TWI895532B - 含氟樹脂、撥液劑、感光性樹脂組合物、硬化物及顯示器 - Google Patents

含氟樹脂、撥液劑、感光性樹脂組合物、硬化物及顯示器

Info

Publication number
TWI895532B
TWI895532B TW110140043A TW110140043A TWI895532B TW I895532 B TWI895532 B TW I895532B TW 110140043 A TW110140043 A TW 110140043A TW 110140043 A TW110140043 A TW 110140043A TW I895532 B TWI895532 B TW I895532B
Authority
TW
Taiwan
Prior art keywords
carbon atoms
group
fluorine
formula
fluororesin
Prior art date
Application number
TW110140043A
Other languages
English (en)
Chinese (zh)
Other versions
TW202229381A (zh
Inventor
服部啓太
坂井田悠太
古屋勇希
兼子譲
Original Assignee
日商中央硝子股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商中央硝子股份有限公司 filed Critical 日商中央硝子股份有限公司
Publication of TW202229381A publication Critical patent/TW202229381A/zh
Application granted granted Critical
Publication of TWI895532B publication Critical patent/TWI895532B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/22—Esters containing halogen
    • C08F220/24—Esters containing halogen containing perhaloalkyl radicals
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/04—Acids; Metal salts or ammonium salts thereof
    • C08F220/06—Acrylic acid; Methacrylic acid; Metal salts or ammonium salts thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/20—Esters of polyhydric alcohols or phenols, e.g. 2-hydroxyethyl (meth)acrylate or glycerol mono-(meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/42—Nitriles
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/42—Nitriles
    • C08F220/44—Acrylonitrile
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
    • C08F290/12—Polymers provided for in subclasses C08C or C08F
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
  • Electroluminescent Light Sources (AREA)
TW110140043A 2020-10-28 2021-10-28 含氟樹脂、撥液劑、感光性樹脂組合物、硬化物及顯示器 TWI895532B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020180680 2020-10-28
JP2020-180680 2020-10-28

Publications (2)

Publication Number Publication Date
TW202229381A TW202229381A (zh) 2022-08-01
TWI895532B true TWI895532B (zh) 2025-09-01

Family

ID=81382636

Family Applications (1)

Application Number Title Priority Date Filing Date
TW110140043A TWI895532B (zh) 2020-10-28 2021-10-28 含氟樹脂、撥液劑、感光性樹脂組合物、硬化物及顯示器

Country Status (5)

Country Link
JP (1) JPWO2022092155A1 (https=)
KR (1) KR20230096006A (https=)
CN (1) CN116438218A (https=)
TW (1) TWI895532B (https=)
WO (1) WO2022092155A1 (https=)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW202016194A (zh) * 2018-07-30 2020-05-01 日商大金工業股份有限公司 含有含氟聚合物之組成物及成形品
TWI700323B (zh) * 2015-08-31 2020-08-01 日商富士軟片股份有限公司 硬化性組成物、硬化膜的製造方法、彩色濾光片、遮光膜、固體攝像元件及圖像顯示裝置
CN111690159A (zh) * 2020-06-10 2020-09-22 北京大学 基于乙烯基醚液晶/高分子全聚合量子点薄膜的制备方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA997000A (en) 1969-12-29 1976-09-14 Allen L. Limberg Multiplex decoding system
JPS53100224A (en) * 1977-02-15 1978-09-01 Cho Lsi Gijutsu Kenkyu Kumiai Radiation sensitive positive regist material
JPS5787404A (en) * 1980-11-21 1982-05-31 Nippon Telegr & Teleph Corp <Ntt> Fluoroalkyl alpha-cyanoacrylate monomer and its polymer
JPS58113933A (ja) * 1981-12-26 1983-07-07 Daikin Ind Ltd レジスト材料およびそれを用いる微細レジストパタ−ンの形成方法
JPH02187411A (ja) * 1989-01-17 1990-07-23 Nippon Shokubai Kagaku Kogyo Co Ltd フッ素含有重合体の製造方法
JPH10183050A (ja) * 1996-12-25 1998-07-07 Kansai Paint Co Ltd 塗料組成物および塗膜形成法
EP1560068B1 (en) 2002-11-06 2008-01-23 Asahi Glass Company Ltd. Barrier rib and its method of preparation
JP4474991B2 (ja) 2004-04-27 2010-06-09 旭硝子株式会社 レジスト組成物及びその塗膜
JP2007217656A (ja) * 2006-01-23 2007-08-30 Fujifilm Corp 組成物、位相差板、液晶表示装置および、位相差板の製造方法
JP6166711B2 (ja) * 2013-12-25 2017-07-19 富士フイルム株式会社 着色組成物、およびこれを用いた硬化膜、カラーフィルタ、パターン形成方法、カラーフィルタの製造方法、固体撮像素子および画像表示装置
KR102411740B1 (ko) 2014-07-18 2022-06-21 에이지씨 가부시키가이샤 네거티브형 감광성 수지 조성물, 수지 경화막, 격벽 및 광학 소자
JP6404799B2 (ja) * 2015-06-04 2018-10-17 信越化学工業株式会社 レジスト下層膜材料及びパターン形成方法
KR20260042521A (ko) 2018-11-26 2026-03-31 샌트랄 글래스 컴퍼니 리미티드 감광성 수지 조성물, 함불소 수지 경화물의 제조 방법, 함불소 수지, 함불소 수지막, 뱅크 및 표시 소자

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI700323B (zh) * 2015-08-31 2020-08-01 日商富士軟片股份有限公司 硬化性組成物、硬化膜的製造方法、彩色濾光片、遮光膜、固體攝像元件及圖像顯示裝置
TW202016194A (zh) * 2018-07-30 2020-05-01 日商大金工業股份有限公司 含有含氟聚合物之組成物及成形品
CN111690159A (zh) * 2020-06-10 2020-09-22 北京大学 基于乙烯基醚液晶/高分子全聚合量子点薄膜的制备方法

Also Published As

Publication number Publication date
TW202229381A (zh) 2022-08-01
JPWO2022092155A1 (https=) 2022-05-05
CN116438218A (zh) 2023-07-14
KR20230096006A (ko) 2023-06-29
WO2022092155A1 (ja) 2022-05-05

Similar Documents

Publication Publication Date Title
JP7755181B2 (ja) 感光性樹脂組成物、含フッ素樹脂硬化物の製造方法
JP2024037750A (ja) パターン膜付き基板の製造方法
TWI895532B (zh) 含氟樹脂、撥液劑、感光性樹脂組合物、硬化物及顯示器
TWI877368B (zh) 發光元件之製造方法
TWI911388B (zh) 感光性樹脂組合物、硬化物、含氟樹脂硬化膜及顯示器
US20240132730A1 (en) Liquid-repelling agent, curable composition, cured product, dividing wall, organic electroluminescent element, method for producing fluorine-containing coating film, and fluorine-containing coating film
WO2025115687A1 (ja) 重合体、該重合体を含む撥液材、該重合体を含む感光性組成物、該感光性組成物を硬化させてなる硬化物、該感光性組成物を用いたパターン膜付き基板及び該パターン膜付き基板の製造方法、並びに該パターン膜付き基板を有する画像表示装置