JPWO2022092155A1 - - Google Patents
Info
- Publication number
- JPWO2022092155A1 JPWO2022092155A1 JP2022559202A JP2022559202A JPWO2022092155A1 JP WO2022092155 A1 JPWO2022092155 A1 JP WO2022092155A1 JP 2022559202 A JP2022559202 A JP 2022559202A JP 2022559202 A JP2022559202 A JP 2022559202A JP WO2022092155 A1 JPWO2022092155 A1 JP WO2022092155A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/22—Esters containing halogen
- C08F220/24—Esters containing halogen containing perhaloalkyl radicals
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/04—Acids; Metal salts or ammonium salts thereof
- C08F220/06—Acrylic acid; Methacrylic acid; Metal salts or ammonium salts thereof
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
- C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/20—Esters of polyhydric alcohols or phenols, e.g. 2-hydroxyethyl (meth)acrylate or glycerol mono-(meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/42—Nitriles
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/42—Nitriles
- C08F220/44—Acrylonitrile
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
- C08F290/12—Polymers provided for in subclasses C08C or C08F
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Materials For Photolithography (AREA)
- Electroluminescent Light Sources (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2020180680 | 2020-10-28 | ||
| PCT/JP2021/039671 WO2022092155A1 (ja) | 2020-10-28 | 2021-10-27 | 含フッ素樹脂、撥液剤、感光性樹脂組成物、硬化物およびディスプレイ |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPWO2022092155A1 true JPWO2022092155A1 (https=) | 2022-05-05 |
Family
ID=81382636
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022559202A Pending JPWO2022092155A1 (https=) | 2020-10-28 | 2021-10-27 |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JPWO2022092155A1 (https=) |
| KR (1) | KR20230096006A (https=) |
| CN (1) | CN116438218A (https=) |
| TW (1) | TWI895532B (https=) |
| WO (1) | WO2022092155A1 (https=) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS53100224A (en) * | 1977-02-15 | 1978-09-01 | Cho Lsi Gijutsu Kenkyu Kumiai | Radiation sensitive positive regist material |
| JPS5787404A (en) * | 1980-11-21 | 1982-05-31 | Nippon Telegr & Teleph Corp <Ntt> | Fluoroalkyl alpha-cyanoacrylate monomer and its polymer |
| JPS58113933A (ja) * | 1981-12-26 | 1983-07-07 | Daikin Ind Ltd | レジスト材料およびそれを用いる微細レジストパタ−ンの形成方法 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA997000A (en) | 1969-12-29 | 1976-09-14 | Allen L. Limberg | Multiplex decoding system |
| JPH02187411A (ja) * | 1989-01-17 | 1990-07-23 | Nippon Shokubai Kagaku Kogyo Co Ltd | フッ素含有重合体の製造方法 |
| JPH10183050A (ja) * | 1996-12-25 | 1998-07-07 | Kansai Paint Co Ltd | 塗料組成物および塗膜形成法 |
| EP1560068B1 (en) | 2002-11-06 | 2008-01-23 | Asahi Glass Company Ltd. | Barrier rib and its method of preparation |
| JP4474991B2 (ja) | 2004-04-27 | 2010-06-09 | 旭硝子株式会社 | レジスト組成物及びその塗膜 |
| JP2007217656A (ja) * | 2006-01-23 | 2007-08-30 | Fujifilm Corp | 組成物、位相差板、液晶表示装置および、位相差板の製造方法 |
| JP6166711B2 (ja) * | 2013-12-25 | 2017-07-19 | 富士フイルム株式会社 | 着色組成物、およびこれを用いた硬化膜、カラーフィルタ、パターン形成方法、カラーフィルタの製造方法、固体撮像素子および画像表示装置 |
| KR102411740B1 (ko) | 2014-07-18 | 2022-06-21 | 에이지씨 가부시키가이샤 | 네거티브형 감광성 수지 조성물, 수지 경화막, 격벽 및 광학 소자 |
| JP6404799B2 (ja) * | 2015-06-04 | 2018-10-17 | 信越化学工業株式会社 | レジスト下層膜材料及びパターン形成方法 |
| KR102071376B1 (ko) * | 2015-08-31 | 2020-01-30 | 후지필름 가부시키가이샤 | 경화성 조성물, 경화막의 제조 방법, 컬러 필터, 차광막, 고체 촬상 소자 및 화상 표시 장치 |
| KR102830613B1 (ko) * | 2018-07-30 | 2025-07-08 | 다이킨 고교 가부시키가이샤 | 불소 함유 폴리머를 함유하는 조성물 및 성형품 |
| KR20260042521A (ko) | 2018-11-26 | 2026-03-31 | 샌트랄 글래스 컴퍼니 리미티드 | 감광성 수지 조성물, 함불소 수지 경화물의 제조 방법, 함불소 수지, 함불소 수지막, 뱅크 및 표시 소자 |
| CN111690159A (zh) * | 2020-06-10 | 2020-09-22 | 北京大学 | 基于乙烯基醚液晶/高分子全聚合量子点薄膜的制备方法 |
-
2021
- 2021-10-27 KR KR1020237017117A patent/KR20230096006A/ko active Pending
- 2021-10-27 JP JP2022559202A patent/JPWO2022092155A1/ja active Pending
- 2021-10-27 CN CN202180074320.XA patent/CN116438218A/zh active Pending
- 2021-10-27 WO PCT/JP2021/039671 patent/WO2022092155A1/ja not_active Ceased
- 2021-10-28 TW TW110140043A patent/TWI895532B/zh active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS53100224A (en) * | 1977-02-15 | 1978-09-01 | Cho Lsi Gijutsu Kenkyu Kumiai | Radiation sensitive positive regist material |
| JPS5787404A (en) * | 1980-11-21 | 1982-05-31 | Nippon Telegr & Teleph Corp <Ntt> | Fluoroalkyl alpha-cyanoacrylate monomer and its polymer |
| JPS58113933A (ja) * | 1981-12-26 | 1983-07-07 | Daikin Ind Ltd | レジスト材料およびそれを用いる微細レジストパタ−ンの形成方法 |
Non-Patent Citations (1)
| Title |
|---|
| ANA ROBERT ESTELRICH 等: "Radical polymerization of 1H, 1H, 2H, 2H,-perfluoro-3,5-alkyldiynol and 1H, 1H-perfluoro-2, 4-alkyld", MACROMOLECULAR CHEMISTRY AND PHYSICS(2004), vol. 205(2), JPN6025025768, 2004, pages 223 - 229, ISSN: 0005743211 * |
Also Published As
| Publication number | Publication date |
|---|---|
| TW202229381A (zh) | 2022-08-01 |
| CN116438218A (zh) | 2023-07-14 |
| KR20230096006A (ko) | 2023-06-29 |
| WO2022092155A1 (ja) | 2022-05-05 |
| TWI895532B (zh) | 2025-09-01 |
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