JP7175864B2 - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
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- JP7175864B2 JP7175864B2 JP2019168401A JP2019168401A JP7175864B2 JP 7175864 B2 JP7175864 B2 JP 7175864B2 JP 2019168401 A JP2019168401 A JP 2019168401A JP 2019168401 A JP2019168401 A JP 2019168401A JP 7175864 B2 JP7175864 B2 JP 7175864B2
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- 239000004065 semiconductor Substances 0.000 title claims description 90
- 239000000758 substrate Substances 0.000 claims description 80
- 239000010410 layer Substances 0.000 description 60
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 48
- 229910052710 silicon Inorganic materials 0.000 description 48
- 239000010703 silicon Substances 0.000 description 48
- 239000012535 impurity Substances 0.000 description 8
- 230000000694 effects Effects 0.000 description 7
- 230000005684 electric field Effects 0.000 description 6
- 230000015556 catabolic process Effects 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 229910052814 silicon oxide Inorganic materials 0.000 description 4
- 238000002955 isolation Methods 0.000 description 3
- 230000005669 field effect Effects 0.000 description 2
- 239000011229 interlayer Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 229910000577 Silicon-germanium Inorganic materials 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
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- H01L29/772—Field effect transistors
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- H01L29/7801—DMOS transistors, i.e. MISFETs with a channel accommodating body or base region adjoining a drain drift region
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Description
以下、第1の実施形態について説明する。
図1は、本実施形態に係る半導体装置を示す平面図である。
図2は、本実施形態に係る半導体装置を示す一部拡大平面図である。
図3(a)は図2に示すA-A’線による断面図であり、(b)は図2に示すB-B’線による断面図である。
図4は、本実施形態に係る半導体装置を示す斜視断面図である。
DMOS61においては、ドレインコンタクト層14とチャネル領域との間に絶縁部材32の第1部分33が設けられているため、ドレインコンタクト層14からソースコンタクト層17に流れるオン電流の一部は、第1部分33の下方を迂回して流れる。このため、DMOS61はドレイン-ゲート間の距離が長く、耐圧が高い。
次に、第2の実施形態について説明する。
図5は、本実施形態に係る半導体装置を示す一部拡大平面図である。
図6(a)は図5に示すA-A’線による断面図であり、(b)は図5に示すB-B’線による断面図である。
図7は、本実施形態に係る半導体装置を示す斜視断面図である。
次に、第3の実施形態について説明する。
図8(a)及び(b)は、本実施形態に係る半導体装置を示す断面図である。
図9は、本実施形態に係る半導体装置を示す斜視断面図である。
図8(a)が示す断面の位置は、図5に示すA-A’線に相当する位置であり、図8(b)が示す断面の位置は、図5に示すB-B’線に相当する位置である。
次に、第4の実施形態について説明する。
図10(a)及び(b)は、本実施形態に係る半導体装置を示す断面図である。
図11は、本実施形態に係る半導体装置を示す斜視断面図である。
図10(a)が示す断面の位置は、図2に示すA-A’線に相当し、図10(b)が示す断面の位置は、図2に示すB-B’線に相当する。
次に、第5の実施形態について説明する。
図12(a)及び(b)は、本実施形態に係る半導体装置を示す断面図である。
図13は、本実施形態に係る半導体装置を示す斜視断面図である。
図12(a)が示す断面の位置は、図5に示すA-A’線に相当し、図12(b)が示す断面の位置は、図5に示すB-B’線に相当する。
次に、第6の実施形態について説明する。
図14(a)及び(b)は、本実施形態に係る半導体装置を示す断面図である。
図15は、本実施形態に係る半導体装置を示す斜視断面図である。
図14(a)が示す断面の位置は、図2に示すA-A’線に相当し、図14(b)が示す断面の位置は、図2に示すB-B’線に相当する。
半導体基板と、
前記半導体基板内に配置され、上面が前記半導体基板の上面において露出した複数の第1絶縁部材と、
前記半導体基板上に設けられた複数の第2絶縁部材と、
