JP7079198B2 - 黒色感光性樹脂組成物及びそれから調製される黒色カラムスペーサ - Google Patents
黒色感光性樹脂組成物及びそれから調製される黒色カラムスペーサ Download PDFInfo
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- JP7079198B2 JP7079198B2 JP2018533178A JP2018533178A JP7079198B2 JP 7079198 B2 JP7079198 B2 JP 7079198B2 JP 2018533178 A JP2018533178 A JP 2018533178A JP 2018533178 A JP2018533178 A JP 2018533178A JP 7079198 B2 JP7079198 B2 JP 7079198B2
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- black
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- photosensitive resin
- acrylate
- meth
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- 125000006374 C2-C10 alkenyl group Chemical group 0.000 description 3
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- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
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Description
本発明の黒色感光性樹脂組成物は、ランダムコポリマーであり得るアクリルコポリマーを含み得る。
本発明において、構造単位(A-1)は、エチレン性不飽和カルボン酸、エチレン性不飽和カルボン酸無水物、またはそれらの組み合わせから誘導される。エチレン性不飽和カルボン酸またはエチレン性不飽和カルボン酸無水物は、分子中に少なくとも1つのカルボキシル基を有する重合性不飽和モノマーである。
本発明において、構造単位(A-2)は、芳香族環を含有するエチレン性不飽和化合物から誘導される。
本発明のコポリマーは、構造単位(A-1)及び(A-2)に加えて、構造単位(A-1)及び(A-2)とは異なるエチレン性不飽和化合物から誘導される構造単位(A-3)をさらに含み得る。
本発明の黒色感光性樹脂組成物は、エポキシ樹脂またはそれから誘導される化合物を含む。好ましくは、エポキシ樹脂またはそれから誘導される化合物は、カド(cado)骨格構造を有し得る。エポキシ樹脂またはそれから誘導される化合物は、ポリスチレンを標準としてゲル浸透クロマトグラフィによって決定されるとき、3,000~18,000、好ましくは5,000~10,000の重量平均分子量を有し得る。この範囲内で、樹脂組成物は、良好な段差特性及び良好な現像後のパターンプロファイルを有するコーティングフィルムを生成する。
Xは、各々独立して、
L1は、各々独立して、C1-10アルキレン、C3-20シクロアルキレン、またはC1-10アルキレンオキシであり、
R1~R7は、各々独立して、H、C1-10アルキル、C1-10アルコキシ、C2-10アルケニル、またはC6-14アリールであり、
R8は、H、メチル、エチル、CH3CHCl-、CH3CHOH-、CH2=CHCH2-、またはフェニルであり、
nは、0~10の整数である。
Halは、ハロゲンであり、X、R1、R2、及びL1は、式1で定義されるものと同じである。
R9は、各々独立して、H、C1-10アルキル基、C1-10アルコキシ基、C2-10アルケニル基、またはC6-14アリール基であり、
R10及びR11は、各々独立して、飽和または不飽和C6脂肪族環またはベンゼン環であり、
nは、1~10の整数であり、
X、R1、R2、及びL1は、式1で定義されるものと同じである。
本発明の黒色感光性樹脂組成物は、(A)及び(B)以外のエポキシ化合物を含み、かかるエポキシ化合物は、エポキシ基及び不飽和二重結合を有するモノマーから誘導される構造単位を有するホモポリマーまたはコポリマーであり得る。
本発明の光重合性化合物は、光開始剤の機能によって重合され得る化合物であり、黒色感光性樹脂組成物で一般に使用される、多官能性モノマー、オリゴマー、またはポリマーを含み得る。
本発明で使用される光重合開始剤は、任意の既知の重合開始剤であり得る。
本発明の黒色感光性樹脂組成物は、遮光特性を付与するための黒色着色剤を含む。
