JP7041482B2 - 露光装置 - Google Patents
露光装置 Download PDFInfo
- Publication number
- JP7041482B2 JP7041482B2 JP2017176123A JP2017176123A JP7041482B2 JP 7041482 B2 JP7041482 B2 JP 7041482B2 JP 2017176123 A JP2017176123 A JP 2017176123A JP 2017176123 A JP2017176123 A JP 2017176123A JP 7041482 B2 JP7041482 B2 JP 7041482B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- exposure
- long
- exposure stage
- stage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
- G03F7/7075—Handling workpieces outside exposure position, e.g. SMIF box
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
- B65H20/00—Advancing webs
- B65H20/02—Advancing webs by friction roller
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Winding Of Webs (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017176123A JP7041482B2 (ja) | 2017-09-13 | 2017-09-13 | 露光装置 |
TW107132014A TWI741215B (zh) | 2017-09-13 | 2018-09-12 | 曝光裝置 |
CN201811060520.6A CN109491209A (zh) | 2017-09-13 | 2018-09-12 | 曝光装置 |
JP2022036821A JP7175409B2 (ja) | 2017-09-13 | 2022-03-10 | 露光装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017176123A JP7041482B2 (ja) | 2017-09-13 | 2017-09-13 | 露光装置 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2022036821A Division JP7175409B2 (ja) | 2017-09-13 | 2022-03-10 | 露光装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2019053140A JP2019053140A (ja) | 2019-04-04 |
JP7041482B2 true JP7041482B2 (ja) | 2022-03-24 |
Family
ID=65689897
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2017176123A Active JP7041482B2 (ja) | 2017-09-13 | 2017-09-13 | 露光装置 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP7041482B2 (zh) |
CN (1) | CN109491209A (zh) |
TW (1) | TWI741215B (zh) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110007569A (zh) * | 2019-05-10 | 2019-07-12 | 苏州微影激光技术有限公司 | 一种直写式曝光机工作台组件及直写式曝光机 |
JP7441076B2 (ja) * | 2020-03-03 | 2024-02-29 | 株式会社Screenホールディングス | 描画装置 |
Citations (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001264999A (ja) | 2000-03-17 | 2001-09-28 | Ushio Inc | 帯状ワークの露光装置 |
JP2005208283A (ja) | 2004-01-22 | 2005-08-04 | Fuji Photo Film Co Ltd | ステージ循環装置、画像形成装置 |
JP2006098727A (ja) | 2004-09-29 | 2006-04-13 | Fuji Photo Film Co Ltd | 伸縮状態の検出手段を設けた長尺の可撓性記録媒体と、この可撓性記録媒体に伸縮状態を補正して画像を描画可能な描画方法及び装置 |
JP2006136897A (ja) | 2004-11-10 | 2006-06-01 | Hitachi Via Mechanics Ltd | シート状ワークの保持方法および保持装置 |
JP2006276398A (ja) | 2005-03-29 | 2006-10-12 | Nsk Ltd | 露光装置 |
JP2007114385A (ja) | 2005-10-19 | 2007-05-10 | Mejiro Precision:Kk | 投影露光装置及びその投影露光方法 |
JP2008191303A (ja) | 2007-02-02 | 2008-08-21 | Fujifilm Corp | 描画装置及び方法 |
JP2010176121A (ja) | 2009-01-30 | 2010-08-12 | Nikon Corp | 露光方法及び装置、並びにデバイス製造方法 |
CN103033138A (zh) | 2012-12-21 | 2013-04-10 | 中国科学院长春光学精密机械与物理研究所 | 一种用于制造绝对式钢带光栅尺的加工装置 |
JP2013218157A (ja) | 2012-04-10 | 2013-10-24 | Nikon Corp | 露光装置、露光方法及び基板処理装置 |
JP2015222370A (ja) | 2014-05-23 | 2015-12-10 | 株式会社オーク製作所 | 露光装置 |
JP2016020278A (ja) | 2011-02-24 | 2016-02-04 | 株式会社ニコン | 基板処理方法 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3376961B2 (ja) * | 1999-06-08 | 2003-02-17 | ウシオ電機株式会社 | マスクを移動させて位置合わせを行う露光装置 |
JP3541783B2 (ja) * | 2000-06-22 | 2004-07-14 | ウシオ電機株式会社 | フィルム回路基板の周辺露光装置 |