前記半導体基板上、前記第1絶縁部材上及び前記第2絶縁部材上に設けられた電極と、
を備え、
前記半導体基板の上面に平行な第1方向に沿って、前記第1絶縁部材と前記第2絶縁部材は交互に配列された半導体装置。
前記第2絶縁部材は前記第1絶縁部材よりも薄い付記1記載の半導体装置。
半導体基板と、
前記半導体基板内に配置され、上面が前記半導体基板の上面において露出した絶縁部材と、
前記半導体基板上及び前記絶縁部材上に設けられた電極と、
を備え、
前記絶縁部材は、
複数の第1部分と、
前記第1部分よりも薄い複数の第2部分と、
を有し、
前記半導体基板の上面に平行な第1方向に沿って、前記第1部分と前記第2部分は交互に配列された半導体装置。
半導体基板と、
前記半導体基板上に設けられた絶縁部材と、
前記半導体基板上及び前記絶縁部材上に配置された電極と、
を備え、
前記絶縁部材は、
複数の第1部分と、
前記第1部分よりも薄い複数の第2部分と、
を有し、
前記半導体基板の上面に平行な第1方向に沿って、前記第1部分と前記第2部分は交互に配列された半導体装置。
10:シリコン基板
10a:上面
11:ディープnウェル
11a:部分
12:ドリフト層
13:pウェル
14:ドレインコンタクト層
15:nウェル
16:ソース層
17:ソースコンタクト層
18:ボディ層
19:ボディコンタクト層
31:STI
32:絶縁部材
33:第1部分
33a:上面
33b:下面
34:第2部分
34a:上面
34b:下面
35:絶縁部材
36:第2部分
36a:上面
37:絶縁部材
38:第1部分
38a:上面
38b:下面
39:第2部分
39a:上面
39b:下面
41:ゲート絶縁膜
42:ゲート電極
42a:基部
42b:歯部
42c:突起部
43:ゲート電極
43a:帯状部分
43b:側面
43c:突起部
61:DMOS
t1、t2、t3、t4、t5:厚さ
Claims (2)
- 半導体基板と、
前記半導体基板上に設けられ、第1方向に沿って相互に離隔して配列された複数の絶縁部材と、
前記半導体基板上及び前記複数の絶縁部材上に配置された電極と、
を備え、
前記電極は、
前記第1方向に延びる基部と、
前記基部から前記第1方向と交差した第2方向に延出した複数の歯部と、
を有し、
上下方向において、前記絶縁部材は前記歯部と重なり、前記絶縁部材間の領域は前記歯部間の領域と重なり、
上下方向において前記絶縁部材の半分以上は、前記半導体基板の上面における前記絶縁部材と接していない領域よりも上方に位置している半導体装置。 - 前記半導体基板上に設けられた第1導電形のソース層と、
前記半導体基板上に設けられた第1導電形のドレイン層と、
をさらに備え、
前記半導体基板の少なくとも上層部分は第2導電形であり、
前記絶縁部材は、前記ドレイン層と前記ソース層との間又は前記間の直上域に配置されている請求項1記載の半導体装置。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019168401A JP7175864B2 (ja) | 2019-09-17 | 2019-09-17 | 半導体装置 |
US16/702,790 US20210083089A1 (en) | 2019-09-17 | 2019-12-04 | Semiconductor device |
CN201911366432.3A CN112531028B (zh) | 2019-09-17 | 2019-12-26 | 半导体装置 |
US17/677,578 US20220181486A1 (en) | 2019-09-17 | 2022-02-22 | Semiconductor device |
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Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019168401A JP7175864B2 (ja) | 2019-09-17 | 2019-09-17 | 半導体装置 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2021048168A JP2021048168A (ja) | 2021-03-25 |
JP2021048168A5 JP2021048168A5 (ja) | 2021-10-14 |
JP7175864B2 true JP7175864B2 (ja) | 2022-11-21 |
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JP2019168401A Active JP7175864B2 (ja) | 2019-09-17 | 2019-09-17 | 半導体装置 |
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US (2) | US20210083089A1 (ja) |
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JP2014027062A (ja) | 2012-07-25 | 2014-02-06 | Asahi Kasei Electronics Co Ltd | 電界効果トランジスタ及び半導体装置 |
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KR102286013B1 (ko) * | 2015-10-07 | 2021-08-05 | 에스케이하이닉스 시스템아이씨 주식회사 | 트랜치 절연 필드플레이트 및 금속 필드플레이트를 갖는 수평형 고전압 집적소자 |
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JP2014027062A (ja) | 2012-07-25 | 2014-02-06 | Asahi Kasei Electronics Co Ltd | 電界効果トランジスタ及び半導体装置 |
US20170194489A1 (en) | 2015-12-31 | 2017-07-06 | SK Hynix Inc. | Lateral power integrated devices having low on-resistance |
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