JP7294851B2 - 表示装置およびその製造方法 - Google Patents
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- JP7294851B2 JP7294851B2 JP2019065924A JP2019065924A JP7294851B2 JP 7294851 B2 JP7294851 B2 JP 7294851B2 JP 2019065924 A JP2019065924 A JP 2019065924A JP 2019065924 A JP2019065924 A JP 2019065924A JP 7294851 B2 JP7294851 B2 JP 7294851B2
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- 238000004519 manufacturing process Methods 0.000 title description 20
- 239000010936 titanium Substances 0.000 claims description 129
- 229910052782 aluminium Inorganic materials 0.000 claims description 72
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 70
- 229910000838 Al alloy Inorganic materials 0.000 claims description 42
- 229910052719 titanium Inorganic materials 0.000 claims description 38
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 34
- 239000000758 substrate Substances 0.000 claims description 23
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 claims description 13
- 239000000126 substance Substances 0.000 claims description 9
- 229910052779 Neodymium Inorganic materials 0.000 claims description 7
- 229910052732 germanium Inorganic materials 0.000 claims description 7
- 229910052746 lanthanum Inorganic materials 0.000 claims description 7
- 229910052759 nickel Inorganic materials 0.000 claims description 7
- 239000010410 layer Substances 0.000 description 231
- 238000000034 method Methods 0.000 description 38
- 238000004140 cleaning Methods 0.000 description 37
- 239000002245 particle Substances 0.000 description 32
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 25
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 21
- 239000010408 film Substances 0.000 description 15
- 238000009792 diffusion process Methods 0.000 description 14
- 239000007788 liquid Substances 0.000 description 10
- 239000004065 semiconductor Substances 0.000 description 10
- 230000015572 biosynthetic process Effects 0.000 description 9
- 230000007547 defect Effects 0.000 description 9
- 238000000151 deposition Methods 0.000 description 9
- 239000000463 material Substances 0.000 description 9
- 230000001186 cumulative effect Effects 0.000 description 8
- 239000007789 gas Substances 0.000 description 8
- 238000010438 heat treatment Methods 0.000 description 8
- 238000002347 injection Methods 0.000 description 8
- 239000007924 injection Substances 0.000 description 8
- 238000004544 sputter deposition Methods 0.000 description 8
- 238000003860 storage Methods 0.000 description 8
- 239000010409 thin film Substances 0.000 description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 7
- 239000011229 interlayer Substances 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- 239000003990 capacitor Substances 0.000 description 6
- 238000005530 etching Methods 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- 229910052581 Si3N4 Inorganic materials 0.000 description 4
- 238000000137 annealing Methods 0.000 description 4
- 230000008021 deposition Effects 0.000 description 4
- 238000005137 deposition process Methods 0.000 description 4
- 150000004767 nitrides Chemical class 0.000 description 4
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 4
- 229910052814 silicon oxide Inorganic materials 0.000 description 4
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 3
- 229910052750 molybdenum Inorganic materials 0.000 description 3
- 239000011733 molybdenum Substances 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 238000002161 passivation Methods 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- LDDQLRUQCUTJBB-UHFFFAOYSA-N ammonium fluoride Chemical compound [NH4+].[F-] LDDQLRUQCUTJBB-UHFFFAOYSA-N 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000005281 excited state Effects 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 230000005283 ground state Effects 0.000 description 2
