JP7401785B2 - 感光性樹脂組成物、含フッ素樹脂硬化物の製造方法、含フッ素樹脂、含フッ素樹脂膜、バンク及び表示素子 - Google Patents

感光性樹脂組成物、含フッ素樹脂硬化物の製造方法、含フッ素樹脂、含フッ素樹脂膜、バンク及び表示素子 Download PDF

Info

Publication number
JP7401785B2
JP7401785B2 JP2020558366A JP2020558366A JP7401785B2 JP 7401785 B2 JP7401785 B2 JP 7401785B2 JP 2020558366 A JP2020558366 A JP 2020558366A JP 2020558366 A JP2020558366 A JP 2020558366A JP 7401785 B2 JP7401785 B2 JP 7401785B2
Authority
JP
Japan
Prior art keywords
group
carbon atoms
formula
fluororesin
repeating unit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2020558366A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2020110793A5 (https=
JPWO2020110793A1 (ja
Inventor
譲 兼子
覚 宮澤
佳子 佐々木
明日香 佐野
祐介 野村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Central Glass Co Ltd
Original Assignee
Central Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Central Glass Co Ltd filed Critical Central Glass Co Ltd
Publication of JPWO2020110793A1 publication Critical patent/JPWO2020110793A1/ja
Publication of JPWO2020110793A5 publication Critical patent/JPWO2020110793A5/ja
Priority to JP2023201743A priority Critical patent/JP7755181B2/ja
Application granted granted Critical
Publication of JP7401785B2 publication Critical patent/JP7401785B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F214/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen
    • C08F214/18Monomers containing fluorine
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10Esters
    • C08F220/22Esters containing halogen
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F14/00Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen
    • C08F14/18Monomers containing fluorine
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/04Polymerisation in solution
    • C08F2/06Organic solvent
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/54Polymerisation initiated by wave energy or particle radiation by X-rays or electrons
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/02Monomers containing only one unsaturated aliphatic radical
    • C08F212/04Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F212/14Monomers containing only one unsaturated aliphatic radical containing one ring substituted by heteroatoms or groups containing heteroatoms
    • C08F212/22Oxygen
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10Esters
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10Esters
    • C08F220/22Esters containing halogen
    • C08F220/24Esters containing halogen containing perhaloalkyl radicals
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10Esters
    • C08F220/26Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/28Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
    • C08F220/282Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety and containing two or more oxygen atoms
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F279/00Macromolecular compounds obtained by polymerising monomers on to polymers of monomers having two or more carbon-to-carbon double bonds as defined in group C08F36/00
    • C08F279/02Macromolecular compounds obtained by polymerising monomers on to polymers of monomers having two or more carbon-to-carbon double bonds as defined in group C08F36/00 on to polymers of conjugated dienes
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/08Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
    • C08F290/12Polymers provided for in subclasses C08C or C08F
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00Chemical modification by after-treatment
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L27/00Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers
    • C08L27/02Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment
    • C08L27/12Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16Coating processes; Apparatus therefor
    • G03F7/168Finishing the coated layer, e.g. drying, baking, soaking
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09FDISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
    • G09F9/30Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00Electroluminescent light sources
    • H05B33/12Light sources with substantially two-dimensional [2D] radiating surfaces
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00Electroluminescent light sources
    • H05B33/12Light sources with substantially two-dimensional [2D] radiating surfaces
    • H05B33/22Light sources with substantially two-dimensional [2D] radiating surfaces characterised by the chemical or physical composition or the arrangement of auxiliary dielectric or reflective layers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10OLED displays
    • H10K59/12Active-matrix OLED [AMOLED] displays
    • H10K59/122Pixel-defining structures or layers, e.g. banks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Emergency Medicine (AREA)
  • Theoretical Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)
  • Graft Or Block Polymers (AREA)
  • Electroluminescent Light Sources (AREA)
JP2020558366A 2018-11-26 2019-11-18 感光性樹脂組成物、含フッ素樹脂硬化物の製造方法、含フッ素樹脂、含フッ素樹脂膜、バンク及び表示素子 Active JP7401785B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2023201743A JP7755181B2 (ja) 2018-11-26 2023-11-29 感光性樹脂組成物、含フッ素樹脂硬化物の製造方法

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
JP2018219938 2018-11-26
JP2018219938 2018-11-26
JP2018227767 2018-12-05
JP2018227767 2018-12-05
JP2019172138 2019-09-20
JP2019172138 2019-09-20
PCT/JP2019/045009 WO2020110793A1 (ja) 2018-11-26 2019-11-18 感光性樹脂組成物、含フッ素樹脂硬化物の製造方法、含フッ素樹脂、含フッ素樹脂膜、バンク及び表示素子

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2023201743A Division JP7755181B2 (ja) 2018-11-26 2023-11-29 感光性樹脂組成物、含フッ素樹脂硬化物の製造方法

Publications (3)

Publication Number Publication Date
JPWO2020110793A1 JPWO2020110793A1 (ja) 2021-10-21
JPWO2020110793A5 JPWO2020110793A5 (https=) 2022-11-24
JP7401785B2 true JP7401785B2 (ja) 2023-12-20

