JP7266068B2 - 横方向ハードマスク凹部縮小のためのハイブリッドカーボンハードマスク - Google Patents
横方向ハードマスク凹部縮小のためのハイブリッドカーボンハードマスク Download PDFInfo
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- JP7266068B2 JP7266068B2 JP2021108321A JP2021108321A JP7266068B2 JP 7266068 B2 JP7266068 B2 JP 7266068B2 JP 2021108321 A JP2021108321 A JP 2021108321A JP 2021108321 A JP2021108321 A JP 2021108321A JP 7266068 B2 JP7266068 B2 JP 7266068B2
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- hardmask
- boron
- silicon
- depositing
- hard mask
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- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 title claims description 14
- 229910052799 carbon Inorganic materials 0.000 title claims description 14
- 239000000463 material Substances 0.000 claims description 105
- 238000000034 method Methods 0.000 claims description 82
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 34
- 229910052796 boron Inorganic materials 0.000 claims description 34
- 239000000758 substrate Substances 0.000 claims description 32
- 238000005530 etching Methods 0.000 claims description 26
- 238000000151 deposition Methods 0.000 claims description 21
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 18
- 239000002243 precursor Substances 0.000 claims description 15
- 150000004767 nitrides Chemical class 0.000 claims description 14
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 11
- 229910052710 silicon Inorganic materials 0.000 claims description 11
- 239000010703 silicon Substances 0.000 claims description 11
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 10
- 229910052757 nitrogen Inorganic materials 0.000 claims description 9
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 8
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 8
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 6
- 238000003672 processing method Methods 0.000 claims description 4
- 239000003989 dielectric material Substances 0.000 claims description 3
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 claims description 3
- RJTANRZEWTUVMA-UHFFFAOYSA-N boron;n-methylmethanamine Chemical compound [B].CNC RJTANRZEWTUVMA-UHFFFAOYSA-N 0.000 claims description 2
- 239000000377 silicon dioxide Substances 0.000 claims description 2
- 235000012239 silicon dioxide Nutrition 0.000 claims description 2
- 238000002230 thermal chemical vapour deposition Methods 0.000 claims description 2
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 claims 1
- 238000000059 patterning Methods 0.000 description 12
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 6
- 229920002120 photoresistant polymer Polymers 0.000 description 5
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 4
- 229910052731 fluorine Inorganic materials 0.000 description 4
- 239000011737 fluorine Substances 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 4
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000003575 carbonaceous material Substances 0.000 description 3
- 239000012159 carrier gas Substances 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- XPDWGBQVDMORPB-UHFFFAOYSA-N Fluoroform Chemical compound FC(F)F XPDWGBQVDMORPB-UHFFFAOYSA-N 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- 229910003481 amorphous carbon Inorganic materials 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- 229910002601 GaN Inorganic materials 0.000 description 1
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- 239000002194 amorphous carbon material Substances 0.000 description 1
- 239000006117 anti-reflective coating Substances 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910000085 borane Inorganic materials 0.000 description 1
- 239000001273 butane Substances 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- RWRIWBAIICGTTQ-UHFFFAOYSA-N difluoromethane Chemical compound FCF RWRIWBAIICGTTQ-UHFFFAOYSA-N 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- 238000001900 extreme ultraviolet lithography Methods 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 238000000671 immersion lithography Methods 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 238000009616 inductively coupled plasma Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 1
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- MWWATHDPGQKSAR-UHFFFAOYSA-N propyne Chemical compound CC#C MWWATHDPGQKSAR-UHFFFAOYSA-N 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 239000002210 silicon-based material Substances 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 1