- 230000005525 hole transport Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000005192 partition Methods 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 2
- DDFHBQSCUXNBSA-UHFFFAOYSA-N 5-(5-carboxythiophen-2-yl)thiophene-2-carboxylic acid Chemical compound S1C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)S1 DDFHBQSCUXNBSA-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 229910017665 NH4HF2 Inorganic materials 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 229910004205 SiNX Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 241000862969 Stella Species 0.000 description 1
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- -1 amine compound Chemical class 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- LDDQLRUQCUTJBB-UHFFFAOYSA-O azanium;hydrofluoride Chemical compound [NH4+].F LDDQLRUQCUTJBB-UHFFFAOYSA-O 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052755 nonmetal Inorganic materials 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 230000003071 parasitic effect Effects 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 239000002096 quantum dot Substances 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000003870 refractory metal Substances 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 238000001878 scanning electron micrograph Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/131—Interconnections, e.g. wiring lines or terminals
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- H—ELECTRICITY
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- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/131—Interconnections, e.g. wiring lines or terminals
- H10K59/1315—Interconnections, e.g. wiring lines or terminals comprising structures specially adapted for lowering the resistance
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/124—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or layout of the wiring layers specially adapted to the circuit arrangement, e.g. scanning lines in LCD pixel circuits
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/1259—Multistep manufacturing methods
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- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/30—Devices specially adapted for multicolour light emission
- H10K59/35—Devices specially adapted for multicolour light emission comprising red-green-blue [RGB] subpixels
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- H10K71/60—Forming conductive regions or layers, e.g. electrodes
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02057—Cleaning during device manufacture
- H01L21/02068—Cleaning during device manufacture during, before or after processing of conductive layers, e.g. polysilicon or amorphous silicon layers
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- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Thin Film Transistor (AREA)
- Electroluminescent Light Sources (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Description
この金属性TiNxは、N含量がこれより多い非金属性のTiNxに比べて、電気抵抗が低く、蒸着レートも大きい(本願図14)。また、硬度(hardness)及び剛性(rigidity; young modulus)も高い。
本願図11~13及び図14によると、エッチングによる表面の凹凸形成を少なくする観点から、窒素流量20sccm以上の条件で製造したものが好ましい。
Claims (9)
- 基板と、
前記基板上に位置するゲート線と、
前記ゲート線の一部を含むトランジスターと、
前記トランジスターと連結された発光素子とを含み、
前記ゲート線は、アルミニウムまたはアルミニウム合金を含む第1層と、窒化チタンを含む第2層と、金属性窒化チタンを含む第3層とを含み、
前記第1層、前記第2層、及び前記第3層は、前記基板の側から、この順で形成されており、
前記金属性窒化チタンのN/Tiモル比は0.2乃至0.75であることを特徴とする表示装置。 - 前記第2層の窒化チタンのN/Tiモル比は、0.8乃至1.2であることを特徴とする請求項1に記載の表示装置。
- 前記第1層のアルミニウム合金は、Ni、La、NdおよびGeのうちの少なくとも一つ以上を含むことを特徴とする請求項1に記載の表示装置。
