JP7200941B2 - 有機光ダイオードおよびこれを含む有機イメージセンサ - Google Patents
有機光ダイオードおよびこれを含む有機イメージセンサ Download PDFInfo
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- JP7200941B2 JP7200941B2 JP2019537215A JP2019537215A JP7200941B2 JP 7200941 B2 JP7200941 B2 JP 7200941B2 JP 2019537215 A JP2019537215 A JP 2019537215A JP 2019537215 A JP2019537215 A JP 2019537215A JP 7200941 B2 JP7200941 B2 JP 7200941B2
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- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- GNTDGMZSJNCJKK-UHFFFAOYSA-N divanadium pentaoxide Chemical compound O=[V](=O)O[V](=O)=O GNTDGMZSJNCJKK-UHFFFAOYSA-N 0.000 description 1
- 239000003480 eluent Substances 0.000 description 1
- 125000004185 ester group Chemical group 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 238000003818 flash chromatography Methods 0.000 description 1
- UIWYJDYFSGRHKR-UHFFFAOYSA-N gadolinium atom Chemical compound [Gd] UIWYJDYFSGRHKR-UHFFFAOYSA-N 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 238000007646 gravure printing Methods 0.000 description 1
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 239000005457 ice water Substances 0.000 description 1
- 125000002883 imidazolyl group Chemical group 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 125000001041 indolyl group Chemical group 0.000 description 1
- 238000007641 inkjet printing Methods 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000004491 isohexyl group Chemical group C(CCC(C)C)* 0.000 description 1
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 125000000842 isoxazolyl group Chemical group 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000011133 lead Substances 0.000 description 1
- 125000005647 linker group Chemical group 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 1
- 235000019341 magnesium sulphate Nutrition 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000003136 n-heptyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 125000002560 nitrile group Chemical group 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 125000001715 oxadiazolyl group Chemical group 0.000 description 1
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
- 229960003540 oxyquinoline Drugs 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 125000003538 pentan-3-yl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 1
- 125000005561 phenanthryl group Chemical group 0.000 description 1
- 125000001484 phenothiazinyl group Chemical group C1(=CC=CC=2SC3=CC=CC=C3NC12)* 0.000 description 1
