JP7065974B2 - 組成物、膜、赤外線透過フィルタ、構造体、光センサおよび画像表示装置 - Google Patents

組成物、膜、赤外線透過フィルタ、構造体、光センサおよび画像表示装置 Download PDF

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JP7065974B2
JP7065974B2 JP2020536392A JP2020536392A JP7065974B2 JP 7065974 B2 JP7065974 B2 JP 7065974B2 JP 2020536392 A JP2020536392 A JP 2020536392A JP 2020536392 A JP2020536392 A JP 2020536392A JP 7065974 B2 JP7065974 B2 JP 7065974B2
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JPWO2020031590A1 (ja
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全弘 森
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Fujifilm Corp
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B5/00—Dyes with an anthracene nucleus condensed with one or more heterocyclic rings with or without carbocyclic rings
    • C09B5/62—Cyclic imides or amidines of peri-dicarboxylic acids of the anthracene, benzanthrene, or perylene series
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B57/00—Other synthetic dyes of known constitution
    • C09B57/02—Coumarine dyes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optical Filters (AREA)
  • Materials For Photolithography (AREA)
  • Polymerisation Methods In General (AREA)
JP2020536392A 2018-08-08 2019-07-09 組成物、膜、赤外線透過フィルタ、構造体、光センサおよび画像表示装置 Active JP7065974B2 (ja)

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JP2018149532 2018-08-08
JP2018149532 2018-08-08
PCT/JP2019/027126 WO2020031590A1 (ja) 2018-08-08 2019-07-09 組成物、膜、赤外線透過フィルタ、構造体、光センサおよび画像表示装置

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JPWO2020031590A1 JPWO2020031590A1 (ja) 2021-08-26
JP7065974B2 true JP7065974B2 (ja) 2022-05-12

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JP (1) JP7065974B2 (zh)
TW (1) TW202007697A (zh)
WO (1) WO2020031590A1 (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7247676B2 (ja) * 2019-03-15 2023-03-29 三菱ケミカル株式会社 感光性着色樹脂組成物、硬化物、及び画像表示装置
JP2022173626A (ja) * 2021-05-10 2022-11-22 イーケムソリューションズジャパン株式会社 黒色レジスト組成物及び近赤外線フォトリソグラフィ法による黒色パターンの形成方法
WO2023054143A1 (ja) * 2021-09-29 2023-04-06 富士フイルム株式会社 硬化性組成物、硬化膜、パターンの形成方法、近赤外線カットフィルタ、固体撮像素子、画像表示装置および赤外線センサ

Citations (2)

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Publication number Priority date Publication date Assignee Title
WO2016190162A1 (ja) 2015-05-22 2016-12-01 富士フイルム株式会社 着色組成物、膜、カラーフィルタ、パターン形成方法、カラーフィルタの製造方法、固体撮像素子および赤外線センサ
WO2018061525A1 (ja) 2016-09-30 2018-04-05 東レ株式会社 ネガ型感光性樹脂組成物、硬化膜、硬化膜を具備する素子及び表示装置、並びにその製造方法

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TW201423272A (zh) * 2012-11-27 2014-06-16 Jsr Corp 感光性組成物、著色劑分散液、濾光片及光感應器
JP6170673B2 (ja) * 2012-12-27 2017-07-26 富士フイルム株式会社 カラーフィルタ用組成物、赤外線透過フィルタ及びその製造方法、並びに赤外線センサー
TWI664499B (zh) * 2016-06-04 2019-07-01 奇美實業股份有限公司 黑色感光性樹脂組成物及其應用
JP6985715B2 (ja) * 2016-06-15 2021-12-22 山陽色素株式会社 黒色顔料組成物及びこれを含む黒色塗膜形成組成物
TWI756347B (zh) * 2017-01-30 2022-03-01 日商富士軟片股份有限公司 組成物、膜、紅外線透過濾波器、固體攝像元件、圖像顯示裝置及紅外線感測器

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016190162A1 (ja) 2015-05-22 2016-12-01 富士フイルム株式会社 着色組成物、膜、カラーフィルタ、パターン形成方法、カラーフィルタの製造方法、固体撮像素子および赤外線センサ
WO2018061525A1 (ja) 2016-09-30 2018-04-05 東レ株式会社 ネガ型感光性樹脂組成物、硬化膜、硬化膜を具備する素子及び表示装置、並びにその製造方法

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
日本化薬，KAYARAD KAYAMER KAYACURE Radiation Curable Products，2016年，第3版，p.1-21

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WO2020031590A1 (ja) 2020-02-13
TW202007697A (zh) 2020-02-16

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