本発明の黒色感光性樹脂組成物は、好ましくは、上記の成分を溶媒と混合する液体組成物として調製され得る。溶媒が黒色感光性樹脂組成物の成分との相溶性を有するが、反応性を有しない限り、溶媒は、黒色感光性樹脂組成物中で使用される任意の既知の溶媒であり得る。
本発明の黒色感光性樹脂組成物は、所望される場合、その被覆性を強化し、欠陥の生成を防止するために界面活性剤をさらに含み得る。
本発明の黒色感光性樹脂組成物は、所望される場合、カルボキシル、(メタ)アクリロイル、イソシアネート、アミノ、メルカプト、ビニル、エポキシ、及びそれらの組み合わせからなる群から選択される反応性置換基を含有するシランカップリング剤を、基板へのコーティングの接着性を改善するための接着補助剤として追加で含み得る。
本発明による上述の成分を含む黒色感光性樹脂組成物は、従来の方法によって調製することができ、その実施形態は、以下の通りである。
本発明は、黒色感光性樹脂組成物を使用して形成された黒色カラムスペーサ(BCS)を提供する。黒色カラムスペーサパターンの実施形態を図1に示す。
以下、本発明を次の実施例を参照して詳細に説明する。しかしながら、実施例は、本発明をさらに例証することが意図され、その範囲がそれに限定されるものではない。
還流コンデンサ及び撹拌機を備えた500mLの丸底フラスコに、51モル%のN-フェニルマレイミド、4モル%のスチレン、10モル%の4-ヒドロキシブチルアクリレートグリシジルエーテル、及び35モル%のメタクリル酸を含有する100gのモノマーの混合物、溶媒としての300gのプロピレングリコールモノメチルエーテルアセテート(PGMEA)、ならびにラジカル重合開始剤としての2gの2,2′-アゾビス(2,4-ジメチルバレロニトリル)を添加し、続いて温度を70℃に上昇させ、5時間撹拌して31%の固形分を有するコポリマーを生成した。このように得られたコポリマーの酸価は、100mgKOH/gであり、ポリスチレン標準を使用するゲル浸透クロマトグラフィ(GPC)によって決定される重量平均分子量は、20,000であった。
3,000mLの3首丸底フラスコに、200gのトルエン、125.4gの4,4′-(9-フルオレニデン)ジフェノール、及び78.6gのエピクロロヒドリンを添加し、撹拌しながら40℃に加熱して溶液を得た。0.1386gのt-ブチルアンモニウム臭化物及び50% NaOH水溶液(3等量)を容器中で混合し、混合物を、得られた溶液に撹拌しながらゆっくりと添加した。
1,000mLの3首フラスコに、115gのステップ(1)で得られた化合物、50mgの塩化テトラメチルアンモニウム、50mgの2,6-ビス(1,1-ジメチルエチル)-4-メチルフェノール、及び35gのアクリル酸を添加した。混合物を、25mL/分の流量で送風しながら90~100℃に加熱し、120℃にさらに加熱して溶液を得た。得られた溶液を、その酸価が1.0mgKOH/g未満に下がるまで約12時間撹拌し、次いで室温に冷却した。300mLのジクロロメタン及び300mLの蒸留水を、撹拌しながら反応混合物に添加した。次いで、有機層を分離し、300mLの蒸留水で2回または3回洗浄し、硫酸マグネシウムで乾燥させ、減圧下で蒸留してジクロロメタンを除去し、それにより表題化合物をもたらした。
PGMEA中のステップ(2)において得られた化合物を、1,000mLの3首フラスコに入れ、1,2,4,5-ベンゼネテトラカルボン酸二無水物(0.75当量)、1,2,3,6-テトラヒドロフタル酸無水物(0.5当量)、及びトリフェニルホスフィン(0.01等量)をそれにさらに添加した。反応混合物を、撹拌しながら2時間、120~130℃に加熱し、次いで80~90℃に冷却し、続いて6時間撹拌した。室温に冷却した後、6,000の重量平均分子量(Mw)を有するポリマーの溶液(49重量%の固形分)及び107mgKOH/g(固形分に基づく)の酸価を得た。
撹拌機、温度計、窒素ガス置換装置、及び還流コンデンサを備えたフラスコに、450gのPGMEAを溶媒として添加し、150gの3,4-エポキシクロヘキシルメチルメタクリレート、及び3gの2,2′-アゾビスイソブチロニトリルをそれに添加した。この反応を30分間実施し、窒素置換を行った。分離され得るフラスコを油浴中に浸漬し、重合を行うために反応温度を80℃に維持しながら5時間撹拌した。このように得られた固体の濃度は、22重量%であり、5,500の重量平均分子量を有する化合物が得られた。
撹拌機、温度計、窒素ガス置換装置、及び還流コンデンサを備えたフラスコに、450gのPGMEAを溶媒として添加し、150gのグリシジルメタクリレート、及び3gの2,2′-アゾビスイソブチロニトリルをそれに添加した。この反応を30分間実施し、窒素置換を行った。分離され得るフラスコを油浴中に浸漬し、重合を行うために反応温度を80℃に維持しながら5時間撹拌した。このように得られた固体の濃度は、22重量%であり、4,000の重量平均分子量を有する化合物が得られた。
