JP7372324B2 - 機上現像型平版印刷版原版、平版印刷版の作製方法、及び、平版印刷方法 - Google Patents

機上現像型平版印刷版原版、平版印刷版の作製方法、及び、平版印刷方法 Download PDF

Info

Publication number
JP7372324B2
JP7372324B2 JP2021528303A JP2021528303A JP7372324B2 JP 7372324 B2 JP7372324 B2 JP 7372324B2 JP 2021528303 A JP2021528303 A JP 2021528303A JP 2021528303 A JP2021528303 A JP 2021528303A JP 7372324 B2 JP7372324 B2 JP 7372324B2
Authority
JP
Japan
Prior art keywords
group
compound
lithographic printing
printing plate
recording layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2021528303A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2020262696A1 (https=
JPWO2020262696A5 (https=
Inventor
啓介 野越
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Publication of JPWO2020262696A1 publication Critical patent/JPWO2020262696A1/ja
Publication of JPWO2020262696A5 publication Critical patent/JPWO2020262696A5/ja
Application granted granted Critical
Publication of JP7372324B2 publication Critical patent/JP7372324B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • B41C1/1016—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials characterised by structural details, e.g. protective layers, backcoat layers or several imaging layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M1/00—Inking and printing with a printer's forme
    • B41M1/06—Lithographic printing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N1/00—Printing plates or foils; Materials therefor
    • B41N1/04—Printing plates or foils; Materials therefor metallic
    • B41N1/08—Printing plates or foils; Materials therefor metallic for lithographic printing
    • B41N1/083—Printing plates or foils; Materials therefor metallic for lithographic printing made of aluminium or aluminium alloys or having such surface layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N1/00—Printing plates or foils; Materials therefor
    • B41N1/12—Printing plates or foils; Materials therefor non-metallic other than stone, e.g. printing plates or foils comprising inorganic materials in an organic matrix
    • B41N1/14—Lithographic printing foils
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2201/00—Location, type or constituents of the non-imaging layers in lithographic printing formes
    • B41C2201/02—Cover layers; Protective layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2201/00—Location, type or constituents of the non-imaging layers in lithographic printing formes
    • B41C2201/12—Location, type or constituents of the non-imaging layers in lithographic printing formes characterised by non-macromolecular organic compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2201/00—Location, type or constituents of the non-imaging layers in lithographic printing formes
    • B41C2201/14—Location, type or constituents of the non-imaging layers in lithographic printing formes characterised by macromolecular organic compounds, e.g. binder, adhesives
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/04—Negative working, i.e. the non-exposed (non-imaged) areas are removed
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/08—Developable by water or the fountain solution
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/22—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/24—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3035—Imagewise removal using liquid means from printing plates fixed on a cylinder or on a curved surface; from printing cylinders

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Engineering & Computer Science (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Thermal Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Methods (AREA)
JP2021528303A 2019-06-28 2020-06-26 機上現像型平版印刷版原版、平版印刷版の作製方法、及び、平版印刷方法 Active JP7372324B2 (ja)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
JP2019122493 2019-06-28
JP2019122493 2019-06-28
JP2019158808 2019-08-30
JP2019158808 2019-08-30
JP2019169800 2019-09-18
JP2019169800 2019-09-18
PCT/JP2020/025418 WO2020262696A1 (ja) 2019-06-28 2020-06-26 機上現像型平版印刷版原版、平版印刷版の作製方法、及び、平版印刷方法

Publications (3)

Publication Number Publication Date
JPWO2020262696A1 JPWO2020262696A1 (https=) 2020-12-30
JPWO2020262696A5 JPWO2020262696A5 (https=) 2022-03-30
JP7372324B2 true JP7372324B2 (ja) 2023-10-31

Family

ID=74061287

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021528303A Active JP7372324B2 (ja) 2019-06-28 2020-06-26 機上現像型平版印刷版原版、平版印刷版の作製方法、及び、平版印刷方法

Country Status (5)

Country Link
US (1) US12117729B2 (https=)
EP (1) EP3991990B1 (https=)
JP (1) JP7372324B2 (https=)
CN (1) CN114051454B (https=)
WO (1) WO2020262696A1 (https=)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7430788B2 (ja) * 2020-05-29 2024-02-13 富士フイルム株式会社 機上現像型平版印刷版原版、平版印刷版の作製方法、及び、平版印刷方法
EP4159457B1 (en) * 2020-05-29 2025-12-31 FUJIFILM Corporation PRECURSOR OF A LITHOGRAPHIC PRINTING PLATE OF THE PRESS-DEVELOPING TYPE AND METHOD FOR MANUFACTURED A LITHOGRAPHIC PRINTING PLATE
EP4159458B1 (en) 2020-05-29 2025-12-24 FUJIFILM Corporation On-press development type lithographic printing plate precursor, method of preparing a lithographic printing plate, and lithographic printing method
CN115666959A (zh) * 2020-05-29 2023-01-31 富士胶片株式会社 机上显影型平版印刷版原版、平版印刷版的制作方法及平版印刷方法
CN116829366B (zh) * 2021-02-26 2026-02-17 富士胶片株式会社 机上显影型平版印刷版原版、平版印刷版的制作方法、平版印刷方法及呈色剂
US20230091079A1 (en) * 2021-07-23 2023-03-23 Eastman Kodak Company Lithographic printing plate precursor and method of use

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000171974A (ja) 1998-12-09 2000-06-23 Fuji Photo Film Co Ltd 光重合性組成物及びそれを用いた感光感熱記録材料
JP2013504084A (ja) 2009-09-04 2013-02-04 イーストマン コダック カンパニー 平版印刷版の単一工程処理後の乾燥方法及び装置
WO2016027886A1 (ja) 2014-08-22 2016-02-25 富士フイルム株式会社 発色組成物、平版印刷版原版、平版印刷版の製版方法、及び、発色剤
US20180207925A1 (en) 2015-07-23 2018-07-26 Agfa Nv A lithographic printing plate precursor comprising graphite oxide
WO2019013268A1 (ja) 2017-07-13 2019-01-17 富士フイルム株式会社 平版印刷版原版、及び、平版印刷版の作製方法
JP6461447B1 (ja) 2017-09-29 2019-01-30 富士フイルム株式会社 平版印刷版原版、平版印刷版の作製方法及び平版印刷方法
WO2019044566A1 (ja) 2017-08-31 2019-03-07 富士フイルム株式会社 平版印刷版原版、平版印刷版の作製方法及び平版印刷方法

Family Cites Families (100)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3458311A (en) 1966-06-27 1969-07-29 Du Pont Photopolymerizable elements with solvent removable protective layers
JPS4841708B1 (https=) 1970-01-13 1973-12-07
DE2064079C2 (de) 1970-12-28 1982-09-09 Hoechst Ag, 6000 Frankfurt Photopolymerisierbares Gemisch
JPS5040047B2 (https=) 1971-09-06 1975-12-22
JPS5549729B2 (https=) 1973-02-07 1980-12-13
DE2361041C3 (de) 1973-12-07 1980-08-14 Hoechst Ag, 6000 Frankfurt Photopolymerisierbares Gemisch
JPS5311314B2 (https=) 1974-09-25 1978-04-20
DE2822190A1 (de) 1978-05-20 1979-11-22 Hoechst Ag Photopolymerisierbares gemisch
DE2822189A1 (de) 1978-05-20 1980-04-17 Hoechst Ag Photopolymerisierbares gemisch
DE3036694A1 (de) 1980-09-29 1982-06-03 Hoechst Ag, 6000 Frankfurt Gummielastische, ethylenisch ungesaettigte polyurethane und dieselben enthaltendes durch strahlung polymerisierbares gemisch
DE3048502A1 (de) 1980-12-22 1982-07-22 Hoechst Ag, 6000 Frankfurt Durch strahlung polymerisierbares gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
JP2525568B2 (ja) 1985-01-18 1996-08-21 富士写真フイルム株式会社 光可溶化組成物
JPH0714670B2 (ja) * 1987-02-18 1995-02-22 富士写真フイルム株式会社 感光性平版印刷版用支持体の製造方法
JP2655349B2 (ja) 1989-05-18 1997-09-17 富士写真フイルム株式会社 感光性平版印刷版
JP2988756B2 (ja) 1991-04-26 1999-12-13 協和醗酵工業株式会社 光重合開始剤およびこれを含有する光重合性組成物
JPH08505958A (ja) 1993-01-20 1996-06-25 アグファ−ゲヴェルト ナームロゼ ベンノートチャップ 高感度の光重合性組成物及びそれで像を得るための方法
JPH08108621A (ja) 1994-10-06 1996-04-30 Konica Corp 画像記録媒体及びそれを用いる画像形成方法
DE69620336T2 (de) 1995-10-24 2002-10-24 Agfa-Gevaert, Mortsel Verfahren zur Herstellung einer lithographischen Druckplatte mit Wasser als Entwickler
DE69517174T2 (de) 1995-10-24 2000-11-09 Agfa-Gevaert N.V., Mortsel Verfahren zur Herstellung einer lithographische Druckplatte mit auf der Druckpresse stattfindenden Entwicklung
DE69608522T2 (de) 1995-11-09 2001-01-25 Agfa-Gevaert N.V., Mortsel Wärmeempfindliches Aufzeichnungselement und Verfahren zur Herstellung einer lithographischen Druckform damit
DE69613078T2 (de) 1995-11-09 2001-11-22 Agfa-Gevaert N.V., Mortsel Wärmeempfindliches Aufzeichnungselement und Verfahren zur Herstellung einer Druckform damit
JPH09179298A (ja) 1995-12-22 1997-07-11 Mitsubishi Chem Corp 光重合性組成物
JPH09179297A (ja) 1995-12-22 1997-07-11 Mitsubishi Chem Corp 光重合性組成物
JPH09179296A (ja) 1995-12-22 1997-07-11 Mitsubishi Chem Corp 光重合性組成物
JPH10282679A (ja) 1997-04-08 1998-10-23 Fuji Photo Film Co Ltd ネガ型感光性平版印刷版
JP3839552B2 (ja) 1997-06-03 2006-11-01 コダックポリクロームグラフィックス株式会社 印刷現像感光性平版印刷版及びその製版方法
EP0931647B1 (en) 1998-01-23 2003-04-02 Agfa-Gevaert A heat sensitive element and a method for producing lithographic plates therewith
US6085656A (en) * 1998-07-24 2000-07-11 Presstak, Inc. Method of lithographic imaging with reduced debris-generated performance degradation and related constructions
JP2000250211A (ja) 1999-03-01 2000-09-14 Fuji Photo Film Co Ltd 光重合性組成物
JP2001133969A (ja) 1999-11-01 2001-05-18 Fuji Photo Film Co Ltd ネガ型平版印刷版原版
JP2001277740A (ja) 2000-01-27 2001-10-10 Fuji Photo Film Co Ltd 平版印刷版用原版
JP2001277742A (ja) 2000-01-27 2001-10-10 Fuji Photo Film Co Ltd 平版印刷版用原版
JP4092055B2 (ja) 2000-02-09 2008-05-28 三菱製紙株式会社 感光性組成物および感光性平版印刷版材料
JP3449342B2 (ja) 2000-03-30 2003-09-22 三菱化学株式会社 光硬化性組成物、低複屈折光学部材及びその製造方法
JP2002023360A (ja) 2000-07-12 2002-01-23 Fuji Photo Film Co Ltd ネガ型画像記録材料
JP4156784B2 (ja) 2000-07-25 2008-09-24 富士フイルム株式会社 ネガ型画像記録材料及び画像形成方法
JP4319363B2 (ja) 2001-01-15 2009-08-26 富士フイルム株式会社 ネガ型画像記録材料
JP4414607B2 (ja) 2001-03-14 2010-02-10 富士フイルム株式会社 ラジカル重合性化合物
JP2002287344A (ja) 2001-03-27 2002-10-03 Fuji Photo Film Co Ltd 光重合性平版印刷版
US7261998B2 (en) 2001-04-04 2007-08-28 Eastman Kodak Company Imageable element with solvent-resistant polymeric binder
JP2002328465A (ja) 2001-04-27 2002-11-15 Fuji Photo Film Co Ltd 平版印刷版原版
JP2003064130A (ja) 2001-08-29 2003-03-05 Fuji Photo Film Co Ltd 光重合性組成物
JP3989270B2 (ja) 2002-03-25 2007-10-10 富士フイルム株式会社 光重合性組成物
EP1359008B1 (de) 2002-04-29 2005-08-31 Agfa-Gevaert Strahlungsempfindliches Gemisch, damit hergestelltes Aufzeichnungsmaterial, und Verfahren zur Herstellung einer Druckplatte
DE10255663B4 (de) 2002-11-28 2006-05-04 Kodak Polychrome Graphics Gmbh Strahlungsempfindliche Elemente
JP4299032B2 (ja) 2003-03-28 2009-07-22 三菱製紙株式会社 感光性平版印刷版材料
EP1500498B1 (en) 2003-07-22 2010-12-15 FUJIFILM Corporation Lithographic printing plate precursour and lithographic printing method
JP4644458B2 (ja) 2003-09-30 2011-03-02 富士フイルム株式会社 平版印刷版原版および平版印刷方法
JP4351933B2 (ja) 2004-03-05 2009-10-28 富士フイルム株式会社 ネガ型平版印刷版原版およびこれを用いた平版印刷版の製版方法
US7425406B2 (en) * 2004-07-27 2008-09-16 Fujifilm Corporation Lithographic printing plate precursor and lithographic printing method
JP2006065210A (ja) 2004-08-30 2006-03-09 Fuji Photo Film Co Ltd 感光性平版印刷版
JP2006188038A (ja) 2004-12-10 2006-07-20 Fuji Photo Film Co Ltd 平版印刷版原版および製版方法
JP4448781B2 (ja) * 2005-01-25 2010-04-14 富士フイルム株式会社 機上現像型平版印刷版原版及びそれを用いた平版印刷方法
JP4469734B2 (ja) 2005-02-03 2010-05-26 富士フイルム株式会社 平版印刷版原版
JP2006239867A (ja) 2005-02-28 2006-09-14 Fuji Photo Film Co Ltd 平版印刷版原版および平版印刷方法
JP5172097B2 (ja) 2005-02-28 2013-03-27 富士フイルム株式会社 平版印刷版原版および平版印刷版原版の製造方法
JP2006243493A (ja) 2005-03-04 2006-09-14 Fuji Photo Film Co Ltd 感光性平版印刷版
JP4393408B2 (ja) 2005-03-16 2010-01-06 富士フイルム株式会社 ネガ型平版印刷版原版
ATE391014T1 (de) 2005-06-21 2008-04-15 Agfa Graphics Nv Wärmeempfindliches bildaufzeichnungselement
US7153632B1 (en) 2005-08-03 2006-12-26 Eastman Kodak Company Radiation-sensitive compositions and imageable materials
JP4759343B2 (ja) 2005-08-19 2011-08-31 富士フイルム株式会社 平版印刷版原版および平版印刷方法
JP5170960B2 (ja) 2005-08-29 2013-03-27 富士フイルム株式会社 平版印刷版原版、及び平版印刷方法
JP2007118587A (ja) * 2005-09-27 2007-05-17 Fujifilm Corp 平版印刷版原版および平版印刷方法
JP2007094138A (ja) 2005-09-29 2007-04-12 Fujifilm Corp 平版印刷版原版及びその製版方法
JP5238170B2 (ja) 2006-03-14 2013-07-17 富士フイルム株式会社 平版印刷版原版
JP4796890B2 (ja) 2006-03-31 2011-10-19 富士フイルム株式会社 平版印刷版原版及び平版印刷方法
JP2007293221A (ja) 2006-03-31 2007-11-08 Fujifilm Corp 平版印刷版の作製方法及び平版印刷版原版
JP2008195018A (ja) 2007-02-15 2008-08-28 Fujifilm Corp 平版印刷版原版および平版印刷方法
JP4826918B2 (ja) 2007-04-03 2011-11-30 三菱化学株式会社 光重合性組成物
JP5046744B2 (ja) 2007-05-18 2012-10-10 富士フイルム株式会社 平版印刷版原版、及びそれを用いた印刷方法
JP2008284858A (ja) 2007-05-21 2008-11-27 Fujifilm Corp 平版印刷版原版、及びそれを用いた印刷方法
EP2006738B1 (en) 2007-06-21 2017-09-06 Fujifilm Corporation Lithographic printing plate precursor
JP2009090645A (ja) 2007-09-20 2009-04-30 Fujifilm Corp 平版印刷版原版、及びそれを用いた印刷方法
JP5322537B2 (ja) 2007-10-29 2013-10-23 富士フイルム株式会社 平版印刷版原版
BR112012023662A2 (pt) * 2010-03-19 2016-08-16 Fujifilm Corp composição fotossensível à coloração, precursor de chapa de impressão litográfica e método de fabricação de chapa
JP5645743B2 (ja) 2010-04-30 2014-12-24 富士フイルム株式会社 平版印刷版原版、その製版方法、及び、多価イソシアネート化合物
JP5205505B2 (ja) 2010-12-28 2013-06-05 富士フイルム株式会社 平版印刷版原版及びその平版印刷方法
JP5205480B2 (ja) 2011-01-31 2013-06-05 富士フイルム株式会社 平版印刷版用支持体、および平版印刷版原版
JP5740275B2 (ja) 2011-09-30 2015-06-24 富士フイルム株式会社 機上現像型の平版印刷版原版を用いる印刷方法
JP5699112B2 (ja) * 2012-07-27 2015-04-08 富士フイルム株式会社 平版印刷版原版及びその製版方法
JP2014079960A (ja) * 2012-10-17 2014-05-08 Eastman Kodak Co 平版印刷版用組成物及び平版印刷版原版
US20170217149A1 (en) 2016-01-28 2017-08-03 Eastman Kodak Company Negatively-working lithographic printing plate precursor and method
JP6785295B2 (ja) 2016-02-19 2020-11-18 富士フイルム株式会社 発色組成物、平版印刷版原版、平版印刷版の作製方法、及び発色性化合物
EP3409499B1 (en) * 2016-02-29 2022-12-07 FUJIFILM Corporation Lithographic printing original plate and plate making method for lithographic printing plates
JP6408191B2 (ja) * 2016-03-30 2018-10-17 富士フイルム株式会社 機上現像用平版印刷版原版、平版印刷版の作製方法、及び、平版印刷方法
US10960656B2 (en) 2016-04-01 2021-03-30 Eastman Kodak Company Negatively-working lithographic printing plate precursor and method
EP3508553B1 (en) 2016-08-31 2022-01-12 FUJIFILM Corporation Color-assuming composition, lithographic printing plate precursor, method for forming lithographic printing plate, and compound
EP3456547B1 (en) * 2017-02-28 2020-10-28 Fujifilm Corporation Lithographic printing plate precursor, method of producing lithographic printing plate, and lithographic printing method
BR112019017946B8 (pt) * 2017-02-28 2023-03-21 Fujifilm Corp Métodos para produção de uma chapa de impressão litográfica do tipo revelação em máquina
CN111361324B (zh) * 2017-03-31 2021-10-19 富士胶片株式会社 平版印刷版原版、其制造方法、其层叠体、平版印刷方法
CN110678335B (zh) 2017-05-31 2021-11-16 富士胶片株式会社 平版印刷版原版、平版印刷版的制作方法、聚合物粒子及组合物
EP3640039B1 (en) 2017-06-12 2024-04-24 FUJIFILM Corporation Lithography original plate, platemaking method for lithography plate, and photosensitive resin composition
CN110998439B (zh) * 2017-07-25 2023-09-19 富士胶片株式会社 平版印刷版原版、平版印刷版的制作方法及显色组合物
CN109863034B (zh) * 2017-09-29 2020-11-27 富士胶片株式会社 平版印刷版原版、平版印刷版的制作方法及平版印刷方法
JP6416419B1 (ja) 2018-01-12 2018-10-31 株式会社コロプラ ゲームプログラム、方法、および情報処理装置
JP6931622B2 (ja) 2018-03-16 2021-09-08 日立Ｇｅニュークリア・エナジー株式会社 原子力プラントの炭素鋼部材への貴金属の付着方法及び原子力プラントの炭素鋼部材への放射性核種の付着抑制方法
JP7067173B2 (ja) 2018-03-22 2022-05-16 沖電気工業株式会社 収音装置、プログラム及び方法
WO2019219574A1 (en) 2018-05-14 2019-11-21 Agfa Nv A lithographic printing plate precursor
WO2020262685A1 (ja) * 2019-06-28 2020-12-30 富士フイルム株式会社 平版印刷版原版、平版印刷版の作製方法、及び、平版印刷方法
WO2021172453A1 (ja) * 2020-02-28 2021-09-02 富士フイルム株式会社 平版印刷版原版、平版印刷版の作製方法、及び、平版印刷方法

