JP7401785B2 - 感光性樹脂組成物、含フッ素樹脂硬化物の製造方法、含フッ素樹脂、含フッ素樹脂膜、バンク及び表示素子 - Google Patents
感光性樹脂組成物、含フッ素樹脂硬化物の製造方法、含フッ素樹脂、含フッ素樹脂膜、バンク及び表示素子 Download PDFInfo
- Publication number
- JP7401785B2 JP7401785B2 JP2020558366A JP2020558366A JP7401785B2 JP 7401785 B2 JP7401785 B2 JP 7401785B2 JP 2020558366 A JP2020558366 A JP 2020558366A JP 2020558366 A JP2020558366 A JP 2020558366A JP 7401785 B2 JP7401785 B2 JP 7401785B2
- Authority
- JP
- Japan
- Prior art keywords
- group
- carbon atoms
- formula
- fluororesin
- repeating unit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F214/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen
- C08F214/18—Monomers containing fluorine
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/22—Esters containing halogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F14/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen
- C08F14/18—Monomers containing fluorine
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/04—Polymerisation in solution
- C08F2/06—Organic solvent
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/54—Polymerisation initiated by wave energy or particle radiation by X-rays or electrons
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F212/02—Monomers containing only one unsaturated aliphatic radical
- C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
- C08F212/14—Monomers containing only one unsaturated aliphatic radical containing one ring substituted by heteroatoms or groups containing heteroatoms
- C08F212/22—Oxygen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/22—Esters containing halogen
- C08F220/24—Esters containing halogen containing perhaloalkyl radicals
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F220/28—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
- C08F220/282—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety and containing two or more oxygen atoms
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F279/00—Macromolecular compounds obtained by polymerising monomers on to polymers of monomers having two or more carbon-to-carbon double bonds as defined in group C08F36/00
- C08F279/02—Macromolecular compounds obtained by polymerising monomers on to polymers of monomers having two or more carbon-to-carbon double bonds as defined in group C08F36/00 on to polymers of conjugated dienes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
- C08F290/12—Polymers provided for in subclasses C08C or C08F
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L27/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers
- C08L27/02—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment
- C08L27/12—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
-
- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
- G09F9/00—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
- G09F9/30—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/12—Light sources with substantially two-dimensional [2D] radiating surfaces