撹拌機、温度計、窒素ガス置換装置、及び還流コンデンサを備えたフラスコに、450gのPGMEAを溶媒として添加し、150gの4-ヒドロキシブチルアクリレートグリシジルエーテル、及び3gの2,2′-アゾビスイソブチロニトリルをそれに添加した。この反応を30分間実施し、窒素置換を行った。分離され得るフラスコを油浴中に浸漬し、重合を行うために反応温度を80℃に維持しながら5時間撹拌した。このように得られた固体の濃度は、22重量%であり、7,000の重量平均分子量を有する化合物が得られた。
着色分散液(F-1)は、Tokushiki Co.から供給され、以下の方法によって調製された。
着色分散液(F-2)は、Tokushiki Co.から供給され、以下の方法によって調製された。
4g(固形分)の調製例1で調製されたコポリマーとしてのコポリマー(A)、2.8g(固形分)の調製例2で調製されたエポキシ樹脂から誘導される化合物(B)、4.9gの光重合化合物(D)としてのDPHA(Nippon Kayaku)、0.2gの光重合開始剤(E)としてのオキシム光開始剤(OXE-03、BASF)、0.2gのトリアジン開始剤(T-Y、Pharmasynthese)、0.2g(固形分)の調製例3で調製されたエポキシ化合物(C-1)、及び6.7g(固形分)の調製例6で調製された着色分散液(F-1)を、81gの溶媒としてのPGMEA(G)中で従来の方法によって混合し、続いて5時間撹拌して黒色感光性樹脂組成物を調製した。
黒色感光性樹脂組成物を、以下の表1に列挙される各成分の種類及び/または量を変化させることを除いて、実施例1に記載されるものと同じ手順を実施することによって調製した。
実施例で調製された黒色感光性樹脂組成物及び比較例の各々を、スピンコーターを使用してガラス基板上にコーティングし、100℃で100秒間プレベークしてコーティングフィルムを形成した。このように製造されたコーティングフィルム上で、100%フルトーン(F/T)カラムスペーサ(CS)のパターンマスク及び30%のハーフトーン(H/T)カラムスペーサ(CS)のパターンマスクがそれぞれ適用され、365nmの波長を有する光を、硬化フィルムとマスクとの間に150μmの間隙を設け、42mJ/cm2の強度で照射した。破断点(BP)時間を確認した後、コーティングフィルムを、0.04重量%の水酸化カリウムを有する希釈水溶液を使用して23℃で15秒間現像し、純粋な水で1分間洗浄した。このように形成されたパターンを、230℃で30分間オーブン内でポストベークして、硬化フィルムを得た。
3gの黒色感光性樹脂組成物を滴下し、10cm×10cmのサイズを有するガラス基板上にスピンコーティングして、被覆性を評価した。ベナールセルまたは干渉ストライプを含まない均一のコーティングフィルムを、良好(○)として評価した。
上記の硬化フィルムの製造方法に従って主カラムスペーサ(主CS)及びサブカラムスペーサ(サブCS)を得た後(図1を参照)、厚さA及び厚さBの各々を、段差測定装置(SNU(SIS-2000)、SNU Precision)を使用して測定した。厚さの差A-Bが0.3~0.5μmである場合、良好な段差特性が予想され得る。
硬化フィルムの製造方法に従い、20μmの直径を有する30% H/Tパターンマスクを使用して一定ドットパターンを再現するための露光強度が得られ、現像可能なパターンを確認した。ドットパターンが10μm以下の最小パターンサイズを有し、パターンを100%のN-メチルピロリドン(NMP)溶液中に80℃で10分間浸漬した後に剥離されなかった場合、接着性を〇として評価した。一方で、ドットパターンが10μm超のサイズを有していたか、またはパターンをNMP溶液中に80℃で10分間浸漬した後に剥離された場合、接着性を×として評価した。
硬化フィルムの製造方法に従って主CS及びサブCSを形成した後、各表面を走査電子顕微鏡(SEM、S-4300、Hitachi)を使用して観察した。表面粒子が凝集されることが見出された場合、表面特性を不良(×)として評価し、表面粒子が滑らかであると見出された場合、表面特性を良好(○)として評価した。
硬化フィルムの製造を、マスクを使用することなく実施して、ポストベーク後に3.0μmの厚さを有する硬化フィルムを形成した。硬化フィルムに関して、550nmでの透過率を、光学密度システム(361T、Xlite)を使用して測定し、1μmの厚さに対する光学密度を得た。
Claims (8)
- 黒色感光性樹脂組成物であって、
(A)アクリルコポリマーと、
(B)エポキシ樹脂またはそれから誘導される化合物と、
(C)(A)及び(B)とは異なるエポキシ化合物と、
(D)光重合性化合物と、
