JP7041482B2 - 露光装置 - Google Patents

露光装置 Download PDF

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Publication number
JP7041482B2
JP7041482B2 JP2017176123A JP2017176123A JP7041482B2 JP 7041482 B2 JP7041482 B2 JP 7041482B2 JP 2017176123 A JP2017176123 A JP 2017176123A JP 2017176123 A JP2017176123 A JP 2017176123A JP 7041482 B2 JP7041482 B2 JP 7041482B2
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JP
Japan
Prior art keywords
substrate
exposure
long
exposure stage
stage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2017176123A
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English (en)
Japanese (ja)
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JP2019053140A (ja
Inventor
勝 山賀
悟 緑川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Orc Manufacturing Co Ltd
Original Assignee
Orc Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Orc Manufacturing Co Ltd filed Critical Orc Manufacturing Co Ltd
Priority to JP2017176123A priority Critical patent/JP7041482B2/ja
Priority to TW107132014A priority patent/TWI741215B/zh
Priority to CN201811060520.6A priority patent/CN109491209A/zh
Publication of JP2019053140A publication Critical patent/JP2019053140A/ja
Priority to JP2022036821A priority patent/JP7175409B2/ja
Application granted granted Critical
Publication of JP7041482B2 publication Critical patent/JP7041482B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/7075—Handling workpieces outside exposure position, e.g. SMIF box
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
    • B65H20/00—Advancing webs
    • B65H20/02—Advancing webs by friction roller
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Winding Of Webs (AREA)
JP2017176123A 2017-09-13 2017-09-13 露光装置 Active JP7041482B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2017176123A JP7041482B2 (ja) 2017-09-13 2017-09-13 露光装置
TW107132014A TWI741215B (zh) 2017-09-13 2018-09-12 曝光裝置
CN201811060520.6A CN109491209A (zh) 2017-09-13 2018-09-12 曝光装置
JP2022036821A JP7175409B2 (ja) 2017-09-13 2022-03-10 露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2017176123A JP7041482B2 (ja) 2017-09-13 2017-09-13 露光装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2022036821A Division JP7175409B2 (ja) 2017-09-13 2022-03-10 露光装置

Publications (2)

Publication Number Publication Date
JP2019053140A JP2019053140A (ja) 2019-04-04
JP7041482B2 true JP7041482B2 (ja) 2022-03-24

Family

ID=65689897

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2017176123A Active JP7041482B2 (ja) 2017-09-13 2017-09-13 露光装置

Country Status (3)

Country Link
JP (1) JP7041482B2 (zh)
CN (1) CN109491209A (zh)
TW (1) TWI741215B (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110007569A (zh) * 2019-05-10 2019-07-12 苏州微影激光技术有限公司 一种直写式曝光机工作台组件及直写式曝光机
JP7441076B2 (ja) * 2020-03-03 2024-02-29 株式会社Ｓｃｒｅｅｎホールディングス 描画装置

Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001264999A (ja) 2000-03-17 2001-09-28 Ushio Inc 帯状ワークの露光装置
JP2005208283A (ja) 2004-01-22 2005-08-04 Fuji Photo Film Co Ltd ステージ循環装置、画像形成装置
JP2006098727A (ja) 2004-09-29 2006-04-13 Fuji Photo Film Co Ltd 伸縮状態の検出手段を設けた長尺の可撓性記録媒体と、この可撓性記録媒体に伸縮状態を補正して画像を描画可能な描画方法及び装置
JP2006136897A (ja) 2004-11-10 2006-06-01 Hitachi Via Mechanics Ltd シート状ワークの保持方法および保持装置
JP2006276398A (ja) 2005-03-29 2006-10-12 Nsk Ltd 露光装置
JP2007114385A (ja) 2005-10-19 2007-05-10 Mejiro Precision:Kk 投影露光装置及びその投影露光方法
JP2008191303A (ja) 2007-02-02 2008-08-21 Fujifilm Corp 描画装置及び方法
JP2010176121A (ja) 2009-01-30 2010-08-12 Nikon Corp 露光方法及び装置、並びにデバイス製造方法
CN103033138A (zh) 2012-12-21 2013-04-10 中国科学院长春光学精密机械与物理研究所 一种用于制造绝对式钢带光栅尺的加工装置
JP2013218157A (ja) 2012-04-10 2013-10-24 Nikon Corp 露光装置、露光方法及び基板処理装置
JP2015222370A (ja) 2014-05-23 2015-12-10 株式会社オーク製作所 露光装置
JP2016020278A (ja) 2011-02-24 2016-02-04 株式会社ニコン 基板処理方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3376961B2 (ja) * 1999-06-08 2003-02-17 ウシオ電機株式会社 マスクを移動させて位置合わせを行う露光装置
JP3541783B2 (ja) * 2000-06-22 2004-07-14 ウシオ電機株式会社 フィルム回路基板の周辺露光装置
JP4215675B2 (ja) * 2004-04-08 2009-01-28 日立ビアメカニクス株式会社 シート状ワークのレーザ加工機
JP2006098718A (ja) * 2004-09-29 2006-04-13 Fuji Photo Film Co Ltd 描画装置
JP6554330B2 (ja) * 2015-06-01 2019-07-31 株式会社オーク製作所 マスクレス露光装置および露光方法

Patent Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001264999A (ja) 2000-03-17 2001-09-28 Ushio Inc 帯状ワークの露光装置
JP2005208283A (ja) 2004-01-22 2005-08-04 Fuji Photo Film Co Ltd ステージ循環装置、画像形成装置
JP2006098727A (ja) 2004-09-29 2006-04-13 Fuji Photo Film Co Ltd 伸縮状態の検出手段を設けた長尺の可撓性記録媒体と、この可撓性記録媒体に伸縮状態を補正して画像を描画可能な描画方法及び装置
JP2006136897A (ja) 2004-11-10 2006-06-01 Hitachi Via Mechanics Ltd シート状ワークの保持方法および保持装置
JP2006276398A (ja) 2005-03-29 2006-10-12 Nsk Ltd 露光装置
JP2007114385A (ja) 2005-10-19 2007-05-10 Mejiro Precision:Kk 投影露光装置及びその投影露光方法
JP2008191303A (ja) 2007-02-02 2008-08-21 Fujifilm Corp 描画装置及び方法
JP2010176121A (ja) 2009-01-30 2010-08-12 Nikon Corp 露光方法及び装置、並びにデバイス製造方法
JP2016020278A (ja) 2011-02-24 2016-02-04 株式会社ニコン 基板処理方法
JP2013218157A (ja) 2012-04-10 2013-10-24 Nikon Corp 露光装置、露光方法及び基板処理装置
CN103033138A (zh) 2012-12-21 2013-04-10 中国科学院长春光学精密机械与物理研究所 一种用于制造绝对式钢带光栅尺的加工装置
JP2015222370A (ja) 2014-05-23 2015-12-10 株式会社オーク製作所 露光装置

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
入江明、他，次世代パッケージ基板用ダイレクトイメージング技術，エレクトロニクス実装学会誌 ，Ｖｏｌ．１３，Ｎｏ．５，2010年，第４０９－４１２頁

Also Published As

Publication number Publication date
TW201921153A (zh) 2019-06-01
JP2019053140A (ja) 2019-04-04
CN109491209A (zh) 2019-03-19
TWI741215B (zh) 2021-10-01

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