CN116438218A - 含氟树脂、拒液剂、感光性树脂组合物、固化物及显示器 - Google Patents

含氟树脂、拒液剂、感光性树脂组合物、固化物及显示器 Download PDF

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Publication number
CN116438218A
CN116438218A CN202180074320.XA CN202180074320A CN116438218A CN 116438218 A CN116438218 A CN 116438218A CN 202180074320 A CN202180074320 A CN 202180074320A CN 116438218 A CN116438218 A CN 116438218A
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CN
China
Prior art keywords
fluorine
containing resin
group
carbon atoms
formula
Prior art date
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Pending
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CN202180074320.XA
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English (en)
Chinese (zh)
Inventor
服部启太
坂井田悠太
古屋勇希
兼子让
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Central Glass Co Ltd
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Central Glass Co Ltd
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Publication of CN116438218A publication Critical patent/CN116438218A/zh
Pending legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/22—Esters containing halogen
    • C08F220/24—Esters containing halogen containing perhaloalkyl radicals
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/04—Acids; Metal salts or ammonium salts thereof
    • C08F220/06—Acrylic acid; Methacrylic acid; Metal salts or ammonium salts thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/20—Esters of polyhydric alcohols or phenols, e.g. 2-hydroxyethyl (meth)acrylate or glycerol mono-(meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/42—Nitriles
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/42—Nitriles
    • C08F220/44—Acrylonitrile
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
    • C08F290/12—Polymers provided for in subclasses C08C or C08F
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
  • Electroluminescent Light Sources (AREA)
CN202180074320.XA 2020-10-28 2021-10-27 含氟树脂、拒液剂、感光性树脂组合物、固化物及显示器 Pending CN116438218A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020180680 2020-10-28
JP2020-180680 2020-10-28
PCT/JP2021/039671 WO2022092155A1 (ja) 2020-10-28 2021-10-27 含フッ素樹脂、撥液剤、感光性樹脂組成物、硬化物およびディスプレイ

Publications (1)

Publication Number Publication Date
CN116438218A true CN116438218A (zh) 2023-07-14

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN202180074320.XA Pending CN116438218A (zh) 2020-10-28 2021-10-27 含氟树脂、拒液剂、感光性树脂组合物、固化物及显示器

Country Status (5)

Country Link
JP (1) JPWO2022092155A1 (https=)
KR (1) KR20230096006A (https=)
CN (1) CN116438218A (https=)
TW (1) TWI895532B (https=)
WO (1) WO2022092155A1 (https=)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015143330A (ja) * 2013-12-25 2015-08-06 富士フイルム株式会社 着色組成物、およびこれを用いた硬化膜、カラーフィルタ、パターン形成方法、カラーフィルタの製造方法、固体撮像素子および画像表示装置
JP2017003959A (ja) * 2015-06-04 2017-01-05 信越化学工業株式会社 レジスト下層膜材料及びパターン形成方法

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CA997000A (en) 1969-12-29 1976-09-14 Allen L. Limberg Multiplex decoding system
JPS53100224A (en) * 1977-02-15 1978-09-01 Cho Lsi Gijutsu Kenkyu Kumiai Radiation sensitive positive regist material
JPS5787404A (en) * 1980-11-21 1982-05-31 Nippon Telegr & Teleph Corp <Ntt> Fluoroalkyl alpha-cyanoacrylate monomer and its polymer
JPS58113933A (ja) * 1981-12-26 1983-07-07 Daikin Ind Ltd レジスト材料およびそれを用いる微細レジストパタ−ンの形成方法
JPH02187411A (ja) * 1989-01-17 1990-07-23 Nippon Shokubai Kagaku Kogyo Co Ltd フッ素含有重合体の製造方法
JPH10183050A (ja) * 1996-12-25 1998-07-07 Kansai Paint Co Ltd 塗料組成物および塗膜形成法
EP1560068B1 (en) 2002-11-06 2008-01-23 Asahi Glass Company Ltd. Barrier rib and its method of preparation
JP4474991B2 (ja) 2004-04-27 2010-06-09 旭硝子株式会社 レジスト組成物及びその塗膜
JP2007217656A (ja) * 2006-01-23 2007-08-30 Fujifilm Corp 組成物、位相差板、液晶表示装置および、位相差板の製造方法
KR102411740B1 (ko) 2014-07-18 2022-06-21 에이지씨 가부시키가이샤 네거티브형 감광성 수지 조성물, 수지 경화막, 격벽 및 광학 소자
KR102071376B1 (ko) * 2015-08-31 2020-01-30 후지필름 가부시키가이샤 경화성 조성물, 경화막의 제조 방법, 컬러 필터, 차광막, 고체 촬상 소자 및 화상 표시 장치
KR102830613B1 (ko) * 2018-07-30 2025-07-08 다이킨 고교 가부시키가이샤 불소 함유 폴리머를 함유하는 조성물 및 성형품
KR20260042521A (ko) 2018-11-26 2026-03-31 샌트랄 글래스 컴퍼니 리미티드 감광성 수지 조성물, 함불소 수지 경화물의 제조 방법, 함불소 수지, 함불소 수지막, 뱅크 및 표시 소자
CN111690159A (zh) * 2020-06-10 2020-09-22 北京大学 基于乙烯基醚液晶/高分子全聚合量子点薄膜的制备方法

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015143330A (ja) * 2013-12-25 2015-08-06 富士フイルム株式会社 着色組成物、およびこれを用いた硬化膜、カラーフィルタ、パターン形成方法、カラーフィルタの製造方法、固体撮像素子および画像表示装置
JP2017003959A (ja) * 2015-06-04 2017-01-05 信越化学工業株式会社 レジスト下層膜材料及びパターン形成方法

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ANA ROBERT ESTELRICH等: ""Radical Polymerisation of 1H, 1H, 2H, 2H-perfluoro-3, 5-alkyldiynol and 1H, 1H-perfluoro-2, 4-alkyldiynol Acrylates and Methacrylates: A New Family of Fluorinated Polymers"", 《MACROMOLECULAR CHEMISTRY AND PHYSICS》, vol. 205, no. 2, 12 January 2004 (2004-01-12), pages 223 - 229 *

Also Published As

Publication number Publication date
TW202229381A (zh) 2022-08-01
JPWO2022092155A1 (https=) 2022-05-05
KR20230096006A (ko) 2023-06-29
WO2022092155A1 (ja) 2022-05-05
TWI895532B (zh) 2025-09-01

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