(E)光開始剤と、
(F)黒色着色剤と、を含み、
前記エポキシ化合物(C)が、エポキシ基及び不飽和二重結合を有するモノマーから誘導される構造単位を有するホモポリマーまたはコポリマーである、黒色感光性樹脂組成物。 - 黒色感光性樹脂組成物であって、
(A)アクリルコポリマーと、
(B)エポキシ樹脂またはそれから誘導される化合物と、
(C)(A)及び(B)とは異なるエポキシ化合物と、
(D)光重合性化合物と、
(E)光開始剤と、
(F)黒色着色剤と、を含み、
前記アクリルコポリマー(A)は、前記黒色感光性樹脂組成物の総重量(固形分に基づく)を基準に10~40重量%の量で含まれ、前記エポキシ樹脂またはそれから誘導される前記化合物(B)は、前記黒色感光性樹脂組成物の総重量(固形分に基づく)を基準に10~40重量%の量で含まれ、
前記アクリルコポリマー(A):前記エポキシ樹脂またはそれから誘導される前記化合物(B)の重量比は、40~80:60~20であり、
前記エポキシ樹脂またはそれから誘導される前記化合物(B)は、カルド(cardo)骨格構造を有する、黒色感光性樹脂組成物。 - 黒色感光性樹脂組成物であって、
(A)アクリルコポリマーと、
(B)エポキシ樹脂またはそれから誘導される化合物と、
(C)(A)及び(B)とは異なるエポキシ化合物と、
(D)光重合性化合物と、
(E)光開始剤と、
(F)黒色着色剤と、を含み、
前記黒色着色剤(F)は、前記黒色感光性樹脂組成物の総重量(固形分に基づく)に基づいて10~60重量%の量で含まれ、
前記エポキシ樹脂またはそれから誘導される前記化合物(B)は、カルド(cardo)骨格構造を有する、黒色感光性樹脂組成物。 - 前記黒色着色剤(F)が、前記着色剤の総重量(固形分に基づく)を基準に90重量%以上の黒色無機着色剤を含む、請求項1~3のいずれか一項に記載の黒色感光性樹脂組成物。
- 前記黒色着色剤(F)が、前記黒色感光性樹脂組成物の総重量(固形分に基づく)に基づいて10~60重量%の量で含まれる、請求項1又は2に記載の黒色感光性樹脂組成物。
- 前記黒色着色剤(F)が、前記着色剤の総重量(固形分に基づく)を基準に0~10重量%の黒色有機着色剤を含む、請求項1~5のいずれか一項に記載の黒色感光性樹脂組成物。
- 前記エポキシ樹脂またはそれから誘導される前記化合物(B)が、カルド(cardo)骨格構造を有する、請求項1に記載の黒色感光性樹脂組成物。
- 前記黒色感光性樹脂組成物は、前記黒色感光性樹脂組成物が1μmの厚さを有するフィルムに硬化されるとき、0.5~2.5の光学密度を有する、請求項1~7のいずれか一項に記載の黒色感光性樹脂組成物。
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Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011048064A (ja) | 2009-08-26 | 2011-03-10 | Asahi Kasei E-Materials Corp | 感光性樹脂組成物及び積層体、並びにこれを用いた電磁波シールド及び透明導電性基板 |
JP2014235376A (ja) | 2013-06-04 | 2014-12-15 | 太陽インキ製造株式会社 | 光硬化熱硬化性樹脂組成物、硬化物、及びプリント配線板 |
WO2015046178A1 (ja) | 2013-09-25 | 2015-04-02 | 三菱化学株式会社 | 感光性着色組成物、ブラックマトリクス、着色スペーサー、画像表示装置及び顔料分散液 |
JP2015518978A (ja) | 2012-05-25 | 2015-07-06 | エルジー・ケム・リミテッド | 感光性樹脂組成物、これを用いて形成されたパターン、パターンの製造方法およびこれを含むディスプレイパネル |
WO2016006669A1 (ja) | 2014-07-11 | 2016-01-14 | 三菱化学株式会社 | 感光性樹脂組成物、硬化物、ブラックマトリックス及び画像表示装置 |
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Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20000035753A (ko) | 1998-11-30 | 2000-06-26 | 마쯔모또 에이찌 | 블랙 레지스트용 감방사선성 조성물 |
JP2001154206A (ja) | 1999-11-25 | 2001-06-08 | Jsr Corp | スペーサー用感放射線性樹脂組成物、スペーサーおよび液晶表示素子 |
