JP7279858B2 - 搬送装置、搬送方法および搬送システム - Google Patents

搬送装置、搬送方法および搬送システム Download PDF

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Publication number
JP7279858B2
JP7279858B2 JP2022524820A JP2022524820A JP7279858B2 JP 7279858 B2 JP7279858 B2 JP 7279858B2 JP 2022524820 A JP2022524820 A JP 2022524820A JP 2022524820 A JP2022524820 A JP 2022524820A JP 7279858 B2 JP7279858 B2 JP 7279858B2
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JP
Japan
Prior art keywords
robot
substrate
transfer
side wall
chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2022524820A
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English (en)
Japanese (ja)
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JPWO2021234928A1 (https=
JPWO2021234928A5 (https=
Inventor
剛 山口
裕光 赤江
健輔 大仁
修 小宮路
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Yaskawa Electric Corp
Original Assignee
Yaskawa Electric Corp
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Filing date
Publication date
Application filed by Yaskawa Electric Corp filed Critical Yaskawa Electric Corp
Publication of JPWO2021234928A1 publication Critical patent/JPWO2021234928A1/ja
Publication of JPWO2021234928A5 publication Critical patent/JPWO2021234928A5/ja
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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B25HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25JMANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
    • B25J9/00Program-controlled manipulators
    • B25J9/0084Program-controlled manipulators comprising a plurality of manipulators
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B25HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25JMANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
    • B25J15/00Gripping heads and other end effectors
    • B25J15/0095Gripping heads and other end effectors with an external support, i.e. a support which does not belong to the manipulator or the object to be gripped, e.g. for maintaining the gripping head in an accurate position, guiding it or preventing vibrations
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04Apparatus for manufacture or treatment
    • H10P72/0451Apparatus for manufacturing or treating in a plurality of work-stations
    • H10P72/0464Apparatus for manufacturing or treating in a plurality of work-stations characterised by the construction of the transfer chamber
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B25HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25JMANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
    • B25J11/00Manipulators not otherwise provided for
    • B25J11/0095Manipulators transporting wafers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B25HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25JMANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
    • B25J15/00Gripping heads and other end effectors
    • B25J15/0052Gripping heads and other end effectors multiple gripper units or multiple end effectors
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B25HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25JMANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
    • B25J15/00Gripping heads and other end effectors
    • B25J15/04Gripping heads and other end effectors with provision for the remote detachment or exchange of the head or parts thereof
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B25HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25JMANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
    • B25J21/00Chambers provided with manipulation devices
    • B25J21/005Clean rooms
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B25HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25JMANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
    • B25J9/00Program-controlled manipulators
    • B25J9/003Program-controlled manipulators having parallel kinematics
    • B25J9/0045Program-controlled manipulators having parallel kinematics with kinematics chains having a rotary joint at the base
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B25HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25JMANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
    • B25J9/00Program-controlled manipulators
    • B25J9/0093Program-controlled manipulators co-operating with conveyor means
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B25HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25JMANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
    • B25J9/00Program-controlled manipulators
    • B25J9/02Program-controlled manipulators characterised by movement of the arms, e.g. cartesian coordinate type
    • B25J9/04Program-controlled manipulators characterised by movement of the arms, e.g. cartesian coordinate type by rotating at least one arm, excluding the head movement itself, e.g. cylindrical coordinate type or polar coordinate type
    • B25J9/041Cylindrical coordinate type
    • B25J9/042Cylindrical coordinate type comprising an articulated arm
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B25HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25JMANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
    • B25J9/00Program-controlled manipulators
    • B25J9/16Program controls
    • B25J9/1679Program controls characterised by the tasks executed
    • B25J9/1682Dual arm manipulator; Coordination of several manipulators
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/30Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/30Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
    • H10P72/33Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations into and out of processing chamber
    • H10P72/3302Mechanical parts of transfer devices
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/30Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
    • H10P72/33Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations into and out of processing chamber
    • H10P72/3306Horizontal transfer of a single workpiece
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/76Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches
    • H10P72/7602Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a robot blade or gripped by a gripper for conveyance

Landscapes

  • Engineering & Computer Science (AREA)
  • Robotics (AREA)
  • Mechanical Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP2022524820A 2020-05-21 2020-05-21 搬送装置、搬送方法および搬送システム Active JP7279858B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2020/020197 WO2021234928A1 (ja) 2020-05-21 2020-05-21 搬送装置、搬送方法および搬送システム