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/12—Light sources with substantially two-dimensional [2D] radiating surfaces
- H05B33/22—Light sources with substantially two-dimensional [2D] radiating surfaces characterised by the chemical or physical composition or the arrangement of auxiliary dielectric or reflective layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/122—Pixel-defining structures or layers, e.g. banks
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Emergency Medicine (AREA)
- Theoretical Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Materials For Photolithography (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Polymerisation Methods In General (AREA)
- Graft Or Block Polymers (AREA)
- Electroluminescent Light Sources (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2023201743A JP7755181B2 (ja) | 2018-11-26 | 2023-11-29 | 感光性樹脂組成物、含フッ素樹脂硬化物の製造方法 |
Applications Claiming Priority (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2018219938 | 2018-11-26 | ||
| JP2018219938 | 2018-11-26 | ||
| JP2018227767 | 2018-12-05 | ||
| JP2018227767 | 2018-12-05 | ||
| JP2019172138 | 2019-09-20 | ||
| JP2019172138 | 2019-09-20 | ||
| PCT/JP2019/045009 WO2020110793A1 (ja) | 2018-11-26 | 2019-11-18 | 感光性樹脂組成物、含フッ素樹脂硬化物の製造方法、含フッ素樹脂、含フッ素樹脂膜、バンク及び表示素子 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023201743A Division JP7755181B2 (ja) | 2018-11-26 | 2023-11-29 | 感光性樹脂組成物、含フッ素樹脂硬化物の製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO2020110793A1 JPWO2020110793A1 (ja) | 2021-10-21 |
| JPWO2020110793A5 JPWO2020110793A5 (https=) | 2022-11-24 |
| JP7401785B2 true JP7401785B2 (ja) | 2023-12-20 |
Family
ID=70852912
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2020558366A Active JP7401785B2 (ja) | 2018-11-26 | 2019-11-18 | 感光性樹脂組成物、含フッ素樹脂硬化物の製造方法、含フッ素樹脂、含フッ素樹脂膜、バンク及び表示素子 |
| JP2023201743A Active JP7755181B2 (ja) | 2018-11-26 | 2023-11-29 | 感光性樹脂組成物、含フッ素樹脂硬化物の製造方法 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023201743A Active JP7755181B2 (ja) | 2018-11-26 | 2023-11-29 | 感光性樹脂組成物、含フッ素樹脂硬化物の製造方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US11939459B2 (https=) |
| JP (2) | JP7401785B2 (https=) |
| KR (2) | KR20260042521A (https=) |
| CN (1) | CN113166294B (https=) |
| TW (1) | TWI838424B (https=) |
| WO (1) | WO2020110793A1 (https=) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPWO2022092155A1 (https=) | 2020-10-28 | 2022-05-05 | ||
| CN116829674A (zh) * | 2021-02-08 | 2023-09-29 | 中央硝子株式会社 | 拒液剂、固化性组合物、固化物、分隔壁、有机电致发光元件、含氟涂膜的制造方法及含氟涂膜 |
| JPWO2022190714A1 (https=) * | 2021-03-09 | 2022-09-15 | ||
| WO2024058265A1 (ja) * | 2022-09-16 | 2024-03-21 | 株式会社Eneosマテリアル | 共役ジエン系重合体、重合体組成物、架橋物、及びタイヤ |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000247914A (ja) | 1999-02-23 | 2000-09-12 | Asahi Glass Co Ltd | 含フッ素ジエン化合物、その重合体、およびそれらの製造方法 |
| WO2006114958A1 (ja) | 2005-04-21 | 2006-11-02 | Asahi Glass Company, Limited | 光硬化性組成物、微細パターン形成体およびその製造方法 |
