JP7109765B2 - 半導体素子パッケージ - Google Patents
半導体素子パッケージ Download PDFInfo
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- JP7109765B2 JP7109765B2 JP2017225767A JP2017225767A JP7109765B2 JP 7109765 B2 JP7109765 B2 JP 7109765B2 JP 2017225767 A JP2017225767 A JP 2017225767A JP 2017225767 A JP2017225767 A JP 2017225767A JP 7109765 B2 JP7109765 B2 JP 7109765B2
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- 239000004065 semiconductor Substances 0.000 title claims description 117
- 239000000758 substrate Substances 0.000 claims description 134
- 230000003287 optical effect Effects 0.000 claims description 60
- 229920005989 resin Polymers 0.000 claims description 46
- 239000011347 resin Substances 0.000 claims description 46
- 239000010410 layer Substances 0.000 description 232
- 239000000463 material Substances 0.000 description 33
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 31
- 238000002845 discoloration Methods 0.000 description 23
- 230000017525 heat dissipation Effects 0.000 description 18
- 230000000694 effects Effects 0.000 description 15
- 230000004907 flux Effects 0.000 description 14
- 239000010931 gold Substances 0.000 description 13
- 239000010949 copper Substances 0.000 description 12
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 11
- 239000010936 titanium Substances 0.000 description 11
- 230000006866 deterioration Effects 0.000 description 10
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 9
- 239000011651 chromium Substances 0.000 description 8
- 229910052802 copper Inorganic materials 0.000 description 8
- 230000001681 protective effect Effects 0.000 description 8
- 230000008878 coupling Effects 0.000 description 7
- 238000010168 coupling process Methods 0.000 description 7
- 238000005859 coupling reaction Methods 0.000 description 7
- 238000000605 extraction Methods 0.000 description 7
- 229910052737 gold Inorganic materials 0.000 description 7
- 229910052759 nickel Inorganic materials 0.000 description 7
- 150000004767 nitrides Chemical class 0.000 description 7
- 239000010703 silicon Substances 0.000 description 7
- 229910052710 silicon Inorganic materials 0.000 description 7
- 229910052719 titanium Inorganic materials 0.000 description 7
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 6
- 239000000853 adhesive Substances 0.000 description 6
- 230000001070 adhesive effect Effects 0.000 description 6
- -1 alkaline earth metal borate halogen Chemical class 0.000 description 6
- 230000004888 barrier function Effects 0.000 description 6
- 229910052804 chromium Inorganic materials 0.000 description 6
- 238000009792 diffusion process Methods 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 239000004593 Epoxy Substances 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 5
- 230000006870 function Effects 0.000 description 5
- 238000002955 isolation Methods 0.000 description 5
- 229910044991 metal oxide Inorganic materials 0.000 description 5
- 150000004706 metal oxides Chemical class 0.000 description 5
- 229910052697 platinum Inorganic materials 0.000 description 5
- 229910052709 silver Inorganic materials 0.000 description 5
- 239000011135 tin Substances 0.000 description 5
- 229910052721 tungsten Inorganic materials 0.000 description 5
- 239000002019 doping agent Substances 0.000 description 4
- 239000011810 insulating material Substances 0.000 description 4
- 229910052747 lanthanoid Inorganic materials 0.000 description 4
- 150000002602 lanthanoids Chemical class 0.000 description 4
- 238000007747 plating Methods 0.000 description 4
- 230000009467 reduction Effects 0.000 description 4
- 239000011342 resin composition Substances 0.000 description 4