Publications (3)

Publication Number Publication Date
JPWO2021234928A1 JPWO2021234928A1 (https=) 2021-11-25
JPWO2021234928A5 JPWO2021234928A5 (https=) 2022-07-21
JP7279858B2 true JP7279858B2 (ja) 2023-05-23

Family

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Family Applications (1)

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JP2022524820A Active JP7279858B2 (ja) 2020-05-21 2020-05-21 搬送装置、搬送方法および搬送システム

Country Status (5)

Country Link
US (1) US11701785B2 (https=)
JP (1) JP7279858B2 (https=)
KR (1) KR102672414B1 (https=)
CN (1) CN113966548B (https=)
WO (1) WO2021234928A1 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12163228B2 (en) * 2021-05-18 2024-12-10 Mellanox Technologies, Ltd. CVD system with substrate carrier and associated mechanisms for moving substrate therethrough
JP7771651B2 (ja) * 2021-11-12 2025-11-18 東京エレクトロン株式会社 基板搬送装置及び基板搬送方法
JP2025038375A (ja) * 2023-09-07 2025-03-19 株式会社安川電機 ロボット、システム、制御方法、及びプログラム
KR20260001720A (ko) * 2024-06-28 2026-01-06 주식회사 원익아이피에스 버퍼모듈 및 이를 포함하는 기판처리시스템

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003197709A (ja) 2001-12-25 2003-07-11 Tokyo Electron Ltd 被処理体の搬送機構及び処理システム
JP2003282669A (ja) 2002-03-26 2003-10-03 Hitachi High-Technologies Corp 基板の搬送方法及びその装置
JP2008510317A (ja) 2004-08-17 2008-04-03 マットソン テクノロジイ インコーポレイテッド 高度な低コスト・高スループット処理プラットフォーム
JP2014068009A (ja) 2012-09-12 2014-04-17 Lam Research Corporation 半導体処理装置に関する方法およびシステム
JP2014216519A (ja) 2013-04-26 2014-11-17 株式会社ディスコ 加工装置及びウエーハの輸送方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7067018B2 (en) * 1997-05-05 2006-06-27 Semitool, Inc. Automated system for handling and processing wafers within a carrier
AU2001268656A1 (en) * 2000-07-07 2002-01-21 Semitool, Inc. Automated processing system
US8668422B2 (en) * 2004-08-17 2014-03-11 Mattson Technology, Inc. Low cost high throughput processing platform
JP4660434B2 (ja) * 2006-07-21 2011-03-30 株式会社安川電機 搬送機構およびそれを備えた処理装置
US20090022574A1 (en) * 2007-07-16 2009-01-22 Eudy Steve L Workpiece loading system
US9443749B2 (en) * 2011-01-20 2016-09-13 Tokyo Electron Limited Vacuum processing apparatus
KR101736855B1 (ko) * 2015-05-29 2017-05-18 세메스 주식회사 기판 처리 설비
JP7246147B2 (ja) * 2017-09-29 2023-03-27 芝浦メカトロニクス株式会社 基板処理装置及び基板処理方法
JP2020027936A (ja) * 2018-08-09 2020-02-20 株式会社安川電機 搬送システムおよび搬送方法
JP6985531B1 (ja) * 2020-02-05 2021-12-22 株式会社安川電機 搬送システム、搬送方法および搬送装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003197709A (ja) 2001-12-25 2003-07-11 Tokyo Electron Ltd 被処理体の搬送機構及び処理システム
JP2003282669A (ja) 2002-03-26 2003-10-03 Hitachi High-Technologies Corp 基板の搬送方法及びその装置
JP2008510317A (ja) 2004-08-17 2008-04-03 マットソン テクノロジイ インコーポレイテッド 高度な低コスト・高スループット処理プラットフォーム
JP2014068009A (ja) 2012-09-12 2014-04-17 Lam Research Corporation 半導体処理装置に関する方法およびシステム
JP2014216519A (ja) 2013-04-26 2014-11-17 株式会社ディスコ 加工装置及びウエーハの輸送方法

Also Published As

Publication number Publication date
CN113966548A (zh) 2022-01-21
WO2021234928A1 (ja) 2021-11-25
KR102672414B1 (ko) 2024-06-04
JPWO2021234928A1 (https=) 2021-11-25
US20220111539A1 (en) 2022-04-14
CN113966548B (zh) 2025-04-11
KR20220007145A (ko) 2022-01-18
US11701785B2 (en) 2023-07-18

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