JP7186646B2 - 基板処理装置および載置台上のフォーカスリングの有無の検知方法 - Google Patents
基板処理装置および載置台上のフォーカスリングの有無の検知方法 Download PDFInfo
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Description
図2は、一実施形態に係る基板処理装置10の一部の構成例を示す概略断面図である。図2においては、図1の載置台31中に配置される検知部60周辺の構成例を拡大して示している。また、図2の断面図は、図1とは異なる位置での基板処理装置10の断面を示している。
ところで、光検知においては外乱光が問題となる。図2の基板処理装置10の場合、第2載置面36eの上方にはシャワーヘッド46が配置されている。シャワーヘッド46はたとえば、フォーカスリング35と同様シリコンで形成されている。
図4は、一実施形態に係る基板処理装置10におけるフォーカスリング35検知の流れの一例を示すフローチャートである。
ところで、フォーカスリング35を備えた基板処理装置にフォーカスリング35を自動搬送する機構を配置する場合、搬送機構の一部を上記検知部60と共用するように構成してもよい。たとえば、上記透過部材71を貫通穴70内を昇降可能なリフタピンとして構成する。そして、載置台31の下方に配置した駆動機構と接続する。検知部60は貫通穴70の軸心からはずれた位置に配置し、光源63aから射出される光がリフタピンすなわち透過部材71を下方から上方に通過するようミラー等を配置する。また、反射光を受光するための光学素子も同様に配置する。このように構成すれば、検知部60専用の貫通穴70を形成せずにフォーカスリング35の有無検知のための機構を載置台31内に配置することができる。このため載置台31の利用効率を高め、フットプリントを抑制することができる。
なお、図1に示す基板処理装置10が備えるフォーカスリング35は1つの部分で構成されるリング状の部材とした。これに限らず、フォーカスリング35の形状は様々に変形できる。図5は、一実施形態の基板処理装置10に適用できるフォーカスリングの変形例を説明するための図である。
上記のように、一実施形態に係る基板処理装置は、載置台と、光源と、焦点調整部と、受光部と、制御部と、を備える。載置台は、基板が載置される第1載置面と、第1載置面を囲んでフォーカスリングが載置される第2載置面とを有する。焦点調整部は、第2載置面上に載置されているときのフォーカスリングの下面位置に光源からの光を集める。受光部は、フォーカスリングの下面位置からの光を受光する。制御部は、受光部が受光した光に基づき、第2載置面上のフォーカスリングの有無を検知する。このため、直進光を第2載置面上に射出する場合と比較して、フォーカスリングに絞って有無を検知することができる。このため、実施形態によれば、載置台上に配置されるフォーカスリングを検知することができる。
30 処理容器
30a 接地導体
31 載置台
33 基台
33b 冷媒入口配管
33c 冷媒出口配管
33d 冷媒流路
34 支持台
35 フォーカスリング
36 静電チャック
36a 電極
36b 絶縁体
36c ヒータ
36d 第1載置面
36e 第2載置面
37 内壁部材
40a 第1のRF電源
40b 第2のRF電源
41a 第1の整合器
42 直流電源
45a ガス供給配管
45b マスフローコントローラ(MFC)
46 シャワーヘッド
46a 本体部
46b 上部天板
46c ガス拡散室
46d ガス通流孔
46e ガス導入孔
46g ガス導入口
47 絶縁性部材
48a ローパスフィルタ(LPF)
48b 可変直流電源
48c オン・オフスイッチ
50 給電棒
60 検知部
61 処理回路
62 焦点調整部
63 センサ
63a 光源
63b 受光部
64 接続部
70 貫通穴
71 透過部材
81 排気口
82 排気管
83 排気装置
84 ゲート
86 デポシールド
90 制御部
G ゲートバルブ
W ウエハ
Claims (12)
- 基板が載置される第1載置面と、当該第1載置面を囲んでフォーカスリングが載置される第2載置面とを有する載置台と、
光源と、
前記第2載置面上に載置されているときのフォーカスリングの下面位置に前記光源からの光を合焦する焦点調整部と、
前記下面位置からの光を受光する受光部と、
前記受光部が受光した光に基づき、前記第2載置面上のフォーカスリングの有無を検知する制御部と、
を備える基板処理装置。 - 前記第2載置面で開口し前記載置台を貫通する第1貫通穴と、
前記第1貫通穴内に配置され光を透過する透過部材と、
をさらに備え、
前記焦点調整部は、前記光源からの光を前記第1貫通穴内に配置された透過部材を介して前記フォーカスリングの下面位置に合焦する、
請求項1に記載の基板処理装置。 - 前記透過部材は、サファイアまたは石英の部材である、請求項2に記載の基板処理装置。
- 前記受光部は、前記下面位置からの反射光を受光し、
前記制御部は、受光した反射光の光量が閾値を超える場合にフォーカスリングありと検知し、閾値以下の場合にフォーカスリングなしと検知する、請求項2または3に記載の基板処理装置。 - 前記透過部材は、前記第1貫通穴を封止する、請求項2から4のいずれか1項に記載の基板処理装置。
- 前記透過部材は、前記第2載置面に直交する方向に昇降可能に形成されるリフタピンである、請求項2から5のいずれか1項に記載の基板処理装置。
- 前記第1貫通穴は複数あり、
前記受光部は前記複数の第1貫通穴各々にひとつ配置される、請求項2から6のいずれか1項に記載の基板処理装置。 - 一部が上下方向に重なりあう2以上のリング部材で構成されるフォーカスリングをさらに備え、
前記2以上のリング部材の少なくとも一つは、前記第2載置面上に配置されたときに第1貫通穴と連通し、前記2以上のリング部材の他方によって閉鎖される第2貫通穴を有し、
前記焦点調整部は、光源からの光を前記2以上のリング部材の前記他方の下面位置に合焦する、請求項1から7のいずれか1項に記載の基板処理装置。 - 前記第2載置面に対向して前記第2載置面の上に配置され、前記フォーカスリングと同材料で形成される対向部材をさらに備える、請求項1から8のいずれか1項に記載の基板処理装置。
- 前記対向部材はシリコンで形成されるシャワーヘッドである、請求項9に記載の基板処理装置。
- 基板が載置される第1載置面と、前記第1載置面を囲んでフォーカスリングが載置される第2載置面とを有する載置台の、当該第2載置面上に載置されているときの前記フォーカスリングの下面位置に光源からの光を合焦し、
前記下面位置からの光を受光し、
受光した光に基づき、前記第2載置面上のフォーカスリングの有無を検知する、
載置台上のフォーカスリングの有無の検知方法。 - 前記光源からの光は、前記第2載置面で開口し前記載置台を貫通する第1貫通穴内に配置され光を透過する透過部材を介して前記フォーカスリングの下面位置に合焦され、
受光した光の光量に応じて、前記第2載置面上のフォーカスリングの有無を検知する、請求項11に記載の載置台上のフォーカスリングの有無の検知方法。
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