- 前記アルミニウム合金中のアルミニウムでない物質の含有量は、1モル%未満であることを特徴とする請求項3に記載の表示装置。
- 前記第2層の厚さは、50Å乃至400Åであることを特徴とする請求項1に記載の表示装置。
- 前記第3層の厚さは、200Å乃至1200Åであることを特徴とする請求項1に記載の表示装置。
- 前記第3層に含まれているチタンの含有量が前記第2層に含まれているチタンの含有量より更に大きいことを特徴とする請求項1に記載の表示装置。
- 前記ゲート線は、チタンの単体からなる層を含んでいないことを特徴とする請求項1に記載の表示装置。
- 基板と、
前記基板上に位置するゲート線と、
前記ゲート線と絶縁されて位置するデータ線と、
前記ゲート線及びデータ線の一部を含むトランジスターと、
前記トランジスターと連結された発光素子とを含み、
前記ゲート線及びデータ線のうちの一つ以上は、アルミニウムまたはアルミニウム合金を含む第1層と、窒化チタンを含む第2層と、金属性窒化チタンを含む第3層とを含み、
前記第1層、前記第2層、及び前記第3層は、前記基板の側から、この順で形成されており、
前記金属性窒化チタンのN/Tiモル比は0.2乃至0.75であり、
前記第3層に含まれているチタンの含有量が、前記第2層に含まれているチタンの含有量より更に大きいことを特徴とする表示装置。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2019-0006374 | 2019-01-17 | ||
KR1020190006374A KR20200089789A (ko) | 2019-01-17 | 2019-01-17 | 표시 장치 및 이의 제조 방법 |
Publications (2)
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JP2020115201A JP2020115201A (ja) | 2020-07-30 |
JP7294851B2 true JP7294851B2 (ja) | 2023-06-20 |
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JP2019065924A Active JP7294851B2 (ja) | 2019-01-17 | 2019-03-29 | 表示装置およびその製造方法 |
Country Status (4)
Country | Link |
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US (2) | US11793044B2 (ja) |
JP (1) | JP7294851B2 (ja) |
KR (1) | KR20200089789A (ja) |
CN (1) | CN111446275A (ja) |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009200355A (ja) | 2008-02-22 | 2009-09-03 | Sharp Corp | Tft基板、tft基板の製造方法、及び液晶表示装置 |
US20130001577A1 (en) | 2011-06-29 | 2013-01-03 | Samsung Mobile Display Co., Ltd. | Backplane for flat panel display apparatus, flat panel display apparatus including the same, and method of manufacturing backplane for flat panel display apparatus |
US20130075833A1 (en) | 2011-09-22 | 2013-03-28 | Taiwan Semiconductor Manufacturing Company, Ltd. | Multi-layer scavenging metal gate stack for ultra-thin interfacial dielctric layer |
US20140001565A1 (en) | 2012-06-29 | 2014-01-02 | Industry-University Cooperation Foundation Hanyang University | Semiconductor device and method of manufacturing the same |
JP2017522613A (ja) | 2014-06-26 | 2017-08-10 | フレックステッラ・インコーポレイテッド | 光パターン化可能な組成物、パターン化高k薄膜誘電体及び関連デバイス |
Family Cites Families (43)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5412100Y2 (ja) | 1974-11-26 | 1979-05-29 | ||
JP3343620B2 (ja) * | 1992-04-09 | 2002-11-11 | アネルバ株式会社 | マグネトロンスパッタリングによる薄膜形成方法および装置 |
KR100400280B1 (ko) * | 1996-06-27 | 2003-12-24 | 주식회사 하이닉스반도체 | 반도체소자의금속배선형성방법 |
TW460597B (en) | 1997-03-27 | 2001-10-21 | Applied Materials Inc | A barrier layer structure for use in semiconductors and a method of producing an aluminum-comprising layer having a 111 crystal orientation |
JP4038485B2 (ja) * | 2003-03-12 | 2008-01-23 | 三星エスディアイ株式会社 | 薄膜トランジスタを備えた平板表示素子 |
KR100669688B1 (ko) | 2003-03-12 | 2007-01-18 | 삼성에스디아이 주식회사 | 박막트랜지스터 및 이를 구비한 평판표시소자 |
KR101054344B1 (ko) * | 2004-11-17 | 2011-08-04 | 삼성전자주식회사 | 박막 트랜지스터 표시판 및 그 제조 방법 |
KR101168728B1 (ko) * | 2005-07-15 | 2012-07-26 | 삼성전자주식회사 | 배선 구조와 배선 형성 방법 및 박막 트랜지스터 기판과 그제조 방법 |
KR101168729B1 (ko) * | 2005-08-16 | 2012-07-26 | 삼성전자주식회사 | 배선 구조와 배선 형성 방법 및 박막 트랜지스터 기판과 그제조 방법 |
KR100720142B1 (ko) * | 2005-11-25 | 2007-05-18 | 삼성전자주식회사 | 표시 장치와 표시장치의 제조방법 |
KR20080070327A (ko) * | 2007-01-26 | 2008-07-30 | 삼성전자주식회사 | 박막 트랜지스터, 이를 포함하는 유기 발광 표시 장치 및그 제조 방법 |
KR101458907B1 (ko) * | 2008-04-18 | 2014-11-10 | 삼성디스플레이 주식회사 | 유기 발광 소자 및 이를 포함하는 유기 발광 표시 장치 |
KR20100075195A (ko) * | 2008-12-24 | 2010-07-02 | 삼성전자주식회사 | 박막 트랜지스터 표시판 및 그 제조 방법 |
KR101597312B1 (ko) * | 2009-11-16 | 2016-02-25 | 삼성디스플레이 주식회사 | 박막 트랜지스터 표시판 및 그 제조 방법 |
KR20110124530A (ko) * | 2010-05-11 | 2011-11-17 | 삼성전자주식회사 | 산화물 반도체, 이를 포함하는 박막 트랜지스터 및 박막 트랜지스터 표시판 |
