JP7373854B2 - 蒸着フィルムおよび蒸着フィルムの製造方法 - Google Patents

蒸着フィルムおよび蒸着フィルムの製造方法 Download PDF

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Publication number
JP7373854B2
JP7373854B2 JP2020527340A JP2020527340A JP7373854B2 JP 7373854 B2 JP7373854 B2 JP 7373854B2 JP 2020527340 A JP2020527340 A JP 2020527340A JP 2020527340 A JP2020527340 A JP 2020527340A JP 7373854 B2 JP7373854 B2 JP 7373854B2
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Prior art keywords
vapor
base material
deposited film
deposited
less
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Japanese (ja)
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JPWO2020003946A1 (ja
Inventor
潤 大西
直美 有村
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Oike and Co Ltd
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Oike and Co Ltd
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B9/00—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Laminated Bodies (AREA)
  • Physical Vapour Deposition (AREA)
  • Wrappers (AREA)
JP2020527340A 2018-06-25 2019-06-05 蒸着フィルムおよび蒸着フィルムの製造方法 Active JP7373854B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2018119880 2018-06-25
JP2018119880 2018-06-25
PCT/JP2019/022390 WO2020003946A1 (fr) 2018-06-25 2019-06-05 Film déposé et son procédé de production

Publications (2)

Publication Number Publication Date
JPWO2020003946A1 JPWO2020003946A1 (ja) 2021-08-26
JP7373854B2 true JP7373854B2 (ja) 2023-11-06

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JP2020527340A Active JP7373854B2 (ja) 2018-06-25 2019-06-05 蒸着フィルムおよび蒸着フィルムの製造方法

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Country Link
JP (1) JP7373854B2 (fr)
TW (1) TW202000953A (fr)
WO (1) WO2020003946A1 (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021210478A1 (fr) * 2020-04-17 2021-10-21 株式会社クラレ Film polymère à cristaux liquides revêtu de métal
TWI784310B (zh) * 2020-09-02 2022-11-21 國立中興大學 蔬果包裝的主動氣調保鮮膜及其製備方法

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003071985A (ja) 2001-09-05 2003-03-12 Kakogawa Plastic Kk 薄膜形成法
JP2004327931A (ja) 2003-04-28 2004-11-18 Matsushita Electric Ind Co Ltd 金属被膜ポリイミド基板及びその製造方法
JP2009006439A (ja) 2007-06-27 2009-01-15 Kyocera Corp 切削工具
JP2012218206A (ja) 2011-04-05 2012-11-12 Oike Ind Co Ltd 熱水耐性を有するガスバリアフィルムの製造方法及び熱水耐性を有するガスバリアフィルム
WO2013100073A1 (fr) 2011-12-28 2013-07-04 大日本印刷株式会社 Dispositif de dépôt en phase vapeur possédant un dispositif de prétraitement au plasma
WO2014050951A1 (fr) 2012-09-28 2014-04-03 大日本印刷株式会社 Film transparent déposé en phase vapeur
JP2018001584A (ja) 2016-06-30 2018-01-11 株式会社麗光 金属積層フイルム、及びその製造方法
WO2018163883A1 (fr) 2017-03-07 2018-09-13 東洋紡株式会社 Film de polyéthylène pour substrats de dépôt en phase vapeur et film de dépôt en phase vapeur l'utilisant

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0394475B1 (fr) * 1988-09-28 1998-11-18 Toray Industries, Inc. Film d'aluminium par evaporation sous vide et procede de production

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003071985A (ja) 2001-09-05 2003-03-12 Kakogawa Plastic Kk 薄膜形成法
JP2004327931A (ja) 2003-04-28 2004-11-18 Matsushita Electric Ind Co Ltd 金属被膜ポリイミド基板及びその製造方法
JP2009006439A (ja) 2007-06-27 2009-01-15 Kyocera Corp 切削工具
JP2012218206A (ja) 2011-04-05 2012-11-12 Oike Ind Co Ltd 熱水耐性を有するガスバリアフィルムの製造方法及び熱水耐性を有するガスバリアフィルム
WO2013100073A1 (fr) 2011-12-28 2013-07-04 大日本印刷株式会社 Dispositif de dépôt en phase vapeur possédant un dispositif de prétraitement au plasma
WO2014050951A1 (fr) 2012-09-28 2014-04-03 大日本印刷株式会社 Film transparent déposé en phase vapeur
JP2018001584A (ja) 2016-06-30 2018-01-11 株式会社麗光 金属積層フイルム、及びその製造方法
WO2018163883A1 (fr) 2017-03-07 2018-09-13 東洋紡株式会社 Film de polyéthylène pour substrats de dépôt en phase vapeur et film de dépôt en phase vapeur l'utilisant

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WO2020003946A1 (fr) 2020-01-02
JPWO2020003946A1 (ja) 2021-08-26
TW202000953A (zh) 2020-01-01

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