JP2022105317A5 - - Google Patents
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- Publication number
- JP2022105317A5 JP2022105317A5 JP2021214089A JP2021214089A JP2022105317A5 JP 2022105317 A5 JP2022105317 A5 JP 2022105317A5 JP 2021214089 A JP2021214089 A JP 2021214089A JP 2021214089 A JP2021214089 A JP 2021214089A JP 2022105317 A5 JP2022105317 A5 JP 2022105317A5
- Authority
- JP
- Japan
- Prior art keywords
- coating
- corrector
- electrically insulating
- insulating material
- corrector system
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011248 coating agent Substances 0.000 claims 34
- 238000000576 coating method Methods 0.000 claims 34
- 230000005405 multipole Effects 0.000 claims 17
- 239000012777 electrically insulating material Substances 0.000 claims 16
- 239000002245 particle Substances 0.000 claims 13
- 239000004020 conductor Substances 0.000 claims 10
- 230000003287 optical effect Effects 0.000 claims 8
- 229910010293 ceramic material Inorganic materials 0.000 claims 3
- 239000000463 material Substances 0.000 claims 3
- 239000004065 semiconductor Substances 0.000 claims 3
- 230000003993 interaction Effects 0.000 claims 1
- 238000000386 microscopy Methods 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US17/139,859 US11437216B2 (en) | 2020-12-31 | 2020-12-31 | Reduction of thermal magnetic field noise in TEM corrector systems |
| US17/139,859 | 2020-12-31 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2022105317A JP2022105317A (ja) | 2022-07-13 |
| JP2022105317A5 true JP2022105317A5 (https=) | 2024-02-14 |
| JP7457687B2 JP7457687B2 (ja) | 2024-03-28 |
Family
ID=78851077
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021214089A Active JP7457687B2 (ja) | 2020-12-31 | 2021-12-28 | Ｔｅｍ補正器システムにおける熱磁場ノイズの低減 |
Country Status (5)
| Country | Link |
|---|---|
| US (2) | US11437216B2 (https=) |
| EP (1) | EP4030461A1 (https=) |
| JP (1) | JP7457687B2 (https=) |
| KR (2) | KR102781260B1 (https=) |
| CN (1) | CN114695037B (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN119104172B (zh) * | 2024-11-08 | 2025-12-12 | 国网浙江省电力有限公司舟山供电公司 | 基于热磁噪声信号的电缆中间接头温度测量方法及系统 |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6586746B1 (en) * | 2000-09-27 | 2003-07-01 | International Business Machines Corporation | Multipole electrostatic e-beam deflector |
| WO2002037526A1 (en) * | 2000-11-02 | 2002-05-10 | Ebara Corporation | Electron beam apparatus and method for manufacturing semiconductor device comprising the apparatus |
| JP3896080B2 (ja) * | 2000-12-12 | 2007-03-22 | 株式会社荏原製作所 | 電子線装置及び該装置を用いた半導体デバイス製造方法 |
| JP4008827B2 (ja) | 2003-01-22 | 2007-11-14 | 株式会社東芝 | 荷電ビーム制御方法、これを用いた半導体装置の製造方法および荷電ビーム装置 |
| US6940080B2 (en) * | 2002-03-28 | 2005-09-06 | Kabushiki Kaisha Toshiba | Charged particle beam lithography system, lithography method using charged particle beam, method of controlling charged particle beam, and method of manufacturing semiconductor device |
| US7420164B2 (en) * | 2004-05-26 | 2008-09-02 | Ebara Corporation | Objective lens, electron beam system and method of inspecting defect |
| JP2006139958A (ja) * | 2004-11-10 | 2006-06-01 | Toshiba Corp | 荷電ビーム装置 |
| US7550739B2 (en) * | 2006-03-30 | 2009-06-23 | Tokyo Electron Limited | Static electricity deflecting device, electron beam irradiating apparatus, substrate processing apparatus, substrate processing method and method of manufacturing substrate |
| JP5623719B2 (ja) * | 2008-10-06 | 2014-11-12 | 日本電子株式会社 | 荷電粒子線装置の色収差補正装置及びその補正方法 |
| JP6324241B2 (ja) * | 2014-07-07 | 2018-05-16 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置および収差補正器 |
| JP2017010671A (ja) | 2015-06-18 | 2017-01-12 | 日本電子株式会社 | ライナーチューブ、および電子顕微鏡 |
| JP2018098268A (ja) * | 2016-12-08 | 2018-06-21 | 株式会社ニューフレアテクノロジー | ブランキング偏向器及びマルチ荷電粒子ビーム描画装置 |
| EP3591685A1 (en) * | 2018-07-06 | 2020-01-08 | FEI Company | Electron microscope with improved imaging resolution |
| US10825644B1 (en) * | 2019-07-25 | 2020-11-03 | Fei Company | Corrector transfer optics for Lorentz EM |
-
2020
- 2020-12-31 US US17/139,859 patent/US11437216B2/en active Active
-
2021
- 2021-12-14 EP EP21214240.0A patent/EP4030461A1/en active Pending
- 2021-12-21 KR KR1020210183740A patent/KR102781260B1/ko active Active
- 2021-12-28 JP JP2021214089A patent/JP7457687B2/ja active Active
- 2021-12-30 CN CN202111647066.6A patent/CN114695037B/zh active Active
-
2022
- 2022-08-03 US US17/880,624 patent/US11915904B2/en active Active
-
2025
- 2025-03-10 KR KR1020250030602A patent/KR102913382B1/ko active Active
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