JP7457687B2 - Ｔｅｍ補正器システムにおける熱磁場ノイズの低減 - Google Patents

Ｔｅｍ補正器システムにおける熱磁場ノイズの低減 Download PDF

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Publication number
JP7457687B2
JP7457687B2 JP2021214089A JP2021214089A JP7457687B2 JP 7457687 B2 JP7457687 B2 JP 7457687B2 JP 2021214089 A JP2021214089 A JP 2021214089A JP 2021214089 A JP2021214089 A JP 2021214089A JP 7457687 B2 JP7457687 B2 JP 7457687B2
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JP
Japan
Prior art keywords
corrector
coating
outer coating
electrically insulating
corrector system
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JP2021214089A
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English (en)
Japanese (ja)
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JP2022105317A (ja
JP2022105317A5 (https=
Inventor
ヘンストラ アレクサンデル
ドナ プレウン
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FEI Co
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FEI Co
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Publication of JP2022105317A5 publication Critical patent/JP2022105317A5/ja
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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/026—Means for avoiding or neutralising unwanted electrical charges on tube components
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/10—Lenses
    • H01J37/145—Combinations of electrostatic and magnetic lenses
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1472—Deflecting along given lines
    • H01J37/1474—Scanning means
    • H01J37/1477—Scanning means electrostatic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261—Details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/049—Focusing means
    • H01J2237/0492—Lens systems
    • H01J2237/04924—Lens systems electrostatic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/049—Focusing means
    • H01J2237/0492—Lens systems
    • H01J2237/04926—Lens systems combined
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/151—Electrostatic means
    • H01J2237/1516—Multipoles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/153—Correcting image defects, e.g. stigmators
    • H01J2237/1534—Aberrations

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP2021214089A 2020-12-31 2021-12-28 Ｔｅｍ補正器システムにおける熱磁場ノイズの低減 Active JP7457687B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US17/139,859 US11437216B2 (en) 2020-12-31 2020-12-31 Reduction of thermal magnetic field noise in TEM corrector systems
US17/139,859 2020-12-31

Publications (3)

Publication Number Publication Date
JP2022105317A JP2022105317A (ja) 2022-07-13
JP2022105317A5 JP2022105317A5 (https=) 2024-02-14
JP7457687B2 true JP7457687B2 (ja) 2024-03-28

Family

ID=78851077

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021214089A Active JP7457687B2 (ja) 2020-12-31 2021-12-28 Ｔｅｍ補正器システムにおける熱磁場ノイズの低減

Country Status (5)

Country Link
US (2) US11437216B2 (https=)
EP (1) EP4030461A1 (https=)
JP (1) JP7457687B2 (https=)
KR (2) KR102781260B1 (https=)
CN (1) CN114695037B (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN119104172B (zh) * 2024-11-08 2025-12-12 国网浙江省电力有限公司舟山供电公司 基于热磁噪声信号的电缆中间接头温度测量方法及系统

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020142496A1 (en) 2000-11-02 2002-10-03 Mamoru Nakasuji Electron beam apparatus and method of manufacturing semiconductor device using the apparatus
JP2004228309A (ja) 2003-01-22 2004-08-12 Toshiba Corp 荷電ビーム制御方法、これを用いた半導体装置の製造方法および荷電ビーム露光装置
US20050263715A1 (en) 2004-05-26 2005-12-01 Ebara Corporation Objective lens, electron beam system and method of inspecting defect
JP2016018626A (ja) 2014-07-07 2016-02-01 株式会社日立ハイテクノロジーズ 荷電粒子線装置および収差補正器
JP2017010671A (ja) 2015-06-18 2017-01-12 日本電子株式会社 ライナーチューブ、および電子顕微鏡
JP2020009765A (ja) 2018-07-06 2020-01-16 エフ イー アイ カンパニＦｅｉ Ｃｏｍｐａｎｙ 撮像分解能を向上させた電子顕微鏡

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6586746B1 (en) * 2000-09-27 2003-07-01 International Business Machines Corporation Multipole electrostatic e-beam deflector
JP3896080B2 (ja) * 2000-12-12 2007-03-22 株式会社荏原製作所 電子線装置及び該装置を用いた半導体デバイス製造方法
US6940080B2 (en) * 2002-03-28 2005-09-06 Kabushiki Kaisha Toshiba Charged particle beam lithography system, lithography method using charged particle beam, method of controlling charged particle beam, and method of manufacturing semiconductor device
JP2006139958A (ja) * 2004-11-10 2006-06-01 Toshiba Corp 荷電ビーム装置
US7550739B2 (en) * 2006-03-30 2009-06-23 Tokyo Electron Limited Static electricity deflecting device, electron beam irradiating apparatus, substrate processing apparatus, substrate processing method and method of manufacturing substrate
JP5623719B2 (ja) * 2008-10-06 2014-11-12 日本電子株式会社 荷電粒子線装置の色収差補正装置及びその補正方法
JP2018098268A (ja) * 2016-12-08 2018-06-21 株式会社ニューフレアテクノロジー ブランキング偏向器及びマルチ荷電粒子ビーム描画装置
US10825644B1 (en) * 2019-07-25 2020-11-03 Fei Company Corrector transfer optics for Lorentz EM

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020142496A1 (en) 2000-11-02 2002-10-03 Mamoru Nakasuji Electron beam apparatus and method of manufacturing semiconductor device using the apparatus
JP2004228309A (ja) 2003-01-22 2004-08-12 Toshiba Corp 荷電ビーム制御方法、これを用いた半導体装置の製造方法および荷電ビーム露光装置
US20050263715A1 (en) 2004-05-26 2005-12-01 Ebara Corporation Objective lens, electron beam system and method of inspecting defect
JP2016018626A (ja) 2014-07-07 2016-02-01 株式会社日立ハイテクノロジーズ 荷電粒子線装置および収差補正器
JP2017010671A (ja) 2015-06-18 2017-01-12 日本電子株式会社 ライナーチューブ、および電子顕微鏡
JP2020009765A (ja) 2018-07-06 2020-01-16 エフ イー アイ カンパニＦｅｉ Ｃｏｍｐａｎｙ 撮像分解能を向上させた電子顕微鏡

Also Published As

Publication number Publication date
US11437216B2 (en) 2022-09-06
EP4030461A1 (en) 2022-07-20
US20220392736A1 (en) 2022-12-08
KR102781260B1 (ko) 2025-03-14
US11915904B2 (en) 2024-02-27
KR102913382B1 (ko) 2026-01-14
KR20220097254A (ko) 2022-07-07
JP2022105317A (ja) 2022-07-13
CN114695037A (zh) 2022-07-01
US20220208507A1 (en) 2022-06-30
CN114695037B (zh) 2025-02-14
KR20250039346A (ko) 2025-03-20

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