JP6884109B2 - 基板搬送ロボットおよびその運転方法 - Google Patents
基板搬送ロボットおよびその運転方法 Download PDFInfo
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- JP6884109B2 JP6884109B2 JP2017556059A JP2017556059A JP6884109B2 JP 6884109 B2 JP6884109 B2 JP 6884109B2 JP 2017556059 A JP2017556059 A JP 2017556059A JP 2017556059 A JP2017556059 A JP 2017556059A JP 6884109 B2 JP6884109 B2 JP 6884109B2
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- 238000012546 transfer Methods 0.000 title claims description 77
- 238000000034 method Methods 0.000 title claims description 30
- 239000000758 substrate Substances 0.000 claims description 217
- 239000012636 effector Substances 0.000 claims description 81
- 230000001133 acceleration Effects 0.000 claims description 39
- 230000008859 change Effects 0.000 claims description 5
- 238000001514 detection method Methods 0.000 claims description 3
- 235000012431 wafers Nutrition 0.000 description 56
- 230000007423 decrease Effects 0.000 description 10
- 230000002159 abnormal effect Effects 0.000 description 9
- 239000004065 semiconductor Substances 0.000 description 9
- 238000006073 displacement reaction Methods 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 7
- 238000012986 modification Methods 0.000 description 7
- 230000004048 modification Effects 0.000 description 7
- 230000001965 increasing effect Effects 0.000 description 6
- 238000012545 processing Methods 0.000 description 5
- 230000008569 process Effects 0.000 description 4
- 230000001174 ascending effect Effects 0.000 description 3
- 230000003028 elevating effect Effects 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 239000004973 liquid crystal related substance Substances 0.000 description 3
- 238000001179 sorption measurement Methods 0.000 description 3
- 230000005856 abnormality Effects 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 230000010485 coping Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000009118 appropriate response Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67742—Mechanical parts of transfer devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67253—Process monitoring, e.g. flow or thickness monitoring
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67259—Position monitoring, e.g. misposition detection or presence detection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67706—Mechanical details, e.g. roller, belt
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68707—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a robot blade, or gripped by a gripper for conveyance
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Robotics (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Manipulator (AREA)
Description
前記保持力検出手段は、前記基板保持手段の真空度を検出するように構成されている、ことを特徴とする。
図15は、上述した各実施形態および変形例による基板搬送ロボットにおける制御方法の他の例を示しており、同図に示したように、基板搬送の動作パターンの加速度(または速度)を全体的に下げることにより、ピークの加速度(または速度)を上限値以下とすることもできる。
2 基台
3 旋回主軸
4 ロボットアーム
5 第1リンク部材
6 第2リンク部材
7 エンドエフェクタ(ハンド)
8 旋回主軸の昇降動作の駆動源
9 旋回主軸および第1リンク部材の回転動作の駆動源(アーム駆動手段)
10 第2リンク部材の回転動作の駆動源(アーム駆動手段)
11 エンドエフェクタの回転動作の駆動源(アーム駆動手段)
12 ロボットコントローラ(ロボット制御手段)
13 基板保持手段
14 固定係合部(基板保持手段)
15 可動係合部(基板保持手段)
16 プランジャ(基板保持手段)
17 細長部材(基板保持手段)
18 固定係合部の段部
19 位置センサ
20 圧力センサ(保持力検出手段)
21 基板収容容器
22 基板収容容器の基板支持部
30 基板保持開口(基板保持手段)
31 真空引き流路(基板保持手段)
32 真空源(基板保持手段)
33 真空センサ(保持力検出手段)
L1 第1回転軸線
L2 第2回転軸線
L3 第3回転軸線
S 基板
Claims (10)
- ロボットアームと、