- RLOWWWKZYUNIDI-UHFFFAOYSA-N phosphinic chloride Chemical compound ClP=O RLOWWWKZYUNIDI-UHFFFAOYSA-N 0.000 description 1
- 125000004592 phthalazinyl group Chemical group C1(=NN=CC2=CC=CC=C12)* 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920000172 poly(styrenesulfonic acid) Polymers 0.000 description 1
- 229920000767 polyaniline Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920000128 polypyrrole Polymers 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000003373 pyrazinyl group Chemical group 0.000 description 1
- 125000001725 pyrenyl group Chemical group 0.000 description 1
- 125000002098 pyridazinyl group Chemical group 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 125000004076 pyridyl group Chemical group 0.000 description 1
- 125000000714 pyrimidinyl group Chemical group 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 125000002294 quinazolinyl group Chemical group N1=C(N=CC2=CC=CC=C12)* 0.000 description 1
- MCJGNVYPOGVAJF-UHFFFAOYSA-N quinolin-8-ol Chemical compound C1=CN=C2C(O)=CC=CC2=C1 MCJGNVYPOGVAJF-UHFFFAOYSA-N 0.000 description 1
- 125000002943 quinolinyl group Chemical group N1=C(C=CC2=CC=CC=C12)* 0.000 description 1
- 125000001567 quinoxalinyl group Chemical group N1=C(C=NC2=CC=CC=C12)* 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 125000003548 sec-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 238000010301 surface-oxidation reaction Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000001973 tert-pentyl group Chemical group [H]C([H])([H])C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 238000002207 thermal evaporation Methods 0.000 description 1
- 125000001113 thiadiazolyl group Chemical group 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 125000004306 triazinyl group Chemical group 0.000 description 1
- 125000001425 triazolyl group Chemical group 0.000 description 1
- 229910001930 tungsten oxide Inorganic materials 0.000 description 1
- 238000004506 ultrasonic cleaning Methods 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 description 1
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Description
前記第1電極に対向して備えられる第2電極と、
前記第1電極と前記第2電極との間に備えられる1層以上の有機物層とを含み、
前記有機物層のうちの1層以上は、下記化学式1の化合物を含むものである有機光ダイオードを提供する。
[化学式1]
RaおよびRbは、互いに同一または異なり、それぞれ独立に、電子受容体として作用する基であり、
Y1~Y5は、互いに同一または異なり、それぞれ独立に、CRR'、NR、O、SiRR'、PR、S、GeRR'、Se、またはTeであり、
Y6およびY7は、互いに異なり、それぞれ独立に、直接結合、CRR'、NR、O、SiRR'、PR、S、GeRR'、Se、またはTeであり、
aは、0または1であり、
aが0の場合、Y6は、直接結合であり、Y7は、CRR'、NR、O、SiRR'、PR、S、GeRR'、Se、またはTeであり、
aが1の場合、Y7は、直接結合であり、Y6は、CRR'、NR、O、SiRR'、PR、S、GeRR'、Se、またはTeであり、
nおよびmは、それぞれ0~5の整数であり、
nおよびmが2以上の場合、括弧内の構造は、互いに同一または異なり、