| JP2015172742A (ja) | 2014-02-18 | 2015-10-01 | 旭硝子株式会社 | ネガ型感光性樹脂組成物、樹脂硬化膜、隔壁および光学素子 |
| JP2018158966A (ja) | 2017-03-22 | 2018-10-11 | 信越化学工業株式会社 | ポリイミド前駆体の重合体、ポジ型感光性樹脂組成物、ネガ型感光性樹脂組成物、パターン形成方法、硬化被膜形成方法、層間絶縁膜、表面保護膜、及び電子部品 |
Family Cites Families (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0234617A (ja) * | 1988-07-22 | 1990-02-05 | Hitachi Ltd | 含フツ素系熱硬化性樹脂組成物 |
| JP2002040650A (ja) * | 2000-07-25 | 2002-02-06 | Fujifilm Arch Co Ltd | ネガ型感光性樹脂組成物 |
| JP2003221406A (ja) | 2002-01-31 | 2003-08-05 | Asahi Glass Co Ltd | 水性分散液 |
| TW200714131A (en) | 2005-07-29 | 2007-04-01 | Sanyo Electric Co | Organic electroluminescent element and organic electroluminescent display device |
| EP1995635A4 (en) * | 2006-03-16 | 2011-03-30 | Asahi Glass Co Ltd | NEGATIVE LIGHT-SENSITIVE FLUORATED AROMATIC RESIN COMPOSITION |
| US8900788B2 (en) * | 2006-10-18 | 2014-12-02 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition for immersion exposure and method of forming resist pattern |
| JP2008250155A (ja) | 2007-03-30 | 2008-10-16 | Fujifilm Corp | 離隔壁付基板及びその製造方法、カラーフィルタ及びその製造方法、並びに表示装置 |
| JP5111299B2 (ja) | 2007-09-20 | 2013-01-09 | 富士フイルム株式会社 | 着色硬化性組成物、着色パターン、カラーフィルタの製造方法、カラーフィルタ、及び液晶表示装置 |
| JP5431225B2 (ja) | 2010-03-29 | 2014-03-05 | 新日鉄住金化学株式会社 | アルカリ現像性感光性樹脂組成物、及びこれを用いて形成した表示素子向け隔壁、並びに表示素子 |
| WO2012057058A1 (ja) | 2010-10-29 | 2012-05-03 | 住友化学株式会社 | 感光性樹脂組成物、パターン構造物、表示装置および隔壁 |
| CN103261968A (zh) | 2010-12-20 | 2013-08-21 | 旭硝子株式会社 | 感光性树脂组合物、间隔壁、彩色滤光膜及有机el元件 |
| WO2012111595A1 (ja) | 2011-02-14 | 2012-08-23 | 住友化学株式会社 | 有機エレクトロルミネッセンス装置とその製造方法 |
| KR20150067226A (ko) | 2012-11-21 | 2015-06-17 | 후지필름 가부시키가이샤 | 감광성 수지 조성물, 경화막의 제조 방법, 경화막, 유기 el 표시 장치 및 액정 표시 장치 |
| JP6171927B2 (ja) | 2013-12-25 | 2017-08-02 | Jsr株式会社 | 感放射線性樹脂組成物、硬化膜、発光素子および発光層の形成方法 |
| KR20160138058A (ko) | 2014-03-31 | 2016-12-02 | 스미또모 가가꾸 가부시키가이샤 | 격벽을 갖는 기판 |
| JP6500458B2 (ja) | 2015-01-29 | 2019-04-17 | 三菱ケミカル株式会社 | 感光性樹脂組成物、それで構成される硬化部材、及びそれを備えた画像表示装置 |
| CN107430341B (zh) * | 2015-02-05 | 2021-03-05 | Agc株式会社 | 感光性树脂组合物、树脂膜的制造方法、有机半导体元件的制造方法 |
| CN105238197A (zh) | 2015-11-15 | 2016-01-13 | 孟红琳 | 一种高导热率的导热涂料 |
| CN105609656B (zh) | 2016-01-06 | 2017-05-17 | 京东方科技集团股份有限公司 | 一种有机电致发光器件及显示装置 |
| CN109641992B (zh) | 2016-08-29 | 2021-09-21 | Agc株式会社 | 含氟聚合物、其制造方法、以及具备含氟聚合物的固化物的物品 |
| CN109661855B (zh) | 2016-09-05 | 2022-07-08 | 三菱化学株式会社 | 有机场致发光元件间隔壁形成用感光性树脂组合物、间隔壁、有机场致发光元件、图像显示装置及照明 |
| KR20200096487A (ko) | 2017-12-04 | 2020-08-12 | 도레이 카부시키가이샤 | 기판, 광 확산 방지용 수지 조성물 및 화상 표시 장치 |
| JP2019102664A (ja) | 2017-12-04 | 2019-06-24 | 株式会社ブイ・テクノロジー | Led表示パネルの製造方法 |
| JP7375546B2 (ja) | 2017-12-11 | 2023-11-08 | Agc株式会社 | ネガ型感光性樹脂組成物 |
| WO2019176785A1 (ja) | 2018-03-14 | 2019-09-19 | 東レ株式会社 | ネガ型感光性着色組成物、硬化膜、それを用いたタッチパネル |
| WO2019225702A1 (ja) | 2018-05-23 | 2019-11-28 | セントラル硝子株式会社 | パターン膜付き基板の製造方法および含フッ素共重合体 |
-
2019
- 2019-11-18 KR KR1020267004698A patent/KR20260042521A/ko active Pending
