JP7299748B2 - シャッター装置、露光装置、膜形成装置および物品製造方法 - Google Patents

シャッター装置、露光装置、膜形成装置および物品製造方法 Download PDF

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Publication number
JP7299748B2
JP7299748B2 JP2019090079A JP2019090079A JP7299748B2 JP 7299748 B2 JP7299748 B2 JP 7299748B2 JP 2019090079 A JP2019090079 A JP 2019090079A JP 2019090079 A JP2019090079 A JP 2019090079A JP 7299748 B2 JP7299748 B2 JP 7299748B2
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JP
Japan
Prior art keywords
shutter
shutter device
light
auxiliary member
base member
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JP2019090079A
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English (en)
Japanese (ja)
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JP2020187185A (ja
Inventor
瑞真 村上
俊輔 大田
宜寛 毛利
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2019090079A priority Critical patent/JP7299748B2/ja
Priority to TW109113605A priority patent/TWI803746B/zh
Priority to KR1020200051202A priority patent/KR20200130130A/ko
Publication of JP2020187185A publication Critical patent/JP2020187185A/ja
Application granted granted Critical
Publication of JP7299748B2 publication Critical patent/JP7299748B2/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2012—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image using liquid photohardening compositions, e.g. for the production of reliefs such as flexographic plates or stamps
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34

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  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Shutters For Cameras (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP2019090079A 2019-05-10 2019-05-10 シャッター装置、露光装置、膜形成装置および物品製造方法 Active JP7299748B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2019090079A JP7299748B2 (ja) 2019-05-10 2019-05-10 シャッター装置、露光装置、膜形成装置および物品製造方法
TW109113605A TWI803746B (zh) 2019-05-10 2020-04-23 遮蔽器裝置、曝光裝置、膜形成裝置及物品製造方法
KR1020200051202A KR20200130130A (ko) 2019-05-10 2020-04-28 셔터장치, 노광장치, 막 형성장치 및 물품 제조방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2019090079A JP7299748B2 (ja) 2019-05-10 2019-05-10 シャッター装置、露光装置、膜形成装置および物品製造方法

Publications (2)

Publication Number Publication Date
JP2020187185A JP2020187185A (ja) 2020-11-19
JP7299748B2 true JP7299748B2 (ja) 2023-06-28

Family

ID=73223455

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2019090079A Active JP7299748B2 (ja) 2019-05-10 2019-05-10 シャッター装置、露光装置、膜形成装置および物品製造方法

Country Status (3)

Country Link
JP (1) JP7299748B2 (zh)
KR (1) KR20200130130A (zh)
TW (1) TWI803746B (zh)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002359173A (ja) 2001-05-31 2002-12-13 Canon Inc 光源装置、露光装置およびデバイス製造方法
JP2004240097A (ja) 2003-02-05 2004-08-26 Dainippon Printing Co Ltd 露光方法及び露光装置
JP2006216727A (ja) 2005-02-03 2006-08-17 Taiheiyo Cement Corp 光路用シャッター
JP2008141016A (ja) 2006-12-01 2008-06-19 Canon Inc シャッタ羽根装置、シャッタユニット、撮像装置、露光装置およびデバイス製造方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09186076A (ja) * 1996-01-05 1997-07-15 Canon Inc 露光装置
JP3575281B2 (ja) * 1998-05-27 2004-10-13 ウシオ電機株式会社 光照射装置のシャッター機構
WO2017199886A1 (ja) * 2016-05-16 2017-11-23 キヤノン電子株式会社 繊維強化積層体、シャッタ装置および光学機器

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002359173A (ja) 2001-05-31 2002-12-13 Canon Inc 光源装置、露光装置およびデバイス製造方法
JP2004240097A (ja) 2003-02-05 2004-08-26 Dainippon Printing Co Ltd 露光方法及び露光装置
JP2006216727A (ja) 2005-02-03 2006-08-17 Taiheiyo Cement Corp 光路用シャッター
JP2008141016A (ja) 2006-12-01 2008-06-19 Canon Inc シャッタ羽根装置、シャッタユニット、撮像装置、露光装置およびデバイス製造方法

Also Published As

Publication number Publication date
KR20200130130A (ko) 2020-11-18
JP2020187185A (ja) 2020-11-19
TWI803746B (zh) 2023-06-01
TW202046022A (zh) 2020-12-16

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