KR101776044B1 (ko) * | 2010-11-02 | 2017-09-20 | 엘지디스플레이 주식회사 | 유기전계 발광소자용 기판 및 그 제조 방법 |
KR20120077470A (ko) * | 2010-12-30 | 2012-07-10 | 삼성모바일디스플레이주식회사 | 유기 발광 표시 장치 및 그 제조 방법 |
JP5176217B2 (ja) | 2011-06-02 | 2013-04-03 | Nltテクノロジー株式会社 | アクティブマトリクス型液晶表示装置 |
KR20130126240A (ko) * | 2012-05-11 | 2013-11-20 | 삼성디스플레이 주식회사 | 박막 트랜지스터 표시판 |
KR101967600B1 (ko) * | 2012-11-09 | 2019-04-10 | 엘지디스플레이 주식회사 | 플렉서블 유기전계발광소자 및 그 제조방법 |
KR101994227B1 (ko) * | 2012-12-07 | 2019-09-30 | 엘지디스플레이 주식회사 | 유기전계 발광소자 및 그 제조방법 |
KR101986144B1 (ko) * | 2012-12-28 | 2019-06-05 | 에스케이하이닉스 주식회사 | 고유전층과 금속게이트를 갖는 반도체장치 및 그 제조 방법 |
KR102044971B1 (ko) * | 2013-02-12 | 2019-11-15 | 삼성디스플레이 주식회사 | 박막 트랜지스터 기판 및 이의 제조 방법 |
KR101656307B1 (ko) * | 2013-03-25 | 2016-09-12 | 삼성디스플레이 주식회사 | 표시장치 및 그 제조방법 |
KR20140143545A (ko) * | 2013-06-07 | 2014-12-17 | 삼성디스플레이 주식회사 | 발광소자, 이를 포함하는 유기발광 표시장치 및 그 제조방법 |
KR102276146B1 (ko) * | 2013-09-10 | 2021-07-13 | 삼성디스플레이 주식회사 | 박막 트랜지스터 기판 및 이의 제조 방법 |
KR102141557B1 (ko) * | 2013-12-26 | 2020-08-05 | 엘지디스플레이 주식회사 | 어레이 기판 |
EP2966705B1 (en) * | 2014-07-11 | 2018-09-19 | LG Display Co., Ltd. | Organic light-emitting diode display device and method of fabricating the same |
KR102247015B1 (ko) | 2014-10-14 | 2021-05-03 | 삼성전자주식회사 | 캐패시터를 포함하는 반도체 장치 및 그의 제조 방법 |
KR102304991B1 (ko) * | 2015-04-21 | 2021-09-28 | 삼성디스플레이 주식회사 | 박막트랜지스터 어레이 기판 및 그의 제조방법, 박막트랜지스터 어레이 기판을 구비한 표시장치 |
US10032880B2 (en) * | 2016-10-10 | 2018-07-24 | Semiconductor Components Industries, Llc | Method for forming ohmic contacts |
KR20180061850A (ko) * | 2016-11-30 | 2018-06-08 | 엘지디스플레이 주식회사 | 유기발광 표시장치와 그의 제조방법 |
KR102611794B1 (ko) * | 2016-11-30 | 2023-12-07 | 엘지디스플레이 주식회사 | 유기발광 표시장치와 그의 제조방법 |
KR102656795B1 (ko) * | 2016-11-30 | 2024-04-11 | 엘지디스플레이 주식회사 | 유기발광 표시장치와 그의 제조방법 |
KR20180064704A (ko) * | 2016-12-06 | 2018-06-15 | 엘지디스플레이 주식회사 | 유기발광 표시장치 |
CN108183120B (zh) * | 2016-12-08 | 2022-04-26 | 乐金显示有限公司 | 显示装置及其制造方法 |
KR20180078669A (ko) * | 2016-12-30 | 2018-07-10 | 엘지디스플레이 주식회사 | 터치 스크린 일체형 표시장치와 그의 제조방법 |
KR102281226B1 (ko) * | 2017-07-18 | 2021-07-22 | 엘지디스플레이 주식회사 | 표시장치 |
KR102413716B1 (ko) * | 2017-09-25 | 2022-06-28 | 삼성디스플레이 주식회사 | 표시패널 |
KR20190043194A (ko) * | 2017-10-17 | 2019-04-26 | 삼성디스플레이 주식회사 | 금속 배선 및 이를 포함하는 박막 트랜지스터 |
US10283565B1 (en) * | 2017-12-21 | 2019-05-07 | International Business Machines Corporation | Resistive memory with a plurality of resistive random access memory cells each comprising a transistor and a resistive element |
KR20190083027A (ko) * | 2018-01-02 | 2019-07-11 | 삼성디스플레이 주식회사 | 표시패널 및 그 제조방법 |
KR20200072890A (ko) * | 2018-12-13 | 2020-06-23 | 엘지디스플레이 주식회사 | 플렉서블 유기발광표시장치 |
-
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Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009200355A (ja) | 2008-02-22 | 2009-09-03 | Sharp Corp | Tft基板、tft基板の製造方法、及び液晶表示装置 |
US20130001577A1 (en) | 2011-06-29 | 2013-01-03 | Samsung Mobile Display Co., Ltd. | Backplane for flat panel display apparatus, flat panel display apparatus including the same, and method of manufacturing backplane for flat panel display apparatus |
US20130075833A1 (en) | 2011-09-22 | 2013-03-28 | Taiwan Semiconductor Manufacturing Company, Ltd. | Multi-layer scavenging metal gate stack for ultra-thin interfacial dielctric layer |
US20140001565A1 (en) | 2012-06-29 | 2014-01-02 | Industry-University Cooperation Foundation Hanyang University | Semiconductor device and method of manufacturing the same |
JP2017522613A (ja) | 2014-06-26 | 2017-08-10 | フレックステッラ・インコーポレイテッド | 光パターン化可能な組成物、パターン化高k薄膜誘電体及び関連デバイス |
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US11793044B2 (en) | 2023-10-17 |
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