- 2019-11-18 WO PCT/JP2019/045009 patent/WO2020110793A1/ja not_active Ceased
- 2019-11-18 CN CN201980078051.7A patent/CN113166294B/zh active Active
- 2019-11-18 KR KR1020217019916A patent/KR102929030B1/ko active Active
- 2019-11-18 US US17/296,459 patent/US11939459B2/en active Active
- 2019-11-18 JP JP2020558366A patent/JP7401785B2/ja active Active
- 2019-11-21 TW TW108142283A patent/TWI838424B/zh active
-
2023
- 2023-11-29 JP JP2023201743A patent/JP7755181B2/ja active Active
-
2024
- 2024-01-30 US US18/427,145 patent/US12460031B2/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000247914A (ja) | 1999-02-23 | 2000-09-12 | Asahi Glass Co Ltd | 含フッ素ジエン化合物、その重合体、およびそれらの製造方法 |
| WO2006114958A1 (ja) | 2005-04-21 | 2006-11-02 | Asahi Glass Company, Limited | 光硬化性組成物、微細パターン形成体およびその製造方法 |
| JP2015172742A (ja) | 2014-02-18 | 2015-10-01 | 旭硝子株式会社 | ネガ型感光性樹脂組成物、樹脂硬化膜、隔壁および光学素子 |
| JP2018158966A (ja) | 2017-03-22 | 2018-10-11 | 信越化学工業株式会社 | ポリイミド前駆体の重合体、ポジ型感光性樹脂組成物、ネガ型感光性樹脂組成物、パターン形成方法、硬化被膜形成方法、層間絶縁膜、表面保護膜、及び電子部品 |
Also Published As
| Publication number | Publication date |
|---|---|
| TWI838424B (zh) | 2024-04-11 |
| JP7755181B2 (ja) | 2025-10-16 |
| KR102929030B1 (ko) | 2026-02-23 |
| KR20210097737A (ko) | 2021-08-09 |
| US12460031B2 (en) | 2025-11-04 |
| JPWO2020110793A1 (ja) | 2021-10-21 |
| CN113166294A (zh) | 2021-07-23 |
| US11939459B2 (en) | 2024-03-26 |
| JP2024028789A (ja) | 2024-03-05 |
| US20240270952A1 (en) | 2024-08-15 |
| KR20260042521A (ko) | 2026-03-31 |
| CN113166294B (zh) | 2024-01-12 |
| TW202030553A (zh) | 2020-08-16 |
| WO2020110793A1 (ja) | 2020-06-04 |
| US20230027085A1 (en) | 2023-01-26 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP7755181B2 (ja) | 感光性樹脂組成物、含フッ素樹脂硬化物の製造方法 | |
| JP7360053B2 (ja) | パターン膜付き基板の製造方法および含フッ素共重合体 | |
| JP5264404B2 (ja) | レジスト組成物、レジストパターン形成方法、化合物、酸発生剤 | |
| KR20080107871A (ko) | 감광성 화합물 및 이를 포함하는 포토레지스트 조성물 | |
| JP7853585B2 (ja) | 発光素子の製造方法 | |
| TWI895532B (zh) | 含氟樹脂、撥液劑、感光性樹脂組合物、硬化物及顯示器 | |
| TWI894435B (zh) | 縮醛化合物、含有該化合物之添加劑及含有該化合物之阻劑用組成物 | |
| WO2022168829A1 (ja) | 撥液剤、硬化性組成物、硬化物、隔壁、有機電界発光素子、含フッ素塗膜の製造方法及び含フッ素塗膜 | |
| KR20250162823A (ko) | 경화성 수지 재료, 발액제 조성물, 감광성 수지 조성물 및 격벽 재료 | |
| KR20230147110A (ko) | 표면 조정제, 감광성 수지 조성물, 경화물 및 디스플레이 | |
| WO2022176885A1 (ja) | 感光性樹脂組成物、硬化物、含フッ素樹脂硬化膜及びディスプレイ | |
| JP2024028150A (ja) | 感光性樹脂組成物、樹脂膜、硬化物、隔壁、有機電界発光素子、ディスプレイ、硬化物の製造方法、含フッ素樹脂及びポリマーブレンド |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20210524 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20221115 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20221115 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20230620 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20230808 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20231107 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20231120 |
|
| R150 | Certificate of patent or registration of utility model |
Ref document number: 7401785 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |