JP7132742B2 - テープ剥離装置 - Google Patents
テープ剥離装置 Download PDFInfo
- Publication number
- JP7132742B2 JP7132742B2 JP2018084698A JP2018084698A JP7132742B2 JP 7132742 B2 JP7132742 B2 JP 7132742B2 JP 2018084698 A JP2018084698 A JP 2018084698A JP 2018084698 A JP2018084698 A JP 2018084698A JP 7132742 B2 JP7132742 B2 JP 7132742B2
- Authority
- JP
- Japan
- Prior art keywords
- peeling
- tape
- wafer
- protective tape
- protective
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67132—Apparatus for placing on an insulating substrate, e.g. tape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67126—Apparatus for sealing, encapsulating, glassing, decapsulating or the like
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Dicing (AREA)
- Processing And Handling Of Plastics And Other Materials For Molding In General (AREA)
Description
11:保持テーブル
25:挟持手段
31:剥離テープ貼着手段
32:押し付け部
37:移動手段
46:気体噴射手段
47:気体噴射口
50:先端剥離領域
51:保護テープ
52:貼着テープ
W :ウェーハ
Claims (3)
- ウェーハの一方の面に貼着された保護テープに剥離テープを貼着し該剥離テープを引っ張って該保護テープをウェーハから剥離するテープ剥離装置であって、
ウェーハの他方の面側を保持する保持テーブルと、
該保持テーブルに保持されたウェーハの該保護テープの上面に押し付け部で該剥離テープを押し付けて貼着する剥離テープ貼着手段と、
該剥離テープ貼着手段で貼着された該剥離テープの一端を挟持する挟持手段と、
該挟持手段と該保持テーブルとを相対的に移動させてウェーハの外側から中心に向かって該剥離テープを引っ張って該保護テープをウェーハから剥離する移動手段と、
ウェーハ外周縁直近に貼着された該剥離テープにより該保護テープがウェーハから剥離される先端剥離領域に対向して気体噴射口を位置付けてウェーハの外側に配設され、該先端剥離領域からウェーハ中心に向かって気体を噴射する気体噴射手段と、を備え、
該狭持手段が該剥離テープを狭持した状態で、該先端剥離領域から該気体噴射手段の気体噴射によりウェーハの該一方の面から該保護テープの一部が剥離し、次いで該剥離テープを引っ張って該保護テープをウェーハから剥離し、該気体噴射手段は、少なくとも該先端剥離領域からウェーハ中心までの半分が剥離するまで気体を間欠的に噴射させること、を特徴とするテープ剥離装置。 - ウェーハは分割予定ラインにより区画された領域に複数のデバイスが形成され該分割予定ラインに沿って分割されて個片化された状態で該保護テープに貼着されており、
該剥離テープは該分割予定ラインに対して非平行に剥離する方向に貼着され、
該気体噴射手段は、該分割予定ラインと非平行に気体を噴射すること、を特徴とする請求項1記載のテープ剥離装置。 - 該気体噴射手段は、イオナイザーであること、を特徴とする請求項1乃至2記載のテープ剥離装置。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2018084698A JP7132742B2 (ja) | 2018-04-26 | 2018-04-26 | テープ剥離装置 |
KR1020190036040A KR20190124635A (ko) | 2018-04-26 | 2019-03-28 | 테이프 박리 장치 |
CN201910316551.1A CN110416114B (zh) | 2018-04-26 | 2019-04-19 | 带剥离装置 |
TW108114162A TWI782203B (zh) | 2018-04-26 | 2019-04-23 | 膠膜剝離裝置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2018084698A JP7132742B2 (ja) | 2018-04-26 | 2018-04-26 | テープ剥離装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2019192804A JP2019192804A (ja) | 2019-10-31 |
JP7132742B2 true JP7132742B2 (ja) | 2022-09-07 |
Family
ID=68357610
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2018084698A Active JP7132742B2 (ja) | 2018-04-26 | 2018-04-26 | テープ剥離装置 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP7132742B2 (ja) |
KR (1) | KR20190124635A (ja) |
CN (1) | CN110416114B (ja) |
TW (1) | TWI782203B (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102456864B1 (ko) * | 2020-08-18 | 2022-10-21 | (주) 엔지온 | 반도체 칩 디라미네이션 장치 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005209942A (ja) | 2004-01-23 | 2005-08-04 | Toshiba Corp | 剥離装置及び剥離方法 |
US20070261783A1 (en) | 2006-05-10 | 2007-11-15 | Micron Technology, Inc. | Methods and systems for removing protective films from microfeature workpieces |
JP2008288485A (ja) | 2007-05-21 | 2008-11-27 | Lintec Corp | シート剥離装置及び剥離方法 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5918928A (ja) | 1982-07-23 | 1984-01-31 | Canon Inc | 液晶−光学シヤツタの駆動法 |
JP4025292B2 (ja) * | 2001-10-16 | 2007-12-19 | 日本たばこ産業株式会社 | 棒状物品の包材として使用されるウエブを相互に接続するための接着テープ及びその接着テープの供給装置 |
JP4054359B2 (ja) * | 2004-07-02 | 2008-02-27 | シャープ株式会社 | フィルム剥離方法と装置 |
JP2010129607A (ja) * | 2008-11-25 | 2010-06-10 | Nitto Denko Corp | ダイシング用表面保護テープ及びダイシング用表面保護テープの剥離除去方法 |
JP5558244B2 (ja) | 2010-07-22 | 2014-07-23 | 株式会社ディスコ | テープ剥離装置 |
JP6580408B2 (ja) * | 2015-07-30 | 2019-09-25 | 株式会社ディスコ | 剥離方法および剥離装置 |
-
2018
- 2018-04-26 JP JP2018084698A patent/JP7132742B2/ja active Active
-
2019
- 2019-03-28 KR KR1020190036040A patent/KR20190124635A/ko not_active Application Discontinuation
- 2019-04-19 CN CN201910316551.1A patent/CN110416114B/zh active Active
- 2019-04-23 TW TW108114162A patent/TWI782203B/zh active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005209942A (ja) | 2004-01-23 | 2005-08-04 | Toshiba Corp | 剥離装置及び剥離方法 |
US20070261783A1 (en) | 2006-05-10 | 2007-11-15 | Micron Technology, Inc. | Methods and systems for removing protective films from microfeature workpieces |
JP2008288485A (ja) | 2007-05-21 | 2008-11-27 | Lintec Corp | シート剥離装置及び剥離方法 |
Also Published As
Publication number | Publication date |
---|---|
TW201946211A (zh) | 2019-12-01 |
JP2019192804A (ja) | 2019-10-31 |
CN110416114A (zh) | 2019-11-05 |
CN110416114B (zh) | 2024-02-20 |
TWI782203B (zh) | 2022-11-01 |
KR20190124635A (ko) | 2019-11-05 |
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