- 238000002207 thermal evaporation Methods 0.000 description 1
- 230000036962 time dependent Effects 0.000 description 1
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- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
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- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
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- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3205—Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
- H01L21/321—After treatment
- H01L21/3213—Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer
- H01L21/32139—Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer using masks
-
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L28/00—Passive two-terminal components without a potential-jump or surface barrier for integrated circuits; Details thereof; Multistep manufacturing processes therefor
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B43/00—EEPROM devices comprising charge-trapping gate insulators
- H10B43/20—EEPROM devices comprising charge-trapping gate insulators characterised by three-dimensional arrangements, e.g. with cells on different height levels
- H10B43/23—EEPROM devices comprising charge-trapping gate insulators characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels
- H10B43/27—EEPROM devices comprising charge-trapping gate insulators characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
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- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
- H01L21/02115—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material being carbon, e.g. alpha-C, diamond or hydrogen doped carbon
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- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
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Description
[0002] 集積回路は、単一チップ上に数百万個ものトランジスタ、コンデンサ、及び抵抗器が搭載されうる複雑なデバイスへと進化を遂げている。チップ設計の進化には、より高速な回路及びより高い回路密度が継続的に必要とされる。より高い回路密度を有するより高速な回路に対する要求は、このような集積回路の製造に使用される材料についても同様の要求を課している。特に、集積回路構成要素の寸法がサブミクロン単位まで小さくなるにつれ、このような構成要素に対して適切な電気的性能を得るためには、低抵抗率導電性材料並びに低誘電率絶縁材料を使用することが必要となることが多い。
Claims (19)
- 基板上に配置された一又は複数の材料層の上に堆積された第1のハードマスク及び第2のハードマスクをエッチングすることと、
エッチングされた前記第1のハードマスク、エッチングされた前記第2のハードマスク、及び前記一又は複数の材料層の上に、ホウ素がドープされた炭素質ハードマスクを共形に堆積することであって、前記ホウ素がドープされた炭素質ハードマスクは約25重量%を超えるホウ素と約50重量%を超える炭素を含む、炭素質ハードマスクを共形に堆積することと、
前記ホウ素がドープされた炭素質ハードマスクの中の開口を通して前記一又は複数の材料層をエッチングすることと、
を含む基板処理方法。 - 前記一又は複数の材料層は、窒化ケイ素材料及び酸化ケイ素材料を含む、請求項1に記載の方法。
- 前記窒化ケイ素材料及び前記酸化ケイ素材料は、積み重ねられた層を形成するため、交互の層に堆積される、請求項2に記載の方法。
- 前記積み重ねられた層は、約48を超える材料層を有する、請求項3に記載の方法。
- 前記第1のハードマスクは、炭素含有材料であり、前記一又は複数の材料層の上に接触して堆積される、請求項1に記載の方法。
- 前記第1のハードマスクは、約1μmから約2μmまでの厚さに堆積される、請求項5に記載の方法。
- 前記第2のハードマスクは、誘電体材料であり、前記第1のハードマスクの上に接触して堆積される、請求項5に記載の方法。
- 前記誘電体材料は、ケイ素含有材料である、請求項7に記載の方法。
- 前記ケイ素含有材料は、二酸化ケイ素材料、窒化ケイ素材料、酸窒化ケイ素材料、或いはこれらの組み合わせである、請求項8に記載の方法。
- 前記第2のハードマスクは、約50μmから200μmまでの厚さに堆積される、請求項7に記載の方法。
- 前記第1のハードマスク及び前記第2のハードマスクをエッチングするために第1のエッチング処理を行うことは、フッ化炭素前駆体を用いたプラズマエッチング処理である、請求項7に記載の方法。
- 前記ホウ素がドープされた炭素質ハードマスクは、約5nmから約15nmまでの厚さを有する、請求項7に記載の方法。
- 前記ホウ素がドープされた炭素質ハードマスクは、窒素をふくむ炭窒化ホウ素材料である、請求項1に記載の方法。
- 前記炭窒化ホウ素材料の少なくとも約80原子%は、ホウ素、炭素及び窒素から形成される、請求項13に記載の方法。
- 前記炭窒化ホウ素材料は、前駆体としてジメチルアミンボランを用いた熱CVD処理によって堆積される、請求項14に記載の方法。
- 基板上に第1のハードマスクを堆積することと、
前記第1のハードマスク上に第2のハードマスクを堆積することと、
前記第1のハードマスク及び前記第2のハードマスクをエッチングするために第1のエッチング処理を行うことと、
前記第1のハードマスク及び前記第2のハードマスクの上に、約25重量%を超えるホウ素と約50重量%を超える炭素を含む炭窒化ホウ素ハードマスクを堆積することと、
前記炭窒化ホウ素ハードマスクの中の開口を通して前記基板をエッチングすることと、
を含む、基板処理方法。 - 前記炭窒化ホウ素ハードマスクは、前記第1のハードマスク及び前記第2のハードマスクの上に共形に堆積される、請求項16に記載の方法。
- 基板上に配置された一又は複数の酸化物及び窒化物含有材料層の上に炭素質ハードマスクを堆積することと、
前記炭素質ハードマスク上にケイ素含有誘電体ハードマスクを堆積することと、
前記一又は複数の酸化物及び窒化物含有材料層、前記炭素質ハードマスク、及び前記ケイ素含有誘電体ハードマスクの上に、炭窒化ホウ素ハードマスクを堆積することであって、約25重量%を超えるホウ素と約50重量%を超える炭素を含む前記炭窒化ホウ素ハードマスクを堆積することと、
前記炭窒化ホウ素ハードマスクの中の開口を通して前記一又は複数の酸化物及び窒化物含有材料層をエッチングすることと、
を含む、基板処理方法。 - 前記炭窒化ホウ素ハードマスクの少なくとも約80原子%は、ホウ素、炭素及び窒素から形成されている、請求項18に記載の方法。
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KR20180097763A (ko) | 2018-08-31 |
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CN108475640A (zh) | 2018-08-31 |
JP6907217B2 (ja) | 2021-07-21 |
CN116631865A (zh) | 2023-08-22 |
JP2019503082A (ja) | 2019-01-31 |
US10410864B2 (en) | 2019-09-10 |
CN108475640B (zh) | 2023-06-06 |
US9991118B2 (en) | 2018-06-05 |
US20180277370A1 (en) | 2018-09-27 |
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