JP7384273B2 - 半導体装置、リザバーコンピューティングシステム及び半導体装置の製造方法 - Google Patents

半導体装置、リザバーコンピューティングシステム及び半導体装置の製造方法 Download PDF

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JP7384273B2
JP7384273B2 JP2022514920A JP2022514920A JP7384273B2 JP 7384273 B2 JP7384273 B2 JP 7384273B2 JP 2022514920 A JP2022514920 A JP 2022514920A JP 2022514920 A JP2022514920 A JP 2022514920A JP 7384273 B2 JP7384273 B2 JP 7384273B2
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semiconductor region
semiconductor
insulating film
nanowire
circuit
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研一 河口
剛 高橋
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Fujitsu Ltd
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    • HELECTRICITY
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    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D8/00Diodes
    • H10D8/70Tunnel-effect diodes
    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06NCOMPUTING ARRANGEMENTS BASED ON SPECIFIC COMPUTATIONAL MODELS
    • G06N3/00Computing arrangements based on biological models
    • G06N3/02Neural networks
    • G06N3/04Architecture, e.g. interconnection topology
    • G06N3/044Recurrent networks, e.g. Hopfield networks
    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
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    • G06N3/00Computing arrangements based on biological models
    • G06N3/02Neural networks
    • G06N3/06Physical realisation, i.e. hardware implementation of neural networks, neurons or parts of neurons
    • G06N3/063Physical realisation, i.e. hardware implementation of neural networks, neurons or parts of neurons using electronic means
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    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
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    • H10D62/118Nanostructure semiconductor bodies
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    • H10D84/221Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of only components covered by H10D1/00 or H10D8/00, e.g. RLC circuits of combinations of diodes or capacitors or resistors of only diodes
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JP2022514920A 2020-04-15 2020-04-15 半導体装置、リザバーコンピューティングシステム及び半導体装置の製造方法 Active JP7384273B2 (ja)

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Citations (3)

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JP2008511985A (ja) 2004-08-31 2008-04-17 エージェンシー フォー サイエンス,テクノロジー アンド リサーチ ナノ構造体及びそれを製造する方法
JP2013508966A (ja) 2009-10-22 2013-03-07 ソル ヴォルタイクス アーベー ナノワイヤトンネルダイオードおよびその製造方法
JP2016510943A (ja) 2012-12-21 2016-04-11 ソル ヴォルテイックス エービーSol Voltaics Ab 半導体ナノワイヤへの凹んだコンタクト

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JP2008511985A (ja) 2004-08-31 2008-04-17 エージェンシー フォー サイエンス,テクノロジー アンド リサーチ ナノ構造体及びそれを製造する方法
JP2013508966A (ja) 2009-10-22 2013-03-07 ソル ヴォルタイクス アーベー ナノワイヤトンネルダイオードおよびその製造方法
JP2016510943A (ja) 2012-12-21 2016-04-11 ソル ヴォルテイックス エービーSol Voltaics Ab 半導体ナノワイヤへの凹んだコンタクト

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Ganjipour et al.,High Current Density Esaki Tunnel Diodes Based on GaSb-InAsSb Heterostructure Nanowires,NANO LETTERS,11,米国,American Chemical Society,2011年09月06日,pp.4222-4226,dx.doi.org/10.1021/nl202180b
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CN115428166B (zh) 2026-04-14
US12363968B2 (en) 2025-07-15
US20230015231A1 (en) 2023-01-19
WO2021210095A1 (ja) 2021-10-21
JPWO2021210095A1 (https=) 2021-10-21
EP4138141A4 (en) 2023-06-07
EP4138141A1 (en) 2023-02-22
CN115428166A (zh) 2022-12-02

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