 0.000 description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 3
- 238000000354 decomposition reaction Methods 0.000 description 3
- 239000008367 deionised water Substances 0.000 description 3
- 229910021641 deionized water Inorganic materials 0.000 description 3
- 239000010419 fine particle Substances 0.000 description 3
- 125000000524 functional group Chemical group 0.000 description 3
- 230000015271 coagulation Effects 0.000 description 2
- 238000005345 coagulation Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 238000011033 desalting Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 230000008929 regeneration Effects 0.000 description 2
- 238000011069 regeneration method Methods 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- 238000004065 wastewater treatment Methods 0.000 description 2
- RSWGJHLUYNHPMX-UHFFFAOYSA-N 1,4a-dimethyl-7-propan-2-yl-2,3,4,4b,5,6,10,10a-octahydrophenanthrene-1-carboxylic acid Chemical compound C12CCC(C(C)C)=CC2=CCC2C1(C)CCCC2(C)C(O)=O RSWGJHLUYNHPMX-UHFFFAOYSA-N 0.000 description 1
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 1
- MBBZMMPHUWSWHV-BDVNFPICSA-N N-methylglucamine Chemical group CNC[C@H](O)[C@@H](O)[C@H](O)[C@H](O)CO MBBZMMPHUWSWHV-BDVNFPICSA-N 0.000 description 1
- 239000003957 anion exchange resin Substances 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 239000003729 cation exchange resin Substances 0.000 description 1
- 229920001429 chelating resin Polymers 0.000 description 1
- 238000005115 demineralization Methods 0.000 description 1
- 230000002328 demineralizing effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000010828 elution Methods 0.000 description 1
- -1 etc. Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000003014 ion exchange membrane Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000001471 micro-filtration Methods 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
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- B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
- B01D61/42—Electrodialysis; Electro-osmosis ; Electro-ultrafiltration; Membrane capacitive deionization
- B01D61/44—Ion-selective electrodialysis
- B01D61/46—Apparatus therefor
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- B01D61/02—Reverse osmosis; Hyperfiltration ; Nanofiltration
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- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
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- B01D61/42—Electrodialysis; Electro-osmosis ; Electro-ultrafiltration; Membrane capacitive deionization
- B01D61/44—Ion-selective electrodialysis
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- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
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- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J39/00—Cation exchange; Use of material as cation exchangers; Treatment of material for improving the cation exchange properties
- B01J39/08—Use of material as cation exchangers; Treatment of material for improving the cation exchange properties
- B01J39/16—Organic material
- B01J39/18—Macromolecular compounds
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B01J41/00—Anion exchange; Use of material as anion exchangers; Treatment of material for improving the anion exchange properties
- B01J41/08—Use of material as anion exchangers; Treatment of material for improving the anion exchange properties
- B01J41/12—Macromolecular compounds
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J47/00—Ion-exchange processes in general; Apparatus therefor