R11~R14は、互いに同一または異なり、それぞれ独立に、炭素数1~4のアルキル基であり、
R1、R2、RおよびR'は、互いに同一または異なり、それぞれ独立に、水素;重水素;置換もしくは非置換のアルキル基;置換もしくは非置換のシクロアルキル基;置換もしくは非置換のアリール基;または置換もしくは非置換のヘテロ環基である。
[化学式2]
Y6およびY7は、互いに同一または異なり、それぞれ独立に、CRR'、NR、O、SiRR'、PR、S、GeRR'、Se、またはTeであり、
Ra、Rb、Y1~Y5、R1、R2、R11~R14、n、m、RおよびR'は、化学式1で定義した通りである。
[化学式1-1]
Y6は、CRR'、NR、O、SiRR'、PR、S、GeRR'、Se、またはTeであり、
Ra、Rb、Y1~Y5、R1、R2、R11~R14、RおよびR'は、化学式1で定義した通りである。
c、dおよびeは、それぞれ1~4の整数であり、
c、dおよびeがそれぞれ2以上の場合、2以上の括弧内の構造は、互いに同一または異なり、
R20~R25は、互いに同一または異なり、それぞれ独立に、水素;重水素;ハロゲン基;置換もしくは非置換のアルキル基;置換もしくは非置換のシクロアルキル基;置換もしくは非置換のアリール基;または置換もしくは非置換のヘテロ環基である。
[化学式1-11]
Y6およびY7は、互いに同一または異なり、それぞれ独立に、CRR'、NR、O、SiRR'、PR、S、GeRR'、Se、またはTeであり、
Y1、R11~R14、RおよびR'は、化学式1で定義した通りである。
(1)化合物A-2の製造
図2は、化合物A-2のMSスペクトルを示す図である。
図3は、化合物1のMALDI-TOF測定結果を示す図である。
ガラス基板上にITOをスパッタリングで積層して約100nmの厚さの第1電極(アノード)を形成し、その上に、正孔輸送層としてモリブデン酸化物(MoOx、0<x≦3)薄膜を30nmの厚さに積層した。次に、モリブデン酸化物(MoOx、0<x≦3)薄膜上に、前記製造例の化合物(p型有機物層)とC60(n型有機物層)とを3:4の厚さ比で蒸着して80nmの厚さの光活性層を形成した。次に、光活性層上に、BCP(bathocuproine)を8nmの厚さに熱蒸着して電子輸送層を形成した。最後に、アルミニウム(Al)を熱蒸着で80nmの厚さの第2電極(カソード)を形成して、有機光電素子を作製した。
前記化合物A-2で有機光電素子の作製を試みたが、化合物A-2は粘度がある状態でフィルムの形成が不可能であることによって、有機光電素子の作製が不可能であった。
前記化学式1において、R11~R14が炭素数5以上の化合物を合成した後、有機光電素子の作製を試みたが、蒸着工程が不可能であった。
20:第2電極
30:光活性層
100:有機光ダイオード
Claims (11)
- 第1電極と、
前記第1電極に対向して備えられる第2電極と、
前記第1電極と前記第2電極との間に備えられる1層以上の有機物層とを含み、
前記有機物層のうちの1層以上は、400nm~850nmにおける最大吸収波長を有する下記化学式1の化合物を含むものである有機光ダイオード:
[化学式1]
RaおよびRbは、互いに同一または異なり、それぞれ独立に、電子受容体として作用する基であり、
Y1~Y5は、互いに同一または異なり、それぞれ独立に、CRR'、NR、O、SiRR'、PR、S、GeRR'、Se、またはTeであり、
aは、1であり、
Y7は、直接結合であり、Y6は、CRR'、NR、O、SiRR'、PR、S、GeRR'、Se、またはTeであり、
nおよびmは、それぞれ0~5の整数であり、
nおよびmが2以上の場合、括弧内の構造は、互いに同一または異なり、
R11~R14は、互いに同一または異なり、それぞれ独立に、炭素数1~4のアルキル基であり、
R1、R2、RおよびR'は、互いに同一または異なり、それぞれ独立に、水素;重水素;置換もしくは非置換のアルキル基;置換もしくは非置換のシクロアルキル基;置換もしくは非置換のアリール基;または置換もしくは非置換のヘテロ環基である。 - 第1電極と、
前記第1電極に対向して備えられる第2電極と、
前記第1電極と前記第2電極との間に備えられる1層以上の有機物層とを含み、
前記有機物層のうちの1層以上は、400nm~850nmにおける最大吸収波長を有する下記化学式1-1または化学式1-2の化合物を含むものである有機光ダイオード:
[化学式1-1]
Y6は、CRR'、NR、O、SiRR'、PR、S、GeRR'、Se、またはTeであり、
RaおよびRbは、互いに同一または異なり、それぞれ独立に、電子受容体として作用する基であり、
Y1~Y5は、互いに同一または異なり、それぞれ独立に、CRR'、NR、O、SiRR'、PR、S、GeRR'、Se、またはTeであり、
R11~R14は、互いに同一または異なり、それぞれ独立に、炭素数1~4のアルキル基であり、
R1、R2、RおよびR'は、互いに同一または異なり、それぞれ独立に、水素;重水素;置換もしくは非置換のアルキル基;置換もしくは非置換のシクロアルキル基;置換もしくは非置換のアリール基;または置換もしくは非置換のヘテロ環基である。 - 第1電極と、
前記第1電極に対向して備えられる第2電極と、
前記第1電極と前記第2電極との間に備えられる1層以上の有機物層とを含み、
前記有機物層のうちの1層以上は、400nm~850nmにおける最大吸収波長を有する下記化学式1の化合物を含むものである有機光ダイオード:
[化学式1]
Y1~Y5は、互いに同一または異なり、それぞれ独立に、CRR'、NR、O、SiRR'、PR、S、GeRR'、Se、またはTeであり、
Y6およびY7は、互いに異なり、それぞれ独立に、直接結合、CRR'、NR、O、SiRR'、PR、S、GeRR'、Se、またはTeであり、
aは、0または1であり、