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000171974A (ja) 1998-12-09 2000-06-23 Fuji Photo Film Co Ltd 光重合性組成物及びそれを用いた感光感熱記録材料
JP2013504084A (ja) 2009-09-04 2013-02-04 イーストマン コダック カンパニー 平版印刷版の単一工程処理後の乾燥方法及び装置
WO2016027886A1 (ja) 2014-08-22 2016-02-25 富士フイルム株式会社 発色組成物、平版印刷版原版、平版印刷版の製版方法、及び、発色剤
US20180207925A1 (en) 2015-07-23 2018-07-26 Agfa Nv A lithographic printing plate precursor comprising graphite oxide
WO2019013268A1 (ja) 2017-07-13 2019-01-17 富士フイルム株式会社 平版印刷版原版、及び、平版印刷版の作製方法
WO2019044566A1 (ja) 2017-08-31 2019-03-07 富士フイルム株式会社 平版印刷版原版、平版印刷版の作製方法及び平版印刷方法
JP6461447B1 (ja) 2017-09-29 2019-01-30 富士フイルム株式会社 平版印刷版原版、平版印刷版の作製方法及び平版印刷方法

Also Published As

Publication number Publication date
EP3991990A1 (en) 2022-05-04
JPWO2020262696A1 (https=) 2020-12-30
CN114051454A (zh) 2022-02-15
CN114051454B (zh) 2023-12-15
US20220113629A1 (en) 2022-04-14
EP3991990B1 (en) 2025-02-26
US12117729B2 (en) 2024-10-15
WO2020262696A1 (ja) 2020-12-30
EP3991990A4 (en) 2022-08-17

Similar Documents

Publication Publication Date Title
JP6621570B2 (ja) 平版印刷版原版、及び、平版印刷版の作製方法
JP7372324B2 (ja) 機上現像型平版印刷版原版、平版印刷版の作製方法、及び、平版印刷方法
JP7282885B2 (ja) 平版印刷版原版、平版印刷版の作製方法、及び、平版印刷方法
JP7293356B2 (ja) 機上現像型平版印刷版原版、平版印刷版の作製方法、及び、平版印刷方法
JP7640639B2 (ja) 平版印刷版原版、平版印刷版の作製方法、及び、平版印刷方法
WO2020262686A1 (ja) 機上現像型平版印刷版原版、平版印刷版の作製方法、及び、平版印刷方法
JP2023171431A (ja) 平版印刷版原版、平版印刷版の作製方法、及び、平版印刷方法
CN113474178B (zh) 平版印刷版原版、平版印刷版的制作方法及平版印刷方法
CN113382870B (zh) 平版印刷版原版、平版印刷版的制作方法及平版印刷方法
JP7293377B2 (ja) 平版印刷版原版、平版印刷版の作製方法、及び、平版印刷方法
JP7321261B2 (ja) 平版印刷版原版、平版印刷版の作製方法、及び、平版印刷方法
JP7321115B2 (ja) 機上現像型平版印刷版原版、平版印刷版の作製方法、及び、平版印刷方法
JP7064595B2 (ja) 機上現像型平版印刷版原版、平版印刷版の作製方法、及び、平版印刷方法
JP7062064B2 (ja) 機上現像型平版印刷版原版、平版印刷版の作製方法、及び、平版印刷方法
WO2020262688A1 (ja) 平版印刷版原版、平版印刷版の作製方法、及び、平版印刷方法
WO2020262695A1 (ja) 機上現像型平版印刷版原版、平版印刷版の作製方法、及び、平版印刷方法
WO2020262687A1 (ja) 平版印刷版原版、平版印刷版の作製方法、及び平版印刷方法
WO2020262690A1 (ja) 機上現像型平版印刷版原版、平版印刷版の作製方法、及び、平版印刷方法
WO2018159626A1 (ja) 硬化性組成物、平版印刷版原版、及び、平版印刷版の作製方法

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20211006

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20220322

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20220830

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20221026

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20221118

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20230307

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20230428

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20230926

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20231019

R150 Certificate of patent or registration of utility model

Ref document number: 7372324

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150