- 238000000926 separation method Methods 0.000 description 4
- 229920001187 thermosetting polymer Polymers 0.000 description 4
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 3
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 239000003086 colorant Substances 0.000 description 3
- 238000004891 communication Methods 0.000 description 3
- 150000002736 metal compounds Chemical class 0.000 description 3
- 229910052750 molybdenum Inorganic materials 0.000 description 3
- 238000000465 moulding Methods 0.000 description 3
- 239000011241 protective layer Substances 0.000 description 3
- 239000004332 silver Substances 0.000 description 3
- 229910052718 tin Inorganic materials 0.000 description 3
- 229910052720 vanadium Inorganic materials 0.000 description 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 229910052693 Europium Inorganic materials 0.000 description 2
- 239000004954 Polyphthalamide Substances 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 2
- 238000006731 degradation reaction Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 239000011574 phosphorus Substances 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 229920006375 polyphtalamide Polymers 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- 229910052761 rare earth metal Inorganic materials 0.000 description 2
- 230000004044 response Effects 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- 229910002704 AlGaN Inorganic materials 0.000 description 1
- PIGFYZPCRLYGLF-UHFFFAOYSA-N Aluminum nitride Chemical compound [Al]#N PIGFYZPCRLYGLF-UHFFFAOYSA-N 0.000 description 1
- 229910052684 Cerium Inorganic materials 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 229910052586 apatite Inorganic materials 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 229910052593 corundum Inorganic materials 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- 239000004611 light stabiliser Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 150000002921 oxetanes Chemical class 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- VSIIXMUUUJUKCM-UHFFFAOYSA-D pentacalcium;fluoride;triphosphate Chemical compound [F-].[Ca+2].[Ca+2].[Ca+2].[Ca+2].[Ca+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O VSIIXMUUUJUKCM-UHFFFAOYSA-D 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 150000004760 silicates Chemical class 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 239000010944 silver (metal) Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 230000001954 sterilising effect Effects 0.000 description 1
- 238000004659 sterilization and disinfection Methods 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 230000001052 transient effect Effects 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- 229910001845 yogo sapphire Inorganic materials 0.000 description 1
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- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/64—Heat extraction or cooling elements
- H01L33/647—Heat extraction or cooling elements the elements conducting electric current to or from the semiconductor body
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- H01L33/483—Containers
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- H01L33/38—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
- F21V5/00—Refractors for light sources
- F21V5/04—Refractors for light sources of lens shape
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- H01L33/10—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a light reflecting structure, e.g. semiconductor Bragg reflector
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Description