JP2007071994A (ja) | 2005-09-05 | 2007-03-22 | Tokyo Ohka Kogyo Co Ltd | 黒色感光性樹脂組成物 |
KR100791817B1 (ko) | 2005-09-30 | 2008-01-04 | 주식회사 동진쎄미켐 | 감광성 수지 조성물 |
KR100961818B1 (ko) * | 2007-02-21 | 2010-06-08 | 주식회사 엘지화학 | 블랙 매트릭스용 감광성 수지 조성물, 이에 의해 형성되는블랙 매트릭스 및 이를 포함하는 액정표시소자 |
JP5549099B2 (ja) | 2009-03-31 | 2014-07-16 | 凸版印刷株式会社 | 感光性樹脂組成物、カラーフィルタ及びカラーフィルタの製造方法 |
KR101981579B1 (ko) * | 2012-12-10 | 2019-05-23 | 엘지디스플레이 주식회사 | 표시장치용 감광성 조성물, 이를 포함하는 블랙 매트릭스 및 블랙 매트릭스의 패턴 형성 방법 |
KR101658374B1 (ko) | 2013-01-25 | 2016-09-22 | 롬엔드하스전자재료코리아유한회사 | 컬럼 스페이서 및 블랙 매트릭스를 동시에 구현할 수 있는 착색 감광성 수지 조성물 |
JP5668118B2 (ja) * | 2013-09-20 | 2015-02-12 | 新日鉄住金化学株式会社 | 感光性樹脂組成物及び硬化膜 |
JP6365118B2 (ja) | 2013-09-20 | 2018-08-01 | 三菱ケミカル株式会社 | 感光性樹脂組成物、それを硬化させてなる硬化物、ブラックマトリックス及び画像表示装置 |
TWI544278B (zh) * | 2014-05-28 | 2016-08-01 | 奇美實業股份有限公司 | 感光性樹脂組成物及其應用 |
JP6373571B2 (ja) * | 2013-11-14 | 2018-08-15 | 東京応化工業株式会社 | ブラックカラムスペーサ形成用感光性樹脂組成物 |
TWI477539B (zh) | 2014-02-13 | 2015-03-21 | Chi Mei Corp | 鹼可溶性樹脂、感光性樹脂組成物、彩色濾光片及其製造方法、液晶顯示裝置 |
KR101804259B1 (ko) * | 2015-03-24 | 2017-12-04 | 삼성에스디아이 주식회사 | 감광성 수지 조성물, 이를 이용한 블랙 컬럼 스페이서 및 컬러필터 |
WO2017110893A1 (ja) * | 2015-12-24 | 2017-06-29 | 三菱化学株式会社 | 感光性着色組成物、硬化物、着色スペーサー、画像表示装置 |
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Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011048064A (ja) | 2009-08-26 | 2011-03-10 | Asahi Kasei E-Materials Corp | 感光性樹脂組成物及び積層体、並びにこれを用いた電磁波シールド及び透明導電性基板 |
JP2015518978A (ja) | 2012-05-25 | 2015-07-06 | エルジー・ケム・リミテッド | 感光性樹脂組成物、これを用いて形成されたパターン、パターンの製造方法およびこれを含むディスプレイパネル |
JP2014235376A (ja) | 2013-06-04 | 2014-12-15 | 太陽インキ製造株式会社 | 光硬化熱硬化性樹脂組成物、硬化物、及びプリント配線板 |
WO2015046178A1 (ja) | 2013-09-25 | 2015-04-02 | 三菱化学株式会社 | 感光性着色組成物、ブラックマトリクス、着色スペーサー、画像表示装置及び顔料分散液 |
WO2016006669A1 (ja) | 2014-07-11 | 2016-01-14 | 三菱化学株式会社 | 感光性樹脂組成物、硬化物、ブラックマトリックス及び画像表示装置 |
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KR20170086399A (ko) | 2017-07-26 |
TWI737667B (zh) | 2021-09-01 |
JP2019505012A (ja) | 2019-02-21 |
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US10884335B2 (en) | 2021-01-05 |
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