前記ロボットアームに設けられ、基板を保持するための基板保持手段を有するエンドエフェクタと、
前記ロボットアームを駆動するためのアーム駆動手段と、
前記アーム駆動手段を制御するためのロボット制御手段と、
前記基板保持手段による基板保持力を検出するための保持力検出手段と、を備え、
前記ロボット制御手段は、前記保持力検出手段により検出された前記基板保持力に応じて決定される前記エンドエフェクタの加速度および速度の少なくとも一方の上限値に基づいて前記アーム駆動手段を制御するように構成されており、
前記基板保持手段は、前記基板保持力を生成するための保持力発生手段を有し、
前記ロボット制御手段は、前記基板保持力が正常値よりも低下した場合、前記保持力発生手段のパワーを増大させるように構成されている、基板搬送ロボット。 - 前記ロボット制御手段は、前記エンドエフェクタの加速度および速度の両方の上限値に基づいて前記アーム駆動手段を制御するように構成されている、請求項1記載の基板搬送ロボット。
- 前記基板保持手段は、前記基板を真空吸着するように構成されており
前記保持力検出手段は、前記基板保持手段の真空度を検出するように構成されている、請求項1または2に記載の基板搬送ロボット。 - 前記基板保持手段は、前記基板の縁部に解放可能に係合する可動係合部と、前記可動係合部を駆動するためのプランジャと、を有し、
前記保持力検出手段は、前記プランジャの圧力を検出するように構成されている、請求項1または2に記載の基板搬送ロボット。 - 前記ロボット制御手段は、前記保持力検出手段により検出された前記基板保持力に応じて前記上限値を連続的に変更するように構成されている、請求項1乃至4のいずれか一項に記載の基板搬送ロボット。
- 前記ロボット制御手段は、前記保持力検出手段により検出された前記基板保持力に応じて前記上限値をステップ状に変更するように構成されている、請求項1乃至4のいずれか一項に記載の基板搬送ロボット。
- 基板を保持するための基板保持手段を含むエンドエフェクタが設けられたロボットアームを備えた基板搬送ロボットの運転方法であって、
前記基板保持手段による基板保持力を検出する保持力検出工程と、
前記基板保持力に応じて前記エンドエフェクタの加速度および速度の少なくとも一方の上限値を決定する上限値決定工程と、
前記エンドエフェクタの前記上限値に基づいて前記ロボットアームを駆動するアーム駆動工程と、を備え、
前記基板保持手段は、前記基板保持力を生成するための保持力発生手段を有し、
前記基板保持力が正常値よりも低下した場合、前記保持力発生手段のパワーを増大させる、基板搬送ロボットの運転方法。 - 前記アーム駆動工程は、前記エンドエフェクタの加速度および速度の両方の上限値に基づいて前記ロボットアームを駆動する、請求項7記載の基板搬送ロボットの運転方法。
- 前記基板保持力に応じて前記上限値を連続的に変更する、請求項7または8に記載の基板搬送ロボットの運転方法。
- 前記基板保持力に応じて前記上限値をステップ状に変更する、請求項7または8に記載の基板搬送ロボットの運転方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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US14/968,148 | 2015-12-14 | ||
US14/968,148 US10014205B2 (en) | 2015-12-14 | 2015-12-14 | Substrate conveyance robot and operating method thereof |
PCT/JP2016/087015 WO2017104648A1 (ja) | 2015-12-14 | 2016-12-13 | 基板搬送ロボットおよびその運転方法 |
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JPWO2017104648A1 JPWO2017104648A1 (ja) | 2018-10-04 |
JP6884109B2 true JP6884109B2 (ja) | 2021-06-09 |
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JP2017556059A Active JP6884109B2 (ja) | 2015-12-14 | 2016-12-13 | 基板搬送ロボットおよびその運転方法 |
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US (1) | US10014205B2 (ja) |
JP (1) | JP6884109B2 (ja) |
KR (1) | KR102115690B1 (ja) |
CN (1) | CN108604563B (ja) |
TW (1) | TWI629149B (ja) |
WO (1) | WO2017104648A1 (ja) |
Cited By (1)
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JP7187147B2 (ja) * | 2017-12-12 | 2022-12-12 | 東京エレクトロン株式会社 | 搬送装置のティーチング方法及び基板処理システム |
JP2019155542A (ja) * | 2018-03-14 | 2019-09-19 | 株式会社東芝 | 搬送装置、搬送システム、コントローラ、および搬送方法 |
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- 2016-12-13 WO PCT/JP2016/087015 patent/WO2017104648A1/ja active Application Filing
- 2016-12-13 KR KR1020187020194A patent/KR102115690B1/ko active IP Right Grant
- 2016-12-13 CN CN201680073320.7A patent/CN108604563B/zh active Active
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Cited By (1)
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JP7439322B1 (ja) | 2023-05-01 | 2024-02-27 | Dmg森精機株式会社 | ロボットの動作制御方法、及び制御装置 |
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CN108604563B (zh) | 2022-12-06 |
WO2017104648A1 (ja) | 2017-06-22 |
TW201722663A (zh) | 2017-07-01 |
KR102115690B1 (ko) | 2020-05-27 |
TWI629149B (zh) | 2018-07-11 |
US10014205B2 (en) | 2018-07-03 |
KR20180099726A (ko) | 2018-09-05 |
US20170170050A1 (en) | 2017-06-15 |
JPWO2017104648A1 (ja) | 2018-10-04 |
CN108604563A (zh) | 2018-09-28 |
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