JP7394781B2 - ターゲット及びターゲットの製造方法 - Google Patents
ターゲット及びターゲットの製造方法 Download PDFInfo
- Publication number
- JP7394781B2 JP7394781B2 JP2020555886A JP2020555886A JP7394781B2 JP 7394781 B2 JP7394781 B2 JP 7394781B2 JP 2020555886 A JP2020555886 A JP 2020555886A JP 2020555886 A JP2020555886 A JP 2020555886A JP 7394781 B2 JP7394781 B2 JP 7394781B2
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- JP
- Japan
- Prior art keywords
- diboride
- tungsten
- tab
- tantalum
- pentaboride
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000004519 manufacturing process Methods 0.000 title claims description 14
- OFEAOSSMQHGXMM-UHFFFAOYSA-N 12007-10-2 Chemical compound [W].[W]=[B] OFEAOSSMQHGXMM-UHFFFAOYSA-N 0.000 claims description 44
- JEUVAEBWTRCMTB-UHFFFAOYSA-N boron;tantalum Chemical compound B#[Ta]#B JEUVAEBWTRCMTB-UHFFFAOYSA-N 0.000 claims description 42
- 239000000203 mixture Substances 0.000 claims description 23
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 19
- 229910052799 carbon Inorganic materials 0.000 claims description 18
- 239000000843 powder Substances 0.000 claims description 18
- 239000012071 phase Substances 0.000 claims description 16
- 238000000034 method Methods 0.000 claims description 14
- 238000005240 physical vapour deposition Methods 0.000 claims description 13
- 150000001875 compounds Chemical class 0.000 claims description 10
- 238000007731 hot pressing Methods 0.000 claims description 10
- 238000002490 spark plasma sintering Methods 0.000 claims description 9
- 239000002245 particle Substances 0.000 claims description 7
- 239000000126 substance Substances 0.000 claims description 7
- 238000005259 measurement Methods 0.000 claims description 6
- 229910052751 metal Inorganic materials 0.000 claims description 6
- 239000002184 metal Substances 0.000 claims description 6
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 5
- 229910052721 tungsten Inorganic materials 0.000 claims description 5
- 239000010937 tungsten Substances 0.000 claims description 5
- 238000000151 deposition Methods 0.000 claims description 4
- 239000012535 impurity Substances 0.000 claims description 4
- 239000000758 substrate Substances 0.000 claims description 4
- 229910052715 tantalum Inorganic materials 0.000 claims description 4
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 4
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 3
- 229910052796 boron Inorganic materials 0.000 claims description 3
- 229910002804 graphite Inorganic materials 0.000 claims description 3
- 239000010439 graphite Substances 0.000 claims description 3
- 229910052729 chemical element Inorganic materials 0.000 claims description 2
- 230000001681 protective effect Effects 0.000 claims description 2
- 238000001947 vapour-phase growth Methods 0.000 claims description 2
- XSPFOMKWOOBHNA-UHFFFAOYSA-N bis(boranylidyne)tungsten Chemical compound B#[W]#B XSPFOMKWOOBHNA-UHFFFAOYSA-N 0.000 claims 24
- 230000000704 physical effect Effects 0.000 claims 1
- 238000002601 radiography Methods 0.000 claims 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 238000005245 sintering Methods 0.000 description 4
- 238000000576 coating method Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- XTDAIYZKROTZLD-UHFFFAOYSA-N boranylidynetantalum Chemical compound [Ta]#B XTDAIYZKROTZLD-UHFFFAOYSA-N 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 238000004663 powder metallurgy Methods 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910004533 TaB2 Inorganic materials 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000000889 atomisation Methods 0.000 description 1
- 238000000541 cathodic arc deposition Methods 0.000 description 1
- 238000005056 compaction Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000005242 forging Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000001513 hot isostatic pressing Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000006115 industrial coating Substances 0.000 description 1
- 238000005272 metallurgy Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- YOUIDGQAIILFBW-UHFFFAOYSA-J tetrachlorotungsten Chemical compound Cl[W](Cl)(Cl)Cl YOUIDGQAIILFBW-UHFFFAOYSA-J 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/067—Borides
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- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/515—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics
- C04B35/58—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides
- C04B35/5805—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides based on borides
- C04B35/58064—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides based on borides based on refractory borides
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- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
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- C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/64—Burning or sintering processes
- C04B35/645—Pressure sintering
- C04B35/6455—Hot isostatic pressing
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
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- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
- C04B2235/3231—Refractory metal oxides, their mixed metal oxides, or oxide-forming salts thereof
