JPWO2022092155A1 - - Google Patents
Info
- Publication number
- JPWO2022092155A1 JPWO2022092155A1 JP2022559202A JP2022559202A JPWO2022092155A1 JP WO2022092155 A1 JPWO2022092155 A1 JP WO2022092155A1 JP 2022559202 A JP2022559202 A JP 2022559202A JP 2022559202 A JP2022559202 A JP 2022559202A JP WO2022092155 A1 JPWO2022092155 A1 JP WO2022092155A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/22—Esters containing halogen
- C08F220/24—Esters containing halogen containing perhaloalkyl radicals
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/04—Acids; Metal salts or ammonium salts thereof
- C08F220/06—Acrylic acid; Methacrylic acid; Metal salts or ammonium salts thereof
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
- C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/20—Esters of polyhydric alcohols or phenols, e.g. 2-hydroxyethyl (meth)acrylate or glycerol mono-(meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/42—Nitriles
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/42—Nitriles
- C08F220/44—Acrylonitrile
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
- C08F290/12—Polymers provided for in subclasses C08C or C08F
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Materials For Photolithography (AREA)
- Electroluminescent Light Sources (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2020180680 | 2020-10-28 | ||
PCT/JP2021/039671 WO2022092155A1 (ja) | 2020-10-28 | 2021-10-27 | 含フッ素樹脂、撥液剤、感光性樹脂組成物、硬化物およびディスプレイ |
Publications (1)
Publication Number | Publication Date |
---|---|
JPWO2022092155A1 true JPWO2022092155A1 (ja) | 2022-05-05 |
Family
ID=81382636
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2022559202A Pending JPWO2022092155A1 (ja) | 2020-10-28 | 2021-10-27 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JPWO2022092155A1 (ja) |
KR (1) | KR20230096006A (ja) |
CN (1) | CN116438218A (ja) |
TW (1) | TW202229381A (ja) |
WO (1) | WO2022092155A1 (ja) |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA997000A (en) | 1969-12-29 | 1976-09-14 | Allen L. Limberg | Multiplex decoding system |
JPH02187411A (ja) * | 1989-01-17 | 1990-07-23 | Nippon Shokubai Kagaku Kogyo Co Ltd | フッ素含有重合体の製造方法 |
JPH10183050A (ja) * | 1996-12-25 | 1998-07-07 | Kansai Paint Co Ltd | 塗料組成物および塗膜形成法 |
WO2004042474A1 (ja) | 2002-11-06 | 2004-05-21 | Asahi Glass Company, Limited | ネガ型感光性樹脂組成物 |
JP4474991B2 (ja) | 2004-04-27 | 2010-06-09 | 旭硝子株式会社 | レジスト組成物及びその塗膜 |
JP2007217656A (ja) * | 2006-01-23 | 2007-08-30 | Fujifilm Corp | 組成物、位相差板、液晶表示装置および、位相差板の製造方法 |
JP6166711B2 (ja) * | 2013-12-25 | 2017-07-19 | 富士フイルム株式会社 | 着色組成物、およびこれを用いた硬化膜、カラーフィルタ、パターン形成方法、カラーフィルタの製造方法、固体撮像素子および画像表示装置 |
KR102411740B1 (ko) | 2014-07-18 | 2022-06-21 | 에이지씨 가부시키가이샤 | 네거티브형 감광성 수지 조성물, 수지 경화막, 격벽 및 광학 소자 |
US11939459B2 (en) | 2018-11-26 | 2024-03-26 | Central Glass Company, Limited | Photosensitive resin composition, method for producing cured product of fluororesin, fluororesin, fluororesin film, bank and display element |
CN111690159A (zh) * | 2020-06-10 | 2020-09-22 | 北京大学 | 基于乙烯基醚液晶/高分子全聚合量子点薄膜的制备方法 |
-
2021
- 2021-10-27 WO PCT/JP2021/039671 patent/WO2022092155A1/ja active Application Filing
- 2021-10-27 KR KR1020237017117A patent/KR20230096006A/ko unknown
- 2021-10-27 CN CN202180074320.XA patent/CN116438218A/zh active Pending
- 2021-10-27 JP JP2022559202A patent/JPWO2022092155A1/ja active Pending
- 2021-10-28 TW TW110140043A patent/TW202229381A/zh unknown
Also Published As
Publication number | Publication date |
---|---|
CN116438218A (zh) | 2023-07-14 |
WO2022092155A1 (ja) | 2022-05-05 |
KR20230096006A (ko) | 2023-06-29 |
TW202229381A (zh) | 2022-08-01 |