JP7211664B2 - 耐食性セラミックス - Google Patents
耐食性セラミックス Download PDFInfo
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- JP7211664B2 JP7211664B2 JP2021512180A JP2021512180A JP7211664B2 JP 7211664 B2 JP7211664 B2 JP 7211664B2 JP 2021512180 A JP2021512180 A JP 2021512180A JP 2021512180 A JP2021512180 A JP 2021512180A JP 7211664 B2 JP7211664 B2 JP 7211664B2
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- C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
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- C04B2235/78—Grain sizes and shapes, product microstructures, e.g. acicular grains, equiaxed grains, platelet-structures
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- C04B2235/9669—Resistance against chemicals, e.g. against molten glass or molten salts
- C04B2235/9676—Resistance against chemicals, e.g. against molten glass or molten salts against molten metals such as steel or aluminium
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
- H05H1/2441—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes characterised by the physical-chemical properties of the dielectric, e.g. porous dielectric
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Materials Engineering (AREA)
- Structural Engineering (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Composite Materials (AREA)
- Drying Of Semiconductors (AREA)
Description
2 下部容器
3 処理チャンバー
4 支持テーブル
5 静電チャック
6 半導体基板
7 ガスノズル
8 誘導コイル
9 真空ポンプ
10 プラズマ処理装置
Claims (10)
- イットリウムジルコニウム酸化物を主成分として、複数の開気孔を有する耐食性セラミックスであって、
前記開気孔の重心間距離の平均値と前記開気孔の直径の平均値との差が50μm以上であり、
形状が円筒体であって、該円筒体の内周面を含む断面において、前記内周面上における珪素の濃度が、前記内周面と外周面との間に位置し、前記内周面と平行な仮想周面上における珪素の濃度よりも高い、
耐食性セラミックス。 - 前記開気孔の重心間距離の尖度が0以上である、請求項1に記載の耐食性セラミックス。
- 前記開気孔の直径の平均値が2.5μm以下である、請求項1または2に記載の耐食性セラミックス。
- 前記開気孔の直径の尖度が0以上である、請求項1~3のいずれかに記載の耐食性セラミックス。
- 前記開気孔の直径の変動係数が0.7以下である、請求項1~4のいずれかに記載の耐食性セラミックス。
- 前記開気孔の面積率が0.1%以下である、請求項1~5のいずれかに記載の耐食性セラミックス。
- 結晶粒子の平均粒径が0.2μm以上0.5μm以下である、請求項1~6のいずれかに記載の耐食性セラミックス。
- ニッケルを含み、ニッケルの含有量がNiO換算で4質量ppm以下である、請求項1~7のいずれかに記載の耐食性セラミックス。
- 請求項1~8のいずれかに記載の耐食性セラミックスを含有する、プラズマ処理装置用部材。
- 請求項9に記載のプラズマ処理装置用部材とプラズマ発生装置とを備えた、プラズマ処理装置。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019070698 | 2019-04-02 | ||
JP2019070698 | 2019-04-02 | ||
PCT/JP2020/015066 WO2020204085A1 (ja) | 2019-04-02 | 2020-04-01 | 耐食性セラミックス |
Publications (2)
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JPWO2020204085A1 JPWO2020204085A1 (ja) | 2020-10-08 |
JP7211664B2 true JP7211664B2 (ja) | 2023-01-24 |
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JP2021512180A Active JP7211664B2 (ja) | 2019-04-02 | 2020-04-01 | 耐食性セラミックス |
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US (1) | US20220185740A1 (ja) |
JP (1) | JP7211664B2 (ja) |
WO (1) | WO2020204085A1 (ja) |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000001362A (ja) | 1998-06-10 | 2000-01-07 | Nippon Seratekku:Kk | 耐食性セラミックス材料 |
JP2003048792A (ja) | 2001-08-02 | 2003-02-21 | Toshiba Ceramics Co Ltd | 半導体製造装置用耐プラズマ部材とその製造方法 |
JP2008174398A (ja) | 2007-01-16 | 2008-07-31 | Covalent Materials Corp | イットリアセラミックス焼成体 |
JP2010095393A (ja) | 2008-10-14 | 2010-04-30 | Nikkato:Kk | 耐食性に優れたセラミックス製熱処理用部材およびその製造方法 |
JP2013067526A (ja) | 2011-09-21 | 2013-04-18 | Tosoh Corp | 耐プラズマ部材およびその製造方法 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08117248A (ja) * | 1994-10-26 | 1996-05-14 | Hoya Corp | 歯列矯正用ブラケットおよびその製造方法 |
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2020
- 2020-04-01 WO PCT/JP2020/015066 patent/WO2020204085A1/ja active Application Filing
- 2020-04-01 US US17/600,849 patent/US20220185740A1/en active Pending
- 2020-04-01 JP JP2021512180A patent/JP7211664B2/ja active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000001362A (ja) | 1998-06-10 | 2000-01-07 | Nippon Seratekku:Kk | 耐食性セラミックス材料 |
JP2003048792A (ja) | 2001-08-02 | 2003-02-21 | Toshiba Ceramics Co Ltd | 半導体製造装置用耐プラズマ部材とその製造方法 |
JP2008174398A (ja) | 2007-01-16 | 2008-07-31 | Covalent Materials Corp | イットリアセラミックス焼成体 |
JP2010095393A (ja) | 2008-10-14 | 2010-04-30 | Nikkato:Kk | 耐食性に優れたセラミックス製熱処理用部材およびその製造方法 |
JP2013067526A (ja) | 2011-09-21 | 2013-04-18 | Tosoh Corp | 耐プラズマ部材およびその製造方法 |
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Publication number | Publication date |
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JPWO2020204085A1 (ja) | 2020-10-08 |
US20220185740A1 (en) | 2022-06-16 |
WO2020204085A1 (ja) | 2020-10-08 |
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