- C04B2235/3251—Niobium oxides, niobates, tantalum oxides, tantalates, or oxide-forming salts thereof
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- C04B2235/3231—Refractory metal oxides, their mixed metal oxides, or oxide-forming salts thereof
- C04B2235/3258—Tungsten oxides, tungstates, or oxide-forming salts thereof
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- C04B2235/42—Non metallic elements added as constituents or additives, e.g. sulfur, phosphor, selenium or tellurium
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- C04B2235/42—Non metallic elements added as constituents or additives, e.g. sulfur, phosphor, selenium or tellurium
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- C04B2235/425—Graphite
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- C04B2235/65—Aspects relating to heat treatments of ceramic bodies such as green ceramics or pre-sintered ceramics, e.g. burning, sintering or melting processes
- C04B2235/66—Specific sintering techniques, e.g. centrifugal sintering
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- C04B2235/78—Grain sizes and shapes, product microstructures, e.g. acicular grains, equiaxed grains, platelet-structures
- C04B2235/786—Micrometer sized grains, i.e. from 1 to 100 micron
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- C04B2235/74—Physical characteristics
- C04B2235/78—Grain sizes and shapes, product microstructures, e.g. acicular grains, equiaxed grains, platelet-structures
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- C04B2235/80—Phases present in the sintered or melt-cast ceramic products other than the main phase
- C04B2235/81—Materials characterised by the absence of phases other than the main phase, i.e. single phase materials
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- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Manufacturing & Machinery (AREA)
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Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| ATGM50074/2018U AT16480U1 (de) | 2018-04-20 | 2018-04-20 | Target und Verfahren zur Herstellung eines Targets |
| ATGM50074/2018 | 2018-04-20 | ||
| PCT/EP2019/059515 WO2019201795A1 (de) | 2018-04-20 | 2019-04-12 | Target und verfahren zur herstellung eines targets |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2021521334A JP2021521334A (ja) | 2021-08-26 |
| JP2021521334A5 JP2021521334A5 (enExample) | 2021-10-07 |
| JP7394781B2 true JP7394781B2 (ja) | 2023-12-08 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2020555886A Active JP7394781B2 (ja) | 2018-04-20 | 2019-04-12 | ターゲット及びターゲットの製造方法 |
Country Status (6)
| Country | Link |
|---|---|
| EP (1) | EP3781720B1 (enExample) |
| JP (1) | JP7394781B2 (enExample) |
| CN (1) | CN112236541A (enExample) |
| AT (1) | AT16480U1 (enExample) |
| TW (1) | TWI694980B (enExample) |
| WO (1) | WO2019201795A1 (enExample) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115385695B (zh) * | 2022-07-28 | 2023-07-28 | 广东工业大学 | 一种含缺陷的片状二硼化钨粉体及其制备方法和应用 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006150462A (ja) | 2004-11-25 | 2006-06-15 | Mitsubishi Materials Kobe Tools Corp | 高反応性被削材の高速切削加工で硬質被覆層がすぐれた耐摩耗性を発揮する表面被覆超硬合金製切削工具 |
| JP2015521150A (ja) | 2012-05-01 | 2015-07-27 | アメリカ合衆国 | 耐熱金属ホウ化物セラミック、及びそれを生産する方法 |
Family Cites Families (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS55128560A (en) * | 1979-03-27 | 1980-10-04 | Agency Of Ind Science & Technol | Boride based ultrahard heat resistant material |
| JP3154735B2 (ja) * | 1991-03-07 | 2001-04-09 | 住友大阪セメント株式会社 | スパッタリング用ターゲットおよびその製造方法 |
| JPH05195199A (ja) * | 1991-10-04 | 1993-08-03 | Toyo Kohan Co Ltd | 耐摩耗性、耐食性に優れた硼化物系超硬質コーティン グ薄膜の製造方法 |
| JPH0681124A (ja) * | 1992-09-02 | 1994-03-22 | Mitsubishi Materials Corp | 表面被覆材 |
| JPH0681125A (ja) * | 1992-09-02 | 1994-03-22 | Mitsubishi Materials Corp | 表面被覆材 |
| JP3160387B2 (ja) * | 1992-10-01 | 2001-04-25 | トーカロ株式会社 | 耐溶融金属性に優れる複合溶射材料および複合溶射皮膜 |
| JPH06248446A (ja) * | 1993-02-26 | 1994-09-06 | Mitsubishi Materials Corp | スパッタリング用ターゲット及びその製造方法 |
| DE19516883A1 (de) * | 1994-05-13 | 1995-11-16 | Merck Patent Gmbh | Tiefdruckform |
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- 2018-04-20 AT ATGM50074/2018U patent/AT16480U1/de not_active IP Right Cessation
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2019
- 2019-04-12 CN CN201980026624.1A patent/CN112236541A/zh active Pending
- 2019-04-12 EP EP19717488.1A patent/EP3781720B1/de active Active
- 2019-04-12 JP JP2020555886A patent/JP7394781B2/ja active Active
- 2019-04-12 WO PCT/EP2019/059515 patent/WO2019201795A1/de not_active Ceased
- 2019-04-16 TW TW108113200A patent/TWI694980B/zh active
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| JP2006150462A (ja) | 2004-11-25 | 2006-06-15 | Mitsubishi Materials Kobe Tools Corp | 高反応性被削材の高速切削加工で硬質被覆層がすぐれた耐摩耗性を発揮する表面被覆超硬合金製切削工具 |
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| TW201943678A (zh) | 2019-11-16 |
| EP3781720B1 (de) | 2024-09-04 |
| WO2019201795A1 (de) | 2019-10-24 |
| EP3781720A1 (de) | 2021-02-24 |
| AT16480U1 (de) | 2019-10-15 |
| JP2021521334A (ja) | 2021-08-26 |
| EP3781720C0 (de) | 2024-09-04 |
| TWI694980B (zh) | 2020-06-01 |
| CN112236541A (zh) | 2021-01-15 |
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