- B01J47/014—Ion-exchange processes in general; Apparatus therefor in which the adsorbent properties of the ion-exchanger are involved, e.g. recovery of proteins or other high-molecular compounds
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- B01J47/00—Ion-exchange processes in general; Apparatus therefor
- B01J47/016—Modification or after-treatment of ion-exchangers
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- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J47/00—Ion-exchange processes in general; Apparatus therefor
- B01J47/02—Column or bed processes
- B01J47/026—Column or bed processes using columns or beds of different ion exchange materials in series
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- C02F1/30—Treatment of water, waste water, or sewage by irradiation
- C02F1/32—Treatment of water, waste water, or sewage by irradiation with ultraviolet light
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Description
上述の一次純水製造システム21と同様の構成のシステムを用いて、被処理水の処理を行った。表1に各装置の仕様を示す。表2,3にそれぞれ実施例1,2の各装置の処理水の主な物質の濃度と水質(比抵抗)を示す。実施例1では膜脱気装置24を省略し、実施例2では膜脱気装置24を設けた。逆浸透膜装置22、第1のEDI23、ほう素選択性樹脂装置25、紫外線酸化装置26、第2のEDI28は実施例1,2とも設けた。白金族金属担持イオン交換樹脂装置27は設けていない。逆浸透膜装置22で大半のイオン成分を除去し、イオン濃度を数十~数百μg/Lまで低減し、第1のEDI23でイオン成分と炭酸(CO2)とほう素(B)を除去し、ほう素選択性樹脂で、ほう素を1ng/L未満の濃度まで除去した。さらに、紫外線酸化装置26によってTOCを低減し、第2のEDI28で、シリカ(SiO2)を0.1μg/L未満、金属(Na)を10ng/L未満の濃度まで除去した。ほう素選択性樹脂から溶出する微量の導電性有機物の影響で、ほう素選択性樹脂装置25の処理水では、第1のEDI23の処理水に比べて、TOCが微増し、比抵抗が微減した。しかし、被処理水が紫外線酸化装置26で処理され、有機物が分解された後、第2のEDI28で処理されイオン成分が除去されるため、TOCは減少し、比抵抗は増加した。実施例1と2の比較より、膜脱気装置24は第2のEDI28の処理水のTOCを減少させることが確認された。これは、前述の通り、溶存酸素濃度が低減したことで、紫外線酸化装置26における有機物の分解効率が向上したためと考えられる。
21 一次純水製造システム
22 逆浸透膜装置
23 第1の電気式脱イオン水製造装置(第1のEDI)
24 膜脱気装置
25 ほう素選択性樹脂装置
26 紫外線酸化装置
27 白金族金属担持イオン交換樹脂装置
28 第2の電気式脱イオン水製造装置(第2のEDI)
31 二次純水製造システム
Claims (10)
- 被処理水を処理して純水を製造する純水製造装置であって、
前記被処理水の通水方向に沿って順に配置された逆浸透膜装置と、第1の電気式脱イオン水製造装置と、ほう素選択性樹脂が充填されたほう素選択性樹脂装置と、紫外線酸化装置と、第2の電気式脱イオン水製造装置と、を有し、
前記逆浸透膜装置と前記ほう素選択性樹脂装置との間に他の紫外線酸化装置が設けられていない、純水製造装置。 - 前記ほう素選択性樹脂装置に充填されたほう素選択性樹脂は非再生型である、請求項1に記載の純水製造装置。
- 前記紫外線酸化装置の上流に配置された膜脱気装置を有する、請求項1または2に記載の純水製造装置。
- 前記紫外線酸化装置の下流に配置され、白金族金属触媒を担持した白金族金属担持イオン交換樹脂装置を有する、請求項1から3のいずれか1項に記載の純水製造装置。
- 請求項1から4のいずれか1項に記載の純水製造装置を一次純水製造システムとして備えるとともに、前記一次純水製造システムで製造された純水を被処理水として超純水を製造する二次純水製造システムを備える超純水製造装置。
- 被処理水を処理して純水を製造する純水製造方法であって、
逆浸透膜装置、第1の電気式脱イオン水製造装置、ほう素選択性樹脂が充填されたほう素選択性樹脂装置、紫外線酸化装置、第2の電気式脱イオン水製造装置の順に前記被処理水が処理され、
前記逆浸透膜装置と前記ほう素選択性樹脂装置との間に他の紫外線酸化装置が設けられていない、純水製造方法。 - 前記ほう素選択性樹脂装置の処理水のほう素濃度が1ng/L未満である、請求項6に記載の純水製造方法。
- 前記第2の電気式脱イオン水製造装置の処理水における全有機炭素が5μg/L未満である、請求項6または7に記載の純水製造方法。
- 前記第2の電気式脱イオン水製造装置の処理水におけるナトリウム濃度が10ng/L未満、且つシリカ濃度が0.1μg/L未満である、請求項6から8のいずれか1項に記載の純水製造方法。
- 請求項6から9のいずれか1項に記載の純水製造方法によって被処理水から純水を製造することと、
前記純水を被処理水として超純水を製造することと、
を有する超純水製造方法。
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JP2003266097A (ja) | 2002-03-13 | 2003-09-24 | Kurita Water Ind Ltd | 超純水製造装置 |
JP2006051423A (ja) | 2004-08-10 | 2006-02-23 | Kurita Water Ind Ltd | 電気脱イオンシステム、電気脱イオン方法及び純水製造装置 |
JP2016097389A (ja) | 2014-11-26 | 2016-05-30 | オルガノ株式会社 | 反応体収容体、反応器及び水処理装置 |
JP2018183761A (ja) | 2017-04-27 | 2018-11-22 | 野村マイクロ・サイエンス株式会社 | 超純水製造システム及び超純水製造方法 |
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Publication number | Priority date | Publication date | Assignee | Title |
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JP2003266097A (ja) | 2002-03-13 | 2003-09-24 | Kurita Water Ind Ltd | 超純水製造装置 |
JP2006051423A (ja) | 2004-08-10 | 2006-02-23 | Kurita Water Ind Ltd | 電気脱イオンシステム、電気脱イオン方法及び純水製造装置 |
JP2016097389A (ja) | 2014-11-26 | 2016-05-30 | オルガノ株式会社 | 反応体収容体、反応器及び水処理装置 |
JP2018183761A (ja) | 2017-04-27 | 2018-11-22 | 野村マイクロ・サイエンス株式会社 | 超純水製造システム及び超純水製造方法 |
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