Family

ID=70852912

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2020558366A Active JP7401785B2 (ja) 2018-11-26 2019-11-18 感光性樹脂組成物、含フッ素樹脂硬化物の製造方法、含フッ素樹脂、含フッ素樹脂膜、バンク及び表示素子
JP2023201743A Active JP7755181B2 (ja) 2018-11-26 2023-11-29 感光性樹脂組成物、含フッ素樹脂硬化物の製造方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2023201743A Active JP7755181B2 (ja) 2018-11-26 2023-11-29 感光性樹脂組成物、含フッ素樹脂硬化物の製造方法

Country Status (6)

Country Link
US (2) US11939459B2 (https=)
JP (2) JP7401785B2 (https=)
KR (2) KR20260042521A (https=)
CN (1) CN113166294B (https=)
TW (1) TWI838424B (https=)
WO (1) WO2020110793A1 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2022092155A1 (https=) 2020-10-28 2022-05-05
CN116829674A (zh) * 2021-02-08 2023-09-29 中央硝子株式会社 拒液剂、固化性组合物、固化物、分隔壁、有机电致发光元件、含氟涂膜的制造方法及含氟涂膜
JPWO2022190714A1 (https=) * 2021-03-09 2022-09-15
WO2024058265A1 (ja) * 2022-09-16 2024-03-21 株式会社Eneosマテリアル 共役ジエン系重合体、重合体組成物、架橋物、及びタイヤ

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000247914A (ja) 1999-02-23 2000-09-12 Asahi Glass Co Ltd 含フッ素ジエン化合物、その重合体、およびそれらの製造方法
WO2006114958A1 (ja) 2005-04-21 2006-11-02 Asahi Glass Company, Limited 光硬化性組成物、微細パターン形成体およびその製造方法
JP2015172742A (ja) 2014-02-18 2015-10-01 旭硝子株式会社 ネガ型感光性樹脂組成物、樹脂硬化膜、隔壁および光学素子
JP2018158966A (ja) 2017-03-22 2018-10-11 信越化学工業株式会社 ポリイミド前駆体の重合体、ポジ型感光性樹脂組成物、ネガ型感光性樹脂組成物、パターン形成方法、硬化被膜形成方法、層間絶縁膜、表面保護膜、及び電子部品

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0234617A (ja) * 1988-07-22 1990-02-05 Hitachi Ltd 含フツ素系熱硬化性樹脂組成物
JP2002040650A (ja) * 2000-07-25 2002-02-06 Fujifilm Arch Co Ltd ネガ型感光性樹脂組成物
JP2003221406A (ja) 2002-01-31 2003-08-05 Asahi Glass Co Ltd 水性分散液
TW200714131A (en) 2005-07-29 2007-04-01 Sanyo Electric Co Organic electroluminescent element and organic electroluminescent display device
EP1995635A4 (en) * 2006-03-16 2011-03-30 Asahi Glass Co Ltd NEGATIVE LIGHT-SENSITIVE FLUORATED AROMATIC RESIN COMPOSITION
US8900788B2 (en) * 2006-10-18 2014-12-02 Tokyo Ohka Kogyo Co., Ltd. Resist composition for immersion exposure and method of forming resist pattern
JP2008250155A (ja) 2007-03-30 2008-10-16 Fujifilm Corp 離隔壁付基板及びその製造方法、カラーフィルタ及びその製造方法、並びに表示装置
JP5111299B2 (ja) 2007-09-20 2013-01-09 富士フイルム株式会社 着色硬化性組成物、着色パターン、カラーフィルタの製造方法、カラーフィルタ、及び液晶表示装置
JP5431225B2 (ja) 2010-03-29 2014-03-05 新日鉄住金化学株式会社 アルカリ現像性感光性樹脂組成物、及びこれを用いて形成した表示素子向け隔壁、並びに表示素子
WO2012057058A1 (ja) 2010-10-29 2012-05-03 住友化学株式会社 感光性樹脂組成物、パターン構造物、表示装置および隔壁
CN103261968A (zh) 2010-12-20 2013-08-21 旭硝子株式会社 感光性树脂组合物、间隔壁、彩色滤光膜及有机el元件
WO2012111595A1 (ja) 2011-02-14 2012-08-23 住友化学株式会社 有機エレクトロルミネッセンス装置とその製造方法
KR20150067226A (ko) 2012-11-21 2015-06-17 후지필름 가부시키가이샤 감광성 수지 조성물, 경화막의 제조 방법, 경화막, 유기 el 표시 장치 및 액정 표시 장치
JP6171927B2 (ja) 2013-12-25 2017-08-02 Jsr株式会社 感放射線性樹脂組成物、硬化膜、発光素子および発光層の形成方法
KR20160138058A (ko) 2014-03-31 2016-12-02 스미또모 가가꾸 가부시키가이샤 격벽을 갖는 기판
JP6500458B2 (ja) 2015-01-29 2019-04-17 三菱ケミカル株式会社 感光性樹脂組成物、それで構成される硬化部材、及びそれを備えた画像表示装置
CN107430341B (zh) * 2015-02-05 2021-03-05 Agc株式会社 感光性树脂组合物、树脂膜的制造方法、有机半导体元件的制造方法
CN105238197A (zh) 2015-11-15 2016-01-13 孟红琳 一种高导热率的导热涂料
CN105609656B (zh) 2016-01-06 2017-05-17 京东方科技集团股份有限公司 一种有机电致发光器件及显示装置
CN109641992B (zh) 2016-08-29 2021-09-21 Agc株式会社 含氟聚合物、其制造方法、以及具备含氟聚合物的固化物的物品
CN109661855B (zh) 2016-09-05 2022-07-08 三菱化学株式会社 有机场致发光元件间隔壁形成用感光性树脂组合物、间隔壁、有机场致发光元件、图像显示装置及照明
KR20200096487A (ko) 2017-12-04 2020-08-12 도레이 카부시키가이샤 기판, 광 확산 방지용 수지 조성물 및 화상 표시 장치
JP2019102664A (ja) 2017-12-04 2019-06-24 株式会社ブイ・テクノロジー Led表示パネルの製造方法
JP7375546B2 (ja) 2017-12-11 2023-11-08 Agc株式会社 ネガ型感光性樹脂組成物
WO2019176785A1 (ja) 2018-03-14 2019-09-19 東レ株式会社 ネガ型感光性着色組成物、硬化膜、それを用いたタッチパネル
WO2019225702A1 (ja) 2018-05-23 2019-11-28 セントラル硝子株式会社 パターン膜付き基板の製造方法および含フッ素共重合体