図1は、第1実施例に係る半導体素子パッケージ200における平面図として、基板201と半導体素子100の平面図である。実施例の半導体素子パッケージ200は、半導体素子パッケージからなることができる。よって、実施例の半導体素子パッケージ200は、基板201と半導体素子100を含むことができる。例えば、実施例の半導体素子パッケージ200は、基板201と発光素子100を含むことができる。
図2を参照すると、実施例に係る半導体素子パッケージ200は、基板201の上に配置された第1電極部210と、前記第1電極部210と電気的に分離されて前記基板201に配置された第2電極部220を含むことができる。
実施例で解決しようとする技術的課題の1つは、基板のメッキ層の変色等によって光束低下が発生する問題を解決できる半導体素子パッケージ及びこれを含む照明装置を提供することにある。
図3を参照すると、実施例の発光素子100は、発光チップ110と蛍光体層120を含むことができる。まず蛍光体層120の内容を記述してから発光チップ110に対する特徴を記述することにする。
次に、図5は第1実施例に係る半導体素子パッケージの平面透明図であり、図6aは図5に示された第1実施例に係る半導体素子パッケージのIII-III’線断面図である。また、図6bは第1実施例に係る半導体素子パッケージのV-V’線断面図であり、図6cは第1実施例に係る半導体素子パッケージのIII-III’線の別の断面図である。
図7aは第2実施例に係る半導体素子パッケージ202における基板と発光チップの平面図であり、図7bは図7aに示された第2実施例に係る半導体素子パッケージのIII-III’線に沿った基板と発光チップの断面図である。
実施例に係る半導体素子パッケージは、複数個が基板の上にアレイされ、半導体素子パッケージから放出される光の経路上に光学部材である導光板、プリズムシート、拡散シート、蛍光シート等が配置される。
Claims (10)
- 基板と、
前記基板の上に配置される第1電極部と、
前記第1電極部と電気的に分離されて前記基板に配置される第2電極部と、
前記第1電極部の上に配置される発光素子と、
前記第1電極部と前記第2電極部との間に配置される絶縁性反射層と、
前記絶縁性反射層の上に配置される光学レンズと、
を含み、
前記絶縁性反射層の上面は、複数個の頂点を含む多角形形状に配置され、
前記絶縁性反射層の頂点は、少なくとも1つ以上の第1地点を含み、
前記光学レンズに外接する接線は、前記基板の外側角を通り、前記接線と前記基板の前記上面とがなす角度が60°~90°であり、
前記基板の平面方向に垂直な方向を上下方向という場合に、前記少なくとも1つ以上の第1地点は、前記接線と前記光学レンズとの外接点及び前記接線と前記基板が会う点を連結する線分と前記上下方向に重なり、
前記光学レンズは、レンズ部及び曲率部を含み、
前記曲率部と前記レンズ部の曲率方向は相互に異なり、
前記少なくとも1つ以上の第1地点は、前記曲率部と前記上下方向に重なる、
半導体素子パッケージ。 - 前記第2電極部は、前記第2電極部の外側面から前記発光素子の方向に突出した第1突出部と第2突出部を含む、請求項1に記載の半導体素子パッケージ。
- 前記基板の平面方向は、第1軸方向と、前記第1軸方向に対して垂直な第2軸方向とを含み、
前記第1突出部または前記第2突出部の前記第2軸方向の幅は一定であり、前記発光素子が配置される前記第1電極部の第1領域と前記第1突出部または前記第2突出部までの前記第1軸方向の距離である第1距離は、前記第1領域の前記第1軸方向の幅の1/10~3/10の範囲である請求項2に記載の半導体素子パッケージ。 - 前記第1電極部は、
前記第1電極部における前記第2軸方向の一方の側にある第1側角領域に位置する第3領域と、
前記第1電極部における前記第2軸方向の他方の側にある第2側角領域に位置する第4領域と、
前記第3領域及び前記第4領域のそれぞれと前記第1領域との間に配置される第5領域と、を含む、請求項3に記載の半導体素子パッケージ。 - 前記第1電極部は、前記第1領域と前記第4領域との間に配置される第2領域と前記第1電極部の前記第2側角領域に配置される第1連結部を含み、
前記第1連結部の前記第2軸方向の幅は、前記第2領域の前記第2軸方向の幅より小さい、請求項4に記載の半導体素子パッケージ。 - 前記第2電極部は、前記第2電極部における前記第2軸方向の一方の側にある第1側角領域に位置する第4突出部と前記第2電極部における前記第2軸方向の他方の側にある第2側角領域に位置する第5突出部を含み、
前記第4突出部は、前記第3領域に対応し、
前記第5突出部は、前記第4領域に対応する、請求項5に記載の半導体素子パッケージ。 - 前記絶縁性反射層は、前記第1電極部及び前記第2電極部とは、前記上下方向に重ならない、請求項1~6のいずれか一項に記載の半導体素子パッケージ。
- 前記第2領域の前記第1軸方向の幅は、前記第1領域の前記第1軸方向の幅の1/5~2/5である、請求項5に記載の半導体素子パッケージ。
- 前記発光素子の側面周りに配置された樹脂反射層をさらに含む、請求項1~8のいずれか一項に記載の半導体素子パッケージ。
- 基板と、
前記基板の上に配置される第1電極部と、
前記第1電極部と離隔して前記基板の上に配置される第2電極部と、
前記第1電極部と前記第2電極部との間に配置される絶縁性反射層と、
を含み、
前記基板の平面方向は、第1軸方向と、前記第1軸方向に対して垂直な第2軸方向と、前記第1軸方向と反対方向である第3軸方向と、前記第2軸方向と反対方向である第4軸方向とを含み、
前記第1電極部は、
前記第1電極部の前記第1軸方向の外縁に配置され、前記第2軸方向に延長される第1電極延長部と、
前記第1電極延長部と前記第3軸方向に離隔し、発光素子が配置される第1領域と、
前記第1電極延長部と前記第1軸方向に離隔し、前記第1領域と前記第2軸方向に離隔し、保護素子が配置される第2領域と、
前記第1領域と前記第1電極延長部との間に配置され、前記第1領域と前記第1電極延長部とを電気的に連結する第1連結部と、
前記第2領域と前記第1電極延長部との間に配置され、前記第2領域と前記第1電極延長部とを電気的に連結する第2連結部と、
前記第1電極延長部は、前記第1連結部と前記第2連結部との間で前記第2軸方向と平行に配置される第1垂直部と、
前記第1垂直部と前記第2連結部との間に配置され、前記第1軸方向の幅が前記第2軸方向に向かうほど増加する第1斜線部と、
前記第2領域と前記第2軸方向に離隔し、前記第1電極部の前記第2軸方向の外縁に配置され、前記第1斜線部と連結され、前記第1軸方向に突出配置される第1突出部と、
前記第1領域と前記第4軸方向の外縁に配置される第2突出部と、
前記第2突出部と前記第1垂直部との間に配置され、前記第1軸方向の幅が前記第4軸方向に向かうほど増加する第2斜線部と、
を含み、
前記第2斜線部は、前記第2突出部と連結されるように配置され、
前記第2電極部は、
前記第2電極部の前記第3軸方向の外縁に配置され、前記第2軸方向に延長される第2電極延長部と、
前記第1軸方向に前記第1領域と重なる領域を含むように配置され、前記第2電極延長部と連結される第1ボンディング部と、
前記第1ボンディング部と前記第2軸方向に離隔して配置され、前記第1軸方向に前記第1領域と重なる領域を含むように配置され、前記第2電極延長部と連結される第2ボンディング部と、
前記第1軸方向に前記第2領域と重なる領域を含むように配置され、前記第2電極延長部と連結される第3ボンディング部と、
前記第2軸方向に前記第3ボンディング部と離隔して配置され、前記第1軸方向に延長され、前記第2電極延長部と連結される第3突出部と、
前記第4軸方向に前記第2ボンディング部と離隔して配置され、前記第1軸方向に延長され、前記第2電極延長部と連結される第4突出部と、
前記第2電極延長部は、前記第1ボンディング部と前記第2ボンディング部との間で前記第2軸方向と平行に配置される第2垂直部と、
前記第2電極延長部は、前記第3突出部と前記第2垂直部との間に配置され、前記第1軸方向の幅が前記第2軸方向に向かうほど増加する第3斜線部と、
前記第4突出部と前記第2垂直部との間に配置され、前記第1軸方向の幅が前記第4軸方向に向かうほど増加する第4斜線部と、を含む、半導体素子パッケージ。
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