aが0の場合、Y6は、直接結合であり、Y7は、CRR'、NR、O、SiRR'、PR、S、GeRR'、Se、またはTeであり、
aが1の場合、Y7は、直接結合であり、Y6は、CRR'、NR、O、SiRR'、PR、S、GeRR'、Se、またはTeであり、
nおよびmは、それぞれ0~5の整数であり、
nおよびmが2以上の場合、括弧内の構造は、互いに同一または異なり、
R11~R14は、互いに同一または異なり、それぞれ独立に、炭素数1~4のアルキル基であり、
R1、R2、RおよびR'は、互いに同一または異なり、それぞれ独立に、水素;重水素;置換もしくは非置換のアルキル基;置換もしくは非置換のシクロアルキル基;置換もしくは非置換のアリール基;または置換もしくは非置換のヘテロ環基であり、
RaおよびRbは、互いに同一または異なり、それぞれ下記構造のうちのいずれか1つであり、
c、dおよびeは、それぞれ1~4の整数であり、
c、dおよびeがそれぞれ2以上の場合、2以上の括弧内の構造は、互いに同一または異なり、
R20~R25は、互いに同一または異なり、それぞれ独立に、水素;重水素;ハロゲン基;置換もしくは非置換のアルキル基;置換もしくは非置換のシクロアルキル基;置換もしくは非置換のアリール基;または置換もしくは非置換のヘテロ環基である。 - 第1電極と、
前記第1電極に対向して備えられる第2電極と、
前記第1電極と前記第2電極との間に備えられる1層以上の有機物層とを含み、
前記有機物層のうちの1層以上は、400nm~850nmにおける最大吸収波長を有する下記化学式1の化合物を含むものである有機光ダイオード:
[化学式1]
RaおよびRbは、互いに同一または異なり、それぞれ独立に、電子受容体として作用する基であり、
Y1~Y5は、互いに同一または異なり、それぞれ独立に、CRR'、NR、O、SiRR'、PR、S、GeRR'、Se、またはTeであり、
Y6およびY7は、互いに異なり、それぞれ独立に、直接結合、CRR'、NR、O、SiRR'、PR、S、GeRR'、Se、またはTeであり、
aは、0または1であり、
aが0の場合、Y6は、直接結合であり、Y7は、CRR'、NR、O、SiRR'、PR、S、GeRR'、Se、またはTeであり、
aが1の場合、Y7は、直接結合であり、Y6は、CRR'、NR、O、SiRR'、PR、S、GeRR'、Se、またはTeであり、
nおよびmは、それぞれ0~5の整数であり、
nおよびmが2以上の場合、括弧内の構造は、互いに同一または異なり、
R11~R14は、互いに同一または異なり、それぞれ独立に、炭素数1~4のアルキル基であり、
R1およびR2は、水素であり、
RおよびR'は、互いに同一または異なり、それぞれ独立に、水素;重水素;置換もしくは非置換のアルキル基;置換もしくは非置換のシクロアルキル基;置換もしくは非置換のアリール基;または置換もしくは非置換のヘテロ環基である。 - 第1電極と、
前記第1電極に対向して備えられる第2電極と、
前記第1電極と前記第2電極との間に備えられる1層以上の有機物層とを含み、
前記有機物層のうちの1層以上は、400nm~850nmにおける最大吸収波長を有する下記化学式1-11~1-24のうちのいずれか1つで表される化合物を含むものである有機光ダイオード:
[化学式1-11]
Y1、Y6およびY7は、互いに同一または異なり、それぞれ独立に、CRR'、NR、O、SiRR'、PR、S、GeRR'、Se、またはTeであり、
R11~R14は、互いに同一または異なり、それぞれ独立に、炭素数1~4のアルキル基であり、
RおよびR'は、互いに同一または異なり、それぞれ独立に、水素;重水素;置換もしくは非置換のアルキル基;置換もしくは非置換のシクロアルキル基;置換もしくは非置換のアリール基;または置換もしくは非置換のヘテロ環基である。 - 第1電極と、
前記第1電極に対向して備えられる第2電極と、
前記第1電極と前記第2電極との間に備えられる1層以上の有機物層とを含み、
前記有機物層のうちの1層以上は、400nm~850nmにおける最大吸収波長を有する下記化学式1の化合物を含むものである有機光ダイオード:
[化学式1]
RaおよびRbは、互いに同一または異なり、それぞれ独立に、電子受容体として作用する基であり、
Y1~Y5は、Sであり、
Y6およびY7は、互いに異なり、それぞれ独立に、直接結合、CRR'、NR、O、SiRR'、PR、S、GeRR'、Se、またはTeであり、
aは、0または1であり、
aが0の場合、Y6は、直接結合であり、Y7は、CRR'、NR、O、SiRR'、PR、S、GeRR'、Se、またはTeであり、
aが1の場合、Y7は、直接結合であり、Y6は、CRR'、NR、O、SiRR'、PR、S、GeRR'、Se、またはTeであり、
nおよびmは、それぞれ0~5の整数であり、
nおよびmが2以上の場合、括弧内の構造は、互いに同一または異なり、
R11~R14は、互いに同一または異なり、それぞれ独立に、炭素数1~4のアルキル基であり、
R1、R2、RおよびR'は、互いに同一または異なり、それぞれ独立に、水素;重水素;置換もしくは非置換のアルキル基;置換もしくは非置換のシクロアルキル基;置換もしくは非置換のアリール基;または置換もしくは非置換のヘテロ環基である。 - 前記有機物層は、光活性層を含み、
前記光活性層は、電子供与体物質および電子受容体物質を含み、
前記電子供与体物質は、前記化合物を含むものである、請求項1~8のいずれか1項に記載の有機光ダイオード。 - 前記有機物層は、光活性層を含み、
前記光活性層は、p型有機物層およびn型有機物層を含み、
前記p型有機物層は、前記化合物を含むものである、請求項1~8のいずれか1項に記載の有機光ダイオード。 - 請求項1~10のいずれか1項に記載の有機光ダイオードを含む有機イメージセンサ。
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