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000247914A (ja) 1999-02-23 2000-09-12 Asahi Glass Co Ltd 含フッ素ジエン化合物、その重合体、およびそれらの製造方法
WO2006114958A1 (ja) 2005-04-21 2006-11-02 Asahi Glass Company, Limited 光硬化性組成物、微細パターン形成体およびその製造方法
JP2015172742A (ja) 2014-02-18 2015-10-01 旭硝子株式会社 ネガ型感光性樹脂組成物、樹脂硬化膜、隔壁および光学素子
JP2018158966A (ja) 2017-03-22 2018-10-11 信越化学工業株式会社 ポリイミド前駆体の重合体、ポジ型感光性樹脂組成物、ネガ型感光性樹脂組成物、パターン形成方法、硬化被膜形成方法、層間絶縁膜、表面保護膜、及び電子部品

Also Published As

Publication number Publication date
TWI838424B (zh) 2024-04-11
JP7755181B2 (ja) 2025-10-16
KR102929030B1 (ko) 2026-02-23
KR20210097737A (ko) 2021-08-09
US12460031B2 (en) 2025-11-04
JPWO2020110793A1 (ja) 2021-10-21
CN113166294A (zh) 2021-07-23
US11939459B2 (en) 2024-03-26
JP2024028789A (ja) 2024-03-05
US20240270952A1 (en) 2024-08-15
KR20260042521A (ko) 2026-03-31
CN113166294B (zh) 2024-01-12
TW202030553A (zh) 2020-08-16
WO2020110793A1 (ja) 2020-06-04
US20230027085A1 (en) 2023-01-26

Similar Documents

Publication Publication Date Title
JP7755181B2 (ja) 感光性樹脂組成物、含フッ素樹脂硬化物の製造方法
JP7360053B2 (ja) パターン膜付き基板の製造方法および含フッ素共重合体
JP5264404B2 (ja) レジスト組成物、レジストパターン形成方法、化合物、酸発生剤
KR20080107871A (ko) 감광성 화합물 및 이를 포함하는 포토레지스트 조성물
JP7853585B2 (ja) 発光素子の製造方法
TWI895532B (zh) 含氟樹脂、撥液劑、感光性樹脂組合物、硬化物及顯示器
TWI894435B (zh) 縮醛化合物、含有該化合物之添加劑及含有該化合物之阻劑用組成物
WO2022168829A1 (ja) 撥液剤、硬化性組成物、硬化物、隔壁、有機電界発光素子、含フッ素塗膜の製造方法及び含フッ素塗膜
KR20250162823A (ko) 경화성 수지 재료, 발액제 조성물, 감광성 수지 조성물 및 격벽 재료
KR20230147110A (ko) 표면 조정제, 감광성 수지 조성물, 경화물 및 디스플레이
WO2022176885A1 (ja) 感光性樹脂組成物、硬化物、含フッ素樹脂硬化膜及びディスプレイ
JP2024028150A (ja) 感光性樹脂組成物、樹脂膜、硬化物、隔壁、有機電界発光素子、ディスプレイ、硬化物の製造方法、含フッ素樹脂及びポリマーブレンド

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20210524

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20221115

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20221115

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20230620

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20230808

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20231107

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20231120

R150 Certificate of patent or registration of utility model

Ref document number: 7401785

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150