JP4215675B2 (ja) * | 2004-04-08 | 2009-01-28 | 日立ビアメカニクス株式会社 | シート状ワークのレーザ加工機 |
JP2006098718A (ja) * | 2004-09-29 | 2006-04-13 | Fuji Photo Film Co Ltd | 描画装置 |
JP6554330B2 (ja) * | 2015-06-01 | 2019-07-31 | 株式会社オーク製作所 | マスクレス露光装置および露光方法 |
-
2017
- 2017-09-13 JP JP2017176123A patent/JP7041482B2/ja active Active
-
2018
- 2018-09-12 CN CN201811060520.6A patent/CN109491209A/zh active Pending
- 2018-09-12 TW TW107132014A patent/TWI741215B/zh active
Patent Citations (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001264999A (ja) | 2000-03-17 | 2001-09-28 | Ushio Inc | 帯状ワークの露光装置 |
JP2005208283A (ja) | 2004-01-22 | 2005-08-04 | Fuji Photo Film Co Ltd | ステージ循環装置、画像形成装置 |
JP2006098727A (ja) | 2004-09-29 | 2006-04-13 | Fuji Photo Film Co Ltd | 伸縮状態の検出手段を設けた長尺の可撓性記録媒体と、この可撓性記録媒体に伸縮状態を補正して画像を描画可能な描画方法及び装置 |
JP2006136897A (ja) | 2004-11-10 | 2006-06-01 | Hitachi Via Mechanics Ltd | シート状ワークの保持方法および保持装置 |
JP2006276398A (ja) | 2005-03-29 | 2006-10-12 | Nsk Ltd | 露光装置 |
JP2007114385A (ja) | 2005-10-19 | 2007-05-10 | Mejiro Precision:Kk | 投影露光装置及びその投影露光方法 |
JP2008191303A (ja) | 2007-02-02 | 2008-08-21 | Fujifilm Corp | 描画装置及び方法 |
JP2010176121A (ja) | 2009-01-30 | 2010-08-12 | Nikon Corp | 露光方法及び装置、並びにデバイス製造方法 |
JP2016020278A (ja) | 2011-02-24 | 2016-02-04 | 株式会社ニコン | 基板処理方法 |
JP2013218157A (ja) | 2012-04-10 | 2013-10-24 | Nikon Corp | 露光装置、露光方法及び基板処理装置 |
CN103033138A (zh) | 2012-12-21 | 2013-04-10 | 中国科学院长春光学精密机械与物理研究所 | 一种用于制造绝对式钢带光栅尺的加工装置 |
JP2015222370A (ja) | 2014-05-23 | 2015-12-10 | 株式会社オーク製作所 | 露光装置 |
Non-Patent Citations (1)
Title |
---|
入江明、他,次世代パッケージ基板用ダイレクトイメージング技術,エレクトロニクス実装学会誌 ,Vol.13,No.5,2010年,第409-412頁 |
Also Published As
Publication number | Publication date |
---|---|
TW201921153A (zh) | 2019-06-01 |
JP2019053140A (ja) | 2019-04-04 |
CN109491209A (zh) | 2019-03-19 |
TWI741215B (zh) | 2021-10-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6510768B2 (ja) | 露光装置 | |
TWI363256B (zh) | ||
CN1756290A (zh) | 描绘装置 | |
JP2006106097A (ja) | 画像記録装置及び画像記録方法 | |
JP7041482B2 (ja) | 露光装置 | |
JP2006102991A (ja) | 画像記録装置及び画像記録方法 | |
JP6723831B2 (ja) | 露光装置 | |
JP2020184045A (ja) | 直描式露光装置 | |
JP7175409B2 (ja) | 露光装置 | |
JP7175150B2 (ja) | 露光装置 | |
WO2013065451A1 (ja) | 基板処理装置および基板処理方法 | |
JP7037416B2 (ja) | 露光装置 | |
JP7040981B2 (ja) | 露光装置 | |
JP6818395B2 (ja) | 露光装置 | |
JP7175149B2 (ja) | 露光装置および露光方法 | |
JP7089920B2 (ja) | 露光装置 | |
TWI816763B (zh) | 曝光裝置 | |
TWI839598B (zh) | 曝光裝置 | |
JP2023078747A (ja) | 露光装置 | |
JP7023620B2 (ja) | 露光装置及び基板載置方法 | |
JP4499482B2 (ja) | 帯状ワークの露光装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20200805 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20210531 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20210615 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20210803 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20210824 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20211012 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20211222 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20220215 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20220311 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 7041482 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |